JP2002244035A5 - - Google Patents

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Publication number
JP2002244035A5
JP2002244035A5 JP2001370947A JP2001370947A JP2002244035A5 JP 2002244035 A5 JP2002244035 A5 JP 2002244035A5 JP 2001370947 A JP2001370947 A JP 2001370947A JP 2001370947 A JP2001370947 A JP 2001370947A JP 2002244035 A5 JP2002244035 A5 JP 2002244035A5
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JP
Japan
Prior art keywords
lens group
optical system
optical
projection optical
photosensitive substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001370947A
Other languages
English (en)
Japanese (ja)
Other versions
JP2002244035A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2001370947A priority Critical patent/JP2002244035A/ja
Priority claimed from JP2001370947A external-priority patent/JP2002244035A/ja
Priority to CN02118048A priority patent/CN1423147A/zh
Publication of JP2002244035A publication Critical patent/JP2002244035A/ja
Publication of JP2002244035A5 publication Critical patent/JP2002244035A5/ja
Pending legal-status Critical Current

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JP2001370947A 2000-12-11 2001-12-05 投影光学系および該投影光学系を備えた露光装置 Pending JP2002244035A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2001370947A JP2002244035A (ja) 2000-12-11 2001-12-05 投影光学系および該投影光学系を備えた露光装置
CN02118048A CN1423147A (zh) 2001-12-05 2002-04-19 投影光学系统和具有该投影光学系统的曝光装置

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2000375992 2000-12-11
JP2000-375992 2000-12-11
JP2001370947A JP2002244035A (ja) 2000-12-11 2001-12-05 投影光学系および該投影光学系を備えた露光装置

Publications (2)

Publication Number Publication Date
JP2002244035A JP2002244035A (ja) 2002-08-28
JP2002244035A5 true JP2002244035A5 (enrdf_load_stackoverflow) 2005-08-18

Family

ID=26605599

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001370947A Pending JP2002244035A (ja) 2000-12-11 2001-12-05 投影光学系および該投影光学系を備えた露光装置

Country Status (1)

Country Link
JP (1) JP2002244035A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8208123B2 (en) 2003-08-29 2012-06-26 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10210899A1 (de) 2002-03-08 2003-09-18 Zeiss Carl Smt Ag Refraktives Projektionsobjektiv für Immersions-Lithographie
US7362508B2 (en) * 2002-08-23 2008-04-22 Nikon Corporation Projection optical system and method for photolithography and exposure apparatus and method using same
EP1571700A4 (en) * 2002-12-10 2007-09-12 Nikon Corp OPTICAL DEVICE AND PROJECTION EXPOSURE DEVICE USING THE OPTICAL DEVICE
KR101383984B1 (ko) 2003-05-06 2014-04-10 가부시키가이샤 니콘 투영 광학계, 노광 장치 및 노광 방법
US7348575B2 (en) 2003-05-06 2008-03-25 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
JP2005017734A (ja) * 2003-06-26 2005-01-20 Nikon Corp 投影光学系、露光装置、およびデバイス製造方法
US7697111B2 (en) 2003-08-26 2010-04-13 Nikon Corporation Optical element and exposure apparatus
JP2005114400A (ja) * 2003-10-03 2005-04-28 Nikon Corp 光学特性の計測方法、反射防止膜、光学系及び投影露光装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8208123B2 (en) 2003-08-29 2012-06-26 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method

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