IT1022786B - Apparecchiatura per rivestire in modo uniforme superfici irregolari ad esempio wafer semiconduttori - Google Patents

Apparecchiatura per rivestire in modo uniforme superfici irregolari ad esempio wafer semiconduttori

Info

Publication number
IT1022786B
IT1022786B IT28314/74A IT2831474A IT1022786B IT 1022786 B IT1022786 B IT 1022786B IT 28314/74 A IT28314/74 A IT 28314/74A IT 2831474 A IT2831474 A IT 2831474A IT 1022786 B IT1022786 B IT 1022786B
Authority
IT
Italy
Prior art keywords
equipment
semiconductor wafers
uniform coating
example semiconductor
irregular surfaces
Prior art date
Application number
IT28314/74A
Other languages
English (en)
Original Assignee
Ibm
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibm filed Critical Ibm
Application granted granted Critical
Publication of IT1022786B publication Critical patent/IT1022786B/it

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
IT28314/74A 1973-12-03 1974-10-11 Apparecchiatura per rivestire in modo uniforme superfici irregolari ad esempio wafer semiconduttori IT1022786B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US00421020A US3853091A (en) 1973-12-03 1973-12-03 Thin film coating apparatus

Publications (1)

Publication Number Publication Date
IT1022786B true IT1022786B (it) 1978-04-20

Family

ID=23668864

Family Applications (1)

Application Number Title Priority Date Filing Date
IT28314/74A IT1022786B (it) 1973-12-03 1974-10-11 Apparecchiatura per rivestire in modo uniforme superfici irregolari ad esempio wafer semiconduttori

Country Status (11)

Country Link
US (1) US3853091A (it)
JP (1) JPS5325718B2 (it)
CA (1) CA1035255A (it)
CH (1) CH606479A5 (it)
DE (1) DE2448023B2 (it)
ES (1) ES432508A1 (it)
FR (1) FR2253270B1 (it)
GB (1) GB1474927A (it)
IT (1) IT1022786B (it)
NL (1) NL7415450A (it)
SE (1) SE397435B (it)

Families Citing this family (40)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH580990A5 (it) * 1974-03-04 1976-10-29 Ebauches Sa
US4010710A (en) * 1974-09-20 1977-03-08 Rockwell International Corporation Apparatus for coating substrates
JPS5266756U (it) * 1975-11-13 1977-05-17
US4022939A (en) * 1975-12-18 1977-05-10 Western Electric Company, Inc. Synchronous shielding in vacuum deposition system
US3983838A (en) * 1975-12-31 1976-10-05 International Business Machines Corporation Planetary evaporator
US4222345A (en) * 1978-11-30 1980-09-16 Optical Coating Laboratory, Inc. Vacuum coating apparatus with rotary motion assembly
US4241698A (en) * 1979-02-09 1980-12-30 Mca Discovision, Inc. Vacuum evaporation system for the deposition of a thin evaporated layer having a high degree of uniformity
DE2917841A1 (de) * 1979-05-03 1980-11-13 Leybold Heraeus Gmbh & Co Kg Verdampfer fuer vakuumaufdampfanlagen
US4284033A (en) * 1979-10-31 1981-08-18 Rca Corporation Means to orbit and rotate target wafers supported on planet member
JPS5727032A (en) * 1980-07-25 1982-02-13 Hitachi Ltd Plasma cvd device
DE3306870A1 (de) * 1983-02-26 1984-08-30 Leybold-Heraeus GmbH, 5000 Köln Vorrichtung zum herstellen von schichten mit rotationssymmetrischem dickenprofil durch katodenzerstaeubung
DE3310044A1 (de) * 1983-03-19 1984-09-20 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Verfahren und anordnung zur beschichtung eines substrates
DE3422718A1 (de) * 1984-06-19 1986-01-09 Plasmainvent AG, Zug Vakuum-plasma-beschichtungsanlage
US4640846A (en) * 1984-09-25 1987-02-03 Yue Kuo Semiconductor spin coating method
JPS61227165A (ja) * 1985-03-29 1986-10-09 Mitsubishi Electric Corp 蒸着装置
US4662310A (en) * 1986-07-09 1987-05-05 Deco Tools, Inc. Robotic paint masking machine
DE3702775A1 (de) * 1987-01-30 1988-08-11 Leybold Ag Vorrichtung zum quasi-kontinuierlichen behandeln von substraten
DE3705592A1 (de) * 1987-02-21 1988-09-01 Convac Gmbh Geraete Zur Halble Vorrichtung zur duennen beschichtung (belackung) scheibenfoermiger substrate fuer elektronische anwendungszwecke, bspw. leiterplatten, compact disks etc.
DE3705945A1 (de) * 1987-02-25 1988-09-08 Krupp Corpoplast Masch Vorrichtung zum herstellen von hohlkoerpern aus thermoplastischem kunststoff
DE3705946A1 (de) * 1987-02-25 1988-09-08 Krupp Corpoplast Masch Vorrichtung zum behandeln von formlingen aus kunststoff
US5002011A (en) * 1987-04-14 1991-03-26 Kabushiki Kaisha Toshiba Vapor deposition apparatus
JPH01143211A (ja) * 1987-11-27 1989-06-05 Takatori Haitetsuku:Kk ウエハーに対する保護テープの貼付け切り抜き方法および装置
EP0362418A1 (en) * 1988-10-03 1990-04-11 International Business Machines Corporation Improved method and system for the angled exposition of a surface portion to an emission impinging obliquely thereon, and semiconductor wafers having facets exposed according to said method
DE4025659A1 (de) * 1990-08-14 1992-02-20 Leybold Ag Umlaufraedergetriebe mit einem raedersatz, insbesondere fuer vorrichtungen zum beschichten von substraten
JPH0828333B2 (ja) * 1992-11-30 1996-03-21 株式会社半導体プロセス研究所 半導体装置の製造装置
AU7403694A (en) * 1994-07-19 1996-02-16 American Plating Systems, Inc. Electrolytic plating apparatus and method
GB2291889B (en) * 1994-07-27 1998-02-25 Gec Marconi Avionics Holdings Depositing coatings of materials on a substrate
FR2733253B1 (fr) * 1995-04-24 1997-06-13 Commissariat Energie Atomique Dispositif pour deposer un materiau par evaporation sur des substrats de grande surface
US5702532A (en) * 1995-05-31 1997-12-30 Hughes Aircraft Company MOCVD reactor system for indium antimonide epitaxial material
US5776256A (en) * 1996-10-01 1998-07-07 The United States Of America As Represented By The Secretary Of The Air Force Coating chamber planetary gear mirror rotating system
DE19738234C1 (de) 1997-09-02 1998-10-22 Fraunhofer Ges Forschung Einrichtung zum Aufstäuben von Hartstoffschichten
JPH11200017A (ja) * 1998-01-20 1999-07-27 Nikon Corp 光学薄膜成膜装置およびこの光学薄膜成膜装置により成膜された光学素子
US6203619B1 (en) 1998-10-26 2001-03-20 Symetrix Corporation Multiple station apparatus for liquid source fabrication of thin films
JP4614538B2 (ja) * 1998-12-15 2011-01-19 エリコン・トレーディング・アクチェンゲゼルシャフト，トリュープバッハ 真空処理遊星システム工作物キャリヤ
US7081166B2 (en) 1999-12-15 2006-07-25 Unaxis Balzers Aktiengesellschaft Planetary system workpiece support and method for surface treatment of workpieces
US6749764B1 (en) * 2000-11-14 2004-06-15 Tru-Si Technologies, Inc. Plasma processing comprising three rotational motions of an article being processed
DE102004027989B4 (de) * 2004-06-09 2007-05-10 Esser, Stefan, Dr.-Ing. Werkstückträgervorrichtung zum Halten von Werkstücken
WO2013189935A1 (en) * 2012-06-18 2013-12-27 Oc Oerlikon Balzers Ag Pvd apparatus for directional material deposition, methods and workpiece
JP6019310B1 (ja) * 2015-04-16 2016-11-02 ナルックス株式会社 蒸着装置及び蒸着装置による成膜工程を含む製造方法
DE102018126862A1 (de) * 2018-10-26 2020-04-30 Oerlikon Surface Solutions Ag, Pfäffikon Werkstückträgereinrichtung und Beschichtungsanordnung

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2351537A (en) * 1942-03-05 1944-06-13 Spencer Lens Co Apparatus for treating surfaces
US3023727A (en) * 1959-09-10 1962-03-06 Ibm Substrate processing apparatus
US3352282A (en) * 1965-07-23 1967-11-14 Bendix Corp Vacuum deposit device including means to register and manipulate mask and substrate elements
US3598083A (en) * 1969-10-27 1971-08-10 Varian Associates Complex motion mechanism for thin film coating apparatuses

Also Published As

Publication number Publication date
SE7414445L (it) 1975-06-04
US3853091A (en) 1974-12-10
GB1474927A (en) 1977-05-25
CH606479A5 (it) 1978-10-31
DE2448023A1 (de) 1975-06-05
SE397435B (sv) 1977-10-31
DE2448023B2 (de) 1976-11-04
ES432508A1 (es) 1977-03-01
JPS5087576A (it) 1975-07-14
NL7415450A (nl) 1975-06-05
JPS5325718B2 (it) 1978-07-28
FR2253270B1 (it) 1977-03-25
CA1035255A (en) 1978-07-25
FR2253270A1 (it) 1975-06-27

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