JP2001521293A5 - - Google Patents

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Publication number
JP2001521293A5
JP2001521293A5 JP2000518129A JP2000518129A JP2001521293A5 JP 2001521293 A5 JP2001521293 A5 JP 2001521293A5 JP 2000518129 A JP2000518129 A JP 2000518129A JP 2000518129 A JP2000518129 A JP 2000518129A JP 2001521293 A5 JP2001521293 A5 JP 2001521293A5
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Japan
Prior art keywords
cracker
chuck
reactor
precursor
wafer
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JP2000518129A
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Japanese (ja)
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JP2001521293A (ja
JP4425461B2 (ja
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Priority claimed from US08/958,352 external-priority patent/US6086679A/en
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JP2000518129A 1997-10-24 1998-10-15 蒸着装置 Expired - Lifetime JP4425461B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US08/958,352 1997-10-24
US08/958,352 US6086679A (en) 1997-10-24 1997-10-24 Deposition systems and processes for transport polymerization and chemical vapor deposition
PCT/US1998/021754 WO1999022043A1 (en) 1997-10-24 1998-10-15 New deposition systems and processes for transport polymerization and chemical vapor deposition

Publications (3)

Publication Number Publication Date
JP2001521293A JP2001521293A (ja) 2001-11-06
JP2001521293A5 true JP2001521293A5 (https=) 2006-01-05
JP4425461B2 JP4425461B2 (ja) 2010-03-03

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JP2000518129A Expired - Lifetime JP4425461B2 (ja) 1997-10-24 1998-10-15 蒸着装置

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US (1) US6086679A (https=)
JP (1) JP4425461B2 (https=)
KR (1) KR100621226B1 (https=)
AU (1) AU1188899A (https=)
WO (1) WO1999022043A1 (https=)

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