JP2001284342A5 - - Google Patents
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- Publication number
- JP2001284342A5 JP2001284342A5 JP2001013099A JP2001013099A JP2001284342A5 JP 2001284342 A5 JP2001284342 A5 JP 2001284342A5 JP 2001013099 A JP2001013099 A JP 2001013099A JP 2001013099 A JP2001013099 A JP 2001013099A JP 2001284342 A5 JP2001284342 A5 JP 2001284342A5
- Authority
- JP
- Japan
- Prior art keywords
- insulating film
- film
- pixel electrode
- hole
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000004065 semiconductor Substances 0.000 claims 60
- 238000002161 passivation Methods 0.000 claims 22
- 229910052581 Si3N4 Inorganic materials 0.000 claims 20
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims 20
- 239000000758 substrate Substances 0.000 claims 20
- -1 siloxane structure Chemical group 0.000 claims 12
- 238000004528 spin coating Methods 0.000 claims 12
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 10
- 229910052814 silicon oxide Inorganic materials 0.000 claims 10
- 239000010410 layer Substances 0.000 claims 9
- 239000011229 interlayer Substances 0.000 claims 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims 2
- 229910052782 aluminium Inorganic materials 0.000 claims 2
- 239000000463 material Substances 0.000 claims 2
- 238000000034 method Methods 0.000 claims 2
- 229910052719 titanium Inorganic materials 0.000 claims 2
- 239000010936 titanium Substances 0.000 claims 2
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001013099A JP2001284342A (ja) | 2000-01-25 | 2001-01-22 | 電気光学装置の作製方法 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000-16309 | 2000-01-25 | ||
| JP2000016309 | 2000-01-25 | ||
| JP2001013099A JP2001284342A (ja) | 2000-01-25 | 2001-01-22 | 電気光学装置の作製方法 |
Related Child Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004315626A Division JP2005148728A (ja) | 2000-01-25 | 2004-10-29 | 集積回路 |
| JP2004315625A Division JP4963158B2 (ja) | 2000-01-25 | 2004-10-29 | 表示装置の作製方法、電気光学装置の作製方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2001284342A JP2001284342A (ja) | 2001-10-12 |
| JP2001284342A5 true JP2001284342A5 (enExample) | 2005-07-07 |
Family
ID=26584138
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001013099A Withdrawn JP2001284342A (ja) | 2000-01-25 | 2001-01-22 | 電気光学装置の作製方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2001284342A (enExample) |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2004053816A1 (ja) | 2002-12-10 | 2004-06-24 | Semiconductor Energy Laboratory Co., Ltd. | 発光装置およびその作製方法 |
| KR100528326B1 (ko) * | 2002-12-31 | 2005-11-15 | 삼성전자주식회사 | 가요성 기판 상에 보호캡을 구비하는 박막 반도체 소자 및 이를 이용하는 전자장치 및 그 제조방법 |
| CN1577796A (zh) | 2003-07-10 | 2005-02-09 | 精工爱普生株式会社 | 电子器件的制造方法和半导体器件的制造方法 |
| KR101207442B1 (ko) | 2003-12-15 | 2012-12-03 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 박막 집적회로장치의 제조방법, 비접촉형 박막 집적회로장치 및 그 제조 방법, 비접촉형 박막 집적회로 장치를 가지는 아이디 태그 및 동전 |
| KR101205191B1 (ko) | 2003-12-19 | 2012-11-27 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체 집적 회로 |
| US7566010B2 (en) | 2003-12-26 | 2009-07-28 | Semiconductor Energy Laboratory Co., Ltd. | Securities, chip mounting product, and manufacturing method thereof |
| JP2005223034A (ja) * | 2004-02-04 | 2005-08-18 | Sony Corp | 配線構造及びパネル型表示装置 |
| CN100502018C (zh) | 2004-02-06 | 2009-06-17 | 株式会社半导体能源研究所 | 薄膜集成电路的制造方法和元件基片 |
| EP1793266B1 (en) * | 2005-12-05 | 2017-03-08 | Semiconductor Energy Laboratory Co., Ltd. | Transflective Liquid Crystal Display with a Horizontal Electric Field Configuration |
| JP2007242895A (ja) * | 2006-03-08 | 2007-09-20 | Mitsubishi Electric Corp | 薄膜トランジスタ装置及びその製造方法 |
| KR101634970B1 (ko) | 2007-05-18 | 2016-06-30 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체 장치 및 반도체 장치 제조 방법 |
| US9224759B2 (en) | 2010-12-20 | 2015-12-29 | Japan Display Inc. | Pixel array substrate structure, method of manufacturing pixel array substrate structure, display device, and electronic apparatus |
| US8830436B2 (en) | 2010-12-24 | 2014-09-09 | Japan Display West Inc. | Pixel structure, display device, and electronic apparatus |
| JP6044223B2 (ja) * | 2012-09-20 | 2016-12-14 | セイコーエプソン株式会社 | 光電変換装置、医療機器および光電変換装置の製造方法 |
| CN104570455B (zh) * | 2014-12-19 | 2017-06-27 | 深圳市华星光电技术有限公司 | 一种液晶显示面板的制作方法 |
| KR102794829B1 (ko) * | 2016-08-18 | 2025-04-11 | 삼성디스플레이 주식회사 | 표시 장치 및 그 제조방법 |
| KR102791286B1 (ko) * | 2016-08-30 | 2025-04-04 | 삼성디스플레이 주식회사 | 유기 발광 표시 장치 |
| CN111146215B (zh) * | 2020-02-21 | 2022-12-09 | 京东方科技集团股份有限公司 | 一种阵列基板、其制作方法及显示装置 |
| CN111725281B (zh) * | 2020-06-12 | 2023-08-04 | 维沃移动通信有限公司 | 显示模组及电子设备 |
-
2001
- 2001-01-22 JP JP2001013099A patent/JP2001284342A/ja not_active Withdrawn
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