IT1022786B - Apparecchiatura per rivestire in modo uniforme superfici irregolari ad esempio wafer semiconduttori - Google Patents
Apparecchiatura per rivestire in modo uniforme superfici irregolari ad esempio wafer semiconduttoriInfo
- Publication number
- IT1022786B IT1022786B IT28314/74A IT2831474A IT1022786B IT 1022786 B IT1022786 B IT 1022786B IT 28314/74 A IT28314/74 A IT 28314/74A IT 2831474 A IT2831474 A IT 2831474A IT 1022786 B IT1022786 B IT 1022786B
- Authority
- IT
- Italy
- Prior art keywords
- equipment
- semiconductor wafers
- uniform coating
- example semiconductor
- irregular surfaces
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C23C14/505—Substrate holders for rotation of the substrates
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US00421020A US3853091A (en) | 1973-12-03 | 1973-12-03 | Thin film coating apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
IT1022786B true IT1022786B (it) | 1978-04-20 |
Family
ID=23668864
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IT28314/74A IT1022786B (it) | 1973-12-03 | 1974-10-11 | Apparecchiatura per rivestire in modo uniforme superfici irregolari ad esempio wafer semiconduttori |
Country Status (11)
Country | Link |
---|---|
US (1) | US3853091A (it) |
JP (1) | JPS5325718B2 (it) |
CA (1) | CA1035255A (it) |
CH (1) | CH606479A5 (it) |
DE (1) | DE2448023B2 (it) |
ES (1) | ES432508A1 (it) |
FR (1) | FR2253270B1 (it) |
GB (1) | GB1474927A (it) |
IT (1) | IT1022786B (it) |
NL (1) | NL7415450A (it) |
SE (1) | SE397435B (it) |
Families Citing this family (40)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CH580990A5 (it) * | 1974-03-04 | 1976-10-29 | Ebauches Sa | |
US4010710A (en) * | 1974-09-20 | 1977-03-08 | Rockwell International Corporation | Apparatus for coating substrates |
JPS5266756U (it) * | 1975-11-13 | 1977-05-17 | ||
US4022939A (en) * | 1975-12-18 | 1977-05-10 | Western Electric Company, Inc. | Synchronous shielding in vacuum deposition system |
US3983838A (en) * | 1975-12-31 | 1976-10-05 | International Business Machines Corporation | Planetary evaporator |
US4222345A (en) * | 1978-11-30 | 1980-09-16 | Optical Coating Laboratory, Inc. | Vacuum coating apparatus with rotary motion assembly |
US4241698A (en) * | 1979-02-09 | 1980-12-30 | Mca Discovision, Inc. | Vacuum evaporation system for the deposition of a thin evaporated layer having a high degree of uniformity |
DE2917841A1 (de) * | 1979-05-03 | 1980-11-13 | Leybold Heraeus Gmbh & Co Kg | Verdampfer fuer vakuumaufdampfanlagen |
US4284033A (en) * | 1979-10-31 | 1981-08-18 | Rca Corporation | Means to orbit and rotate target wafers supported on planet member |
JPS5727032A (en) * | 1980-07-25 | 1982-02-13 | Hitachi Ltd | Plasma cvd device |
DE3306870A1 (de) * | 1983-02-26 | 1984-08-30 | Leybold-Heraeus GmbH, 5000 Köln | Vorrichtung zum herstellen von schichten mit rotationssymmetrischem dickenprofil durch katodenzerstaeubung |
DE3310044A1 (de) * | 1983-03-19 | 1984-09-20 | Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt | Verfahren und anordnung zur beschichtung eines substrates |
DE3422718A1 (de) * | 1984-06-19 | 1986-01-09 | Plasmainvent AG, Zug | Vakuum-plasma-beschichtungsanlage |
US4640846A (en) * | 1984-09-25 | 1987-02-03 | Yue Kuo | Semiconductor spin coating method |
JPS61227165A (ja) * | 1985-03-29 | 1986-10-09 | Mitsubishi Electric Corp | 蒸着装置 |
US4662310A (en) * | 1986-07-09 | 1987-05-05 | Deco Tools, Inc. | Robotic paint masking machine |
DE3702775A1 (de) * | 1987-01-30 | 1988-08-11 | Leybold Ag | Vorrichtung zum quasi-kontinuierlichen behandeln von substraten |
DE3705592A1 (de) * | 1987-02-21 | 1988-09-01 | Convac Gmbh Geraete Zur Halble | Vorrichtung zur duennen beschichtung (belackung) scheibenfoermiger substrate fuer elektronische anwendungszwecke, bspw. leiterplatten, compact disks etc. |
DE3705946A1 (de) * | 1987-02-25 | 1988-09-08 | Krupp Corpoplast Masch | Vorrichtung zum behandeln von formlingen aus kunststoff |
DE3705945A1 (de) * | 1987-02-25 | 1988-09-08 | Krupp Corpoplast Masch | Vorrichtung zum herstellen von hohlkoerpern aus thermoplastischem kunststoff |
US5002011A (en) * | 1987-04-14 | 1991-03-26 | Kabushiki Kaisha Toshiba | Vapor deposition apparatus |
JPH01143211A (ja) * | 1987-11-27 | 1989-06-05 | Takatori Haitetsuku:Kk | ウエハーに対する保護テープの貼付け切り抜き方法および装置 |
EP0362418A1 (en) * | 1988-10-03 | 1990-04-11 | International Business Machines Corporation | Improved method and system for the angled exposition of a surface portion to an emission impinging obliquely thereon, and semiconductor wafers having facets exposed according to said method |
DE4025659A1 (de) * | 1990-08-14 | 1992-02-20 | Leybold Ag | Umlaufraedergetriebe mit einem raedersatz, insbesondere fuer vorrichtungen zum beschichten von substraten |
JPH0828333B2 (ja) * | 1992-11-30 | 1996-03-21 | 株式会社半導体プロセス研究所 | 半導体装置の製造装置 |
AU7403694A (en) * | 1994-07-19 | 1996-02-16 | American Plating Systems, Inc. | Electrolytic plating apparatus and method |
GB2291889B (en) * | 1994-07-27 | 1998-02-25 | Gec Marconi Avionics Holdings | Depositing coatings of materials on a substrate |
FR2733253B1 (fr) * | 1995-04-24 | 1997-06-13 | Commissariat Energie Atomique | Dispositif pour deposer un materiau par evaporation sur des substrats de grande surface |
US5702532A (en) * | 1995-05-31 | 1997-12-30 | Hughes Aircraft Company | MOCVD reactor system for indium antimonide epitaxial material |
US5776256A (en) * | 1996-10-01 | 1998-07-07 | The United States Of America As Represented By The Secretary Of The Air Force | Coating chamber planetary gear mirror rotating system |
DE19738234C1 (de) | 1997-09-02 | 1998-10-22 | Fraunhofer Ges Forschung | Einrichtung zum Aufstäuben von Hartstoffschichten |
JPH11200017A (ja) * | 1998-01-20 | 1999-07-27 | Nikon Corp | 光学薄膜成膜装置およびこの光学薄膜成膜装置により成膜された光学素子 |
US6203619B1 (en) | 1998-10-26 | 2001-03-20 | Symetrix Corporation | Multiple station apparatus for liquid source fabrication of thin films |
JP4614538B2 (ja) * | 1998-12-15 | 2011-01-19 | エリコン・トレーディング・アクチェンゲゼルシャフト,トリュープバッハ | 真空処理遊星システム工作物キャリヤ |
US7081166B2 (en) | 1999-12-15 | 2006-07-25 | Unaxis Balzers Aktiengesellschaft | Planetary system workpiece support and method for surface treatment of workpieces |
US6749764B1 (en) | 2000-11-14 | 2004-06-15 | Tru-Si Technologies, Inc. | Plasma processing comprising three rotational motions of an article being processed |
DE102004027989B4 (de) * | 2004-06-09 | 2007-05-10 | Esser, Stefan, Dr.-Ing. | Werkstückträgervorrichtung zum Halten von Werkstücken |
WO2013189935A1 (en) * | 2012-06-18 | 2013-12-27 | Oc Oerlikon Balzers Ag | Pvd apparatus for directional material deposition, methods and workpiece |
JP6019310B1 (ja) * | 2015-04-16 | 2016-11-02 | ナルックス株式会社 | 蒸着装置及び蒸着装置による成膜工程を含む製造方法 |
DE102018126862A1 (de) * | 2018-10-26 | 2020-04-30 | Oerlikon Surface Solutions Ag, Pfäffikon | Werkstückträgereinrichtung und Beschichtungsanordnung |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2351537A (en) * | 1942-03-05 | 1944-06-13 | Spencer Lens Co | Apparatus for treating surfaces |
US3023727A (en) * | 1959-09-10 | 1962-03-06 | Ibm | Substrate processing apparatus |
US3352282A (en) * | 1965-07-23 | 1967-11-14 | Bendix Corp | Vacuum deposit device including means to register and manipulate mask and substrate elements |
US3598083A (en) * | 1969-10-27 | 1971-08-10 | Varian Associates | Complex motion mechanism for thin film coating apparatuses |
-
1973
- 1973-12-03 US US00421020A patent/US3853091A/en not_active Expired - Lifetime
-
1974
- 1974-10-09 DE DE19742448023 patent/DE2448023B2/de active Granted
- 1974-10-09 FR FR7434706A patent/FR2253270B1/fr not_active Expired
- 1974-10-11 IT IT28314/74A patent/IT1022786B/it active
- 1974-11-11 GB GB4863074A patent/GB1474927A/en not_active Expired
- 1974-11-13 CA CA213,557A patent/CA1035255A/en not_active Expired
- 1974-11-18 SE SE7414445A patent/SE397435B/xx unknown
- 1974-11-20 CH CH1543174A patent/CH606479A5/xx not_active IP Right Cessation
- 1974-11-27 JP JP13564174A patent/JPS5325718B2/ja not_active Expired
- 1974-11-27 NL NL7415450A patent/NL7415450A/xx not_active Application Discontinuation
- 1974-12-02 ES ES432508A patent/ES432508A1/es not_active Expired
Also Published As
Publication number | Publication date |
---|---|
CA1035255A (en) | 1978-07-25 |
NL7415450A (nl) | 1975-06-05 |
GB1474927A (en) | 1977-05-25 |
US3853091A (en) | 1974-12-10 |
JPS5087576A (it) | 1975-07-14 |
ES432508A1 (es) | 1977-03-01 |
SE7414445L (it) | 1975-06-04 |
SE397435B (sv) | 1977-10-31 |
FR2253270B1 (it) | 1977-03-25 |
DE2448023A1 (de) | 1975-06-05 |
FR2253270A1 (it) | 1975-06-27 |
JPS5325718B2 (it) | 1978-07-28 |
DE2448023B2 (de) | 1976-11-04 |
CH606479A5 (it) | 1978-10-31 |
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