JP2002244035A - 投影光学系および該投影光学系を備えた露光装置 - Google Patents

投影光学系および該投影光学系を備えた露光装置

Info

Publication number
JP2002244035A
JP2002244035A JP2001370947A JP2001370947A JP2002244035A JP 2002244035 A JP2002244035 A JP 2002244035A JP 2001370947 A JP2001370947 A JP 2001370947A JP 2001370947 A JP2001370947 A JP 2001370947A JP 2002244035 A JP2002244035 A JP 2002244035A
Authority
JP
Japan
Prior art keywords
lens
optical system
lens group
mask
projection optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001370947A
Other languages
English (en)
Japanese (ja)
Other versions
JP2002244035A5 (enrdf_load_stackoverflow
Inventor
Yutaka Suenaga
豊 末永
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP2001370947A priority Critical patent/JP2002244035A/ja
Priority to CN02118048A priority patent/CN1423147A/zh
Publication of JP2002244035A publication Critical patent/JP2002244035A/ja
Publication of JP2002244035A5 publication Critical patent/JP2002244035A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2001370947A 2000-12-11 2001-12-05 投影光学系および該投影光学系を備えた露光装置 Pending JP2002244035A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2001370947A JP2002244035A (ja) 2000-12-11 2001-12-05 投影光学系および該投影光学系を備えた露光装置
CN02118048A CN1423147A (zh) 2001-12-05 2002-04-19 投影光学系统和具有该投影光学系统的曝光装置

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2000375992 2000-12-11
JP2000-375992 2000-12-11
JP2001370947A JP2002244035A (ja) 2000-12-11 2001-12-05 投影光学系および該投影光学系を備えた露光装置

Publications (2)

Publication Number Publication Date
JP2002244035A true JP2002244035A (ja) 2002-08-28
JP2002244035A5 JP2002244035A5 (enrdf_load_stackoverflow) 2005-08-18

Family

ID=26605599

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001370947A Pending JP2002244035A (ja) 2000-12-11 2001-12-05 投影光学系および該投影光学系を備えた露光装置

Country Status (1)

Country Link
JP (1) JP2002244035A (enrdf_load_stackoverflow)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004019128A3 (en) * 2002-08-23 2004-10-28 Nippon Kogaku Kk Projection optical system and method for photolithography and exposure apparatus and method using same
WO2005001543A1 (ja) * 2003-06-26 2005-01-06 Nikon Corporation 投影光学系、露光装置、およびデバイス製造方法
JP2005114400A (ja) * 2003-10-03 2005-04-28 Nikon Corp 光学特性の計測方法、反射防止膜、光学系及び投影露光装置
US7203008B2 (en) 2002-03-08 2007-04-10 Carl Zeiss Smt Ag Very high-aperture projection objective
EP1571700A4 (en) * 2002-12-10 2007-09-12 Nikon Corp OPTICAL DEVICE AND PROJECTION EXPOSURE DEVICE USING THE OPTICAL DEVICE
US9081295B2 (en) 2003-05-06 2015-07-14 Nikon Corporation Catadioptric projection optical system, exposure apparatus, and exposure method
US9500943B2 (en) 2003-05-06 2016-11-22 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US10175584B2 (en) 2003-08-26 2019-01-08 Nikon Corporation Optical element and exposure apparatus

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6954256B2 (en) 2003-08-29 2005-10-11 Asml Netherlands B.V. Gradient immersion lithography

Cited By (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7203008B2 (en) 2002-03-08 2007-04-10 Carl Zeiss Smt Ag Very high-aperture projection objective
US7495840B2 (en) 2002-03-08 2009-02-24 Karl-Heinz Schuster Very high-aperture projection objective
US7619827B2 (en) 2002-08-23 2009-11-17 Nikon Corporation Projection optical system and method for photolithography and exposure apparatus and method using same
WO2004019128A3 (en) * 2002-08-23 2004-10-28 Nippon Kogaku Kk Projection optical system and method for photolithography and exposure apparatus and method using same
US7701640B2 (en) 2002-08-23 2010-04-20 Nikon Corporation Projection optical system and method for photolithography and exposure apparatus and method using same
US7362508B2 (en) 2002-08-23 2008-04-22 Nikon Corporation Projection optical system and method for photolithography and exposure apparatus and method using same
US7688517B2 (en) 2002-08-23 2010-03-30 Nikon Corporation Projection optical system and method for photolithography and exposure apparatus and method using same
US7551362B2 (en) 2002-08-23 2009-06-23 Nikon Corporation Projection optical system and method for photolithography and exposure apparatus and method using same
US7580197B2 (en) 2002-08-23 2009-08-25 Nikon Corporation Projection optical system and method for photolithography and exposure apparatus and method using same
US7609455B2 (en) 2002-08-23 2009-10-27 Nikon Corporation Projection optical system and method for photolithography and exposure apparatus and method using same
US7876418B2 (en) 2002-12-10 2011-01-25 Nikon Corporation Optical element and projection exposure apparatus based on use of the optical element
EP1571700A4 (en) * 2002-12-10 2007-09-12 Nikon Corp OPTICAL DEVICE AND PROJECTION EXPOSURE DEVICE USING THE OPTICAL DEVICE
US8767173B2 (en) 2002-12-10 2014-07-01 Nikon Corporation Optical element and projection exposure apparatus based on use of the optical element
US9081295B2 (en) 2003-05-06 2015-07-14 Nikon Corporation Catadioptric projection optical system, exposure apparatus, and exposure method
US9086635B2 (en) 2003-05-06 2015-07-21 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9500943B2 (en) 2003-05-06 2016-11-22 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9606443B2 (en) 2003-05-06 2017-03-28 Nikon Corporation Reducing immersion projection optical system
US9846366B2 (en) 2003-05-06 2017-12-19 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9933705B2 (en) 2003-05-06 2018-04-03 Nikon Corporation Reduction projection optical system, exposure apparatus, and exposure method
US10156792B2 (en) 2003-05-06 2018-12-18 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
WO2005001543A1 (ja) * 2003-06-26 2005-01-06 Nikon Corporation 投影光学系、露光装置、およびデバイス製造方法
US10175584B2 (en) 2003-08-26 2019-01-08 Nikon Corporation Optical element and exposure apparatus
JP2005114400A (ja) * 2003-10-03 2005-04-28 Nikon Corp 光学特性の計測方法、反射防止膜、光学系及び投影露光装置

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