JP2000021765A5 - - Google Patents

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Publication number
JP2000021765A5
JP2000021765A5 JP1998204428A JP20442898A JP2000021765A5 JP 2000021765 A5 JP2000021765 A5 JP 2000021765A5 JP 1998204428 A JP1998204428 A JP 1998204428A JP 20442898 A JP20442898 A JP 20442898A JP 2000021765 A5 JP2000021765 A5 JP 2000021765A5
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JP
Japan
Prior art keywords
optical system
illumination
optical
mask
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1998204428A
Other languages
English (en)
Japanese (ja)
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JP2000021765A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP10204428A priority Critical patent/JP2000021765A/ja
Priority claimed from JP10204428A external-priority patent/JP2000021765A/ja
Priority to US09/340,236 priority patent/US6249382B1/en
Publication of JP2000021765A publication Critical patent/JP2000021765A/ja
Publication of JP2000021765A5 publication Critical patent/JP2000021765A5/ja
Pending legal-status Critical Current

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JP10204428A 1998-07-03 1998-07-03 照明装置及びそれを用いた投影露光装置 Pending JP2000021765A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP10204428A JP2000021765A (ja) 1998-07-03 1998-07-03 照明装置及びそれを用いた投影露光装置
US09/340,236 US6249382B1 (en) 1998-07-03 1999-07-01 Illumination optical system and projection exposure apparatus using same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10204428A JP2000021765A (ja) 1998-07-03 1998-07-03 照明装置及びそれを用いた投影露光装置

Publications (2)

Publication Number Publication Date
JP2000021765A JP2000021765A (ja) 2000-01-21
JP2000021765A5 true JP2000021765A5 (enExample) 2005-11-04

Family

ID=16490384

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10204428A Pending JP2000021765A (ja) 1998-07-03 1998-07-03 照明装置及びそれを用いた投影露光装置

Country Status (2)

Country Link
US (1) US6249382B1 (enExample)
JP (1) JP2000021765A (enExample)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6833904B1 (en) 1998-02-27 2004-12-21 Nikon Corporation Exposure apparatus and method of fabricating a micro-device using the exposure apparatus
JP4238390B2 (ja) * 1998-02-27 2009-03-18 株式会社ニコン 照明装置、該照明装置を備えた露光装置および該露光装置を用いて半導体デバイスを製造する方法
US6220713B1 (en) * 1998-10-23 2001-04-24 Compaq Computer Corporation Projection lens and system
JP4532647B2 (ja) * 2000-02-23 2010-08-25 キヤノン株式会社 露光装置
US7301605B2 (en) 2000-03-03 2007-11-27 Nikon Corporation Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices
DE10016176A1 (de) * 2000-03-31 2001-10-04 Zeiss Carl Mikrolithographisches Beleuchtungssystem und Mikrolithographische Projektionsbelichtungsanlage damit
US6509577B1 (en) * 2000-11-10 2003-01-21 Asml Us, Inc. Systems and methods for exposing substrate periphery
TWI241458B (en) * 2001-02-23 2005-10-11 Zeiss Carl Smt Ag Illumination system with reduced energy loading
JP2004342711A (ja) * 2003-05-14 2004-12-02 Nikon Corp 照明光学装置、露光装置、および露光方法
US6953275B2 (en) * 2003-05-21 2005-10-11 Jds Uniphase Corporation System and method for providing a uniform source of light
US7400381B2 (en) * 2004-05-26 2008-07-15 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20080192224A1 (en) * 2005-02-12 2008-08-14 Carl Zeiss Smt Ag Microlithographic Projection Exposure Apparatus
US7884921B2 (en) * 2006-04-12 2011-02-08 Nikon Corporation Illumination optical apparatus, projection exposure apparatus, projection optical system, and device manufacturing method
JP4784746B2 (ja) 2006-04-12 2011-10-05 株式会社ニコン 照明光学装置、投影露光装置、投影光学系、及びデバイス製造方法
WO2007119514A1 (ja) * 2006-04-17 2007-10-25 Nikon Corporation 照明光学装置、露光装置、およびデバイス製造方法
US20070247729A1 (en) * 2006-04-25 2007-10-25 Rudolph Technologies, Inc. Reflective objective
WO2008036561A1 (en) * 2006-09-18 2008-03-27 3M Innovative Properties Company Reflective corrector for optical projection engine
DE102008028416A1 (de) * 2008-06-17 2009-12-24 Carl Zeiss Smt Ag Beleuchtungssystem für eine Projektionsbelichtungsanlage in der Halbleiterlitographie und Projektionsbelichtungsanlage
KR101327394B1 (ko) 2011-11-23 2013-11-08 주식회사 우보테크 헤드레스트 이동장치
JP6053737B2 (ja) 2014-09-22 2016-12-27 キヤノン株式会社 照明光学装置、露光装置、および物品の製造方法
CN107111222A (zh) 2014-12-31 2017-08-29 杜比实验室特许公司 用于图像投影仪的改进的积分棒组件
JP7227775B2 (ja) * 2019-01-31 2023-02-22 キヤノン株式会社 照明光学系、露光装置および物品製造方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58147708A (ja) 1982-02-26 1983-09-02 Nippon Kogaku Kk <Nikon> 照明用光学装置
US4918583A (en) 1988-04-25 1990-04-17 Nikon Corporation Illuminating optical device
US5719704A (en) * 1991-09-11 1998-02-17 Nikon Corporation Projection exposure apparatus
US5673102A (en) * 1991-02-22 1997-09-30 Canon Kabushiki Kaisha Image farming and microdevice manufacturing method and exposure apparatus in which a light source includes four quadrants of predetermined intensity
JPH0567558A (ja) * 1991-09-06 1993-03-19 Nikon Corp 露光方法
JPH0697047A (ja) 1992-09-11 1994-04-08 Nikon Corp 照明光学系
US5640284A (en) 1992-09-11 1997-06-17 Nikon Corporation Optical reflector, illumination optical system, light source system and illumination optical apparatus
US5581605A (en) 1993-02-10 1996-12-03 Nikon Corporation Optical element, production method of optical element, optical system, and optical apparatus
KR950033689A (ko) * 1994-03-02 1995-12-26 오노 시게오 노광장치 및 이를 이용한 회로패턴 형성방법
JPH08250402A (ja) * 1995-03-15 1996-09-27 Nikon Corp 走査型露光方法及び装置
JPH10275771A (ja) * 1997-02-03 1998-10-13 Nikon Corp 照明光学装置
JP4310816B2 (ja) * 1997-03-14 2009-08-12 株式会社ニコン 照明装置、投影露光装置、デバイスの製造方法、及び投影露光装置の調整方法
JPH11162832A (ja) * 1997-11-25 1999-06-18 Nikon Corp 走査露光方法及び走査型露光装置
US5967319A (en) * 1998-03-27 1999-10-19 White, Jr.; George H. Bottle carrier

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