IN2014MN00824A - - Google Patents
Info
- Publication number
- IN2014MN00824A IN2014MN00824A IN824MUN2014A IN2014MN00824A IN 2014MN00824 A IN2014MN00824 A IN 2014MN00824A IN 824MUN2014 A IN824MUN2014 A IN 824MUN2014A IN 2014MN00824 A IN2014MN00824 A IN 2014MN00824A
- Authority
- IN
- India
- Prior art keywords
- layer
- silicon oxycarbide
- formation
- substrate
- sih
- Prior art date
Links
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 abstract 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 4
- 229910052710 silicon Inorganic materials 0.000 abstract 4
- 239000010703 silicon Substances 0.000 abstract 4
- 230000015572 biosynthetic process Effects 0.000 abstract 3
- 239000000758 substrate Substances 0.000 abstract 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract 2
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 abstract 2
- 239000005977 Ethylene Substances 0.000 abstract 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 abstract 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 2
- 230000004913 activation Effects 0.000 abstract 2
- 229910052799 carbon Inorganic materials 0.000 abstract 2
- 229910002092 carbon dioxide Inorganic materials 0.000 abstract 2
- 239000001569 carbon dioxide Substances 0.000 abstract 2
- 230000002209 hydrophobic effect Effects 0.000 abstract 2
- 238000000034 method Methods 0.000 abstract 2
- 229910000077 silane Inorganic materials 0.000 abstract 2
- 239000000126 substance Substances 0.000 abstract 2
- 239000002253 acid Substances 0.000 abstract 1
- 238000000137 annealing Methods 0.000 abstract 1
- 239000007789 gas Substances 0.000 abstract 1
- 239000011521 glass Substances 0.000 abstract 1
- 229910052500 inorganic mineral Inorganic materials 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 239000011707 mineral Substances 0.000 abstract 1
- 238000009832 plasma treatment Methods 0.000 abstract 1
- 238000007493 shaping process Methods 0.000 abstract 1
- 239000000377 silicon dioxide Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/42—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating of an organic material and at least one non-metal coating
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
- C03C23/0005—Other surface treatment of glass not in the form of fibres or filaments by irradiation
- C03C23/006—Other surface treatment of glass not in the form of fibres or filaments by irradiation by plasma or corona discharge
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/76—Hydrophobic and oleophobic coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/152—Deposition methods from the vapour phase by cvd
- C03C2218/1525—Deposition methods from the vapour phase by cvd by atmospheric CVD
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Plasma & Fusion (AREA)
- Physics & Mathematics (AREA)
- Surface Treatment Of Glass (AREA)
- Chemical Vapour Deposition (AREA)
- Laminated Bodies (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR1160419A FR2982609B1 (fr) | 2011-11-16 | 2011-11-16 | Vitrage hydrophobe |
| PCT/FR2012/052621 WO2013072622A1 (fr) | 2011-11-16 | 2012-11-14 | Vitrage hydrophobe |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| IN2014MN00824A true IN2014MN00824A (enExample) | 2015-04-17 |
Family
ID=47291135
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IN824MUN2014 IN2014MN00824A (enExample) | 2011-11-16 | 2012-11-14 |
Country Status (15)
| Country | Link |
|---|---|
| US (1) | US9051213B2 (enExample) |
| EP (1) | EP2780295B1 (enExample) |
| JP (1) | JP6219837B2 (enExample) |
| KR (1) | KR101996696B1 (enExample) |
| CN (1) | CN104024176B (enExample) |
| BR (1) | BR112014010421A2 (enExample) |
| CA (1) | CA2853193C (enExample) |
| EA (1) | EA026831B1 (enExample) |
| ES (1) | ES2554913T3 (enExample) |
| FR (1) | FR2982609B1 (enExample) |
| IN (1) | IN2014MN00824A (enExample) |
| MX (1) | MX338342B (enExample) |
| PL (1) | PL2780295T3 (enExample) |
| PT (1) | PT2780295E (enExample) |
| WO (1) | WO2013072622A1 (enExample) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| PL3319915T3 (pl) * | 2015-07-07 | 2020-06-15 | Agc Glass Europe | Szklane podłoże o podwyższonej odporności na warunki atmosferyczne i środki chemiczne |
| CN106517813B (zh) * | 2016-09-26 | 2019-09-24 | 武汉钢铁有限公司 | 疏油疏水防雾玻璃及其涂层的制备方法 |
| ES2673370B1 (es) * | 2016-12-21 | 2019-04-03 | Bsh Electrodomesticos Espana Sa | Método para recubrir un elemento base para un componente de aparato doméstico, y componente de aparato doméstico |
| DE102018207101B4 (de) * | 2018-05-08 | 2024-06-13 | Robert Bosch Gmbh | Verfahren zum Herstellen eines Bodens einer Analysezelle zum Analysieren eines biochemischen Materials und Analysezelle |
| CN109487234A (zh) * | 2018-12-18 | 2019-03-19 | 湖北大学 | 超疏油涂层及其制备方法和应用 |
| JP7020458B2 (ja) * | 2019-07-12 | 2022-02-16 | Agc株式会社 | 膜付きガラス基板及びその製造方法 |
| JP7306502B2 (ja) * | 2019-07-12 | 2023-07-11 | Agc株式会社 | 膜付きガラス基板及びその製造方法 |
| DE112021004623T5 (de) * | 2020-09-04 | 2023-06-15 | AGC Inc. | Glasgegenstand |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE69123228T2 (de) | 1990-12-21 | 1997-03-13 | Matsushita Electric Industrial Co., Ltd., Kadoma, Osaka | Verfahren zur Herstellung einer chemisch adsorbierten Schicht |
| EP0492545B1 (en) | 1990-12-25 | 1998-03-25 | Matsushita Electric Industrial Co., Ltd. | Transparent substrate with monomolecular film thereon and method of manufacturing the same |
| JPH04285038A (ja) * | 1991-03-14 | 1992-10-09 | Tokai Rika Co Ltd | ガラス用撥水膜 |
| DE69227806T2 (de) | 1991-07-26 | 1999-04-29 | Matsushita Electric Industrial Co., Ltd., Kadoma, Osaka | Öl- und wasserabweisendes Bekleidungsmaterial |
| CA2159296C (en) * | 1994-10-14 | 2007-01-30 | Michel J. Soubeyrand | Glass coating method and glass coated thereby |
| US6627532B1 (en) * | 1998-02-11 | 2003-09-30 | Applied Materials, Inc. | Method of decreasing the K value in SiOC layer deposited by chemical vapor deposition |
| FR2800731B1 (fr) | 1999-11-05 | 2002-01-18 | Saint Gobain Vitrage | Substrat transparent muni d'une couche en derive de silicium |
| FR2806076B1 (fr) * | 2000-03-08 | 2002-09-20 | Saint Gobain Vitrage | Substrat transparent revetu d'une couche polymere |
| US7485570B2 (en) * | 2002-10-30 | 2009-02-03 | Fujitsu Limited | Silicon oxycarbide, growth method of silicon oxycarbide layer, semiconductor device and manufacture method for semiconductor device |
| US6913992B2 (en) * | 2003-03-07 | 2005-07-05 | Applied Materials, Inc. | Method of modifying interlayer adhesion |
| FR2866643B1 (fr) * | 2004-02-24 | 2006-05-26 | Saint Gobain | Substrat, notamment verrier, a surface hydrophobe, avec une durabilite amelioree des proprietes hydrophobes |
| US7482060B2 (en) * | 2004-07-14 | 2009-01-27 | Agc Flat Glass North America, Inc. | Silicon oxycarbide coatings having durable hydrophilic properties |
| FR2889183B1 (fr) | 2005-07-26 | 2007-09-07 | Saint Gobain | Revetement hydrophobe comprenant un primage comprenant un disilane et une couche hydrophobe comprenant un alkysilane fluore |
| FR2940966B1 (fr) * | 2009-01-09 | 2011-03-04 | Saint Gobain | Substrat hydrophobe comprenant un primage du type oxycarbure de silicium active par plasma |
| JP5494656B2 (ja) | 2009-04-30 | 2014-05-21 | コニカミノルタ株式会社 | 撥水部材、車載用ガラス、及び、撥水部材の製造方法 |
-
2011
- 2011-11-16 FR FR1160419A patent/FR2982609B1/fr not_active Expired - Fee Related
-
2012
- 2012-11-14 EP EP12795541.7A patent/EP2780295B1/fr not_active Not-in-force
- 2012-11-14 CN CN201280055822.9A patent/CN104024176B/zh not_active Expired - Fee Related
- 2012-11-14 CA CA2853193A patent/CA2853193C/fr not_active Expired - Fee Related
- 2012-11-14 PL PL12795541T patent/PL2780295T3/pl unknown
- 2012-11-14 JP JP2014541736A patent/JP6219837B2/ja not_active Expired - Fee Related
- 2012-11-14 US US14/358,496 patent/US9051213B2/en not_active Expired - Fee Related
- 2012-11-14 ES ES12795541.7T patent/ES2554913T3/es active Active
- 2012-11-14 EA EA201490977A patent/EA026831B1/ru not_active IP Right Cessation
- 2012-11-14 MX MX2014005761A patent/MX338342B/es active IP Right Grant
- 2012-11-14 KR KR1020147012776A patent/KR101996696B1/ko not_active Expired - Fee Related
- 2012-11-14 PT PT127955417T patent/PT2780295E/pt unknown
- 2012-11-14 IN IN824MUN2014 patent/IN2014MN00824A/en unknown
- 2012-11-14 BR BR112014010421A patent/BR112014010421A2/pt not_active Application Discontinuation
- 2012-11-14 WO PCT/FR2012/052621 patent/WO2013072622A1/fr not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| ES2554913T3 (es) | 2015-12-28 |
| CN104024176A (zh) | 2014-09-03 |
| JP6219837B2 (ja) | 2017-10-25 |
| EP2780295A1 (fr) | 2014-09-24 |
| US9051213B2 (en) | 2015-06-09 |
| PL2780295T3 (pl) | 2016-04-29 |
| JP2015505793A (ja) | 2015-02-26 |
| MX338342B (es) | 2016-04-13 |
| US20140315027A1 (en) | 2014-10-23 |
| CA2853193C (fr) | 2020-01-07 |
| MX2014005761A (es) | 2014-05-30 |
| CN104024176B (zh) | 2016-12-21 |
| EA026831B1 (ru) | 2017-05-31 |
| KR101996696B1 (ko) | 2019-07-04 |
| EP2780295B1 (fr) | 2015-11-11 |
| CA2853193A1 (fr) | 2013-05-23 |
| FR2982609B1 (fr) | 2014-06-20 |
| FR2982609A1 (fr) | 2013-05-17 |
| BR112014010421A2 (pt) | 2017-04-25 |
| KR20140093233A (ko) | 2014-07-25 |
| WO2013072622A1 (fr) | 2013-05-23 |
| EA201490977A1 (ru) | 2014-08-29 |
| PT2780295E (pt) | 2015-11-30 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| IN2014MN00824A (enExample) | ||
| US8822018B2 (en) | Hydrophobic substrate including a plasma-activated silicon oxycarbide primer | |
| JP6050370B2 (ja) | アルカリ金属に対するSiOCバリア層 | |
| EP2116632A3 (en) | Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants | |
| JP2015505793A5 (enExample) | ||
| BRPI0507935B1 (pt) | Processo de fabricação de um substrato | |
| JP2012513117A5 (enExample) | ||
| WO2006078354A3 (en) | Micro-feature fill process and apparatus using hexachlorodisilane or other chlorine-containing silicon precursor | |
| GB201207448D0 (en) | Method of depositing silicon dioxide films | |
| EP2362003A3 (en) | Methods of depositing SiO2 films | |
| WO2007027350A3 (en) | Method of removing surface deposits and passivating interior surfaces of the interior of a chemical vapour deposition (cvd) chamber | |
| KR20050104401A (ko) | 수소화 규소 옥시카바이드 막의 제조방법 | |
| DE502005010041D1 (de) | Verfahren zur ausbildung dünner schichten aus siliziumnitrid auf substratoberflächen | |
| CN101068001A (zh) | 制造层结构的方法 | |
| JP6318433B2 (ja) | シリコン窒化膜の形成方法及びシリコン窒化膜 | |
| TH149304A (th) | สิ่งเคลือบกระจกแบบไม่ชอบรับน้ำ | |
| TH149304B (th) | สิ่งเคลือบกระจกแบบไม่ชอบรับน้ำ | |
| EP3922750A3 (en) | Method of deposition | |
| TW201429908A (zh) | 線上低輻射鍍膜玻璃的製造裝置及其製造方法 | |
| WO2007061980A8 (en) | Deposition of ruthenium oxide coatings on a substrate | |
| CN111051567A (zh) | 形成氧化硅涂层的化学气相沉积方法 | |
| TWM483955U (zh) | 線上低輻射鍍膜玻璃的製造裝置 |