IT1022968B - Procedimento perfezionato per la lavorazione di wafer semiconduttori - Google Patents

Procedimento perfezionato per la lavorazione di wafer semiconduttori

Info

Publication number
IT1022968B
IT1022968B IT28563/74A IT2856374A IT1022968B IT 1022968 B IT1022968 B IT 1022968B IT 28563/74 A IT28563/74 A IT 28563/74A IT 2856374 A IT2856374 A IT 2856374A IT 1022968 B IT1022968 B IT 1022968B
Authority
IT
Italy
Prior art keywords
semiconductor wafers
processing semiconductor
perfected process
perfected
processing
Prior art date
Application number
IT28563/74A
Other languages
English (en)
Original Assignee
Ibm
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibm filed Critical Ibm
Application granted granted Critical
Publication of IT1022968B publication Critical patent/IT1022968B/it

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R27/00—Arrangements for measuring resistance, reactance, impedance, or electric characteristics derived therefrom
    • G01R27/02—Measuring real or complex resistance, reactance, impedance, or other two-pole characteristics derived therefrom, e.g. time constant
    • G01R27/025—Measuring very high resistances, e.g. isolation resistances, i.e. megohm-meters
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/26—Testing of individual semiconductor devices
    • G01R31/2607—Circuits therefor
    • G01R31/2637—Circuits therefor for testing other individual devices
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/26—Testing of individual semiconductor devices
    • G01R31/2644—Adaptations of individual semiconductor devices to facilitate the testing thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Electrodes Of Semiconductors (AREA)
IT28563/74A 1973-12-26 1974-10-18 Procedimento perfezionato per la lavorazione di wafer semiconduttori IT1022968B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US00427972A US3851245A (en) 1973-12-26 1973-12-26 Method for determining whether holes in insulated layer of semiconductor substrate are fully open

Publications (1)

Publication Number Publication Date
IT1022968B true IT1022968B (it) 1978-04-20

Family

ID=23697061

Family Applications (1)

Application Number Title Priority Date Filing Date
IT28563/74A IT1022968B (it) 1973-12-26 1974-10-18 Procedimento perfezionato per la lavorazione di wafer semiconduttori

Country Status (7)

Country Link
US (1) US3851245A (it)
JP (1) JPS5245189B2 (it)
CA (1) CA1019466A (it)
DE (1) DE2453578A1 (it)
FR (1) FR2256538B1 (it)
GB (1) GB1431875A (it)
IT (1) IT1022968B (it)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4144493A (en) * 1976-06-30 1979-03-13 International Business Machines Corporation Integrated circuit test structure
US4488349A (en) * 1982-04-09 1984-12-18 Nissan Motor Company, Limited Method of repairing shorts in parallel connected vertical semiconductor devices by selective anodization
US4652812A (en) * 1984-11-27 1987-03-24 Harris Corporation One-sided ion migration velocity measurement and electromigration failure warning device
US4760032A (en) * 1987-05-29 1988-07-26 Sgs-Thomson Microelectronics, Inc. Screening of gate oxides on semiconductors
US4860079A (en) * 1987-05-29 1989-08-22 Sgs-Thompson Microelectronics, Inc. Screening of gate oxides on semiconductors
US5049811A (en) * 1990-07-02 1991-09-17 Motorola, Inc. Measuring integrity of semiconductor multi-layer metal structures
US5082792A (en) * 1990-08-15 1992-01-21 Lsi Logic Corporation Forming a physical structure on an integrated circuit device and determining its size by measurement of resistance
US5777486A (en) * 1994-10-03 1998-07-07 United Microelectronics Corporation Electromigration test pattern simulating semiconductor components

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3335340A (en) * 1964-02-24 1967-08-08 Ibm Combined transistor and testing structures and fabrication thereof
US3609537A (en) * 1969-04-01 1971-09-28 Ibm Resistance standard
US3781670A (en) * 1972-12-29 1973-12-25 Ibm Ac performance test for large scale integrated circuit chips
US3796947A (en) * 1973-02-27 1974-03-12 Bell Telephone Labor Inc Electron beam testing of film integrated circuits
US3808527A (en) * 1973-06-28 1974-04-30 Ibm Alignment determining system

Also Published As

Publication number Publication date
FR2256538A1 (it) 1975-07-25
GB1431875A (en) 1976-04-14
FR2256538B1 (it) 1976-10-22
US3851245A (en) 1974-11-26
CA1019466A (en) 1977-10-18
JPS5245189B2 (it) 1977-11-14
DE2453578A1 (de) 1975-07-10
JPS5098269A (it) 1975-08-05

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