IT1308658B1 - Polimeri per rivestimenti anti-riflettenti e procedimento per la loropreparazione. - Google Patents

Polimeri per rivestimenti anti-riflettenti e procedimento per la loropreparazione.

Info

Publication number
IT1308658B1
IT1308658B1 IT1999TO001027A ITTO991027A IT1308658B1 IT 1308658 B1 IT1308658 B1 IT 1308658B1 IT 1999TO001027 A IT1999TO001027 A IT 1999TO001027A IT TO991027 A ITTO991027 A IT TO991027A IT 1308658 B1 IT1308658 B1 IT 1308658B1
Authority
IT
Italy
Prior art keywords
reflective
polymers
present
reflective coating
light
Prior art date
Application number
IT1999TO001027A
Other languages
English (en)
Italian (it)
Inventor
Sung-Eun Hong
Min-Ho Jung
Hyeong-Soo Kim
Ki-Ho Baik
Original Assignee
Hyundai Electronics Ind
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hyundai Electronics Ind filed Critical Hyundai Electronics Ind
Publication of ITTO991027A0 publication Critical patent/ITTO991027A0/it
Publication of ITTO991027A1 publication Critical patent/ITTO991027A1/it
Application granted granted Critical
Publication of IT1308658B1 publication Critical patent/IT1308658B1/it

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/34—Introducing sulfur atoms or sulfur-containing groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/02—Monomers containing only one unsaturated aliphatic radical
    • C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F212/14—Monomers containing only one unsaturated aliphatic radical containing one ring substituted by heteroatoms or groups containing heteroatoms
    • C08F212/16—Halogens
    • C08F212/20—Fluorine
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
IT1999TO001027A 1998-12-31 1999-11-24 Polimeri per rivestimenti anti-riflettenti e procedimento per la loropreparazione. IT1308658B1 (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR10-1998-0063695A KR100363695B1 (ko) 1998-12-31 1998-12-31 유기난반사방지중합체및그의제조방법

Publications (3)

Publication Number Publication Date
ITTO991027A0 ITTO991027A0 (it) 1999-11-24
ITTO991027A1 ITTO991027A1 (it) 2001-05-24
IT1308658B1 true IT1308658B1 (it) 2002-01-09

Family

ID=19570257

Family Applications (1)

Application Number Title Priority Date Filing Date
IT1999TO001027A IT1308658B1 (it) 1998-12-31 1999-11-24 Polimeri per rivestimenti anti-riflettenti e procedimento per la loropreparazione.

Country Status (10)

Country Link
US (2) US6350818B1 (US06350818-20020226-C00044.png)
JP (2) JP4253088B2 (US06350818-20020226-C00044.png)
KR (1) KR100363695B1 (US06350818-20020226-C00044.png)
CN (1) CN1166704C (US06350818-20020226-C00044.png)
DE (1) DE19940320B4 (US06350818-20020226-C00044.png)
FR (1) FR2788060B1 (US06350818-20020226-C00044.png)
GB (1) GB2345289B (US06350818-20020226-C00044.png)
IT (1) IT1308658B1 (US06350818-20020226-C00044.png)
NL (1) NL1012840C2 (US06350818-20020226-C00044.png)
TW (1) TWI227259B (US06350818-20020226-C00044.png)

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KR100465866B1 (ko) * 2001-10-26 2005-01-13 주식회사 하이닉스반도체 유기반사방지막 조성물 및 그의 제조방법
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US8053159B2 (en) 2003-11-18 2011-11-08 Honeywell International Inc. Antireflective coatings for via fill and photolithography applications and methods of preparation thereof
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US8642246B2 (en) * 2007-02-26 2014-02-04 Honeywell International Inc. Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof
WO2009028360A1 (ja) * 2007-08-24 2009-03-05 Toray Industries, Inc. 感光性組成物、それから形成された硬化膜、および硬化膜を有する素子
EP2245512B1 (en) 2008-01-29 2019-09-11 Brewer Science, Inc. On-track process for patterning hardmask by multiple dark field exposures
US9640396B2 (en) 2009-01-07 2017-05-02 Brewer Science Inc. Spin-on spacer materials for double- and triple-patterning lithography
US8557877B2 (en) 2009-06-10 2013-10-15 Honeywell International Inc. Anti-reflective coatings for optically transparent substrates
JP5842503B2 (ja) * 2010-09-29 2016-01-13 Jsr株式会社 レジスト下層膜形成用組成物、レジスト下層膜及びその形成方法
KR101811064B1 (ko) 2010-09-29 2017-12-20 제이에스알 가부시끼가이샤 패턴형성 방법, 레지스트 하층막의 형성 방법, 레지스트 하층막 형성용 조성물 및 레지스트 하층막
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements
JP6160068B2 (ja) * 2011-12-16 2017-07-12 Jsr株式会社 レジスト下層膜形成用樹脂組成物、レジスト下層膜、その形成方法及びパターン形成方法
KR101993480B1 (ko) * 2011-12-16 2019-06-26 제이에스알 가부시끼가이샤 레지스트 하층막 형성용 수지 조성물, 레지스트 하층막, 그의 형성 방법 및 패턴 형성 방법
JP6803842B2 (ja) 2015-04-13 2020-12-23 ハネウェル・インターナショナル・インコーポレーテッドＨｏｎｅｙｗｅｌｌ Ｉｎｔｅｒｎａｔｉｏｎａｌ Ｉｎｃ． オプトエレクトロニクス用途のためのポリシロキサン製剤及びコーティング
CN107797384B (zh) * 2016-09-07 2020-10-09 上海飞凯电子材料有限公司 一种感光树脂、正性光刻胶及应用
CN117820910A (zh) * 2022-06-30 2024-04-05 华为技术有限公司 涂层材料和集成电路及制备方法、电子设备

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Also Published As

Publication number Publication date
US6492441B2 (en) 2002-12-10
KR100363695B1 (ko) 2003-04-11
KR20010016643A (ko) 2001-03-05
US6350818B1 (en) 2002-02-26
DE19940320A1 (de) 2000-07-06
DE19940320B4 (de) 2006-09-21
ITTO991027A0 (it) 1999-11-24
ITTO991027A1 (it) 2001-05-24
CN1166704C (zh) 2004-09-15
GB2345289A (en) 2000-07-05
GB9917218D0 (en) 1999-09-22
FR2788060B1 (fr) 2003-10-17
CN1260355A (zh) 2000-07-19
US20020120070A1 (en) 2002-08-29
JP2007231270A (ja) 2007-09-13
GB2345289B (en) 2003-03-26
NL1012840A1 (nl) 2000-07-03
TWI227259B (en) 2005-02-01
JP2000204115A (ja) 2000-07-25
JP4253088B2 (ja) 2009-04-08
NL1012840C2 (nl) 2001-06-07
FR2788060A1 (fr) 2000-07-07

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