JP2001022075A5 - - Google Patents
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- Publication number
- JP2001022075A5 JP2001022075A5 JP1999198164A JP19816499A JP2001022075A5 JP 2001022075 A5 JP2001022075 A5 JP 2001022075A5 JP 1999198164 A JP1999198164 A JP 1999198164A JP 19816499 A JP19816499 A JP 19816499A JP 2001022075 A5 JP2001022075 A5 JP 2001022075A5
- Authority
- JP
- Japan
- Prior art keywords
- resin
- resist
- epoxy
- monomer unit
- integer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 239000011347 resin Substances 0.000 description 12
- 229920005989 resin Polymers 0.000 description 12
- 239000000178 monomer Substances 0.000 description 9
- 239000002253 acid Substances 0.000 description 5
- 125000000217 alkyl group Chemical group 0.000 description 4
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 3
- 239000003513 alkali Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- NCTBYWFEJFTVEL-UHFFFAOYSA-N 2-methylbutyl prop-2-enoate Chemical compound CCC(C)COC(=O)C=C NCTBYWFEJFTVEL-UHFFFAOYSA-N 0.000 description 1
- CFVWNXQPGQOHRJ-UHFFFAOYSA-N 2-methylpropyl prop-2-enoate Chemical compound CC(C)COC(=O)C=C CFVWNXQPGQOHRJ-UHFFFAOYSA-N 0.000 description 1
- PGLAMOZAURDHAC-UHFFFAOYSA-N 3,4,4-trimethylpentyl prop-2-enoate Chemical compound C(C=C)(=O)OCCC(C(C)(C)C)C PGLAMOZAURDHAC-UHFFFAOYSA-N 0.000 description 1
- RDFJPGOQFLMCAJ-UHFFFAOYSA-N 3-methylhexyl prop-2-enoate Chemical compound CCCC(C)CCOC(=O)C=C RDFJPGOQFLMCAJ-UHFFFAOYSA-N 0.000 description 1
- SYKJJCUPAGWOPT-UHFFFAOYSA-N 6-oxabicyclo[3.1.0]hexan-2-ylmethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC1CCC2OC12 SYKJJCUPAGWOPT-UHFFFAOYSA-N 0.000 description 1
- FYYIUODUDSPAJQ-UHFFFAOYSA-N 7-oxabicyclo[4.1.0]heptan-4-ylmethyl 2-methylprop-2-enoate Chemical compound C1C(COC(=O)C(=C)C)CCC2OC21 FYYIUODUDSPAJQ-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- OUQORLXONDVVHJ-UHFFFAOYSA-N CC(=C)C(=O)OCC1CCC2C(O2)CC1 Chemical compound CC(=C)C(=O)OCC1CCC2C(O2)CC1 OUQORLXONDVVHJ-UHFFFAOYSA-N 0.000 description 1
- HYVADMAVOQUAQK-UHFFFAOYSA-N CC(=C)C(=O)OCC1CCCC2C(O2)CC1 Chemical compound CC(=C)C(=O)OCC1CCCC2C(O2)CC1 HYVADMAVOQUAQK-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 230000003321 amplification Effects 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000000686 lactone group Chemical group 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19816499A JP4544550B2 (ja) | 1999-07-12 | 1999-07-12 | レジスト用樹脂、化学増幅型レジスト組成物およびレジストパターン形成方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19816499A JP4544550B2 (ja) | 1999-07-12 | 1999-07-12 | レジスト用樹脂、化学増幅型レジスト組成物およびレジストパターン形成方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2001022075A JP2001022075A (ja) | 2001-01-26 |
| JP2001022075A5 true JP2001022075A5 (enExample) | 2006-08-31 |
| JP4544550B2 JP4544550B2 (ja) | 2010-09-15 |
Family
ID=16386539
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19816499A Expired - Lifetime JP4544550B2 (ja) | 1999-07-12 | 1999-07-12 | レジスト用樹脂、化学増幅型レジスト組成物およびレジストパターン形成方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4544550B2 (enExample) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2006080786A1 (en) * | 2005-01-25 | 2006-08-03 | Lg Chem. Ltd. | Thermally curable resin composition with extended storage stability and good adhesive property |
| WO2007055134A1 (ja) * | 2005-11-10 | 2007-05-18 | Nec Corporation | 光導波路形成用感光性樹脂組成物、光導波路、及び光導波路の製造方法 |
| JP5432456B2 (ja) * | 2008-01-23 | 2014-03-05 | 出光興産株式会社 | アダマンタン系共重合樹脂、樹脂組成物及びその用途 |
| JP5506621B2 (ja) * | 2009-10-16 | 2014-05-28 | 富士フイルム株式会社 | 感光性樹脂組成物、硬化膜、硬化膜の形成方法、有機ｅｌ表示装置、及び、液晶表示装置 |
| JP5451570B2 (ja) * | 2009-10-16 | 2014-03-26 | 富士フイルム株式会社 | 感光性樹脂組成物、硬化膜の形成方法、硬化膜、有機ｅｌ表示装置、及び、液晶表示装置 |
| JP5623897B2 (ja) * | 2010-01-22 | 2014-11-12 | 富士フイルム株式会社 | ポジ型感光性樹脂組成物、硬化膜の形成方法、硬化膜、有機ｅｌ表示装置、及び、液晶表示装置 |
| JP5524036B2 (ja) * | 2010-01-25 | 2014-06-18 | 富士フイルム株式会社 | ポジ型感光性樹脂組成物、硬化膜の形成方法、硬化膜、液晶表示装置、及び、有機ｅｌ表示装置 |
| JP5734152B2 (ja) * | 2011-09-30 | 2015-06-10 | 富士フイルム株式会社 | 感光性樹脂組成物、硬化膜並びにその製造方法 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5429627A (en) * | 1977-08-09 | 1979-03-05 | Somar Mfg | Positive resist material and use thereof |
| JP3643657B2 (ja) * | 1996-07-22 | 2005-04-27 | ダイセル化学工業株式会社 | 水性樹脂分散液 |
| JPH1087747A (ja) * | 1996-09-10 | 1998-04-07 | Toyo Ink Mfg Co Ltd | 放射線硬化型液状樹脂 |
| JPH10316721A (ja) * | 1997-05-15 | 1998-12-02 | Nippon Steel Chem Co Ltd | アルカリ可溶性樹脂及びそれを用いた画像形成用材料 |
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1999
- 1999-07-12 JP JP19816499A patent/JP4544550B2/ja not_active Expired - Lifetime