JP2000077345A - 電気炉制御装置 - Google Patents
電気炉制御装置Info
- Publication number
- JP2000077345A JP2000077345A JP10248635A JP24863598A JP2000077345A JP 2000077345 A JP2000077345 A JP 2000077345A JP 10248635 A JP10248635 A JP 10248635A JP 24863598 A JP24863598 A JP 24863598A JP 2000077345 A JP2000077345 A JP 2000077345A
- Authority
- JP
- Japan
- Prior art keywords
- control
- heater
- power
- zero
- control signal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000010438 heat treatment Methods 0.000 claims abstract description 19
- 239000004065 semiconductor Substances 0.000 claims abstract description 19
- 238000004519 manufacturing process Methods 0.000 claims abstract description 13
- 238000000034 method Methods 0.000 abstract description 50
- 230000007274 generation of a signal involved in cell-cell signaling Effects 0.000 abstract description 21
- 230000008569 process Effects 0.000 abstract description 15
- 230000006641 stabilisation Effects 0.000 abstract description 12
- 238000011105 stabilization Methods 0.000 abstract description 12
- 238000001816 cooling Methods 0.000 abstract description 5
- 238000012545 processing Methods 0.000 description 11
- 238000010586 diagram Methods 0.000 description 10
- 238000009826 distribution Methods 0.000 description 10
- 239000000758 substrate Substances 0.000 description 6
- 238000009792 diffusion process Methods 0.000 description 5
- 230000008901 benefit Effects 0.000 description 4
- 238000004364 calculation method Methods 0.000 description 4
- 239000011810 insulating material Substances 0.000 description 4
- 238000002791 soaking Methods 0.000 description 4
- 230000001360 synchronised effect Effects 0.000 description 4
- 238000012935 Averaging Methods 0.000 description 3
- 230000010365 information processing Effects 0.000 description 3
- 239000010453 quartz Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 238000000137 annealing Methods 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 230000012447 hatching Effects 0.000 description 2
- 239000012141 concentrate Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10248635A JP2000077345A (ja) | 1998-09-02 | 1998-09-02 | 電気炉制御装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10248635A JP2000077345A (ja) | 1998-09-02 | 1998-09-02 | 電気炉制御装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2000077345A true JP2000077345A (ja) | 2000-03-14 |
| JP2000077345A5 JP2000077345A5 (enExample) | 2006-01-26 |
Family
ID=17181053
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10248635A Withdrawn JP2000077345A (ja) | 1998-09-02 | 1998-09-02 | 電気炉制御装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2000077345A (enExample) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6847015B2 (en) | 2000-09-27 | 2005-01-25 | Tokyo Electron Limited | Heat treatment apparatus and controller for heat treatment apparatus and control method for heat treatment apparatus |
| JP2010097854A (ja) * | 2008-10-17 | 2010-04-30 | Ulvac Japan Ltd | 加熱真空処理方法 |
| KR20110131098A (ko) * | 2010-05-28 | 2011-12-06 | 도쿄엘렉트론가부시키가이샤 | 기판 처리 시스템용 가열 장치의 승온 제어 방법, 컴퓨터 기록 매체 및 기판 처리 시스템 |
| CN111508867A (zh) * | 2018-12-21 | 2020-08-07 | 细美事有限公司 | 用于处理基板的装置和方法 |
-
1998
- 1998-09-02 JP JP10248635A patent/JP2000077345A/ja not_active Withdrawn
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6847015B2 (en) | 2000-09-27 | 2005-01-25 | Tokyo Electron Limited | Heat treatment apparatus and controller for heat treatment apparatus and control method for heat treatment apparatus |
| JP2010097854A (ja) * | 2008-10-17 | 2010-04-30 | Ulvac Japan Ltd | 加熱真空処理方法 |
| KR20110131098A (ko) * | 2010-05-28 | 2011-12-06 | 도쿄엘렉트론가부시키가이샤 | 기판 처리 시스템용 가열 장치의 승온 제어 방법, 컴퓨터 기록 매체 및 기판 처리 시스템 |
| JP2011249633A (ja) * | 2010-05-28 | 2011-12-08 | Tokyo Electron Ltd | 基板処理システム用加熱装置の昇温制御方法、プログラム、コンピュータ記録媒体及び基板処理システム |
| KR101663746B1 (ko) | 2010-05-28 | 2016-10-07 | 도쿄엘렉트론가부시키가이샤 | 기판 처리 시스템용 가열 장치의 승온 제어 방법, 컴퓨터 기록 매체 및 기판 처리 시스템 |
| CN111508867A (zh) * | 2018-12-21 | 2020-08-07 | 细美事有限公司 | 用于处理基板的装置和方法 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20040929 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20050526 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20051207 |
|
| A761 | Written withdrawal of application |
Free format text: JAPANESE INTERMEDIATE CODE: A761 Effective date: 20080325 |