JP2000031164A5 - - Google Patents

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Publication number
JP2000031164A5
JP2000031164A5 JP1998193125A JP19312598A JP2000031164A5 JP 2000031164 A5 JP2000031164 A5 JP 2000031164A5 JP 1998193125 A JP1998193125 A JP 1998193125A JP 19312598 A JP19312598 A JP 19312598A JP 2000031164 A5 JP2000031164 A5 JP 2000031164A5
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JP
Japan
Prior art keywords
group
iii
nitride semiconductor
buffer layer
semiconductor device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1998193125A
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English (en)
Japanese (ja)
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JP2000031164A (ja
JP3982070B2 (ja
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Publication date
Application filed filed Critical
Priority to JP19312598A priority Critical patent/JP3982070B2/ja
Priority claimed from JP19312598A external-priority patent/JP3982070B2/ja
Priority to US09/270,749 priority patent/US6069021A/en
Publication of JP2000031164A publication Critical patent/JP2000031164A/ja
Publication of JP2000031164A5 publication Critical patent/JP2000031164A5/ja
Application granted granted Critical
Publication of JP3982070B2 publication Critical patent/JP3982070B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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JP19312598A 1997-05-14 1998-07-08 Iii族窒化物半導体fet及びその製造方法 Expired - Lifetime JP3982070B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP19312598A JP3982070B2 (ja) 1998-07-08 1998-07-08 Iii族窒化物半導体fet及びその製造方法
US09/270,749 US6069021A (en) 1997-05-14 1999-03-17 Method of growing group III nitride semiconductor crystal layer and semiconductor device incorporating group III nitride semiconductor crystal layer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19312598A JP3982070B2 (ja) 1998-07-08 1998-07-08 Iii族窒化物半導体fet及びその製造方法

Publications (3)

Publication Number Publication Date
JP2000031164A JP2000031164A (ja) 2000-01-28
JP2000031164A5 true JP2000031164A5 (enExample) 2005-07-07
JP3982070B2 JP3982070B2 (ja) 2007-09-26

Family

ID=16302690

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19312598A Expired - Lifetime JP3982070B2 (ja) 1997-05-14 1998-07-08 Iii族窒化物半導体fet及びその製造方法

Country Status (1)

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JP (1) JP3982070B2 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000277724A (ja) * 1999-03-26 2000-10-06 Nagoya Kogyo Univ 電界効果トランジスタとそれを備えた半導体装置及びその製造方法
US6787814B2 (en) 2000-06-22 2004-09-07 Showa Denko Kabushiki Kaisha Group-III nitride semiconductor light-emitting device and production method thereof
US7018728B2 (en) 2001-12-14 2006-03-28 Showa Denko K.K. Boron phosphide-based semiconductor device and production method thereof
JP5773035B2 (ja) * 2014-06-04 2015-09-02 富士通株式会社 化合物半導体装置

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