JP2000258913A5 - - Google Patents
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- Publication number
- JP2000258913A5 JP2000258913A5 JP1999060286A JP6028699A JP2000258913A5 JP 2000258913 A5 JP2000258913 A5 JP 2000258913A5 JP 1999060286 A JP1999060286 A JP 1999060286A JP 6028699 A JP6028699 A JP 6028699A JP 2000258913 A5 JP2000258913 A5 JP 2000258913A5
- Authority
- JP
- Japan
- Prior art keywords
- resin composition
- sensitive resin
- polymer
- carbon atoms
- formula
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 229920000642 polymer Polymers 0.000 claims 5
- 239000011342 resin composition Substances 0.000 claims 5
- 125000004432 carbon atoms Chemical group C* 0.000 claims 4
- 150000001875 compounds Chemical class 0.000 claims 3
- 239000002253 acid Substances 0.000 claims 2
- 125000000217 alkyl group Chemical group 0.000 claims 2
- 125000003710 aryl alkyl group Chemical group 0.000 claims 2
- 125000001424 substituent group Chemical group 0.000 claims 2
- -1 vinyl ether compound Chemical class 0.000 claims 2
- 239000003377 acid catalyst Substances 0.000 claims 1
- 239000003513 alkali Substances 0.000 claims 1
- 125000003118 aryl group Chemical group 0.000 claims 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 1
- 229910052799 carbon Inorganic materials 0.000 claims 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 1
Claims (4)
- 前記(c)のアセタール化合物の総量が、前記(a)のポリマーの総重量に対して0.1重量部以上100重量部未満であることを特徴とする請求項1又は2に記載のポジ型感放射線性樹脂組成物。
- 請求項1〜3のいずれかに記載のポジ型感放射線性樹脂組成物により膜を形成し、当該膜を露光、現像することを特徴とするパターン形成方法。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6028699A JP4067215B2 (ja) | 1999-03-08 | 1999-03-08 | ポジ型感放射線性樹脂組成物 |
KR1020000011410A KR100692264B1 (ko) | 1999-03-08 | 2000-03-08 | 포지티브형 감방사선성 수지 조성물 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6028699A JP4067215B2 (ja) | 1999-03-08 | 1999-03-08 | ポジ型感放射線性樹脂組成物 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2000258913A JP2000258913A (ja) | 2000-09-22 |
JP2000258913A5 true JP2000258913A5 (ja) | 2005-07-07 |
JP4067215B2 JP4067215B2 (ja) | 2008-03-26 |
Family
ID=13137772
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6028699A Expired - Fee Related JP4067215B2 (ja) | 1999-03-08 | 1999-03-08 | ポジ型感放射線性樹脂組成物 |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP4067215B2 (ja) |
KR (1) | KR100692264B1 (ja) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4602496B2 (ja) * | 1999-05-24 | 2010-12-22 | ローム・アンド・ハース・エレクトロニック・マテリアルズ,エル.エル.シー. | ポリビニルフェノール類のアセタール化物及び/又はカーボネート化物の製造方法及び感放射線性樹脂組成物 |
TW562999B (en) * | 2001-05-09 | 2003-11-21 | Fuji Photo Film Co Ltd | Positive resist composition for electronic or X-rays |
EP1662320A1 (en) * | 2004-11-24 | 2006-05-31 | Rohm and Haas Electronic Materials, L.L.C. | Photoresist compositions |
JP4602063B2 (ja) * | 2004-12-16 | 2010-12-22 | 東京応化工業株式会社 | 電子線又はeuv用ポジ型レジスト組成物およびレジストパターン形成方法 |
KR101677058B1 (ko) * | 2009-10-13 | 2016-11-18 | 금호석유화학 주식회사 | 폴리아세탈 수지, 그 합성 방법 및 포토레지스트 조성물 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02272457A (ja) * | 1989-04-13 | 1990-11-07 | Fuji Photo Film Co Ltd | 感電離放射線性樹脂組成物 |
DE4007924A1 (de) * | 1990-03-13 | 1991-09-19 | Basf Ag | Strahlungsempfindliches gemisch |
EP0819982A1 (en) * | 1996-07-18 | 1998-01-21 | Olin Microelectronic Chemicals, Inc. | Radiation-sensitive composition |
DE69821049T2 (de) * | 1997-05-09 | 2004-10-21 | Fuji Photo Film Co Ltd | Positiv arbeitende lichtempfindliche Zusammensetzung |
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1999
- 1999-03-08 JP JP6028699A patent/JP4067215B2/ja not_active Expired - Fee Related
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2000
- 2000-03-08 KR KR1020000011410A patent/KR100692264B1/ko active IP Right Grant