JP2001522774A - パーフッ素化された生成物を精製するための方法 - Google Patents

パーフッ素化された生成物を精製するための方法

Info

Publication number
JP2001522774A
JP2001522774A JP2000520379A JP2000520379A JP2001522774A JP 2001522774 A JP2001522774 A JP 2001522774A JP 2000520379 A JP2000520379 A JP 2000520379A JP 2000520379 A JP2000520379 A JP 2000520379A JP 2001522774 A JP2001522774 A JP 2001522774A
Authority
JP
Japan
Prior art keywords
pfc
composition
mixture
azeotrope
tetrafluoromethane
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000520379A
Other languages
English (en)
Japanese (ja)
Other versions
JP2001522774A5 (enExample
Inventor
バリー アセル マフラー
ラルフ ニュートン ミラー
シェン−ピン チャイ カオ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US09/189,322 external-priority patent/US6458249B2/en
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of JP2001522774A publication Critical patent/JP2001522774A/ja
Publication of JP2001522774A5 publication Critical patent/JP2001522774A5/ja
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C19/00—Acyclic saturated compounds containing halogen atoms
    • C07C19/08—Acyclic saturated compounds containing halogen atoms containing fluorine
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B21/00—Nitrogen; Compounds thereof
    • C01B21/082—Compounds containing nitrogen and non-metals and optionally metals
    • C01B21/083—Compounds containing nitrogen and non-metals and optionally metals containing one or more halogen atoms
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D3/00—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping
    • B01D3/34—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping with one or more auxiliary substances
    • B01D3/36—Azeotropic distillation
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B21/00—Nitrogen; Compounds thereof
    • C01B21/082—Compounds containing nitrogen and non-metals and optionally metals
    • C01B21/083—Compounds containing nitrogen and non-metals and optionally metals containing one or more halogen atoms
    • C01B21/0832—Binary compounds of nitrogen with halogens
    • C01B21/0835—Nitrogen trifluoride
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B21/00—Nitrogen; Compounds thereof
    • C01B21/082—Compounds containing nitrogen and non-metals and optionally metals
    • C01B21/083—Compounds containing nitrogen and non-metals and optionally metals containing one or more halogen atoms
    • C01B21/0832—Binary compounds of nitrogen with halogens
    • C01B21/0835—Nitrogen trifluoride
    • C01B21/0837—Purification
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C17/00—Preparation of halogenated hydrocarbons
    • C07C17/38—Separation; Purification; Stabilisation; Use of additives
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/80—Compositional purity

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
JP2000520379A 1997-11-10 1998-11-10 パーフッ素化された生成物を精製するための方法 Pending JP2001522774A (ja)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US6499397P 1997-11-10 1997-11-10
US60/064,993 1997-11-10
US8614698P 1998-05-20 1998-05-20
US60/086,146 1998-05-20
US09/189,322 US6458249B2 (en) 1997-11-10 1998-11-09 Process for purifying perfluorinated products
US09/189,322 1998-11-09
PCT/US1998/023965 WO1999024358A1 (en) 1997-11-10 1998-11-10 Process for purifying perfluorinated products

Publications (2)

Publication Number Publication Date
JP2001522774A true JP2001522774A (ja) 2001-11-20
JP2001522774A5 JP2001522774A5 (enExample) 2006-01-05

Family

ID=27370715

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000520379A Pending JP2001522774A (ja) 1997-11-10 1998-11-10 パーフッ素化された生成物を精製するための方法

Country Status (9)

Country Link
EP (1) EP1030818B1 (enExample)
JP (1) JP2001522774A (enExample)
KR (1) KR100588025B1 (enExample)
CN (4) CN1252011C (enExample)
AT (1) ATE222215T1 (enExample)
AU (1) AU1455099A (enExample)
CA (1) CA2306800A1 (enExample)
DE (1) DE69807254T2 (enExample)
RU (1) RU2206498C2 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006523604A (ja) * 2003-04-14 2006-10-19 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー 三フッ化窒素中の二フッ化二窒素および四フッ化二窒素の濃度を低下させるための蒸留プロセス
JP2009541212A (ja) * 2006-05-31 2009-11-26 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー 過フッ素化生成物の精製方法

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2248321C1 (ru) * 2004-03-16 2005-03-20 Общество с ограниченной ответственностью "НьюКем" Способ очистки трифторида азота от тетрафторметана
CN1328160C (zh) * 2005-07-27 2007-07-25 中国船舶重工集团公司第七一八研究所 三氟化氮气体的纯化方法
KR100703875B1 (ko) * 2005-09-07 2007-04-04 주식회사 소디프신소재 삼불화질소의 정제방법
CN101920944A (zh) * 2010-08-30 2010-12-22 天津市泰源工业气体有限公司 一种萃取精馏分离三氟化氮与四氟化碳制备高纯三氟化氮的技术
CN102516018A (zh) * 2011-12-16 2012-06-27 天津市泰亨气体有限公司 一种制备高纯四氟化碳的方法
KR101514801B1 (ko) * 2013-06-25 2015-04-24 (주)파인텍 과불화화합물의 분리 및 재활용시스템
JP6798468B2 (ja) * 2017-10-23 2020-12-09 ダイキン工業株式会社 ヘキサフルオロブタジエンの製造方法
ES2937914T3 (es) * 2019-01-23 2023-04-03 Weiss Technik Gmbh Refrigerante
CN112279234B (zh) * 2019-07-23 2023-08-08 中化近代环保化工(西安)有限公司 碳酰氟与二氧化碳的共沸组合物
CN114288702A (zh) * 2021-12-24 2022-04-08 天津海嘉斯迪新材料合伙企业(有限合伙) 一种三氟化氮气体中氧化亚氮的回收系统及方法
CN114191829A (zh) * 2021-12-31 2022-03-18 天津海嘉斯迪新材料合伙企业(有限合伙) 一种三氟化氮粗品中氧化亚氮的去除方法和系统
CN114538391B (zh) * 2022-03-01 2023-11-03 中船(邯郸)派瑞特种气体股份有限公司 一种从nf3废气中回收高纯n2o的装置及其回收方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63306383A (ja) * 1987-06-04 1988-12-14 三井東圧化学株式会社 フッ化窒素の精製方法
JPH0798648B2 (ja) * 1990-01-10 1995-10-25 セントラル硝子株式会社 Ｎｆ３ガスの精製方法
US5637285A (en) * 1996-01-30 1997-06-10 Air Products And Chemicals, Inc. Process for nitrogen trifluoride synthesis

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006523604A (ja) * 2003-04-14 2006-10-19 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー 三フッ化窒素中の二フッ化二窒素および四フッ化二窒素の濃度を低下させるための蒸留プロセス
JP2009541212A (ja) * 2006-05-31 2009-11-26 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー 過フッ素化生成物の精製方法

Also Published As

Publication number Publication date
ATE222215T1 (de) 2002-08-15
KR100588025B1 (ko) 2006-06-13
CN1219739C (zh) 2005-09-21
CA2306800A1 (en) 1999-05-20
CN1515488A (zh) 2004-07-28
CN1137043C (zh) 2004-02-04
CN1278779A (zh) 2001-01-03
CN1252011C (zh) 2006-04-19
KR20010031951A (ko) 2001-04-16
AU1455099A (en) 1999-05-31
CN1246216C (zh) 2006-03-22
DE69807254T2 (de) 2003-04-10
EP1030818B1 (en) 2002-08-14
EP1030818A1 (en) 2000-08-30
CN1515527A (zh) 2004-07-28
CN1515529A (zh) 2004-07-28
RU2206498C2 (ru) 2003-06-20
DE69807254D1 (de) 2002-09-19

Similar Documents

Publication Publication Date Title
US6458249B2 (en) Process for purifying perfluorinated products
JP5049320B2 (ja) ヘキサフルオロエタンの生成物の精製方法
CN101541673B (zh) 纯化全氟化产品的方法
KR100332392B1 (ko) 추출증류법을사용하여테트라플루오로에탄으로부터불순물을분리및제거하는방법
JP2011042570A (ja) 弗化水素を精製する方法
JP2001522774A (ja) パーフッ素化された生成物を精製するための方法
EP1425076A4 (en) AZEOTROPÄHNLICHE COMPOSITIONS OF 1,1,1,3,3-PENTAFLUORBUTANE AND HYDROGEN HYDROGEN
JPH09501400A (ja) 共沸および共沸様組成物並びにＨＣ▲ｌ▼とハロカーボンとを分離するための方法
EP1062194A1 (en) Processes for purifying perfluorocyclobutane
EP1251101A2 (en) Nitrogen trifluoride (NF3)
JP4275313B2 (ja) フッ化水素から１，１，１，３，３−ペンタフルオロプロパンを分離する方法
JPH08143486A (ja) ペンタフルオロエタンの精製方法
EP1611055B1 (en) Distillation process for reducing the concentration of dinitrogen difluoride and dinitrogen tetrafluoride in nitrogen trifluoride
US20180056210A1 (en) SEPARATION OF (Z)-1-CHLORO-3,3,3-TRIFLUOROPROPENE (HCFO-1233zd(Z)) AND 1-CHLORO-1,3,3,3-TETRAFLUOROPROPANE (HCFC-244fa) BY ADDING A THIRD COMPONENT
MXPA00004478A (en) Process for purifying perfluorinated products
JP4458784B2 (ja) ペンタフルオロエタンの製造方法およびその用途
HK1137729A (en) Process for purifying perfluorinated products

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20051108

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20051108

RD04 Notification of resignation of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7424

Effective date: 20051108

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20081010

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20090108

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20090116

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20090209

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20090217

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20090310

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20090317

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20090609