JP2001522130A5 - - Google Patents
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- JP2001522130A5 JP2001522130A5 JP2000519457A JP2000519457A JP2001522130A5 JP 2001522130 A5 JP2001522130 A5 JP 2001522130A5 JP 2000519457 A JP2000519457 A JP 2000519457A JP 2000519457 A JP2000519457 A JP 2000519457A JP 2001522130 A5 JP2001522130 A5 JP 2001522130A5
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- average diameter
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- 239000002245 particle Substances 0.000 description 15
- 238000004140 cleaning Methods 0.000 description 4
- 239000002105 nanoparticle Substances 0.000 description 3
- 230000001699 photocatalysis Effects 0.000 description 3
- 239000012530 fluid Substances 0.000 description 2
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
Description
【特許請求の範囲】
【請求項1】
自己清浄性表面を含む物品であって、UV線に暴露した時に光触媒性となる離散した粒子を含み、前記粒子が約5nmから約100nmの範囲の平均直径を有する、前記物品。
【請求項2】
前記自己清浄性表面が可動物である、請求項1記載の物品。
【請求項3】
前記粒子がTiO2を含む、請求項1記載の物品。
【請求項4】
前記粒子が、粒子の少なくとも約95パーセントが平均直径の約60パーセント以上及び平均直径の約140パーセント以下の直径を有するような直径分布を有する、請求項1記載の物品。
【請求項5】
前記粒子が約5nmから約50nmの範囲の平均直径を有する、請求項1記載の物品。
【請求項6】
流体を純化する方法であって、UV線に暴露した時に光触媒性となる離散した粒子を含む表面に前記流体を接触させる工程を含み、前記粒子が約5nmから約100nmの範囲の平均直径を有し、前記表面がUV線に晒される、前記純化方法。
【請求項7】
硬質表面を清浄化する方法であって、硬質表面をUV線に暴露する工程を含み、前記硬質表面がUV線に暴露した時に光触媒性となる離散した粒子を含み、前記粒子が約5nmから約100nmの範囲の平均直径を有する、前記清浄化方法。
【請求項8】
前記粒子が、粒子の少なくとも約95パーセントが平均直径の約60パーセント以上及び平均直径の約140パーセント以下の直径を有するような直径分布を有する、請求項6または7記載の方法。
【請求項9】
光活性組成物と金属酸化物を含む粒子とを含むフォトレジスト組成物であって、前記粒子が約5nmから約150nmの範囲の平均直径を有する、前記組成物。
【請求項1】
自己清浄性表面を含む物品であって、UV線に暴露した時に光触媒性となる離散した粒子を含み、前記粒子が約5nmから約100nmの範囲の平均直径を有する、前記物品。
【請求項2】
前記自己清浄性表面が可動物である、請求項1記載の物品。
【請求項3】
前記粒子がTiO2を含む、請求項1記載の物品。
【請求項4】
前記粒子が、粒子の少なくとも約95パーセントが平均直径の約60パーセント以上及び平均直径の約140パーセント以下の直径を有するような直径分布を有する、請求項1記載の物品。
【請求項5】
前記粒子が約5nmから約50nmの範囲の平均直径を有する、請求項1記載の物品。
【請求項6】
流体を純化する方法であって、UV線に暴露した時に光触媒性となる離散した粒子を含む表面に前記流体を接触させる工程を含み、前記粒子が約5nmから約100nmの範囲の平均直径を有し、前記表面がUV線に晒される、前記純化方法。
【請求項7】
硬質表面を清浄化する方法であって、硬質表面をUV線に暴露する工程を含み、前記硬質表面がUV線に暴露した時に光触媒性となる離散した粒子を含み、前記粒子が約5nmから約100nmの範囲の平均直径を有する、前記清浄化方法。
【請求項8】
前記粒子が、粒子の少なくとも約95パーセントが平均直径の約60パーセント以上及び平均直径の約140パーセント以下の直径を有するような直径分布を有する、請求項6または7記載の方法。
【請求項9】
光活性組成物と金属酸化物を含む粒子とを含むフォトレジスト組成物であって、前記粒子が約5nmから約150nmの範囲の平均直径を有する、前記組成物。
反応は、ポンプがもはやフィルター252の抵抗に対して反応室104の所望の圧力を維持できなくなるほど、フィルター252に充分なナノ粒子が収集されるまで継続することができる。反応室104の圧力を所望の値に維持できなくなった時、反応を停止し、そしてフィルター252を取り外す。この態様において、1回の実行で反応室の圧力を維持できなくなる前に、約3−75グラムのナノ粒子を収集することができる。1回の実行は、製造する粒子の型及び特定のフィルターにもよるが、一般的に約10分ないし約3時間継続する。従って巨視的量のナノ粒子、即ち、肉眼で見える量を製造することは簡単である。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/962,515 | 1997-10-31 | ||
US08/962,515 US6099798A (en) | 1997-10-31 | 1997-10-31 | Ultraviolet light block and photocatalytic materials |
PCT/US1998/023018 WO1999023687A1 (en) | 1997-10-31 | 1998-10-29 | Articles or compositions comprising nanoscale particles; methods of utilizing or producing such particles |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2001522130A JP2001522130A (ja) | 2001-11-13 |
JP2001522130A5 true JP2001522130A5 (ja) | 2006-01-05 |
Family
ID=25505994
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2000519457A Pending JP2001522130A (ja) | 1997-10-31 | 1998-10-29 | ナノスケール粒子を含む物品又は組成物および前記粒子の利用又は製造の方法 |
Country Status (7)
Country | Link |
---|---|
US (4) | US6099798A (ja) |
EP (1) | EP1027721B1 (ja) |
JP (1) | JP2001522130A (ja) |
CN (1) | CN1277734A (ja) |
AU (1) | AU1289199A (ja) |
DE (1) | DE69839645D1 (ja) |
WO (1) | WO1999023687A1 (ja) |
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-
1997
- 1997-10-31 US US08/962,515 patent/US6099798A/en not_active Expired - Lifetime
-
1998
- 1998-10-29 DE DE69839645T patent/DE69839645D1/de not_active Expired - Fee Related
- 1998-10-29 WO PCT/US1998/023018 patent/WO1999023687A1/en active Application Filing
- 1998-10-29 EP EP98956351A patent/EP1027721B1/en not_active Expired - Lifetime
- 1998-10-29 AU AU12891/99A patent/AU1289199A/en not_active Abandoned
- 1998-10-29 CN CN98810600A patent/CN1277734A/zh active Pending
- 1998-10-29 JP JP2000519457A patent/JP2001522130A/ja active Pending
-
2005
- 2005-06-08 US US11/147,566 patent/US20050232878A1/en not_active Abandoned
-
2007
- 2007-02-02 US US11/701,571 patent/US20080003522A1/en not_active Abandoned
-
2009
- 2009-05-26 US US12/472,167 patent/US8048523B2/en not_active Expired - Fee Related
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