JP2001051417A5 - - Google Patents
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- Publication number
- JP2001051417A5 JP2001051417A5 JP1999227792A JP22779299A JP2001051417A5 JP 2001051417 A5 JP2001051417 A5 JP 2001051417A5 JP 1999227792 A JP1999227792 A JP 1999227792A JP 22779299 A JP22779299 A JP 22779299A JP 2001051417 A5 JP2001051417 A5 JP 2001051417A5
- Authority
- JP
- Japan
- Prior art keywords
- groups
- acid
- group
- chemically amplified
- resist composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000002253 acid Substances 0.000 claims 9
- 229920002120 photoresistant polymer Polymers 0.000 claims 4
- 125000000217 alkyl group Chemical group 0.000 claims 3
- 238000010894 electron beam technology Methods 0.000 claims 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims 2
- 125000003545 alkoxy group Chemical group 0.000 claims 2
- 150000001450 anions Chemical class 0.000 claims 2
- 125000003118 aryl group Chemical group 0.000 claims 2
- 239000003431 cross linking reagent Substances 0.000 claims 2
- 125000001153 fluoro group Chemical group F* 0.000 claims 2
- 125000000962 organic group Chemical group 0.000 claims 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims 2
- 230000005855 radiation Effects 0.000 claims 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims 1
- 150000007513 acids Chemical class 0.000 claims 1
- 125000002252 acyl group Chemical group 0.000 claims 1
- 125000004423 acyloxy group Chemical group 0.000 claims 1
- 125000004453 alkoxycarbonyl group Chemical group 0.000 claims 1
- 125000004849 alkoxymethyl group Chemical group 0.000 claims 1
- ILFFFKFZHRGICY-UHFFFAOYSA-N anthracene-1-sulfonic acid Chemical compound C1=CC=C2C=C3C(S(=O)(=O)O)=CC=CC3=CC2=C1 ILFFFKFZHRGICY-UHFFFAOYSA-N 0.000 claims 1
- 125000003710 aryl alkyl group Chemical group 0.000 claims 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 1
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 claims 1
- 229940092714 benzenesulfonic acid Drugs 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 claims 1
- 229910052731 fluorine Inorganic materials 0.000 claims 1
- 125000005843 halogen group Chemical group 0.000 claims 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 1
- 125000004029 hydroxymethyl group Chemical group [H]OC([H])([H])* 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- PSZYNBSKGUBXEH-UHFFFAOYSA-N naphthalene-1-sulfonic acid Chemical compound C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1 PSZYNBSKGUBXEH-UHFFFAOYSA-N 0.000 claims 1
- 229910052757 nitrogen Inorganic materials 0.000 claims 1
- 229910052760 oxygen Inorganic materials 0.000 claims 1
- 239000001301 oxygen Substances 0.000 claims 1
- 150000002989 phenols Chemical class 0.000 claims 1
- 239000011347 resin Substances 0.000 claims 1
- 229920005989 resin Polymers 0.000 claims 1
- 125000006296 sulfonyl amino group Chemical group [H]N(*)S(*)(=O)=O 0.000 claims 1
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 claims 1
- -1 sulfonyloxy groups Chemical group 0.000 claims 1
- 229910052717 sulfur Inorganic materials 0.000 claims 1
- 239000011593 sulfur Substances 0.000 claims 1
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22779299A JP3929653B2 (ja) | 1999-08-11 | 1999-08-11 | ネガ型レジスト組成物 |
| US09/636,811 US6511783B1 (en) | 1999-08-11 | 2000-08-10 | Negative resist composition |
| KR1020000046253A KR100651042B1 (ko) | 1999-08-11 | 2000-08-10 | 네거티브 레지스트 조성물 |
| DE60039274T DE60039274D1 (de) | 1999-08-11 | 2000-08-11 | Negativ arbeitende Resistzusammensetzung |
| EP00117227A EP1076261B1 (en) | 1999-08-11 | 2000-08-11 | Negative resist composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22779299A JP3929653B2 (ja) | 1999-08-11 | 1999-08-11 | ネガ型レジスト組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2001051417A JP2001051417A (ja) | 2001-02-23 |
| JP2001051417A5 true JP2001051417A5 (https=) | 2005-07-07 |
| JP3929653B2 JP3929653B2 (ja) | 2007-06-13 |
Family
ID=16866470
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP22779299A Expired - Fee Related JP3929653B2 (ja) | 1999-08-11 | 1999-08-11 | ネガ型レジスト組成物 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US6511783B1 (https=) |
| EP (1) | EP1076261B1 (https=) |
| JP (1) | JP3929653B2 (https=) |
| KR (1) | KR100651042B1 (https=) |
| DE (1) | DE60039274D1 (https=) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4070393B2 (ja) | 2000-01-17 | 2008-04-02 | 富士フイルム株式会社 | ネガ型レジスト組成物 |
| JP4092083B2 (ja) * | 2001-03-21 | 2008-05-28 | 富士フイルム株式会社 | 電子線又はｘ線用ネガ型レジスト組成物 |
| JP4645789B2 (ja) * | 2001-06-18 | 2011-03-09 | Ｊｓｒ株式会社 | ネガ型感放射線性樹脂組成物 |
| US20030235775A1 (en) * | 2002-06-13 | 2003-12-25 | Munirathna Padmanaban | Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds |
| US7083892B2 (en) * | 2002-06-28 | 2006-08-01 | Fuji Photo Film Co., Ltd. | Resist composition |
| JP4213925B2 (ja) | 2002-08-19 | 2009-01-28 | 富士フイルム株式会社 | ネガ型レジスト組成物 |
| DE10244197A1 (de) * | 2002-09-23 | 2004-04-08 | Infineon Technologies Ag | Zusammensetzung, die eine elektrisch leitfähige Lackschicht bildet und ein Verfahren zur Strukturierung eines Fotoresists unter Verwendung der Lackschicht |
| KR101392291B1 (ko) * | 2007-04-13 | 2014-05-07 | 주식회사 동진쎄미켐 | 포토레지스트 조성물 및 이를 이용한 박막트랜지스터기판의 제조방법 |
| JP5745368B2 (ja) * | 2011-09-02 | 2015-07-08 | 富士フイルム株式会社 | ネガ型感活性光線性又は感放射線性樹脂組成物、並びに、それを用いたレジスト膜、レジスト塗布マスクブランクス、レジストパターン形成方法、及び、フォトマスク |
| CN105324720B (zh) | 2013-06-26 | 2020-01-03 | 日产化学工业株式会社 | 包含被置换的交联性化合物的抗蚀剂下层膜形成用组合物 |
| JP6520091B2 (ja) * | 2013-12-16 | 2019-05-29 | Jsr株式会社 | 着色組成物、着色硬化膜及び表示素子 |
| JP6313604B2 (ja) * | 2014-02-05 | 2018-04-18 | 富士フイルム株式会社 | 感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性膜、感活性光線性又は感放射線性膜を備えたマスクブランクス、パターン形成方法、及び電子デバイスの製造方法 |
| KR101598826B1 (ko) | 2015-08-28 | 2016-03-03 | 영창케미칼 주식회사 | 에칭 내성이 우수한 i-선용 네가티브형 포토레지스트 조성물 |
| JP2017090849A (ja) * | 2015-11-17 | 2017-05-25 | アーゼッド・エレクトロニック・マテリアルズ（ルクセンブルグ）ソシエテ・ア・レスポンサビリテ・リミテ | 高耐熱性レジスト組成物およびそれを用いたパターン形成方法 |
| US9872399B1 (en) * | 2016-07-22 | 2018-01-16 | International Business Machines Corporation | Implementing backdrilling elimination utilizing anti-electroplate coating |
Family Cites Families (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3821584A1 (de) | 1988-06-25 | 1989-12-28 | Hoechst Ag | Strahlungshaertbares gemisch und daraus hergestelltes strahlungsempfindliches aufzeichungsmaterial fuer hochenergetische strahlung |
| JPH02150848A (ja) | 1988-12-02 | 1990-06-11 | Hitachi Ltd | 光退色性放射線感応性組成物およびそれを用いたパターン形成法 |
| US5128232A (en) | 1989-05-22 | 1992-07-07 | Shiply Company Inc. | Photoresist composition with copolymer binder having a major proportion of phenolic units and a minor proportion of non-aromatic cyclic alcoholic units |
| CA2019693A1 (en) | 1989-07-07 | 1991-01-07 | Karen Ann Graziano | Acid-hardening photoresists of improved sensitivity |
| JP2500533B2 (ja) | 1990-01-30 | 1996-05-29 | 和光純薬工業株式会社 | 新規なジアゾジスルホン化合物 |
| DE4006190A1 (de) | 1990-02-28 | 1991-08-29 | Hoechst Ag | Negativ arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial |
| JP2973585B2 (ja) | 1990-06-15 | 1999-11-08 | 三菱化学株式会社 | ネガ型感光性組成物 |
| JPH04291259A (ja) | 1991-03-19 | 1992-10-15 | Nippon Zeon Co Ltd | レジスト組成物 |
| JPH04367864A (ja) | 1991-06-14 | 1992-12-21 | Nippon Zeon Co Ltd | レジスト組成物 |
| JP2722870B2 (ja) | 1991-06-14 | 1998-03-09 | 日本ゼオン株式会社 | レジスト組成物 |
| US5286600A (en) | 1991-08-27 | 1994-02-15 | Mitsubishi Kasei Corporation | Negative photosensitive composition and method for forming a resist pattern by means thereof |
| JP3016231B2 (ja) | 1991-11-15 | 2000-03-06 | ジェイエスアール株式会社 | ネガ型レジスト組成物 |
| JP3259263B2 (ja) | 1992-06-22 | 2002-02-25 | ジェイエスアール株式会社 | ネガ型感放射線性樹脂組成物 |
| US5389491A (en) | 1992-07-15 | 1995-02-14 | Matsushita Electric Industrial Co., Ltd. | Negative working resist composition |
| JPH06236024A (ja) | 1992-09-24 | 1994-08-23 | Sumitomo Chem Co Ltd | フォトレジスト組成物 |
| JPH06199770A (ja) | 1992-12-28 | 1994-07-19 | Japan Synthetic Rubber Co Ltd | 新規オニウム塩およびそれを含有する感放射線性樹脂 組成物 |
| US5344742A (en) | 1993-04-21 | 1994-09-06 | Shipley Company Inc. | Benzyl-substituted photoactive compounds and photoresist compositions comprising same |
| JPH083635A (ja) | 1994-06-15 | 1996-01-09 | Kobe Steel Ltd | 靱性の優れた鋼板の製造方法 |
| US5731364A (en) * | 1996-01-24 | 1998-03-24 | Shipley Company, L.L.C. | Photoimageable compositions comprising multiple arylsulfonium photoactive compounds |
| JP3636827B2 (ja) * | 1996-07-01 | 2005-04-06 | 富士写真フイルム株式会社 | ネガ型画像記録材料 |
| JP3798504B2 (ja) | 1997-04-21 | 2006-07-19 | 富士写真フイルム株式会社 | ネガ型画像記録材料 |
| ATE323602T1 (de) * | 1999-05-31 | 2006-05-15 | Fuji Photo Film Co Ltd | Bildaufzeichnungsmaterial und flachdruckplatte mit diesem bildaufzeichnungsmaterial |
-
1999
- 1999-08-11 JP JP22779299A patent/JP3929653B2/ja not_active Expired - Fee Related
-
2000
- 2000-08-10 US US09/636,811 patent/US6511783B1/en not_active Expired - Lifetime
- 2000-08-10 KR KR1020000046253A patent/KR100651042B1/ko not_active Expired - Lifetime
- 2000-08-11 DE DE60039274T patent/DE60039274D1/de not_active Expired - Lifetime
- 2000-08-11 EP EP00117227A patent/EP1076261B1/en not_active Expired - Lifetime