JP2000026474A5 - - Google Patents

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Publication number
JP2000026474A5
JP2000026474A5 JP1999116567A JP11656799A JP2000026474A5 JP 2000026474 A5 JP2000026474 A5 JP 2000026474A5 JP 1999116567 A JP1999116567 A JP 1999116567A JP 11656799 A JP11656799 A JP 11656799A JP 2000026474 A5 JP2000026474 A5 JP 2000026474A5
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JP
Japan
Prior art keywords
alkyl group
aluminum
integer
carbon atoms
formula
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1999116567A
Other languages
English (en)
Japanese (ja)
Other versions
JP4198820B2 (ja
JP2000026474A (ja
Filing date
Publication date
Priority claimed from KR19980014522A external-priority patent/KR100279067B1/ko
Application filed filed Critical
Publication of JP2000026474A publication Critical patent/JP2000026474A/ja
Publication of JP2000026474A5 publication Critical patent/JP2000026474A5/ja
Application granted granted Critical
Publication of JP4198820B2 publication Critical patent/JP4198820B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP11656799A 1998-04-23 1999-04-23 化学蒸着のためのアルミニウム錯体誘導体およびその製造方法 Expired - Fee Related JP4198820B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR98/14522 1998-04-23
KR19980014522A KR100279067B1 (ko) 1998-04-23 1998-04-23 화학증착용알루미늄화합물및그제조방법

Publications (3)

Publication Number Publication Date
JP2000026474A JP2000026474A (ja) 2000-01-25
JP2000026474A5 true JP2000026474A5 (enExample) 2005-10-27
JP4198820B2 JP4198820B2 (ja) 2008-12-17

Family

ID=36915015

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11656799A Expired - Fee Related JP4198820B2 (ja) 1998-04-23 1999-04-23 化学蒸着のためのアルミニウム錯体誘導体およびその製造方法

Country Status (7)

Country Link
US (2) US6143357A (enExample)
EP (1) EP0952156B1 (enExample)
JP (1) JP4198820B2 (enExample)
KR (1) KR100279067B1 (enExample)
DE (1) DE69932560T2 (enExample)
SG (1) SG83121A1 (enExample)
TW (1) TW562800B (enExample)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100316760B1 (ko) * 1999-06-11 2001-12-12 신현국 알루미나 박막의 화학 증착용 전구체 화합물 및 이의 제조방법
US7223823B2 (en) * 2002-06-06 2007-05-29 Exxon Mobil Chemical Patents Inc. Catalyst system and process
US7199072B2 (en) * 2002-12-31 2007-04-03 Univation Technologies, Llc Process of producing a supported mixed catalyst system and polyolefins therefrom
US7098339B2 (en) * 2005-01-18 2006-08-29 Praxair Technology, Inc. Processes for the production of organometallic compounds
JP5093448B2 (ja) * 2005-01-19 2012-12-12 Ｊｓｒ株式会社 トレンチ埋め込み方法
US7348445B2 (en) 2005-02-14 2008-03-25 Praxair Technology, Inc. Organoaluminum precursor compounds
KR100724084B1 (ko) * 2005-11-16 2007-06-04 주식회사 유피케미칼 디알킬아미도디하이드로알루미늄 화합물을 이용한 박막증착방법
KR100756403B1 (ko) * 2006-05-18 2007-09-10 (주)디엔에프 알루미늄 박막의 화학증착용 전구체 화합물의 제조방법
KR100829472B1 (ko) * 2006-05-18 2008-05-16 (주)디엔에프 알루미늄 박막의 화학증착용 전구체 화합물 및 이의제조방법
US8142847B2 (en) * 2007-07-13 2012-03-27 Rohm And Haas Electronic Materials Llc Precursor compositions and methods
JP4962311B2 (ja) * 2007-12-27 2012-06-27 セイコーエプソン株式会社 電子回路装置および電子機器
JP2010241698A (ja) * 2009-04-01 2010-10-28 Air Water Inc アミンアランの精製方法
US20110206844A1 (en) 2010-02-24 2011-08-25 Jacob Grant Wiles Chromium-free passivation of vapor deposited aluminum surfaces
JP5971248B2 (ja) * 2011-07-21 2016-08-17 Jsr株式会社 金属体を備える基体の製造方法
US9255324B2 (en) * 2012-08-15 2016-02-09 Up Chemical Co., Ltd. Aluminum precursor composition
US9994954B2 (en) 2013-07-26 2018-06-12 Versum Materials Us, Llc Volatile dihydropyrazinly and dihydropyrazine metal complexes
CN111855723B (zh) * 2020-06-11 2023-11-14 宁夏大学 一种粗大铝胞状晶组织形貌的直接三维显示方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB905985A (en) 1959-02-24 1962-09-19 Ethyl Corp Preparing metal-alumino hydrides
JPS57188026A (en) 1981-05-14 1982-11-18 Minolta Camera Co Ltd Driving device for photographing lens of automatic focusing camera
US4923717A (en) * 1989-03-17 1990-05-08 Regents Of The University Of Minnesota Process for the chemical vapor deposition of aluminum
JP2721023B2 (ja) * 1989-09-26 1998-03-04 キヤノン株式会社 堆積膜形成法
US5113025A (en) * 1989-10-02 1992-05-12 Ethyl Corporation Selective reducing agents
US5178911A (en) * 1989-11-30 1993-01-12 The President And Fellows Of Harvard College Process for chemical vapor deposition of main group metal nitrides
EP0448223B1 (en) * 1990-02-19 1996-06-26 Canon Kabushiki Kaisha Process for forming metal deposited film containing aluminium as main component by use of alkyl aluminum hydride
US5136046A (en) * 1990-09-28 1992-08-04 Ethyl Corporation Preparation of amine alanes
US5191099A (en) * 1991-09-05 1993-03-02 Regents Of The University Of Minnesota Chemical vapor deposition of aluminum films using dimethylethylamine alane
US5900279A (en) 1995-11-20 1999-05-04 Tri Chemical Laboratory Inc. Processes for the chemical vapor deposition and solvent used for the processes

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