JP2002075600A - ウエハ加熱装置 - Google Patents

ウエハ加熱装置

Info

Publication number
JP2002075600A
JP2002075600A JP2000263020A JP2000263020A JP2002075600A JP 2002075600 A JP2002075600 A JP 2002075600A JP 2000263020 A JP2000263020 A JP 2000263020A JP 2000263020 A JP2000263020 A JP 2000263020A JP 2002075600 A JP2002075600 A JP 2002075600A
Authority
JP
Japan
Prior art keywords
wafer
temperature
resistance
heating resistor
heating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000263020A
Other languages
English (en)
Japanese (ja)
Other versions
JP2002075600A5 (https=
Inventor
Toshimi Ejima
登士巳 槐島
Satoshi Tanaka
智 田中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP2000263020A priority Critical patent/JP2002075600A/ja
Publication of JP2002075600A publication Critical patent/JP2002075600A/ja
Publication of JP2002075600A5 publication Critical patent/JP2002075600A5/ja
Pending legal-status Critical Current

Links

Landscapes

  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Surface Heating Bodies (AREA)
  • Resistance Heating (AREA)
JP2000263020A 2000-08-31 2000-08-31 ウエハ加熱装置 Pending JP2002075600A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000263020A JP2002075600A (ja) 2000-08-31 2000-08-31 ウエハ加熱装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000263020A JP2002075600A (ja) 2000-08-31 2000-08-31 ウエハ加熱装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2006261126A Division JP4809171B2 (ja) 2006-09-26 2006-09-26 ウエハ加熱装置

Publications (2)

Publication Number Publication Date
JP2002075600A true JP2002075600A (ja) 2002-03-15
JP2002075600A5 JP2002075600A5 (https=) 2005-06-09

Family

ID=18750617

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000263020A Pending JP2002075600A (ja) 2000-08-31 2000-08-31 ウエハ加熱装置

Country Status (1)

Country Link
JP (1) JP2002075600A (https=)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003282403A (ja) * 2002-03-22 2003-10-03 Sumitomo Electric Ind Ltd 半導体製造装置用保持体
JP2016072567A (ja) * 2014-10-01 2016-05-09 日本特殊陶業株式会社 半導体製造装置用部品及びその製造方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003282403A (ja) * 2002-03-22 2003-10-03 Sumitomo Electric Ind Ltd 半導体製造装置用保持体
JP2016072567A (ja) * 2014-10-01 2016-05-09 日本特殊陶業株式会社 半導体製造装置用部品及びその製造方法

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