JP2001319850A - 液処理方法、液処理装置、薄膜形成システム - Google Patents

液処理方法、液処理装置、薄膜形成システム

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Publication number
JP2001319850A
JP2001319850A JP2000135229A JP2000135229A JP2001319850A JP 2001319850 A JP2001319850 A JP 2001319850A JP 2000135229 A JP2000135229 A JP 2000135229A JP 2000135229 A JP2000135229 A JP 2000135229A JP 2001319850 A JP2001319850 A JP 2001319850A
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JP
Japan
Prior art keywords
wafer
cleaning
holding
liquid
thin film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2000135229A
Other languages
English (en)
Japanese (ja)
Other versions
JP2001319850A5 (https=
Inventor
Yoshinori Kato
善規 加藤
Hiroshi Sato
浩 佐藤
Yoshinori Marumo
吉典 丸茂
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Priority to JP2000135229A priority Critical patent/JP2001319850A/ja
Publication of JP2001319850A publication Critical patent/JP2001319850A/ja
Publication of JP2001319850A5 publication Critical patent/JP2001319850A5/ja
Withdrawn legal-status Critical Current

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Landscapes

  • Cleaning By Liquid Or Steam (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Materials For Photolithography (AREA)
JP2000135229A 2000-05-08 2000-05-08 液処理方法、液処理装置、薄膜形成システム Withdrawn JP2001319850A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000135229A JP2001319850A (ja) 2000-05-08 2000-05-08 液処理方法、液処理装置、薄膜形成システム

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000135229A JP2001319850A (ja) 2000-05-08 2000-05-08 液処理方法、液処理装置、薄膜形成システム

Publications (2)

Publication Number Publication Date
JP2001319850A true JP2001319850A (ja) 2001-11-16
JP2001319850A5 JP2001319850A5 (https=) 2007-06-21

Family

ID=18643345

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000135229A Withdrawn JP2001319850A (ja) 2000-05-08 2000-05-08 液処理方法、液処理装置、薄膜形成システム

Country Status (1)

Country Link
JP (1) JP2001319850A (https=)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008153450A (ja) * 2006-12-18 2008-07-03 Tokyo Electron Ltd 塗布膜処理方法および塗布膜処理装置
DE102009006397A1 (de) 2008-01-30 2009-08-13 Tokyo Electron Limited Polysiliziumschicht-Entfernverfahren und Speichermedium
JP2012130894A (ja) * 2010-12-24 2012-07-12 Kitazawa Sangyo Kk 調理鍋の洗浄装置
JP2013162040A (ja) * 2012-02-07 2013-08-19 Tokyo Electron Ltd 基板処理装置、これを備える塗布現像装置、及び基板処理方法
KR101378140B1 (ko) 2009-09-17 2014-03-24 도쿄엘렉트론가부시키가이샤 기판 액처리 방법, 기판 액처리 장치 및 기억 매체

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008153450A (ja) * 2006-12-18 2008-07-03 Tokyo Electron Ltd 塗布膜処理方法および塗布膜処理装置
US8069816B2 (en) 2006-12-18 2011-12-06 Tokyo Electron Limited Coating film processing method and apparatus
DE102009006397A1 (de) 2008-01-30 2009-08-13 Tokyo Electron Limited Polysiliziumschicht-Entfernverfahren und Speichermedium
DE102009006397B4 (de) * 2008-01-30 2011-03-17 Tokyo Electron Limited Polysiliziumschicht-Entfernverfahren und Speichermedium
KR101378140B1 (ko) 2009-09-17 2014-03-24 도쿄엘렉트론가부시키가이샤 기판 액처리 방법, 기판 액처리 장치 및 기억 매체
JP2012130894A (ja) * 2010-12-24 2012-07-12 Kitazawa Sangyo Kk 調理鍋の洗浄装置
JP2013162040A (ja) * 2012-02-07 2013-08-19 Tokyo Electron Ltd 基板処理装置、これを備える塗布現像装置、及び基板処理方法

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