JP2002026153A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2002026153A5 JP2002026153A5 JP2000208341A JP2000208341A JP2002026153A5 JP 2002026153 A5 JP2002026153 A5 JP 2002026153A5 JP 2000208341 A JP2000208341 A JP 2000208341A JP 2000208341 A JP2000208341 A JP 2000208341A JP 2002026153 A5 JP2002026153 A5 JP 2002026153A5
- Authority
- JP
- Japan
- Prior art keywords
- switching element
- charge storage
- storage layer
- semiconductor memory
- memory cells
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 claims 26
- 238000000034 method Methods 0.000 claims 4
- 238000002955 isolation Methods 0.000 claims 3
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims 2
- 239000012212 insulator Substances 0.000 claims 2
- 239000000463 material Substances 0.000 claims 2
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 claims 2
- 229910001936 tantalum oxide Inorganic materials 0.000 claims 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims 2
- 229910004541 SiN Inorganic materials 0.000 claims 1
- 229910000577 Silicon-germanium Inorganic materials 0.000 claims 1
- 239000004020 conductor Substances 0.000 claims 1
- 230000005669 field effect Effects 0.000 claims 1
- 230000006870 function Effects 0.000 claims 1
- 239000012535 impurity Substances 0.000 claims 1
- 238000009413 insulation Methods 0.000 claims 1
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000208341A JP2002026153A (ja) | 2000-07-10 | 2000-07-10 | 半導体メモリ |
US09/615,803 US6411548B1 (en) | 1999-07-13 | 2000-07-13 | Semiconductor memory having transistors connected in series |
KR10-2000-0040174A KR100391404B1 (ko) | 1999-07-13 | 2000-07-13 | 반도체 메모리 |
TW089113982A TW475267B (en) | 1999-07-13 | 2000-07-13 | Semiconductor memory |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000208341A JP2002026153A (ja) | 2000-07-10 | 2000-07-10 | 半導体メモリ |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008217927A Division JP2008311679A (ja) | 2008-08-27 | 2008-08-27 | 半導体メモリの閾値設定方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2002026153A JP2002026153A (ja) | 2002-01-25 |
JP2002026153A5 true JP2002026153A5 (enrdf_load_stackoverflow) | 2005-07-07 |
Family
ID=18704936
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2000208341A Pending JP2002026153A (ja) | 1999-07-13 | 2000-07-10 | 半導体メモリ |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2002026153A (enrdf_load_stackoverflow) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100414211B1 (ko) * | 2001-03-17 | 2004-01-07 | 삼성전자주식회사 | 모노스 게이트 구조를 갖는 비휘발성 메모리소자 및 그제조방법 |
KR100395755B1 (ko) * | 2001-06-28 | 2003-08-21 | 삼성전자주식회사 | 비휘발성 메모리 소자 및 그 제조방법 |
JP2004039866A (ja) | 2002-07-03 | 2004-02-05 | Toshiba Corp | 半導体装置及びその製造方法 |
KR100504691B1 (ko) * | 2003-01-10 | 2005-08-03 | 삼성전자주식회사 | 전하저장절연막을 가지는 비휘발성 메모리 소자 및 그제조방법 |
JP2005116119A (ja) * | 2003-10-10 | 2005-04-28 | Toshiba Corp | 不揮発性半導体記憶装置 |
KR100578131B1 (ko) * | 2003-10-28 | 2006-05-10 | 삼성전자주식회사 | 비휘발성 기억 소자 및 그 형성 방법 |
JP4398750B2 (ja) | 2004-02-17 | 2010-01-13 | 株式会社東芝 | Nand型フラッシュメモリ |
US7075828B2 (en) * | 2004-04-26 | 2006-07-11 | Macronix International Co., Intl. | Operation scheme with charge balancing erase for charge trapping non-volatile memory |
JP4802040B2 (ja) | 2006-01-23 | 2011-10-26 | 株式会社東芝 | 不揮発性半導体記憶装置 |
JP5161494B2 (ja) * | 2007-02-01 | 2013-03-13 | ルネサスエレクトロニクス株式会社 | 半導体記憶装置 |
JP2010118580A (ja) * | 2008-11-14 | 2010-05-27 | Toshiba Corp | 不揮発性半導体記憶装置 |
JP2011029576A (ja) | 2009-06-23 | 2011-02-10 | Toshiba Corp | 不揮発性半導体記憶装置及びその製造方法 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100279782B1 (ko) * | 1992-07-06 | 2001-02-01 | 가나이 쓰도무 | 불휘발성 반도체기억장치 |
JP3450467B2 (ja) * | 1993-12-27 | 2003-09-22 | 株式会社東芝 | 不揮発性半導体記憶装置及びその製造方法 |
JPH08316226A (ja) * | 1995-05-17 | 1996-11-29 | Sony Corp | 素子分離領域の形成方法及び半導体装置の製造方法 |
JPH0974146A (ja) * | 1995-09-04 | 1997-03-18 | Sony Corp | 不揮発性半導体記憶装置 |
JP3991383B2 (ja) * | 1997-03-07 | 2007-10-17 | ソニー株式会社 | 半導体記憶装置及びその製造方法 |
JPH11224940A (ja) * | 1997-12-05 | 1999-08-17 | Sony Corp | 不揮発性半導体記憶装置及びその書き込み方法 |
JP3595691B2 (ja) * | 1998-08-25 | 2004-12-02 | 株式会社東芝 | 不揮発性半導体記憶装置 |
JP3540640B2 (ja) * | 1998-12-22 | 2004-07-07 | 株式会社東芝 | 不揮発性半導体記憶装置 |
-
2000
- 2000-07-10 JP JP2000208341A patent/JP2002026153A/ja active Pending
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP7242818B2 (ja) | 半導体メモリ | |
US7274587B2 (en) | Semiconductor memory element and semiconductor memory device | |
CN110190062B (zh) | 铁电存储器件及其操作方法 | |
US8391049B2 (en) | Resistor structure for a non-volatile memory device and method | |
CN102714209B (zh) | 半导体存储器件及其驱动方法 | |
US8036017B2 (en) | Semiconductor memory device | |
CN100585836C (zh) | 半导体集成电路 | |
TWI868756B (zh) | 半導體記憶裝置 | |
JP6329349B2 (ja) | 不揮発性抵抗変化型メモリデバイスおよびその抵抗変化型メモリ構造のバイアス方法 | |
JP2007110083A (ja) | 金属−絶縁体転移膜の抵抗体を含む半導体メモリ素子 | |
JPS602783B2 (ja) | ダイナミツク・ランダム・アクセス・メモリ装置 | |
WO2013075416A1 (zh) | 一种阻变式存储器单元 | |
CN110428858B (zh) | 基于具有滞回特性器件的静态存储器 | |
JP2002026153A5 (enrdf_load_stackoverflow) | ||
JPS5858759B2 (ja) | メモリ装置 | |
JP2015076556A (ja) | メモリ装置、書込方法、読出方法 | |
KR100552841B1 (ko) | 비휘발성 sram | |
US20050167787A1 (en) | Memory array | |
US10541273B2 (en) | Vertical thin film transistors with isolation | |
JP2006253679A (ja) | Nor構造のハイブリッドマルチビットの不揮発性メモリ素子及びその動作方法 | |
US20090147580A1 (en) | One-transistor floating-body dram cell device with non-volatile function | |
JP2001167592A5 (enrdf_load_stackoverflow) | ||
TW200301896A (en) | Programming circuit for a programmable microelectronic device, system including the circuit, and method of forming the same | |
CN1310845A (zh) | 电阻性的铁电存储单元 | |
JPS5922317B2 (ja) | 半導体メモリ |