JP2002289955A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2002289955A5 JP2002289955A5 JP2001085248A JP2001085248A JP2002289955A5 JP 2002289955 A5 JP2002289955 A5 JP 2002289955A5 JP 2001085248 A JP2001085248 A JP 2001085248A JP 2001085248 A JP2001085248 A JP 2001085248A JP 2002289955 A5 JP2002289955 A5 JP 2002289955A5
- Authority
- JP
- Japan
- Prior art keywords
- nitride semiconductor
- semiconductor laser
- contact layer
- laser device
- semiconductor substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 description 21
- 150000004767 nitrides Chemical class 0.000 description 11
- 239000000758 substrate Substances 0.000 description 7
- 230000003287 optical effect Effects 0.000 description 4
- 238000003776 cleavage reaction Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000007017 scission Effects 0.000 description 2
- 229910016420 Ala Inb Inorganic materials 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001085248A JP2002289955A (ja) | 2001-03-23 | 2001-03-23 | 半導体レーザ素子とその製造方法および光学式情報再生装置 |
| US10/104,931 US6865201B2 (en) | 2001-03-23 | 2002-03-22 | Semiconductor laser device, method of fabricating the same and optical information reproduction apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001085248A JP2002289955A (ja) | 2001-03-23 | 2001-03-23 | 半導体レーザ素子とその製造方法および光学式情報再生装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2002289955A JP2002289955A (ja) | 2002-10-04 |
| JP2002289955A5 true JP2002289955A5 (enExample) | 2007-12-27 |
Family
ID=18940792
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001085248A Pending JP2002289955A (ja) | 2001-03-23 | 2001-03-23 | 半導体レーザ素子とその製造方法および光学式情報再生装置 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US6865201B2 (enExample) |
| JP (1) | JP2002289955A (enExample) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003017791A (ja) * | 2001-07-03 | 2003-01-17 | Sharp Corp | 窒化物半導体素子及びこの窒化物半導体素子の製造方法 |
| US6987281B2 (en) * | 2003-02-13 | 2006-01-17 | Cree, Inc. | Group III nitride contact structures for light emitting devices |
| JP2006135221A (ja) * | 2004-11-09 | 2006-05-25 | Mitsubishi Electric Corp | 半導体発光素子 |
| KR101283233B1 (ko) * | 2007-06-25 | 2013-07-11 | 엘지이노텍 주식회사 | 발광 소자 및 그 제조방법 |
| JP5225639B2 (ja) * | 2007-09-06 | 2013-07-03 | 浜松ホトニクス株式会社 | 半導体レーザ素子の製造方法 |
| DE102017119931A1 (de) * | 2017-08-30 | 2019-02-28 | Osram Opto Semiconductors Gmbh | Optoelektronisches Halbleiterbauelement |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6450586A (en) * | 1987-08-21 | 1989-02-27 | Fuji Electric Co Ltd | Semiconductor laser |
| JP2910811B2 (ja) * | 1993-03-25 | 1999-06-23 | 日亜化学工業株式会社 | 窒化ガリウム系化合物半導体ウエハーの切断方法 |
| US6005258A (en) * | 1994-03-22 | 1999-12-21 | Toyoda Gosei Co., Ltd. | Light-emitting semiconductor device using group III Nitrogen compound having emission layer doped with donor and acceptor impurities |
| ID16181A (id) * | 1995-12-25 | 1997-09-11 | Sony Corp | Alat semi konduktor dengan permukaan terbelah |
| JPH1027939A (ja) * | 1996-07-11 | 1998-01-27 | Nichia Chem Ind Ltd | 窒化物半導体レーザ素子 |
| JPH10209569A (ja) * | 1997-01-16 | 1998-08-07 | Hewlett Packard Co <Hp> | p型窒化物半導体装置とその製造方法 |
| JP3223832B2 (ja) * | 1997-02-24 | 2001-10-29 | 日亜化学工業株式会社 | 窒化物半導体素子及び半導体レーザダイオード |
| JPH11251266A (ja) * | 1998-02-27 | 1999-09-17 | Victor Co Of Japan Ltd | 粘着シ−ト |
| JPH11251682A (ja) * | 1998-03-04 | 1999-09-17 | Hitachi Ltd | 半導体光素子 |
| JP3822976B2 (ja) * | 1998-03-06 | 2006-09-20 | ソニー株式会社 | 半導体装置およびその製造方法 |
| US6194742B1 (en) * | 1998-06-05 | 2001-02-27 | Lumileds Lighting, U.S., Llc | Strain engineered and impurity controlled III-V nitride semiconductor films and optoelectronic devices |
| US20010042866A1 (en) * | 1999-02-05 | 2001-11-22 | Carrie Carter Coman | Inxalygazn optical emitters fabricated via substrate removal |
| US6515313B1 (en) * | 1999-12-02 | 2003-02-04 | Cree Lighting Company | High efficiency light emitters with reduced polarization-induced charges |
| TW488088B (en) * | 2001-01-19 | 2002-05-21 | South Epitaxy Corp | Light emitting diode structure |
| TW492202B (en) * | 2001-06-05 | 2002-06-21 | South Epitaxy Corp | Structure of III-V light emitting diode (LED) arranged in flip chip configuration having structure for preventing electrostatic discharge |
| TW515116B (en) * | 2001-12-27 | 2002-12-21 | South Epitaxy Corp | Light emitting diode structure |
-
2001
- 2001-03-23 JP JP2001085248A patent/JP2002289955A/ja active Pending
-
2002
- 2002-03-22 US US10/104,931 patent/US6865201B2/en not_active Expired - Lifetime
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN102170090B (zh) | 氮化物半导体发光元件 | |
| Wong et al. | Continuous-wave InGaN multiple-quantum-well laser diodes on copper substrates | |
| US7501299B2 (en) | Method for controlling the structure and surface qualities of a thin film and product produced thereby | |
| JP2002158373A (ja) | 発光ダイオード及び発光ダイオードの製造方法 | |
| ID28748A (id) | Piringan optik dan metode pembuatannya | |
| JP2006324685A5 (enExample) | ||
| TWI347054B (en) | Nitride semiconductor laser device and method of manufacturing the nitride semiconductor laser device | |
| TW200509119A (en) | Optical recording medium, its manufacturing method, data recording method and data regenerating method of optical recording medium | |
| JP2003198043A5 (enExample) | ||
| JP2012038897A5 (enExample) | ||
| CN101471536B (zh) | 氮化物半导体激光器芯片及其制造方法 | |
| JP2002289955A5 (enExample) | ||
| TW200527714A (en) | A semiconductor light-emitting device | |
| EP1398767A3 (en) | Optical recording/reproducing method and optical recording medium | |
| JPH08274371A (ja) | 半導体発光素子及びその製造方法 | |
| EP1276105A3 (en) | Optical information recording medium and recording method using the same | |
| JP2002314131A5 (enExample) | ||
| TWI256629B (en) | Optical recording/reproduction method and optical recording medium | |
| CN1805230A (zh) | 氮化物半导体发光元件及其制造方法 | |
| TWI360273B (en) | Semiconductor laser | |
| JP2003198065A5 (enExample) | ||
| JP2006278694A5 (enExample) | ||
| JP2003163415A5 (enExample) | ||
| JP2002305348A5 (enExample) | ||
| JP2004096132A5 (enExample) |