CA2853193C - Vitrage hydrophobe - Google Patents
Vitrage hydrophobe Download PDFInfo
- Publication number
- CA2853193C CA2853193C CA2853193A CA2853193A CA2853193C CA 2853193 C CA2853193 C CA 2853193C CA 2853193 A CA2853193 A CA 2853193A CA 2853193 A CA2853193 A CA 2853193A CA 2853193 C CA2853193 C CA 2853193C
- Authority
- CA
- Canada
- Prior art keywords
- layer
- hydrophobic
- glazing
- sih4
- silicon oxycarbide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 230000002209 hydrophobic effect Effects 0.000 title claims abstract description 57
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 38
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims abstract description 32
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 claims abstract description 25
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 24
- 238000000034 method Methods 0.000 claims abstract description 24
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 24
- 239000010703 silicon Substances 0.000 claims abstract description 24
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 22
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 20
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims abstract description 19
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 16
- 239000007789 gas Substances 0.000 claims abstract description 14
- 239000000758 substrate Substances 0.000 claims abstract description 14
- 239000011521 glass Substances 0.000 claims abstract description 13
- 229910000077 silane Inorganic materials 0.000 claims abstract description 12
- 239000005977 Ethylene Substances 0.000 claims abstract description 11
- 230000004913 activation Effects 0.000 claims abstract description 11
- 229910052681 coesite Inorganic materials 0.000 claims abstract description 10
- 229910052906 cristobalite Inorganic materials 0.000 claims abstract description 10
- 229910052682 stishovite Inorganic materials 0.000 claims abstract description 10
- 229910052905 tridymite Inorganic materials 0.000 claims abstract description 10
- 230000015572 biosynthetic process Effects 0.000 claims abstract description 9
- 229910002092 carbon dioxide Inorganic materials 0.000 claims abstract description 9
- 239000000126 substance Substances 0.000 claims abstract description 9
- 239000001569 carbon dioxide Substances 0.000 claims abstract description 7
- 238000000137 annealing Methods 0.000 claims abstract description 6
- 239000002253 acid Substances 0.000 claims abstract description 5
- 229910052500 inorganic mineral Inorganic materials 0.000 claims abstract description 5
- 239000011707 mineral Substances 0.000 claims abstract description 5
- 238000009832 plasma treatment Methods 0.000 claims abstract description 5
- 238000004519 manufacturing process Methods 0.000 claims abstract description 4
- 238000007493 shaping process Methods 0.000 claims abstract description 4
- 235000012239 silicon dioxide Nutrition 0.000 claims abstract 6
- 239000003795 chemical substances by application Substances 0.000 claims description 20
- 238000000151 deposition Methods 0.000 claims description 11
- 230000008021 deposition Effects 0.000 claims description 7
- 230000008569 process Effects 0.000 claims description 7
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 claims description 4
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 4
- 238000005234 chemical deposition Methods 0.000 claims description 3
- 239000005329 float glass Substances 0.000 claims description 3
- 238000001755 magnetron sputter deposition Methods 0.000 claims description 3
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 claims description 3
- 238000004544 sputter deposition Methods 0.000 claims description 3
- 239000012808 vapor phase Substances 0.000 claims description 3
- 125000000229 (C1-C4)alkoxy group Chemical group 0.000 claims description 2
- 230000002378 acidificating effect Effects 0.000 claims description 2
- 125000005843 halogen group Chemical group 0.000 claims description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 2
- 239000002243 precursor Substances 0.000 claims description 2
- 229910052814 silicon oxide Inorganic materials 0.000 claims 2
- 125000004209 (C1-C8) alkyl group Chemical group 0.000 claims 1
- 239000012071 phase Substances 0.000 claims 1
- 230000002459 sustained effect Effects 0.000 claims 1
- 239000010410 layer Substances 0.000 description 49
- 239000000203 mixture Substances 0.000 description 14
- 238000005229 chemical vapour deposition Methods 0.000 description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 10
- 238000001994 activation Methods 0.000 description 8
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 7
- 229910001868 water Inorganic materials 0.000 description 7
- 239000000047 product Substances 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- 230000032683 aging Effects 0.000 description 3
- 239000008367 deionised water Substances 0.000 description 3
- 229910021641 deionized water Inorganic materials 0.000 description 3
- 239000003085 diluting agent Substances 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 239000003153 chemical reaction reagent Substances 0.000 description 2
- 239000004744 fabric Substances 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 125000005372 silanol group Chemical group 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 229910020175 SiOH Inorganic materials 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 238000005903 acid hydrolysis reaction Methods 0.000 description 1
- 238000003915 air pollution Methods 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000036772 blood pressure Effects 0.000 description 1
- 230000005587 bubbling Effects 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000005119 centrifugation Methods 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- -1 for example Substances 0.000 description 1
- 230000005661 hydrophobic surface Effects 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 230000002045 lasting effect Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000005923 long-lasting effect Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 150000002902 organometallic compounds Chemical class 0.000 description 1
- 125000001181 organosilyl group Chemical group [SiH3]* 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 1
- 238000000678 plasma activation Methods 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 239000011265 semifinished product Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 230000035882 stress Effects 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/42—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating of an organic material and at least one non-metal coating
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
- C03C23/0005—Other surface treatment of glass not in the form of fibres or filaments by irradiation
- C03C23/006—Other surface treatment of glass not in the form of fibres or filaments by irradiation by plasma or corona discharge
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/76—Hydrophobic and oleophobic coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/152—Deposition methods from the vapour phase by cvd
- C03C2218/1525—Deposition methods from the vapour phase by cvd by atmospheric CVD
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Plasma & Fusion (AREA)
- Physics & Mathematics (AREA)
- Surface Treatment Of Glass (AREA)
- Chemical Vapour Deposition (AREA)
- Laminated Bodies (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR1160419 | 2011-11-16 | ||
| FR1160419A FR2982609B1 (fr) | 2011-11-16 | 2011-11-16 | Vitrage hydrophobe |
| PCT/FR2012/052621 WO2013072622A1 (fr) | 2011-11-16 | 2012-11-14 | Vitrage hydrophobe |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CA2853193A1 CA2853193A1 (fr) | 2013-05-23 |
| CA2853193C true CA2853193C (fr) | 2020-01-07 |
Family
ID=47291135
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA2853193A Expired - Fee Related CA2853193C (fr) | 2011-11-16 | 2012-11-14 | Vitrage hydrophobe |
Country Status (15)
| Country | Link |
|---|---|
| US (1) | US9051213B2 (enExample) |
| EP (1) | EP2780295B1 (enExample) |
| JP (1) | JP6219837B2 (enExample) |
| KR (1) | KR101996696B1 (enExample) |
| CN (1) | CN104024176B (enExample) |
| BR (1) | BR112014010421A2 (enExample) |
| CA (1) | CA2853193C (enExample) |
| EA (1) | EA026831B1 (enExample) |
| ES (1) | ES2554913T3 (enExample) |
| FR (1) | FR2982609B1 (enExample) |
| IN (1) | IN2014MN00824A (enExample) |
| MX (1) | MX338342B (enExample) |
| PL (1) | PL2780295T3 (enExample) |
| PT (1) | PT2780295E (enExample) |
| WO (1) | WO2013072622A1 (enExample) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| PL3319915T3 (pl) * | 2015-07-07 | 2020-06-15 | Agc Glass Europe | Szklane podłoże o podwyższonej odporności na warunki atmosferyczne i środki chemiczne |
| CN106517813B (zh) * | 2016-09-26 | 2019-09-24 | 武汉钢铁有限公司 | 疏油疏水防雾玻璃及其涂层的制备方法 |
| ES2673370B1 (es) * | 2016-12-21 | 2019-04-03 | Bsh Electrodomesticos Espana Sa | Método para recubrir un elemento base para un componente de aparato doméstico, y componente de aparato doméstico |
| DE102018207101B4 (de) * | 2018-05-08 | 2024-06-13 | Robert Bosch Gmbh | Verfahren zum Herstellen eines Bodens einer Analysezelle zum Analysieren eines biochemischen Materials und Analysezelle |
| CN109487234A (zh) * | 2018-12-18 | 2019-03-19 | 湖北大学 | 超疏油涂层及其制备方法和应用 |
| JP7020458B2 (ja) * | 2019-07-12 | 2022-02-16 | Ａｇｃ株式会社 | 膜付きガラス基板及びその製造方法 |
| JP7306502B2 (ja) * | 2019-07-12 | 2023-07-11 | Ａｇｃ株式会社 | 膜付きガラス基板及びその製造方法 |
| DE112021004623T5 (de) * | 2020-09-04 | 2023-06-15 | AGC Inc. | Glasgegenstand |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE69123228T2 (de) | 1990-12-21 | 1997-03-13 | Matsushita Electric Industrial Co., Ltd., Kadoma, Osaka | Verfahren zur Herstellung einer chemisch adsorbierten Schicht |
| EP0492545B1 (en) | 1990-12-25 | 1998-03-25 | Matsushita Electric Industrial Co., Ltd. | Transparent substrate with monomolecular film thereon and method of manufacturing the same |
| JPH04285038A (ja) * | 1991-03-14 | 1992-10-09 | Tokai Rika Co Ltd | ガラス用撥水膜 |
| DE69227806T2 (de) | 1991-07-26 | 1999-04-29 | Matsushita Electric Industrial Co., Ltd., Kadoma, Osaka | Öl- und wasserabweisendes Bekleidungsmaterial |
| CA2159296C (en) * | 1994-10-14 | 2007-01-30 | Michel J. Soubeyrand | Glass coating method and glass coated thereby |
| US6627532B1 (en) * | 1998-02-11 | 2003-09-30 | Applied Materials, Inc. | Method of decreasing the K value in SiOC layer deposited by chemical vapor deposition |
| FR2800731B1 (fr) | 1999-11-05 | 2002-01-18 | Saint Gobain Vitrage | Substrat transparent muni d'une couche en derive de silicium |
| FR2806076B1 (fr) * | 2000-03-08 | 2002-09-20 | Saint Gobain Vitrage | Substrat transparent revetu d'une couche polymere |
| US7485570B2 (en) * | 2002-10-30 | 2009-02-03 | Fujitsu Limited | Silicon oxycarbide, growth method of silicon oxycarbide layer, semiconductor device and manufacture method for semiconductor device |
| US6913992B2 (en) * | 2003-03-07 | 2005-07-05 | Applied Materials, Inc. | Method of modifying interlayer adhesion |
| FR2866643B1 (fr) * | 2004-02-24 | 2006-05-26 | Saint Gobain | Substrat, notamment verrier, a surface hydrophobe, avec une durabilite amelioree des proprietes hydrophobes |
| US7482060B2 (en) * | 2004-07-14 | 2009-01-27 | Agc Flat Glass North America, Inc. | Silicon oxycarbide coatings having durable hydrophilic properties |
| FR2889183B1 (fr) | 2005-07-26 | 2007-09-07 | Saint Gobain | Revetement hydrophobe comprenant un primage comprenant un disilane et une couche hydrophobe comprenant un alkysilane fluore |
| FR2940966B1 (fr) * | 2009-01-09 | 2011-03-04 | Saint Gobain | Substrat hydrophobe comprenant un primage du type oxycarbure de silicium active par plasma |
| JP5494656B2 (ja) | 2009-04-30 | 2014-05-21 | コニカミノルタ株式会社 | 撥水部材、車載用ガラス、及び、撥水部材の製造方法 |
-
2011
- 2011-11-16 FR FR1160419A patent/FR2982609B1/fr not_active Expired - Fee Related
-
2012
- 2012-11-14 EP EP12795541.7A patent/EP2780295B1/fr not_active Not-in-force
- 2012-11-14 CN CN201280055822.9A patent/CN104024176B/zh not_active Expired - Fee Related
- 2012-11-14 CA CA2853193A patent/CA2853193C/fr not_active Expired - Fee Related
- 2012-11-14 PL PL12795541T patent/PL2780295T3/pl unknown
- 2012-11-14 JP JP2014541736A patent/JP6219837B2/ja not_active Expired - Fee Related
- 2012-11-14 US US14/358,496 patent/US9051213B2/en not_active Expired - Fee Related
- 2012-11-14 ES ES12795541.7T patent/ES2554913T3/es active Active
- 2012-11-14 EA EA201490977A patent/EA026831B1/ru not_active IP Right Cessation
- 2012-11-14 MX MX2014005761A patent/MX338342B/es active IP Right Grant
- 2012-11-14 KR KR1020147012776A patent/KR101996696B1/ko not_active Expired - Fee Related
- 2012-11-14 PT PT127955417T patent/PT2780295E/pt unknown
- 2012-11-14 IN IN824MUN2014 patent/IN2014MN00824A/en unknown
- 2012-11-14 BR BR112014010421A patent/BR112014010421A2/pt not_active Application Discontinuation
- 2012-11-14 WO PCT/FR2012/052621 patent/WO2013072622A1/fr not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| ES2554913T3 (es) | 2015-12-28 |
| CN104024176A (zh) | 2014-09-03 |
| JP6219837B2 (ja) | 2017-10-25 |
| EP2780295A1 (fr) | 2014-09-24 |
| US9051213B2 (en) | 2015-06-09 |
| PL2780295T3 (pl) | 2016-04-29 |
| JP2015505793A (ja) | 2015-02-26 |
| MX338342B (es) | 2016-04-13 |
| US20140315027A1 (en) | 2014-10-23 |
| MX2014005761A (es) | 2014-05-30 |
| CN104024176B (zh) | 2016-12-21 |
| IN2014MN00824A (enExample) | 2015-04-17 |
| EA026831B1 (ru) | 2017-05-31 |
| KR101996696B1 (ko) | 2019-07-04 |
| EP2780295B1 (fr) | 2015-11-11 |
| CA2853193A1 (fr) | 2013-05-23 |
| FR2982609B1 (fr) | 2014-06-20 |
| FR2982609A1 (fr) | 2013-05-17 |
| BR112014010421A2 (pt) | 2017-04-25 |
| KR20140093233A (ko) | 2014-07-25 |
| WO2013072622A1 (fr) | 2013-05-23 |
| EA201490977A1 (ru) | 2014-08-29 |
| PT2780295E (pt) | 2015-11-30 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EEER | Examination request |
Effective date: 20171012 |
|
| MKLA | Lapsed |
Effective date: 20201116 |