JP2010531476A5 - - Google Patents
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- JP2010531476A5 JP2010531476A5 JP2010514758A JP2010514758A JP2010531476A5 JP 2010531476 A5 JP2010531476 A5 JP 2010531476A5 JP 2010514758 A JP2010514758 A JP 2010514758A JP 2010514758 A JP2010514758 A JP 2010514758A JP 2010531476 A5 JP2010531476 A5 JP 2010531476A5
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- JP
- Japan
- Prior art keywords
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- following structure
- repeating unit
- unit represented
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 229920005596 polymer binder Polymers 0.000 claims 5
- 239000002491 polymer binding agent Substances 0.000 claims 5
- 125000000217 alkyl group Chemical group 0.000 claims 4
- 150000004780 naphthols Chemical class 0.000 claims 4
- 230000005855 radiation Effects 0.000 claims 4
- 150000001875 compounds Chemical class 0.000 claims 3
- MUVQKFGNPGZBII-UHFFFAOYSA-N 1-anthrol Chemical group C1=CC=C2C=C3C(O)=CC=CC3=CC2=C1 MUVQKFGNPGZBII-UHFFFAOYSA-N 0.000 claims 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 2
- 125000000304 alkynyl group Chemical group 0.000 claims 2
- 125000003118 aryl group Chemical group 0.000 claims 2
- 125000000753 cycloalkyl group Chemical group 0.000 claims 2
- 125000005843 halogen group Chemical group 0.000 claims 2
- 229910052739 hydrogen Inorganic materials 0.000 claims 2
- 239000001257 hydrogen Substances 0.000 claims 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 2
- 150000002989 phenols Chemical class 0.000 claims 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims 2
- 239000000758 substrate Substances 0.000 claims 2
- DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 claims 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- -1 poly (vinyl acetal Chemical class 0.000 claims 1
- 229920002554 vinyl polymer Polymers 0.000 claims 1
Claims (7)
- 前記輻射線吸収性化合物が赤外線吸収性化合物である、請求項1〜3のいずれか一項に記載の組成物。
- 前記アルカリ可溶性ポリマーバインダーが、下記構造(I−A):
Bは下記構造(Ib):
Cは下記構造(Ic):
Dは下記構造(Id):
Eは下記構造(Ie):
Fは下記構造(If):
Gは下記構造(Ig):
ここで、RおよびR’は、独立に、水素、または置換もしくは非置換アルキル、置換もしくは非置換シクロアルキル、あるいはハロ基であり、
R 1 は、置換もしくは非置換フェノール、置換もしくは非置換ナフトール、または置換もしくは非置換アントラセノール基であり、
R 2 は置換もしくは非置換ナフトールであるが、R 1 とは異なり、
R 3 は、置換もしくは非置換アルキニル基、または置換もしくは非置換フェニル基であり、
R 4 は−O−C(=O)−R 5 基であり、ここで、R 5 は置換もしくは非置換アルキル基またはカルボキシ置換もしくは非置換アリール基であり、
R 6 はヒドロキシ基であり、
R 7 は以下の基:
であり、
mは少なくとも30モル%であり、nは少なくとも20モル%であり、mとnの合計(m+n)は60モル%以下であり、
pは2〜10モル%であり、
qおよびrは独立に2〜25モル%であり、
sは1〜15モル%であり、
tは15〜30モル%である、請求項1〜4のいずれか一項に記載の組成物。 - 基材を含み、当該基材上に請求項1〜5のいずれか一項に記載の輻射線感受性組成物を含む画像形成可能な層を有するポジ型の画像形成可能な要素。
- A)請求項6に記載のポジ型の画像形成可能な要素を像様露光して、露光領域および非露光領域をもたらすこと、および
B)像様露光された要素を現像して、露光領域だけを除去すること、
を含む、印刷版の製造方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/769,766 US7723012B2 (en) | 2007-06-28 | 2007-06-28 | Radiation-sensitive compositions and elements with solvent resistant poly(vinyl acetal)s |
PCT/US2008/007389 WO2009005582A1 (en) | 2007-06-28 | 2008-06-13 | Radiation-sensitive compositions and elements with solvent resistant poly(vinyl acetal)s |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2012229079A Division JP2013020268A (ja) | 2007-06-28 | 2012-10-16 | 耐溶剤性ポリ(ビニルアセタール)を含む輻射線感受性組成物および要素 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2010531476A JP2010531476A (ja) | 2010-09-24 |
JP2010531476A5 true JP2010531476A5 (ja) | 2011-05-26 |
Family
ID=39712582
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010514758A Ceased JP2010531476A (ja) | 2007-06-28 | 2008-06-13 | 耐溶剤性ポリ(ビニルアセタール)を含む輻射線感受性組成物および要素 |
JP2012229079A Pending JP2013020268A (ja) | 2007-06-28 | 2012-10-16 | 耐溶剤性ポリ(ビニルアセタール)を含む輻射線感受性組成物および要素 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2012229079A Pending JP2013020268A (ja) | 2007-06-28 | 2012-10-16 | 耐溶剤性ポリ(ビニルアセタール)を含む輻射線感受性組成物および要素 |
Country Status (5)
Country | Link |
---|---|
US (2) | US7723012B2 (ja) |
EP (1) | EP2160650A1 (ja) |
JP (2) | JP2010531476A (ja) |
CN (1) | CN101689023B (ja) |
WO (1) | WO2009005582A1 (ja) |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8198011B2 (en) * | 2008-02-04 | 2012-06-12 | Eastman Kodak Company | Method of imaging and developing positive-working imageable elements |
US8084189B2 (en) * | 2008-05-22 | 2011-12-27 | Eastman Kodak Company | Method of imaging and developing positive-working imageable elements |
EP2213690B1 (en) | 2009-01-30 | 2015-11-11 | Agfa Graphics N.V. | A new alkali soluble resin |
JP5444831B2 (ja) * | 2009-05-15 | 2014-03-19 | 富士フイルム株式会社 | 平版印刷版原版 |
US8298750B2 (en) | 2009-09-08 | 2012-10-30 | Eastman Kodak Company | Positive-working radiation-sensitive imageable elements |
UA105045C2 (uk) | 2009-10-29 | 2014-04-10 | Майлен Груп | Галотаніни для покривних композицій офсетної друкарської форми |
ES2395993T3 (es) | 2010-03-19 | 2013-02-18 | Agfa Graphics N.V. | Precursor de plancha de impresión litográfica |
US8939080B2 (en) * | 2010-11-18 | 2015-01-27 | Eastman Kodak Company | Methods of processing using silicate-free developer compositions |
US20120192741A1 (en) | 2011-01-31 | 2012-08-02 | Moshe Nakash | Method for preparing lithographic printing plates |
US8647811B2 (en) | 2012-01-12 | 2014-02-11 | Eastman Kodak Company | Positive-working lithographic printing plate precursors |
US9562129B2 (en) | 2013-01-01 | 2017-02-07 | Agfa Graphics Nv | (Ethylene, vinyl acetal) copolymers and their use in lithographic printing plate precursors |
EP2933278B1 (en) | 2014-04-17 | 2018-08-22 | Agfa Nv | (Ethylene, vinyl acetal) copolymers and their use in lithographic printing plate precursors |
ES2617557T3 (es) | 2014-05-15 | 2017-06-19 | Agfa Graphics Nv | Copolímeros (de etileno, vinilacetal) y su uso en precursores de plancha de impresión litográfica |
EP2955198B8 (en) | 2014-06-13 | 2018-01-03 | Agfa Nv | Ethylene/vinyl acetal-copolymers and their use in lithographic printing plate precursors |
EP2963496B1 (en) | 2014-06-30 | 2017-04-05 | Agfa Graphics NV | A lithographic printing plate precursor including ( ethylene, vinyl acetal ) copolymers |
EP3130465B1 (en) | 2015-08-12 | 2020-05-13 | Agfa Nv | Heat-sensitive lithographic printing plate precursor |
EP3430475B1 (en) | 2016-03-16 | 2020-08-12 | Agfa Nv | Apparatus for processing a lithographic printing plate and corresponding method |
JP2020064082A (ja) | 2017-02-17 | 2020-04-23 | 富士フイルム株式会社 | ポジ型平版印刷版原版、及び、平版印刷版の作製方法 |
CN106909024B (zh) * | 2017-03-28 | 2020-03-13 | 辽宁靖帆新材料有限公司 | 一种感光性树脂组合物及其应用 |
EP3778253A1 (en) | 2019-08-13 | 2021-02-17 | Agfa Nv | Method for processing a lithographic printing plate |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1245924A (en) | 1967-09-27 | 1971-09-15 | Agfa Gevaert | Improvements relating to thermo-recording |
US3864133A (en) * | 1970-08-11 | 1975-02-04 | Dainippon Ink & Chemicals | Photo-polymerizable compositions |
US5380623A (en) * | 1992-12-17 | 1995-01-10 | Eastman Kodak Company | Aqueous developer for lithographic printing plates which provides improved oleophilicity |
US6451181B1 (en) * | 1999-03-02 | 2002-09-17 | Motorola, Inc. | Method of forming a semiconductor device barrier layer |
US6255033B1 (en) | 1999-07-30 | 2001-07-03 | Creo, Ltd. | Positive acting photoresist compositions and imageable element |
US6517988B1 (en) * | 2001-07-12 | 2003-02-11 | Kodak Polychrome Graphics Llc | Radiation-sensitive, positive working coating composition based on carboxylic copolymers |
JP4048533B2 (ja) * | 2002-09-30 | 2008-02-20 | 富士フイルム株式会社 | 感赤外線感光性組成物 |
CN100389956C (zh) * | 2003-03-14 | 2008-05-28 | 柯达图像通信加拿大公司 | 辐射敏感组合物、可成像元件、阳性作用型光刻印刷前体及其制备方法 |
EP1603749A2 (en) * | 2003-03-14 | 2005-12-14 | Creo Inc. | Development enhancement of radiation-sensitive elements |
JP2005275231A (ja) * | 2004-03-26 | 2005-10-06 | Fuji Photo Film Co Ltd | 感光性平版印刷版 |
JP4391285B2 (ja) * | 2004-03-26 | 2009-12-24 | 富士フイルム株式会社 | 感光性平版印刷版 |
US7279263B2 (en) * | 2004-06-24 | 2007-10-09 | Kodak Graphic Communications Canada Company | Dual-wavelength positive-working radiation-sensitive elements |
JP2006018203A (ja) | 2004-07-05 | 2006-01-19 | Fuji Photo Film Co Ltd | 平版印刷版原版 |
JP2006058430A (ja) | 2004-08-18 | 2006-03-02 | Fuji Photo Film Co Ltd | 平版印刷版原版 |
US7544462B2 (en) * | 2007-02-22 | 2009-06-09 | Eastman Kodak Company | Radiation-sensitive composition and elements with basic development enhancers |
-
2007
- 2007-06-28 US US11/769,766 patent/US7723012B2/en not_active Expired - Fee Related
-
2008
- 2008-06-13 CN CN2008800225525A patent/CN101689023B/zh active Active
- 2008-06-13 JP JP2010514758A patent/JP2010531476A/ja not_active Ceased
- 2008-06-13 WO PCT/US2008/007389 patent/WO2009005582A1/en active Application Filing
- 2008-06-13 EP EP08768429A patent/EP2160650A1/en not_active Withdrawn
-
2009
- 2009-08-21 US US12/545,297 patent/US7955779B2/en not_active Expired - Fee Related
-
2012
- 2012-10-16 JP JP2012229079A patent/JP2013020268A/ja active Pending
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