JP2002523327A - 酸化アルミニウム粒子 - Google Patents
酸化アルミニウム粒子Info
- Publication number
- JP2002523327A JP2002523327A JP2000566199A JP2000566199A JP2002523327A JP 2002523327 A JP2002523327 A JP 2002523327A JP 2000566199 A JP2000566199 A JP 2000566199A JP 2000566199 A JP2000566199 A JP 2000566199A JP 2002523327 A JP2002523327 A JP 2002523327A
- Authority
- JP
- Japan
- Prior art keywords
- particles
- particle size
- aggregate
- aluminum oxide
- percent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01F—COMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
- C01F7/00—Compounds of aluminium
- C01F7/02—Aluminium oxide; Aluminium hydroxide; Aluminates
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01F—COMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
- C01F7/00—Compounds of aluminium
- C01F7/02—Aluminium oxide; Aluminium hydroxide; Aluminates
- C01F7/30—Preparation of aluminium oxide or hydroxide by thermal decomposition or by hydrolysis or oxidation of aluminium compounds
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01F—COMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
- C01F7/00—Compounds of aluminium
- C01F7/02—Aluminium oxide; Aluminium hydroxide; Aluminates
- C01F7/30—Preparation of aluminium oxide or hydroxide by thermal decomposition or by hydrolysis or oxidation of aluminium compounds
- C01F7/306—Thermal decomposition of hydrated chlorides, e.g. of aluminium trichloride hexahydrate
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2002/00—Crystal-structural characteristics
- C01P2002/70—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data
- C01P2002/72—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data by d-values or two theta-values, e.g. as X-ray diagram
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/01—Particle morphology depicted by an image
- C01P2004/04—Particle morphology depicted by an image obtained by TEM, STEM, STM or AFM
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/30—Particle morphology extending in three dimensions
- C01P2004/32—Spheres
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/50—Agglomerated particles
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/51—Particles with a specific particle size distribution
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/51—Particles with a specific particle size distribution
- C01P2004/52—Particles with a specific particle size distribution highly monodisperse size distribution
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/62—Submicrometer sized, i.e. from 0.1-1 micrometer
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1409—Abrasive particles per se
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1454—Abrasive powders, suspensions and pastes for polishing
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Geology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Thermal Sciences (AREA)
- Engineering & Computer Science (AREA)
- Nanotechnology (AREA)
- Composite Materials (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/136,483 | 1998-08-19 | ||
| US09/136,483 US20090255189A1 (en) | 1998-08-19 | 1998-08-19 | Aluminum oxide particles |
| PCT/US1999/018169 WO2000010920A1 (en) | 1998-08-19 | 1999-08-11 | Aluminum oxide particles |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010154669A Division JP2010265171A (ja) | 1998-08-19 | 2010-07-07 | 酸化アルミニウム粒子 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2002523327A true JP2002523327A (ja) | 2002-07-30 |
| JP2002523327A5 JP2002523327A5 (enExample) | 2006-09-28 |
Family
ID=22473049
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000566199A Withdrawn JP2002523327A (ja) | 1998-08-19 | 1999-08-11 | 酸化アルミニウム粒子 |
| JP2010154669A Pending JP2010265171A (ja) | 1998-08-19 | 2010-07-07 | 酸化アルミニウム粒子 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010154669A Pending JP2010265171A (ja) | 1998-08-19 | 2010-07-07 | 酸化アルミニウム粒子 |
Country Status (7)
| Country | Link |
|---|---|
| US (2) | US20090255189A1 (enExample) |
| EP (1) | EP1129035A1 (enExample) |
| JP (2) | JP2002523327A (enExample) |
| KR (1) | KR20010072686A (enExample) |
| CN (1) | CN1322185A (enExample) |
| TW (1) | TW590988B (enExample) |
| WO (1) | WO2000010920A1 (enExample) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006523178A (ja) * | 2003-04-02 | 2006-10-12 | サン−ゴバン セラミックス アンド プラスティクス,インコーポレイティド | ナノ多孔質超微細アルファ−アルミナ粉末及び該粉末を調製するゾル−ゲル法 |
| JP2007500943A (ja) * | 2003-07-30 | 2007-01-18 | クライマックス・エンジニアード・マテリアルズ・エルエルシー | 銅を化学的機械的に平滑化するためのスラリーおよび方法 |
| KR101286825B1 (ko) * | 2005-03-18 | 2013-07-17 | 스미또모 가가꾸 가부시키가이샤 | 미세 α-알루미나 입자의 제조 방법 |
| JP2021147529A (ja) * | 2020-03-19 | 2021-09-27 | 株式会社フジミインコーポレーテッド | 研磨用組成物、研磨方法および半導体基板の製造方法 |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2002032588A1 (en) | 2000-10-17 | 2002-04-25 | Neophotonics Corporation | Coating formation by reactive deposition |
| US6788866B2 (en) | 2001-08-17 | 2004-09-07 | Nanogram Corporation | Layer materials and planar optical devices |
| US20030077221A1 (en) * | 2001-10-01 | 2003-04-24 | Shivkumar Chiruvolu | Aluminum oxide powders |
| US7080513B2 (en) | 2001-08-04 | 2006-07-25 | Siemens Aktiengesellschaft | Seal element for sealing a gap and combustion turbine having a seal element |
| WO2005053828A2 (en) * | 2003-11-07 | 2005-06-16 | Ahwahnee Technology, Inc. | Systems and methods for manufacture of carbon nanotubes |
| US20070003694A1 (en) * | 2005-05-23 | 2007-01-04 | Shivkumar Chiruvolu | In-flight modification of inorganic particles within a reaction product flow |
| US20090020411A1 (en) * | 2007-07-20 | 2009-01-22 | Holunga Dean M | Laser pyrolysis with in-flight particle manipulation for powder engineering |
| US8252076B2 (en) | 2007-12-05 | 2012-08-28 | 3M Innovative Properties Company | Buffing composition and method of finishing a surface of a material |
| FR2956111B1 (fr) * | 2010-02-11 | 2012-04-20 | Baikowski | Alumine alpha, utilisation, procede de synthese et dispositif associes |
| CN114975234A (zh) * | 2021-02-24 | 2022-08-30 | 中国科学院微电子研究所 | 一种半导体器件的制造方法 |
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| US3406228A (en) * | 1964-06-17 | 1968-10-15 | Cabot Corp | Method of producing extremely finely-divided oxides |
| BE790704A (fr) * | 1971-10-28 | 1973-02-15 | Degussa | Procede pour la fabrication d'oxydes finement |
| US4021263A (en) * | 1972-01-03 | 1977-05-03 | Johnson & Johnson | Polishing compositions |
| US4011099A (en) * | 1975-11-07 | 1977-03-08 | Monsanto Company | Preparation of damage-free surface on alpha-alumina |
| US4048290A (en) * | 1976-01-28 | 1977-09-13 | Cabot Corporation | Process for the production of finely-divided metal and metalloid oxides |
| GB2002342B (en) * | 1977-07-27 | 1982-06-30 | Sumitomo Electric Industries | Process for producing a glass member |
| US4356107A (en) * | 1979-11-26 | 1982-10-26 | Nalco Chemical Company | Process for preparing silica sols |
| DE3132674C2 (de) * | 1981-08-19 | 1983-12-08 | Degussa Ag, 6000 Frankfurt | Verfahren zur Herstellung von Preßlingen |
| JPS58110414A (ja) * | 1981-12-23 | 1983-07-01 | Tokuyama Soda Co Ltd | 無機酸化物及びその製造方法 |
| IT1161200B (it) * | 1983-02-25 | 1987-03-18 | Montedison Spa | Processo e apparecchio per la preparazione di particelle di ossidi metallici monodisperse, sferiche, non aggregate e di dimensione inferiore al micron |
| DE3581293D1 (de) * | 1984-02-09 | 1991-02-21 | Toyota Motor Co Ltd | Verfahren zur herstellung von ultrafeinen keramikpartikeln. |
| US4548798A (en) * | 1984-04-16 | 1985-10-22 | Exxon Research And Engineering Co. | Laser synthesis of refractory oxide powders |
| US4649037A (en) * | 1985-03-29 | 1987-03-10 | Allied Corporation | Spray-dried inorganic oxides from non-aqueous gels or solutions |
| US4690693A (en) * | 1985-12-05 | 1987-09-01 | Gte Products Corporation | High purity silicon nitride polishing compound |
| IT1197794B (it) * | 1986-07-31 | 1988-12-06 | Montedison Spa | Procedimento per la preparazione di panticelle fini di ossidi metallici |
| JPS6374911A (ja) * | 1986-09-19 | 1988-04-05 | Shin Etsu Chem Co Ltd | 微細球状シリカの製造法 |
| JPH0816003B2 (ja) * | 1986-12-27 | 1996-02-21 | 株式会社アドバンス | 無機酸化物の製造方法 |
| US4956313A (en) * | 1987-08-17 | 1990-09-11 | International Business Machines Corporation | Via-filling and planarization technique |
| DE3884778T2 (de) * | 1987-12-29 | 1994-05-11 | Du Pont | Feine Polierzusammensetzung für Plaketten. |
| DE3801270A1 (de) * | 1988-01-19 | 1989-07-27 | Degussa | Zirkondotierter pseudoboehmit, verfahren zu seiner herstellung und anwendung |
| DE3801511C2 (de) * | 1988-01-20 | 1996-11-14 | Espe Stiftung | Verwendung von Photoinitiatoren zur Herstellung von in zwei Schritten härtbaren Dentalmassen |
| US4910155A (en) * | 1988-10-28 | 1990-03-20 | International Business Machines Corporation | Wafer flood polishing |
| US5064517A (en) * | 1989-01-18 | 1991-11-12 | Idemitsu Kosan Company Limited | Method for the preparation of fine particulate-metal-containing compound |
| US5246624A (en) * | 1989-03-21 | 1993-09-21 | Cabot Corporation | Aqueous colloidal dispersion of fumed silica, acid and stabilizer |
| US5158758A (en) * | 1989-04-24 | 1992-10-27 | International Minerals & Chemical Corp. | Production of silica having high specific surface area |
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| DE3939953A1 (de) * | 1989-12-02 | 1991-06-06 | Bayer Ag | Verfahren zur herstellung feinteiliger keramischer oxid-pulver aus vorlaeuferverbindungen |
| US5128081A (en) * | 1989-12-05 | 1992-07-07 | Arch Development Corporation | Method of making nanocrystalline alpha alumina |
| US5320800A (en) * | 1989-12-05 | 1994-06-14 | Arch Development Corporation | Nanocrystalline ceramic materials |
| JP3047110B2 (ja) * | 1990-06-15 | 2000-05-29 | 株式会社東北テクノアーチ | 金属酸化物微粒子の製造方法 |
| US5228886A (en) * | 1990-10-09 | 1993-07-20 | Buehler, Ltd. | Mechanochemical polishing abrasive |
| US5246010A (en) * | 1990-12-11 | 1993-09-21 | Biotrine Corporation | Method and apparatus for exhalation analysis |
| US5930608A (en) * | 1992-02-21 | 1999-07-27 | Semiconductor Energy Laboratory Co., Ltd. | Method of fabricating a thin film transistor in which the channel region of the transistor consists of two portions of differing crystallinity |
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| FR2691918B1 (fr) * | 1992-06-09 | 1994-07-22 | Kodak Pathe | Preparation de poudres conductrices d'oxydes metalliques. |
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| TW555696B (en) * | 1998-01-08 | 2003-10-01 | Nissan Chemical Ind Ltd | Alumina powder, process for producing the same and polishing composition |
| EP1256548A4 (en) * | 1999-12-27 | 2004-05-19 | Showa Denko Kk | ALUMINUM OXIDE PARTICLES, METHOD FOR THE PRODUCTION THEREOF, COMPOSITION THEREOF, AND ALUMINUM OXIDE SLURRY FOR POLISHING |
| AU2002324420A1 (en) * | 2001-02-12 | 2002-12-23 | Elena Mardilovich | Precursors of engineered powders |
-
1998
- 1998-08-19 US US09/136,483 patent/US20090255189A1/en not_active Abandoned
-
1999
- 1999-08-11 WO PCT/US1999/018169 patent/WO2000010920A1/en not_active Ceased
- 1999-08-11 JP JP2000566199A patent/JP2002523327A/ja not_active Withdrawn
- 1999-08-11 KR KR1020017001980A patent/KR20010072686A/ko not_active Withdrawn
- 1999-08-11 CN CN99811839A patent/CN1322185A/zh active Pending
- 1999-08-11 EP EP99942084A patent/EP1129035A1/en not_active Withdrawn
- 1999-08-16 TW TW088113969A patent/TW590988B/zh not_active IP Right Cessation
-
2005
- 2005-01-28 US US11/046,610 patent/US20050132659A1/en not_active Abandoned
-
2010
- 2010-07-07 JP JP2010154669A patent/JP2010265171A/ja active Pending
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006523178A (ja) * | 2003-04-02 | 2006-10-12 | サン−ゴバン セラミックス アンド プラスティクス,インコーポレイティド | ナノ多孔質超微細アルファ−アルミナ粉末及び該粉末を調製するゾル−ゲル法 |
| JP2007500943A (ja) * | 2003-07-30 | 2007-01-18 | クライマックス・エンジニアード・マテリアルズ・エルエルシー | 銅を化学的機械的に平滑化するためのスラリーおよび方法 |
| KR101286825B1 (ko) * | 2005-03-18 | 2013-07-17 | 스미또모 가가꾸 가부시키가이샤 | 미세 α-알루미나 입자의 제조 방법 |
| TWI408104B (zh) * | 2005-03-18 | 2013-09-11 | Sumitomo Chemical Co | 微細α-氧化鋁粒子之製造方法 |
| JP2021147529A (ja) * | 2020-03-19 | 2021-09-27 | 株式会社フジミインコーポレーテッド | 研磨用組成物、研磨方法および半導体基板の製造方法 |
| JP7398304B2 (ja) | 2020-03-19 | 2023-12-14 | 株式会社フジミインコーポレーテッド | 研磨用組成物、研磨方法および半導体基板の製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| US20050132659A1 (en) | 2005-06-23 |
| TW590988B (en) | 2004-06-11 |
| CN1322185A (zh) | 2001-11-14 |
| US20090255189A1 (en) | 2009-10-15 |
| WO2000010920A1 (en) | 2000-03-02 |
| JP2010265171A (ja) | 2010-11-25 |
| EP1129035A1 (en) | 2001-09-05 |
| KR20010072686A (ko) | 2001-07-31 |
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