JP2002284997A5 - - Google Patents

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Publication number
JP2002284997A5
JP2002284997A5 JP2001312551A JP2001312551A JP2002284997A5 JP 2002284997 A5 JP2002284997 A5 JP 2002284997A5 JP 2001312551 A JP2001312551 A JP 2001312551A JP 2001312551 A JP2001312551 A JP 2001312551A JP 2002284997 A5 JP2002284997 A5 JP 2002284997A5
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JP
Japan
Prior art keywords
porogen
polysilica dielectric
organic polysilica
composition
substituted
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001312551A
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English (en)
Japanese (ja)
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JP2002284997A (ja
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Publication of JP2002284997A publication Critical patent/JP2002284997A/ja
Publication of JP2002284997A5 publication Critical patent/JP2002284997A5/ja
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JP2001312551A 2000-10-10 2001-10-10 多孔性有機ポリシリカ誘電体形成用の組成物 Pending JP2002284997A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US23902600P 2000-10-10 2000-10-10
US60/239026 2000-10-10

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2007150981A Division JP4758949B2 (ja) 2000-10-10 2007-06-06 多孔性有機ポリシリカ誘電体形成用の組成物

Publications (2)

Publication Number Publication Date
JP2002284997A JP2002284997A (ja) 2002-10-03
JP2002284997A5 true JP2002284997A5 (https=) 2005-06-30

Family

ID=22900292

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2001312551A Pending JP2002284997A (ja) 2000-10-10 2001-10-10 多孔性有機ポリシリカ誘電体形成用の組成物
JP2007150981A Expired - Fee Related JP4758949B2 (ja) 2000-10-10 2007-06-06 多孔性有機ポリシリカ誘電体形成用の組成物

Family Applications After (1)

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JP2007150981A Expired - Fee Related JP4758949B2 (ja) 2000-10-10 2007-06-06 多孔性有機ポリシリカ誘電体形成用の組成物

Country Status (5)

Country Link
US (3) US6576681B2 (https=)
EP (1) EP1197998A3 (https=)
JP (2) JP2002284997A (https=)
KR (1) KR100816664B1 (https=)
TW (1) TW588072B (https=)

Families Citing this family (87)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8352400B2 (en) 1991-12-23 2013-01-08 Hoffberg Steven M Adaptive pattern recognition based controller apparatus and method and human-factored interface therefore
DE19829172A1 (de) * 1998-06-30 2000-01-05 Univ Konstanz Verfahren zur Herstellung von Antireflexschichten
US7904187B2 (en) 1999-02-01 2011-03-08 Hoffberg Steven M Internet appliance system and method
US6686035B2 (en) * 1999-02-05 2004-02-03 Waters Investments Limited Porous inorganic/organic hybrid particles for chromatographic separations and process for their preparation
EP1323189A2 (en) * 2000-09-13 2003-07-02 Shipley Company LLC Electronic device manufacture
US20020132496A1 (en) * 2001-02-12 2002-09-19 Ball Ian J. Ultra low-k dielectric materials
US6903175B2 (en) * 2001-03-26 2005-06-07 Shipley Company, L.L.C. Polymer synthesis and films therefrom
US7141188B2 (en) * 2001-05-30 2006-11-28 Honeywell International Inc. Organic compositions
US7250214B2 (en) 2001-08-09 2007-07-31 Waters Investments Limited Porous inorganic/organic hybrid monolith materials for chromatographic separations and process for their preparation
TW591341B (en) * 2001-09-26 2004-06-11 Shipley Co Llc Coating compositions for use with an overcoated photoresist
WO2003060979A2 (en) * 2002-01-15 2003-07-24 Honeywell International Inc. Organic compositions for low dielectric constant materials
US8012670B2 (en) 2002-04-11 2011-09-06 Rohm And Haas Electronic Materials Llc Photoresist systems
KR100478982B1 (ko) * 2002-05-02 2005-03-25 금호석유화학 주식회사 신규 산발생제 및 이를 함유한 박막 조성물
US7122880B2 (en) * 2002-05-30 2006-10-17 Air Products And Chemicals, Inc. Compositions for preparing low dielectric materials
US7018678B2 (en) * 2002-06-03 2006-03-28 Shipley Company, L.L.C. Electronic device manufacture
JP4574145B2 (ja) 2002-09-13 2010-11-04 ローム・アンド・ハース・エレクトロニック・マテリアルズ,エル.エル.シー. エアギャップ形成
JP2004274020A (ja) * 2002-09-24 2004-09-30 Rohm & Haas Electronic Materials Llc 電子デバイス製造
US20040067437A1 (en) * 2002-10-06 2004-04-08 Shipley Company, L.L.C. Coating compositions for use with an overcoated photoresist
DE10393599T5 (de) 2002-10-30 2005-10-27 Waters Investments Ltd., New Castle Poröse anorganische/organische Homogene copolymerische Hybridmaterialien für chromatographische Auftrennungen und Verfahren für deren Herstellung
EP1420439B1 (en) * 2002-11-14 2012-08-29 Air Products And Chemicals, Inc. Non-thermal process for forming porous low dielectric constant films
US7404990B2 (en) 2002-11-14 2008-07-29 Air Products And Chemicals, Inc. Non-thermal process for forming porous low dielectric constant films
EP1422565A3 (en) * 2002-11-20 2005-01-05 Shipley Company LLC Multilayer photoresist systems
KR20040044368A (ko) * 2002-11-20 2004-05-28 쉬플리 캄파니, 엘.엘.씨. 다층 포토레지스트 시스템
TWI240959B (en) * 2003-03-04 2005-10-01 Air Prod & Chem Mechanical enhancement of dense and porous organosilicate materials by UV exposure
US7112617B2 (en) 2003-04-22 2006-09-26 International Business Machines Corporation Patterned substrate with hydrophilic/hydrophobic contrast, and method of use
US7282241B2 (en) 2003-04-22 2007-10-16 International Business Machines Corporation Patterned, high surface area substrate with hydrophilic/hydrophobic contrast, and method of use
PL1625716T3 (pl) 2003-05-06 2008-05-30 Apple Inc System i usługa przesyłania wiadomości
ATE377036T1 (de) * 2003-05-23 2007-11-15 Dow Corning Siloxan-harz basierte anti- reflektionsbeschichtung mit hoher nassätzgeschwindigkeit
DE10330022A1 (de) 2003-07-03 2005-01-20 Degussa Ag Verfahren zur Herstellung von Iow-k dielektrischen Filmen
US7361447B2 (en) * 2003-07-30 2008-04-22 Hynix Semiconductor Inc. Photoresist polymer and photoresist composition containing the same
KR100554157B1 (ko) * 2003-08-21 2006-02-22 학교법인 포항공과대학교 저유전 특성의 유기 실리케이트 고분자 복합체
JP4563076B2 (ja) * 2004-05-26 2010-10-13 東京応化工業株式会社 反射防止膜形成用組成物、該反射防止膜形成用組成物からなる反射防止膜、および該反射防止膜形成用組成物を用いたレジストパターン形成方法
US7148263B2 (en) * 2004-07-14 2006-12-12 Honeywell International Inc. Hybrid inorganic/organic low k dielectric films with improved mechanical strength
US8658277B2 (en) * 2004-07-30 2014-02-25 Waters Technologies Corporation Porous inorganic/organic hybrid materials with ordered domains for chromatographic separations and processes for their preparation
US10773186B2 (en) 2004-07-30 2020-09-15 Waters Technologies Corporation Porous inorganic/organic hybrid materials with ordered domains for chromatographic separations and processes for their preparation
EP1632956A1 (en) * 2004-09-07 2006-03-08 Rohm and Haas Electronic Materials, L.L.C. Compositions comprising an organic polysilica and an arylgroup-capped polyol, and methods for preparing porous organic polysilica films
DE602005008100D1 (de) 2004-12-17 2008-08-21 Dow Corning Verfahren zur ausbildung einer antireflexionsbeschichtung
ATE486098T1 (de) 2004-12-17 2010-11-15 Dow Corning Siloxanharzbeschichtung
KR101119141B1 (ko) * 2005-01-20 2012-03-19 삼성코닝정밀소재 주식회사 폴리머 나노 입자를 포함하는 저유전 박막 형성용 조성물및 이를 이용한 저유전 박막의 제조방법
US7693887B2 (en) * 2005-02-01 2010-04-06 Strands, Inc. Dynamic identification of a new set of media items responsive to an input mediaset
US7734569B2 (en) * 2005-02-03 2010-06-08 Strands, Inc. Recommender system for identifying a new set of media items responsive to an input set of media items and knowledge base metrics
EP1844386A4 (en) 2005-02-04 2009-11-25 Strands Inc NAVIGATION SYSTEM IN A MUSICAL CATALOG USING MEASUREMENTS FOR CORRELATION OF A KNOWLEDGE BASE OF MEDIA SETS
TWI340296B (en) * 2005-03-20 2011-04-11 Rohm & Haas Elect Mat Coating compositions for use with an overcoated photoresist
US7877387B2 (en) 2005-09-30 2011-01-25 Strands, Inc. Systems and methods for promotional media item selection and promotional program unit generation
US20090070267A9 (en) * 2005-09-30 2009-03-12 Musicstrands, Inc. User programmed media delivery service
JP4955690B2 (ja) * 2005-10-04 2012-06-20 アップル インコーポレイテッド 音楽ライブラリをビジュアル化するための方法および装置
JP4940410B2 (ja) 2005-12-19 2012-05-30 アップル インコーポレイテッド ユーザ・ツー・ユーザレコメンダ
US20070162546A1 (en) * 2005-12-22 2007-07-12 Musicstrands, Inc. Sharing tags among individual user media libraries
US20070244880A1 (en) * 2006-02-03 2007-10-18 Francisco Martin Mediaset generation system
JP5075132B2 (ja) * 2006-02-10 2012-11-14 アップル インコーポレイテッド モバイルメディアプレーヤファイルに優先度を付けるためのシステムおよび方法
EP1987451A1 (en) * 2006-02-10 2008-11-05 Strands, Inc. Dynamic interactive entertainment
CN101371196B (zh) * 2006-02-13 2012-07-04 陶氏康宁公司 抗反射涂料
WO2007103923A2 (en) * 2006-03-06 2007-09-13 La La Media, Inc Article trading process
CN100425630C (zh) * 2006-04-19 2008-10-15 苏州市成技新材料开发有限公司 含硅偶联剂共聚物成膜树脂及其有机防反射涂膜
WO2008085435A1 (en) * 2007-01-12 2008-07-17 Waters Investments Limited Porous carbon-heteroatom-silicon hybrid inorganic/organic materials for chromatographic separations and process for the preparation thereof
US8026040B2 (en) 2007-02-20 2011-09-27 Az Electronic Materials Usa Corp. Silicone coating composition
US7736837B2 (en) * 2007-02-20 2010-06-15 Az Electronic Materials Usa Corp. Antireflective coating composition based on silicon polymer
EP2121808A1 (en) 2007-02-27 2009-11-25 AZ Electronic Materials USA Corp. Silicon-based antifrelective coating compositions
US8671000B2 (en) 2007-04-24 2014-03-11 Apple Inc. Method and arrangement for providing content to multimedia devices
US20090026924A1 (en) * 2007-07-23 2009-01-29 Leung Roger Y Methods of making low-refractive index and/or low-k organosilicate coatings
WO2009088600A1 (en) 2008-01-08 2009-07-16 Dow Corning Toray Co., Ltd. Silsesquioxane resins
KR20100114075A (ko) 2008-01-15 2010-10-22 다우 코닝 코포레이션 실세스퀴옥산 수지
CN101990551B (zh) 2008-03-04 2012-10-03 陶氏康宁公司 倍半硅氧烷树脂
KR101541939B1 (ko) 2008-03-05 2015-08-04 다우 코닝 코포레이션 실세스퀴옥산 수지
US20090300008A1 (en) * 2008-05-31 2009-12-03 Strands, Inc. Adaptive recommender technology
US20100017725A1 (en) * 2008-07-21 2010-01-21 Strands, Inc. Ambient collage display of digital media content
WO2010040082A1 (en) 2008-10-02 2010-04-08 Strands, Inc. Real-time visualization of user consumption of media items
US20110236835A1 (en) * 2008-12-10 2011-09-29 Peng-Fei Fu Silsesquioxane Resins
EP2373722A4 (en) 2008-12-10 2013-01-23 Dow Corning SILSESQUIOXAN RESINS
US20100169328A1 (en) * 2008-12-31 2010-07-01 Strands, Inc. Systems and methods for making recommendations using model-based collaborative filtering with user communities and items collections
US11439977B2 (en) 2009-06-01 2022-09-13 Waters Technologies Corporation Hybrid material for chromatographic separations comprising a superficially porous core and a surrounding material
JP6151021B2 (ja) 2009-06-01 2017-06-21 ウオーターズ・テクノロジーズ・コーポレイシヨン クロマトグラフ分離用ハイブリッド材料
US20110060738A1 (en) * 2009-09-08 2011-03-10 Apple Inc. Media item clustering based on similarity data
JP2011097024A (ja) * 2009-09-29 2011-05-12 Jsr Corp 光半導体素子の製造方法、及び、光半導体素子保護層形成用組成物
US9138308B2 (en) 2010-02-03 2015-09-22 Apollo Endosurgery, Inc. Mucosal tissue adhesion via textured surface
US9205577B2 (en) * 2010-02-05 2015-12-08 Allergan, Inc. Porogen compositions, methods of making and uses
JP5852640B2 (ja) * 2010-05-11 2016-02-03 アラーガン、インコーポレイテッドAllergan,Incorporated ポロゲン組成物、製造方法、および使用
JP5856162B2 (ja) 2010-07-26 2016-02-09 ウオーターズ・テクノロジーズ・コーポレイシヨン 粒度分布の狭い実質的に非多孔質のハイブリッドコアを含む表面多孔質材料
US8983905B2 (en) 2011-10-03 2015-03-17 Apple Inc. Merging playlists from multiple sources
US8871425B2 (en) * 2012-02-09 2014-10-28 Az Electronic Materials (Luxembourg) S.A.R.L. Low dielectric photoimageable compositions and electronic devices made therefrom
US20190134604A1 (en) 2016-03-06 2019-05-09 Waters Technologies Corporation Porous materials with controlled porosity; process for the preparation thereof; and use thereof for chromatographic separations
US10936653B2 (en) 2017-06-02 2021-03-02 Apple Inc. Automatically predicting relevant contexts for media items
US20200004495A1 (en) 2018-06-27 2020-01-02 Apple Inc. Generating a Customized Social-Driven Playlist
EP3597710B1 (en) * 2018-07-18 2021-08-18 Inkron OY Novel polysiloxane compositions and uses thereof
WO2020198474A1 (en) * 2019-03-26 2020-10-01 Rutgers, The State University Of New Jersey Porous epoxy nanocomposite monoliths
US11512171B2 (en) 2019-08-09 2022-11-29 Merck Patent Gmbh Low dielectric constant siliceous film manufacturing composition and methods for producing cured film and electronic device using the same
JP7579649B2 (ja) * 2020-07-31 2024-11-08 日東電工株式会社 プリント基板用樹脂組成物及び樹脂成形体

Family Cites Families (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4370405A (en) 1981-03-30 1983-01-25 Hewlett-Packard Company Multilayer photoresist process utilizing an absorbant dye
US4362809A (en) 1981-03-30 1982-12-07 Hewlett-Packard Company Multilayer photoresist process utilizing an absorbant dye
US4910122A (en) 1982-09-30 1990-03-20 Brewer Science, Inc. Anti-reflective coating
AU4349489A (en) 1988-09-28 1990-04-18 Brewer Science, Inc. Multifunctional photolithographic compositions
US6165697A (en) * 1991-11-15 2000-12-26 Shipley Company, L.L.C. Antihalation compositions
JP3274487B2 (ja) 1992-01-30 2002-04-15 東レ・ダウコーニング・シリコーン株式会社 発泡性シリコーンゴム組成物およびシリコーンゴム発泡体の製造方法
NZ242686A (en) 1992-05-11 1994-12-22 Carter Holt Harvey Plastic Pro Milking claw divided into four chambers to reduce likelihood of cross contamination of animal's quarters
US5710067A (en) * 1995-06-07 1998-01-20 Advanced Micro Devices, Inc. Silicon oxime film
US6040619A (en) * 1995-06-07 2000-03-21 Advanced Micro Devices Semiconductor device including antireflective etch stop layer
JPH09143420A (ja) 1995-09-21 1997-06-03 Asahi Glass Co Ltd 低誘電率樹脂組成物
US5700844A (en) 1996-04-09 1997-12-23 International Business Machines Corporation Process for making a foamed polymer
US5886102A (en) * 1996-06-11 1999-03-23 Shipley Company, L.L.C. Antireflective coating compositions
US7147983B1 (en) * 1996-10-07 2006-12-12 Shipley Company, L.L.C. Dyed photoresists and methods and articles of manufacture comprising same
US5767014A (en) 1996-10-28 1998-06-16 International Business Machines Corporation Integrated circuit and process for its manufacture
US5895263A (en) 1996-12-19 1999-04-20 International Business Machines Corporation Process for manufacture of integrated circuit device
US5883219A (en) * 1997-05-29 1999-03-16 International Business Machines Corporation Integrated circuit device and process for its manufacture
CA2289782C (en) 1997-07-15 2004-07-13 Asahi Kasei Kogyo Kabushiki Kaisha Alkoxysilane/organic polymer composition for use in producing an insulating thin film and use thereof
JPH11217458A (ja) * 1998-02-04 1999-08-10 Hitachi Chem Co Ltd 多孔質膜、その製造法及び物品
JPH11322992A (ja) * 1998-05-18 1999-11-26 Jsr Corp 多孔質膜
EP1092234A1 (en) * 1998-06-05 2001-04-18 Georgia Tech Research Porous insulating compounds and method for making same
US6143643A (en) 1998-07-08 2000-11-07 International Business Machines Corporation Process for manufacture of integrated circuit device using organosilicate insulative matrices
US6093636A (en) * 1998-07-08 2000-07-25 International Business Machines Corporation Process for manufacture of integrated circuit device using a matrix comprising porous high temperature thermosets
JP2000188332A (ja) * 1998-12-22 2000-07-04 Seiko Epson Corp 半導体装置及びその製造方法
US6146749A (en) 1999-05-03 2000-11-14 Jsr Corporation Low dielectric composition, insulating material, sealing material, and circuit board
US6214746B1 (en) 1999-05-07 2001-04-10 Honeywell International Inc. Nanoporous material fabricated using a dissolvable reagent
JP2003502449A (ja) 1999-06-10 2003-01-21 ハネウエル・インターナシヨナル・インコーポレーテツド フォトリソグラフィ用スピンオンガラス反射防止コーティング
US6268457B1 (en) 1999-06-10 2001-07-31 Allied Signal, Inc. Spin-on glass anti-reflective coatings for photolithography
US6420441B1 (en) * 1999-10-01 2002-07-16 Shipley Company, L.L.C. Porous materials
US6271273B1 (en) 2000-07-14 2001-08-07 Shipley Company, L.L.C. Porous materials
US6368400B1 (en) * 2000-07-17 2002-04-09 Honeywell International Absorbing compounds for spin-on-glass anti-reflective coatings for photolithography
WO2002025374A2 (en) 2000-09-19 2002-03-28 Shipley Company, L.L.C. Antireflective composition

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