JP2001093119A5 - - Google Patents
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- Publication number
- JP2001093119A5 JP2001093119A5 JP1999271282A JP27128299A JP2001093119A5 JP 2001093119 A5 JP2001093119 A5 JP 2001093119A5 JP 1999271282 A JP1999271282 A JP 1999271282A JP 27128299 A JP27128299 A JP 27128299A JP 2001093119 A5 JP2001093119 A5 JP 2001093119A5
- Authority
- JP
- Japan
- Prior art keywords
- magnetic layer
- plane
- layer
- tunnel
- magnetic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000005291 magnetic effect Effects 0.000 claims 40
- 230000004888 barrier function Effects 0.000 claims 14
- 230000000694 effects Effects 0.000 claims 9
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims 6
- 229910052760 oxygen Inorganic materials 0.000 claims 6
- 239000001301 oxygen Substances 0.000 claims 6
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims 5
- 239000003302 ferromagnetic material Substances 0.000 claims 4
- 238000004519 manufacturing process Methods 0.000 claims 4
- 230000005641 tunneling Effects 0.000 claims 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims 2
- 229910052782 aluminium Inorganic materials 0.000 claims 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 2
- 229910052804 chromium Inorganic materials 0.000 claims 2
- 239000011651 chromium Substances 0.000 claims 2
- 239000013078 crystal Substances 0.000 claims 2
- 229910052751 metal Inorganic materials 0.000 claims 2
- 239000002184 metal Substances 0.000 claims 2
- 230000003647 oxidation Effects 0.000 claims 2
- 238000007254 oxidation reaction Methods 0.000 claims 2
- 230000001590 oxidative effect Effects 0.000 claims 2
- 239000000758 substrate Substances 0.000 claims 2
- 229910000599 Cr alloy Inorganic materials 0.000 claims 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical group [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims 1
- WAIPAZQMEIHHTJ-UHFFFAOYSA-N [Cr].[Co] Chemical class [Cr].[Co] WAIPAZQMEIHHTJ-UHFFFAOYSA-N 0.000 claims 1
- 239000000788 chromium alloy Substances 0.000 claims 1
- UMUXBDSQTCDPJZ-UHFFFAOYSA-N chromium titanium Chemical compound [Ti].[Cr] UMUXBDSQTCDPJZ-UHFFFAOYSA-N 0.000 claims 1
- 229910017052 cobalt Inorganic materials 0.000 claims 1
- 239000010941 cobalt Substances 0.000 claims 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims 1
- 239000010931 gold Substances 0.000 claims 1
- 229910052737 gold Inorganic materials 0.000 claims 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 claims 1
- 239000000395 magnesium oxide Substances 0.000 claims 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 claims 1
- 239000011159 matrix material Substances 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 229910052750 molybdenum Inorganic materials 0.000 claims 1
- 239000011733 molybdenum Substances 0.000 claims 1
- 229910052594 sapphire Inorganic materials 0.000 claims 1
- 239000010980 sapphire Substances 0.000 claims 1
- 229910052715 tantalum Inorganic materials 0.000 claims 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims 1
- 229910052721 tungsten Inorganic materials 0.000 claims 1
- 239000010937 tungsten Substances 0.000 claims 1
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27128299A JP3695515B2 (ja) | 1999-09-24 | 1999-09-24 | トンネル磁気抵抗効果素子、磁気ヘッド、磁気メモリ及びその製造方法 |
| US09/666,608 US6710986B1 (en) | 1999-09-24 | 2000-09-20 | Tunneling magnetoresistive head and a process of tunneling magnetoresistive head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27128299A JP3695515B2 (ja) | 1999-09-24 | 1999-09-24 | トンネル磁気抵抗効果素子、磁気ヘッド、磁気メモリ及びその製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2001093119A JP2001093119A (ja) | 2001-04-06 |
| JP2001093119A5 true JP2001093119A5 (https=) | 2004-11-04 |
| JP3695515B2 JP3695515B2 (ja) | 2005-09-14 |
Family
ID=17497905
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP27128299A Expired - Lifetime JP3695515B2 (ja) | 1999-09-24 | 1999-09-24 | トンネル磁気抵抗効果素子、磁気ヘッド、磁気メモリ及びその製造方法 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US6710986B1 (https=) |
| JP (1) | JP3695515B2 (https=) |
Families Citing this family (31)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6937446B2 (en) * | 2000-10-20 | 2005-08-30 | Kabushiki Kaisha Toshiba | Magnetoresistance effect element, magnetic head and magnetic recording and/or reproducing system |
| US6992869B2 (en) * | 2001-02-06 | 2006-01-31 | Yamaha Corporation | Magnetic resistance device |
| US7220498B2 (en) | 2001-05-31 | 2007-05-22 | National Institute Of Advanced Industrial Science And Technology | Tunnel magnetoresistance element |
| JP4812203B2 (ja) * | 2001-09-25 | 2011-11-09 | トヨタ自動車株式会社 | アレイ型センサ |
| JP2004071897A (ja) * | 2002-08-07 | 2004-03-04 | Sony Corp | 磁気抵抗効果素子及び磁気メモリ装置 |
| US6881993B2 (en) * | 2002-08-28 | 2005-04-19 | Micron Technology, Inc. | Device having reduced diffusion through ferromagnetic materials |
| US6841395B2 (en) * | 2002-11-25 | 2005-01-11 | International Business Machines Corporation | Method of forming a barrier layer of a tunneling magnetoresistive sensor |
| JP2005041835A (ja) * | 2003-07-24 | 2005-02-17 | Fuji Xerox Co Ltd | カーボンナノチューブ構造体、その製造方法、カーボンナノチューブ転写体および溶液 |
| KR100612854B1 (ko) * | 2004-07-31 | 2006-08-21 | 삼성전자주식회사 | 스핀차지를 이용한 자성막 구조체와 그 제조 방법과 그를구비하는 반도체 장치 및 이 장치의 동작방법 |
| JP4261454B2 (ja) * | 2004-10-13 | 2009-04-30 | 株式会社東芝 | 磁気抵抗効果素子とそれを用いた磁気ヘッドおよび磁気再生装置 |
| JP2006114610A (ja) * | 2004-10-13 | 2006-04-27 | Toshiba Corp | 磁気抵抗効果素子とそれを用いた磁気ヘッドおよび磁気再生装置 |
| JP4764294B2 (ja) * | 2006-09-08 | 2011-08-31 | 株式会社東芝 | 磁気抵抗効果素子、及び磁気ヘッド |
| US7911741B2 (en) * | 2007-04-30 | 2011-03-22 | Hitachi Global Storage Technologies, Netherlands, B.V. | Slider overcoat for noise reduction of TMR magnetic transducer |
| US7855861B2 (en) * | 2007-04-30 | 2010-12-21 | Hitachi Global Storage Technologies, Netherlands, B.V. | Insulator barrier for noise reduction of a TMR magnetic transducer |
| US8325450B2 (en) * | 2008-12-10 | 2012-12-04 | Hitachi Global Storage Technologies Netherlands B.V. | Low resistance tunnel magnetoresistance (TMR) structure |
| JP5512140B2 (ja) * | 2009-01-30 | 2014-06-04 | 日本電信電話株式会社 | キャパシタ構造及び半導体素子 |
| JP4902686B2 (ja) * | 2009-04-06 | 2012-03-21 | キヤノンアネルバ株式会社 | 磁気抵抗効果素子の製造方法 |
| JP2012054576A (ja) * | 2011-10-12 | 2012-03-15 | Sony Corp | 磁気抵抗効果素子及び磁気メモリ装置 |
| JP5598575B2 (ja) * | 2013-06-19 | 2014-10-01 | ソニー株式会社 | 磁気抵抗効果素子及び磁気メモリ装置 |
| US9779865B2 (en) * | 2014-10-17 | 2017-10-03 | The Arizona Board Of Regents On Behalf Of The University Of Arizona | Voltage-controlled magnetic devices |
| WO2017115839A1 (ja) * | 2015-12-28 | 2017-07-06 | コニカミノルタ株式会社 | 磁気センサー、センサーユニット、磁気検出装置、及び磁気計測装置 |
| US9947862B2 (en) | 2016-03-14 | 2018-04-17 | Toshiba Memory Corporation | Magnetoresistive memory device |
| US10153423B2 (en) * | 2017-01-06 | 2018-12-11 | SK Hynix Inc. | Electronic device |
| JP6799300B2 (ja) * | 2017-03-30 | 2020-12-16 | 国立研究開発法人産業技術総合研究所 | 磁気素子、磁気記憶装置及び磁気センサ |
| US10818346B2 (en) | 2018-09-17 | 2020-10-27 | Northrop Grumman Systems Corporation | Quantizing loop memory cell system |
| US11211117B2 (en) | 2019-01-24 | 2021-12-28 | Northrop Grumman Systems Corporation | Ferrimagnetic/ferromagnetic exchange bilayers for use as a fixed magnetic layer in a superconducting-based memory device |
| US10885974B2 (en) | 2019-01-30 | 2021-01-05 | Northrop Grumman Systems Corporation | Superconducting switch |
| US10879447B2 (en) * | 2019-03-13 | 2020-12-29 | Northrop Grumman Systems Corporation | Repeating alternating multilayer buffer layer |
| US11024791B1 (en) | 2020-01-27 | 2021-06-01 | Northrop Grumman Systems Corporation | Magnetically stabilized magnetic Josephson junction memory cell |
| US11342491B2 (en) | 2020-09-28 | 2022-05-24 | Northrop Grumman Systems Corporation | Magnetic Josephson junction system |
| US11444233B1 (en) | 2021-03-31 | 2022-09-13 | Northrop Grumman Systems Corporation | Josephson magnetic memory cell with ferrimagnetic layers having orthogonal magnetic polarity |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5640343A (en) * | 1996-03-18 | 1997-06-17 | International Business Machines Corporation | Magnetic memory array using magnetic tunnel junction devices in the memory cells |
| JP2924798B2 (ja) * | 1996-07-12 | 1999-07-26 | 日本電気株式会社 | 磁気抵抗効果薄膜 |
| US5801984A (en) * | 1996-11-27 | 1998-09-01 | International Business Machines Corporation | Magnetic tunnel junction device with ferromagnetic multilayer having fixed magnetic moment |
| US6452204B1 (en) * | 1998-12-08 | 2002-09-17 | Nec Corporation | Tunneling magnetoresistance transducer and method for manufacturing the same |
-
1999
- 1999-09-24 JP JP27128299A patent/JP3695515B2/ja not_active Expired - Lifetime
-
2000
- 2000-09-20 US US09/666,608 patent/US6710986B1/en not_active Expired - Lifetime
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