JP2003114387A5 - - Google Patents

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Publication number
JP2003114387A5
JP2003114387A5 JP2001308754A JP2001308754A JP2003114387A5 JP 2003114387 A5 JP2003114387 A5 JP 2003114387A5 JP 2001308754 A JP2001308754 A JP 2001308754A JP 2001308754 A JP2001308754 A JP 2001308754A JP 2003114387 A5 JP2003114387 A5 JP 2003114387A5
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JP
Japan
Prior art keywords
optical system
image
mirror
disposed
catadioptric
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Pending
Application number
JP2001308754A
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English (en)
Japanese (ja)
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JP2003114387A (ja
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Priority to JP2001308754A priority Critical patent/JP2003114387A/ja
Priority claimed from JP2001308754A external-priority patent/JP2003114387A/ja
Publication of JP2003114387A publication Critical patent/JP2003114387A/ja
Publication of JP2003114387A5 publication Critical patent/JP2003114387A5/ja
Pending legal-status Critical Current

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JP2001308754A 2001-10-04 2001-10-04 反射屈折光学系および該光学系を備える投影露光装置 Pending JP2003114387A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001308754A JP2003114387A (ja) 2001-10-04 2001-10-04 反射屈折光学系および該光学系を備える投影露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001308754A JP2003114387A (ja) 2001-10-04 2001-10-04 反射屈折光学系および該光学系を備える投影露光装置

Publications (2)

Publication Number Publication Date
JP2003114387A JP2003114387A (ja) 2003-04-18
JP2003114387A5 true JP2003114387A5 (enrdf_load_stackoverflow) 2005-08-18

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JP2001308754A Pending JP2003114387A (ja) 2001-10-04 2001-10-04 反射屈折光学系および該光学系を備える投影露光装置

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JP (1) JP2003114387A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7782538B2 (en) 2003-12-15 2010-08-24 Carl Zeiss Smt Ag Projection objective having a high aperture and a planar end surface
US7859748B2 (en) 2000-01-14 2010-12-28 Carl Zeiss Smt Gmbh Microlithographic reduction projection catadioptric objective

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KR101124179B1 (ko) 2003-04-09 2012-03-27 가부시키가이샤 니콘 노광 방법 및 장치, 그리고 디바이스 제조 방법
KR101516141B1 (ko) * 2003-05-06 2015-05-04 가부시키가이샤 니콘 투영 광학계, 노광 장치 및 노광 방법
US7348575B2 (en) 2003-05-06 2008-03-25 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
JP2005115127A (ja) * 2003-10-09 2005-04-28 Nikon Corp 反射屈折投影光学系、露光装置及び露光方法
JP2004333761A (ja) * 2003-05-06 2004-11-25 Nikon Corp 反射屈折型の投影光学系、露光装置、および露光方法
US7085075B2 (en) 2003-08-12 2006-08-01 Carl Zeiss Smt Ag Projection objectives including a plurality of mirrors with lenses ahead of mirror M3
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
TWI360158B (en) 2003-10-28 2012-03-11 Nikon Corp Projection exposure device,exposure method and dev
TWI385414B (zh) 2003-11-20 2013-02-11 尼康股份有限公司 光學照明裝置、照明方法、曝光裝置、曝光方法以及元件製造方法
WO2005059645A2 (en) 2003-12-19 2005-06-30 Carl Zeiss Smt Ag Microlithography projection objective with crystal elements
KR101407204B1 (ko) 2004-01-14 2014-06-13 칼 짜이스 에스엠티 게엠베하 투영 대물렌즈
US7463422B2 (en) 2004-01-14 2008-12-09 Carl Zeiss Smt Ag Projection exposure apparatus
US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
TWI360837B (en) 2004-02-06 2012-03-21 Nikon Corp Polarization changing device, optical illumination
US7712905B2 (en) * 2004-04-08 2010-05-11 Carl Zeiss Smt Ag Imaging system with mirror group
KR101391470B1 (ko) 2004-05-17 2014-05-07 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
EP2189848B1 (en) 2004-07-14 2012-03-28 Carl Zeiss SMT GmbH Catadioptric projection objective
US8300210B2 (en) 2004-10-08 2012-10-30 Carl Zeiss Smt Gmbh Optical projection system
DE102005042005A1 (de) 2004-12-23 2006-07-06 Carl Zeiss Smt Ag Hochaperturiges Objektiv mit obskurierter Pupille
KR101148589B1 (ko) * 2004-12-23 2012-05-22 칼 짜이스 에스엠티 게엠베하 마이크로리소그래피 투사 대물렌즈
US7218453B2 (en) 2005-02-04 2007-05-15 Carl Zeiss Smt Ag Projection system, in particular for a microlithographic projection exposure apparatus
US7324185B2 (en) 2005-03-04 2008-01-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2006309220A (ja) 2005-04-29 2006-11-09 Carl Zeiss Smt Ag 投影対物レンズ
US8248577B2 (en) 2005-05-03 2012-08-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP5449672B2 (ja) 2005-05-12 2014-03-19 株式会社ニコン 投影光学系、露光装置、および露光方法
WO2007031271A1 (en) 2005-09-13 2007-03-22 Carl Zeiss Smt Ag Microlithography projection optical system, method for manufacturing a device and method to design an optical surface
WO2007093433A1 (de) 2006-02-17 2007-08-23 Carl Zeiss Smt Ag Beleuchtungssystem für die mikro-lithographie, projektionsbelichtungsanlage mit einem derartigen beleuchtungssystem
DE102006014380A1 (de) 2006-03-27 2007-10-11 Carl Zeiss Smt Ag Projektionsobjektiv und Projektionsbelichtungsanlage mit negativer Schnittweite der Eintrittspupille
US7920338B2 (en) 2006-03-28 2011-04-05 Carl Zeiss Smt Gmbh Reduction projection objective and projection exposure apparatus including the same
US7738188B2 (en) 2006-03-28 2010-06-15 Carl Zeiss Smt Ag Projection objective and projection exposure apparatus including the same
DE102007023411A1 (de) 2006-12-28 2008-07-03 Carl Zeiss Smt Ag Optisches Element, Beleuchtungsoptik für die Mikrolithographie mit mindestens einem derartigen optischen Element sowie Beleuchtungssystem mit einer derartigen Beleuchtungsoptik
JP5267029B2 (ja) 2007-10-12 2013-08-21 株式会社ニコン 照明光学装置、露光装置及びデバイスの製造方法
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
JP2010026526A (ja) * 2009-10-26 2010-02-04 Nikon Corp 反射屈折型の投影光学系、露光装置、および露光方法
JP5877965B2 (ja) * 2011-07-04 2016-03-08 株式会社ニコン 投影光学系、露光装置、露光方法、およびデバイス製造方法
JP5664697B2 (ja) * 2013-05-13 2015-02-04 株式会社ニコン 反射屈折型の投影光学系、露光装置、および露光方法
JP2014194552A (ja) * 2014-04-28 2014-10-09 Nikon Corp 反射屈折型の投影光学系、露光装置、および露光方法
JP6358242B2 (ja) * 2015-11-30 2018-07-18 株式会社ニコン 露光装置、露光方法、デバイス製造方法およびパターン形成方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7859748B2 (en) 2000-01-14 2010-12-28 Carl Zeiss Smt Gmbh Microlithographic reduction projection catadioptric objective
US7782538B2 (en) 2003-12-15 2010-08-24 Carl Zeiss Smt Ag Projection objective having a high aperture and a planar end surface

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