Classifications

• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
  • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
  • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
  • H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
  • H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
  • H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
  • H01L21/822—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using silicon technology
  • H01L21/8248—Combination of bipolar and field-effect technology
  • H01L21/8249—Bipolar and MOS technology
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
  • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
  • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
  • H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
  • H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
  • H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
  • H01L21/822—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using silicon technology
  • H01L21/8248—Combination of bipolar and field-effect technology
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
  • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
  • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
  • H01L27/0203—Particular design considerations for integrated circuits
  • H01L27/0214—Particular design considerations for integrated circuits for internal polarisation, e.g. I2L
  • H01L27/0229—Particular design considerations for integrated circuits for internal polarisation, e.g. I2L of bipolar structures
  • H01L27/0233—Integrated injection logic structures [I2L]
  • H01L27/0244—I2L structures integrated in combination with analog structures
• • H—ELECTRICITY
  • H03—ELECTRONIC CIRCUITRY
  • H03K—PULSE TECHNIQUE
  • H03K19/00—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits
  • H03K19/0175—Coupling arrangements; Interface arrangements
  • H03K19/018—Coupling arrangements; Interface arrangements using bipolar transistors only
  • H03K19/01806—Interface arrangements
  • H03K19/01818—Interface arrangements for integrated injection logic (I2L)

Landscapes

• Engineering & Computer Science (AREA)
• Computer Hardware Design (AREA)
• Power Engineering (AREA)
• Physics & Mathematics (AREA)
• Microelectronics & Electronic Packaging (AREA)
• General Physics & Mathematics (AREA)
• Condensed Matter Physics & Semiconductors (AREA)
• Manufacturing & Machinery (AREA)
• Computing Systems (AREA)
• General Engineering & Computer Science (AREA)
• Mathematical Physics (AREA)
• Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
• Bipolar Transistors (AREA)
• Bipolar Integrated Circuits (AREA)

Applications Claiming Priority (1)

Publications (2)

Family

ID=15474999

Family Applications (1)

Country Status (8)

Families Citing this family (5)

Family Cites Families (8)

• 1981
  • 1981-09-24 JP JP56149433A patent/JPS5851561A/ja active Pending
• 1982
  • 1982-09-17 IT IT23326/82A patent/IT1153730B/it active
  • 1982-09-21 FR FR8215875A patent/FR2514200A1/fr active Granted
  • 1982-09-22 GB GB08227060A patent/GB2107117B/en not_active Expired
  • 1982-09-24 DE DE19823235409 patent/DE3235409A1/de not_active Withdrawn
• 1983
  • 1983-11-23 FR FR8318617A patent/FR2533367B1/fr not_active Expired
• 1985
  • 1985-01-31 GB GB08502454A patent/GB2154061B/en not_active Expired
  • 1985-01-31 GB GB08502453A patent/GB2154060B/en not_active Expired
• 1987
  • 1987-05-06 SG SG40887A patent/SG40887G/en unknown
  • 1987-09-24 HK HK691/87A patent/HK69187A/xx unknown
  • 1987-09-24 HK HK698/87A patent/HK69887A/xx unknown
  • 1987-12-30 MY MY644/87A patent/MY8700644A/xx unknown

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