JP2001518553A5 - - Google Patents

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Publication number
JP2001518553A5
JP2001518553A5 JP2000514171A JP2000514171A JP2001518553A5 JP 2001518553 A5 JP2001518553 A5 JP 2001518553A5 JP 2000514171 A JP2000514171 A JP 2000514171A JP 2000514171 A JP2000514171 A JP 2000514171A JP 2001518553 A5 JP2001518553 A5 JP 2001518553A5
Authority
JP
Japan
Prior art keywords
substrate
photoresist
solution
film
developer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000514171A
Other languages
English (en)
Japanese (ja)
Other versions
JP2001518553A (ja
Filing date
Publication date
Priority claimed from US08/939,451 external-priority patent/US5928836A/en
Application filed filed Critical
Publication of JP2001518553A publication Critical patent/JP2001518553A/ja
Publication of JP2001518553A5 publication Critical patent/JP2001518553A5/ja
Pending legal-status Critical Current

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JP2000514171A 1997-09-29 1998-09-16 分別されたノボラック樹脂コポリマー及びこれから得られるフォトレジスト組成物 Pending JP2001518553A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US08/939,451 US5928836A (en) 1997-09-29 1997-09-29 Fractionated novolak resin copolymer and photoresist composition therefrom
US08/939,451 1997-09-29
PCT/EP1998/005878 WO1999017166A1 (en) 1997-09-29 1998-09-16 Fractionated novolak resin copolymer and photoresist composition therefrom

Publications (2)

Publication Number Publication Date
JP2001518553A JP2001518553A (ja) 2001-10-16
JP2001518553A5 true JP2001518553A5 (enExample) 2006-01-05

Family

ID=25473210

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000514171A Pending JP2001518553A (ja) 1997-09-29 1998-09-16 分別されたノボラック樹脂コポリマー及びこれから得られるフォトレジスト組成物

Country Status (8)

Country Link
US (1) US5928836A (enExample)
EP (1) EP1023637B1 (enExample)
JP (1) JP2001518553A (enExample)
KR (1) KR20010030763A (enExample)
CN (1) CN1142463C (enExample)
DE (1) DE69817003T2 (enExample)
TW (1) TW486606B (enExample)
WO (1) WO1999017166A1 (enExample)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002102867A1 (en) * 2001-06-20 2002-12-27 The Additional Director (Ipr), Defence Research & Development Organisation 'high ortho' novolak copolymers and composition thereof
CN1802603A (zh) * 2003-07-17 2006-07-12 霍尼韦尔国际公司 用于高级微电子应用的平面化薄膜及其生产装置和方法
US7303994B2 (en) * 2004-06-14 2007-12-04 International Business Machines Corporation Process for interfacial adhesion in laminate structures through patterned roughing of a surface
PL1842864T3 (pl) * 2005-01-25 2013-12-31 Hodogaya Chemical Co Ltd Żywica rezorcynowo-formaldehydowa modyfikowana ketonem
KR101308431B1 (ko) * 2006-04-26 2013-09-30 엘지디스플레이 주식회사 인쇄용 레지스트 및 이를 이용한 패턴형성방법
US7642333B2 (en) * 2007-05-21 2010-01-05 Georgia-Pacific Chemicals Llc Anhydride and resorcinol latent catalyst system for improving cure characteristics of phenolic resins
JP5825884B2 (ja) * 2011-07-01 2015-12-02 旭化成イーマテリアルズ株式会社 フェノール樹脂組成物、及び硬化レリーフパターンの製造方法
JP6228460B2 (ja) * 2011-12-09 2017-11-08 旭化成株式会社 感光性樹脂組成物
KR102235159B1 (ko) * 2014-04-15 2021-04-05 롬엔드하스전자재료코리아유한회사 감광성 수지 조성물, 및 이를 이용한 절연막 및 전자소자
TW201806996A (zh) * 2016-04-06 2018-03-01 迪愛生股份有限公司 酚醛清漆型樹脂及抗蝕劑材料
TW201806995A (zh) * 2016-04-06 2018-03-01 迪愛生股份有限公司 酚醛清漆型樹脂之製造方法
JP6828279B2 (ja) * 2016-06-13 2021-02-10 Dic株式会社 ノボラック型樹脂及びレジスト膜
JP7095405B2 (ja) * 2018-05-25 2022-07-05 住友ベークライト株式会社 感光性樹脂組成物用のノボラック型フェノール樹脂
KR20230022064A (ko) * 2021-08-06 2023-02-14 코오롱인더스트리 주식회사 알킬 페놀 수지의 제조 방법, 알킬 페놀 수지 및 이를 포함하는 고무 조성물

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3070435D1 (en) * 1979-12-27 1985-05-09 Mitsui Petrochemical Ind High-molecular-weight novolak substituted phenolic resins and their preparation
JPS60260611A (ja) * 1984-06-08 1985-12-23 Mitsubishi Petrochem Co Ltd 高分子量クレゾ−ルノボラツク樹脂の製造方法
EP0251187A3 (en) * 1986-06-27 1988-03-30 Nippon Zeon Co., Ltd. Method for purifying novolak resins useful as material for coating on a semiconductor substrate
US5238776A (en) * 1986-12-23 1993-08-24 Shipley Company Inc. Photoresist composition containing block copolymer resin and positive-working o-quinone diazide or negative-working azide sensitizer compound
US5266440A (en) * 1986-12-23 1993-11-30 Shipley Company Inc. Photoresist composition with aromatic novolak binder having a weight-average molecular weight in excess of 1500 Daltons
US5130410A (en) * 1986-12-23 1992-07-14 Shipley Company Inc. Alternating and block copolymer resins
JP2711590B2 (ja) * 1990-09-13 1998-02-10 富士写真フイルム株式会社 ポジ型フオトレジスト組成物
US5346799A (en) * 1991-12-23 1994-09-13 Ocg Microelectronic Materials, Inc. Novolak resins and their use in radiation-sensitive compositions wherein the novolak resins are made by condensing 2,6-dimethylphenol, 2,3-dimethylphenol, a para-substituted phenol and an aldehyde
US5476750A (en) * 1992-12-29 1995-12-19 Hoechst Celanese Corporation Metal ion reduction in the raw materials and using a Lewis base to control molecular weight of novolak resin to be used in positive photoresists
US5750632A (en) * 1994-12-30 1998-05-12 Clariant Finance (Bvi) Limited Isolation of novolak resin by low temperature sub surface forced steam distillation
US5665517A (en) * 1996-01-11 1997-09-09 Hoechst Celanese Corporation Acidic ion exchange resin as a catalyst to synthesize a novolak resin and photoresist composition therefrom

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