JP2001284685A5 - - Google Patents
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- Publication number
- JP2001284685A5 JP2001284685A5 JP2000096157A JP2000096157A JP2001284685A5 JP 2001284685 A5 JP2001284685 A5 JP 2001284685A5 JP 2000096157 A JP2000096157 A JP 2000096157A JP 2000096157 A JP2000096157 A JP 2000096157A JP 2001284685 A5 JP2001284685 A5 JP 2001284685A5
- Authority
- JP
- Japan
- Prior art keywords
- laser
- housing
- laser oscillator
- discharge
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010410 layer Substances 0.000 description 77
- 239000007789 gas Substances 0.000 description 75
- 239000011941 photocatalyst Substances 0.000 description 39
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 26
- 229910052751 metal Inorganic materials 0.000 description 24
- 239000002184 metal Substances 0.000 description 24
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 22
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 21
- 230000006866 deterioration Effects 0.000 description 19
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 18
- 239000012212 insulator Substances 0.000 description 14
- 239000003795 chemical substances by application Substances 0.000 description 13
- 238000010586 diagram Methods 0.000 description 13
- 239000000463 material Substances 0.000 description 12
- 238000001816 cooling Methods 0.000 description 11
- 230000000694 effects Effects 0.000 description 11
- 239000011347 resin Substances 0.000 description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 11
- 239000000428 dust Substances 0.000 description 10
- 230000003287 optical effect Effects 0.000 description 10
- 229920005989 resin Polymers 0.000 description 10
- 229910002092 carbon dioxide Inorganic materials 0.000 description 9
- 239000001569 carbon dioxide Substances 0.000 description 9
- 229910052731 fluorine Inorganic materials 0.000 description 9
- 239000011737 fluorine Substances 0.000 description 9
- 238000000034 method Methods 0.000 description 9
- 230000010355 oscillation Effects 0.000 description 9
- 230000007423 decrease Effects 0.000 description 8
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 7
- 229910010413 TiO 2 Inorganic materials 0.000 description 7
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 7
- 239000011521 glass Substances 0.000 description 7
- 239000002245 particle Substances 0.000 description 7
- 238000012545 processing Methods 0.000 description 7
- 239000000741 silica gel Substances 0.000 description 7
- 229910002027 silica gel Inorganic materials 0.000 description 7
- MWUXSHHQAYIFBG-UHFFFAOYSA-N Nitric oxide Chemical compound O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 6
- 239000000460 chlorine Substances 0.000 description 6
- 239000000843 powder Substances 0.000 description 6
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 5
- 229910052801 chlorine Inorganic materials 0.000 description 5
- 230000001699 photocatalysis Effects 0.000 description 5
- 238000007789 sealing Methods 0.000 description 4
- 238000004381 surface treatment Methods 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 3
- 239000000498 cooling water Substances 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 230000003197 catalytic effect Effects 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 2
- 230000002542 deteriorative effect Effects 0.000 description 2
- 238000000295 emission spectrum Methods 0.000 description 2
- -1 fluorine ions Chemical class 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000008188 pellet Substances 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- 239000002335 surface treatment layer Substances 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- 238000011144 upstream manufacturing Methods 0.000 description 2
- 125000006414 CCl Chemical group ClC* 0.000 description 1
- 229920002449 FKM Polymers 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 230000005856 abnormality Effects 0.000 description 1
- 239000003463 adsorbent Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 230000003321 amplification Effects 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000012510 hollow fiber Substances 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
- 239000005416 organic matter Substances 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 238000006479 redox reaction Methods 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 238000007751 thermal spraying Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000096157A JP3884213B2 (ja) | 2000-03-31 | 2000-03-31 | レーザ発振器 |
| TW090107322A TW480791B (en) | 2000-03-31 | 2001-03-28 | Laser oscillator |
| KR10-2001-0016950A KR100423716B1 (ko) | 2000-03-31 | 2001-03-30 | 레이저발진기 |
| US09/820,970 US6940886B2 (en) | 2000-03-31 | 2001-03-30 | Laser oscillator |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000096157A JP3884213B2 (ja) | 2000-03-31 | 2000-03-31 | レーザ発振器 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2001284685A JP2001284685A (ja) | 2001-10-12 |
| JP2001284685A5 true JP2001284685A5 (https=) | 2004-12-09 |
| JP3884213B2 JP3884213B2 (ja) | 2007-02-21 |
Family
ID=18610958
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000096157A Expired - Fee Related JP3884213B2 (ja) | 2000-03-31 | 2000-03-31 | レーザ発振器 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US6940886B2 (https=) |
| JP (1) | JP3884213B2 (https=) |
| KR (1) | KR100423716B1 (https=) |
| TW (1) | TW480791B (https=) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6788724B2 (en) * | 2001-07-06 | 2004-09-07 | Intel Corporation | Hermetically sealed external cavity laser system and method |
| US6816536B2 (en) * | 2001-11-30 | 2004-11-09 | Spectra Physics, Inc. | Method and apparatus for in situ protection of sensitive optical materials |
| JP3746243B2 (ja) * | 2002-03-25 | 2006-02-15 | ファナック株式会社 | レーザ発振器 |
| CA2430608C (en) * | 2002-06-03 | 2012-01-10 | Praxair Technology, Inc. | Carbon dioxide laser resonator gas |
| US7522650B2 (en) * | 2004-03-31 | 2009-04-21 | Cymer, Inc. | Gas discharge laser chamber improvements |
| CN111801854B (zh) * | 2018-04-23 | 2022-10-21 | 极光先进雷射株式会社 | 激光腔、密封部件的制造方法和电子器件的制造方法 |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4261753A (en) * | 1980-01-22 | 1981-04-14 | The United States Of America As Represented By The United States Department Of Energy | Lanthanum-hexaboride carbon composition for use in corrosive hydrogen-fluorine environments |
| DE3148570C2 (de) * | 1981-12-08 | 1991-02-14 | Eltro GmbH, Gesellschaft für Strahlungstechnik, 6900 Heidelberg | Elektrisch angeregter CO↓↓2↓↓-Laser |
| CH667556A5 (de) * | 1983-12-29 | 1988-10-14 | Amada Eng & Service | Hochgeschwindigkeits gaslaser-oszillator. |
| FR2575869B1 (fr) * | 1984-11-23 | 1987-07-10 | Telecommunications Sa | Generateur laser a catalyseur pour le gaz laser |
| JPS6324685A (ja) * | 1986-07-17 | 1988-02-02 | Komatsu Ltd | 炭酸ガスレ−ザ装置 |
| US4897848A (en) * | 1988-01-29 | 1990-01-30 | John Macken | Discharge driven precious metal catalyst with application to carbon monoxide lasers |
| US4905249A (en) * | 1989-01-06 | 1990-02-27 | Applied Photonics, Inc. | Catalytic converter |
| US5841804A (en) * | 1991-03-14 | 1998-11-24 | Jgc Corporation | Method and apparatus for regenerating gas used in carbon dioxide laser generator |
| US5337329A (en) * | 1992-07-07 | 1994-08-09 | Jack Foster | Fluid laser having a roughened, catalytic inner surface |
| US5426661A (en) * | 1993-11-09 | 1995-06-20 | Hughes Aircraft Company | Pulsed laser discharge stabilization |
| JPH0832151A (ja) * | 1994-07-20 | 1996-02-02 | Toshiba Corp | ガスレーザ装置 |
| US5550851A (en) * | 1994-09-15 | 1996-08-27 | Litton Systems, Inc. | Laser system decontamination method and apparatus |
| JPH08231444A (ja) * | 1995-02-28 | 1996-09-10 | Daikin Ind Ltd | １，１，１，３，３−ペンタフルオロプロパンの製造方法 |
| US5771258A (en) * | 1997-02-11 | 1998-06-23 | Cymer, Inc. | Aerodynamic chamber design for high pulse repetition rate excimer lasers |
-
2000
- 2000-03-31 JP JP2000096157A patent/JP3884213B2/ja not_active Expired - Fee Related
-
2001
- 2001-03-28 TW TW090107322A patent/TW480791B/zh not_active IP Right Cessation
- 2001-03-30 US US09/820,970 patent/US6940886B2/en not_active Expired - Fee Related
- 2001-03-30 KR KR10-2001-0016950A patent/KR100423716B1/ko not_active Expired - Fee Related
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