JP2015505793A5 - - Google Patents
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- Publication number
- JP2015505793A5 JP2015505793A5 JP2014541736A JP2014541736A JP2015505793A5 JP 2015505793 A5 JP2015505793 A5 JP 2015505793A5 JP 2014541736 A JP2014541736 A JP 2014541736A JP 2014541736 A JP2014541736 A JP 2014541736A JP 2015505793 A5 JP2015505793 A5 JP 2015505793A5
- Authority
- JP
- Japan
- Prior art keywords
- layer
- sio
- silicon oxycarbide
- hydrophobic
- sih
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000002209 hydrophobic effect Effects 0.000 claims description 48
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 29
- 229910052710 silicon Inorganic materials 0.000 claims description 29
- 239000010703 silicon Substances 0.000 claims description 29
- 238000000034 method Methods 0.000 claims description 28
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 20
- 239000000203 mixture Substances 0.000 claims description 16
- 238000005229 chemical vapour deposition Methods 0.000 claims description 15
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 14
- 229910000077 silane Inorganic materials 0.000 claims description 14
- 239000000126 substance Substances 0.000 claims description 14
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 claims description 13
- 239000005977 Ethylene Substances 0.000 claims description 13
- 239000000758 substrate Substances 0.000 claims description 13
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims description 12
- 239000000463 material Substances 0.000 claims description 12
- 239000011521 glass Substances 0.000 claims description 10
- 239000012495 reaction gas Substances 0.000 claims description 9
- 239000007789 gas Substances 0.000 claims description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 7
- 239000001569 carbon dioxide Substances 0.000 claims description 6
- 229910002092 carbon dioxide Inorganic materials 0.000 claims description 6
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 claims description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 5
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 claims description 4
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 4
- 230000002378 acidificating effect Effects 0.000 claims description 4
- 238000000137 annealing Methods 0.000 claims description 4
- 230000001747 exhibiting effect Effects 0.000 claims description 4
- 229910052500 inorganic mineral Inorganic materials 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 239000011707 mineral Substances 0.000 claims description 4
- 238000009832 plasma treatment Methods 0.000 claims description 4
- 239000005329 float glass Substances 0.000 claims description 3
- 238000001755 magnetron sputter deposition Methods 0.000 claims description 3
- 125000004209 (C1-C8) alkyl group Chemical group 0.000 claims description 2
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 2
- 230000003213 activating effect Effects 0.000 claims description 2
- 125000003545 alkoxy group Chemical group 0.000 claims description 2
- 125000005843 halogen group Chemical group 0.000 claims description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 2
- 239000002243 precursor Substances 0.000 claims description 2
- 238000007493 shaping process Methods 0.000 claims description 2
- 238000004544 sputter deposition Methods 0.000 claims description 2
- 238000011144 upstream manufacturing Methods 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 51
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 15
- 229910052799 carbon Inorganic materials 0.000 description 15
- 238000000151 deposition Methods 0.000 description 10
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 7
- 238000001994 activation Methods 0.000 description 6
- 230000004913 activation Effects 0.000 description 6
- 239000000047 product Substances 0.000 description 6
- 239000000377 silicon dioxide Substances 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 230000008021 deposition Effects 0.000 description 5
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 4
- 230000032683 aging Effects 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 3
- 239000008367 deionised water Substances 0.000 description 3
- 229910021641 deionized water Inorganic materials 0.000 description 3
- 239000003085 diluting agent Substances 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 125000005372 silanol group Chemical group 0.000 description 3
- 239000011260 aqueous acid Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 229910020175 SiOH Inorganic materials 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 238000005903 acid hydrolysis reaction Methods 0.000 description 1
- 238000003915 air pollution Methods 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 238000005119 centrifugation Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- XPBBUZJBQWWFFJ-UHFFFAOYSA-N fluorosilane Chemical compound [SiH3]F XPBBUZJBQWWFFJ-UHFFFAOYSA-N 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 230000005661 hydrophobic surface Effects 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000005923 long-lasting effect Effects 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 150000002902 organometallic compounds Chemical class 0.000 description 1
- 125000001181 organosilyl group Chemical group [SiH3]* 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 1
- 238000000678 plasma activation Methods 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 238000006748 scratching Methods 0.000 description 1
- 230000002393 scratching effect Effects 0.000 description 1
- 239000011265 semifinished product Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 230000035882 stress Effects 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR1160419 | 2011-11-16 | ||
| FR1160419A FR2982609B1 (fr) | 2011-11-16 | 2011-11-16 | Vitrage hydrophobe |
| PCT/FR2012/052621 WO2013072622A1 (fr) | 2011-11-16 | 2012-11-14 | Vitrage hydrophobe |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015505793A JP2015505793A (ja) | 2015-02-26 |
| JP2015505793A5 true JP2015505793A5 (enExample) | 2017-09-21 |
| JP6219837B2 JP6219837B2 (ja) | 2017-10-25 |
Family
ID=47291135
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014541736A Expired - Fee Related JP6219837B2 (ja) | 2011-11-16 | 2012-11-14 | 疎水性グレージング |
Country Status (15)
| Country | Link |
|---|---|
| US (1) | US9051213B2 (enExample) |
| EP (1) | EP2780295B1 (enExample) |
| JP (1) | JP6219837B2 (enExample) |
| KR (1) | KR101996696B1 (enExample) |
| CN (1) | CN104024176B (enExample) |
| BR (1) | BR112014010421A2 (enExample) |
| CA (1) | CA2853193C (enExample) |
| EA (1) | EA026831B1 (enExample) |
| ES (1) | ES2554913T3 (enExample) |
| FR (1) | FR2982609B1 (enExample) |
| IN (1) | IN2014MN00824A (enExample) |
| MX (1) | MX338342B (enExample) |
| PL (1) | PL2780295T3 (enExample) |
| PT (1) | PT2780295E (enExample) |
| WO (1) | WO2013072622A1 (enExample) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| PL3319915T3 (pl) * | 2015-07-07 | 2020-06-15 | Agc Glass Europe | Szklane podłoże o podwyższonej odporności na warunki atmosferyczne i środki chemiczne |
| CN106517813B (zh) * | 2016-09-26 | 2019-09-24 | 武汉钢铁有限公司 | 疏油疏水防雾玻璃及其涂层的制备方法 |
| ES2673370B1 (es) * | 2016-12-21 | 2019-04-03 | Bsh Electrodomesticos Espana Sa | Método para recubrir un elemento base para un componente de aparato doméstico, y componente de aparato doméstico |
| DE102018207101B4 (de) * | 2018-05-08 | 2024-06-13 | Robert Bosch Gmbh | Verfahren zum Herstellen eines Bodens einer Analysezelle zum Analysieren eines biochemischen Materials und Analysezelle |
| CN109487234A (zh) * | 2018-12-18 | 2019-03-19 | 湖北大学 | 超疏油涂层及其制备方法和应用 |
| JP7020458B2 (ja) * | 2019-07-12 | 2022-02-16 | Ａｇｃ株式会社 | 膜付きガラス基板及びその製造方法 |
| JP7306502B2 (ja) * | 2019-07-12 | 2023-07-11 | Ａｇｃ株式会社 | 膜付きガラス基板及びその製造方法 |
| DE112021004623T5 (de) * | 2020-09-04 | 2023-06-15 | AGC Inc. | Glasgegenstand |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE69123228T2 (de) | 1990-12-21 | 1997-03-13 | Matsushita Electric Industrial Co., Ltd., Kadoma, Osaka | Verfahren zur Herstellung einer chemisch adsorbierten Schicht |
| EP0492545B1 (en) | 1990-12-25 | 1998-03-25 | Matsushita Electric Industrial Co., Ltd. | Transparent substrate with monomolecular film thereon and method of manufacturing the same |
| JPH04285038A (ja) * | 1991-03-14 | 1992-10-09 | Tokai Rika Co Ltd | ガラス用撥水膜 |
| DE69227806T2 (de) | 1991-07-26 | 1999-04-29 | Matsushita Electric Industrial Co., Ltd., Kadoma, Osaka | Öl- und wasserabweisendes Bekleidungsmaterial |
| CA2159296C (en) * | 1994-10-14 | 2007-01-30 | Michel J. Soubeyrand | Glass coating method and glass coated thereby |
| US6627532B1 (en) * | 1998-02-11 | 2003-09-30 | Applied Materials, Inc. | Method of decreasing the K value in SiOC layer deposited by chemical vapor deposition |
| FR2800731B1 (fr) | 1999-11-05 | 2002-01-18 | Saint Gobain Vitrage | Substrat transparent muni d'une couche en derive de silicium |
| FR2806076B1 (fr) * | 2000-03-08 | 2002-09-20 | Saint Gobain Vitrage | Substrat transparent revetu d'une couche polymere |
| US7485570B2 (en) * | 2002-10-30 | 2009-02-03 | Fujitsu Limited | Silicon oxycarbide, growth method of silicon oxycarbide layer, semiconductor device and manufacture method for semiconductor device |
| US6913992B2 (en) * | 2003-03-07 | 2005-07-05 | Applied Materials, Inc. | Method of modifying interlayer adhesion |
| FR2866643B1 (fr) * | 2004-02-24 | 2006-05-26 | Saint Gobain | Substrat, notamment verrier, a surface hydrophobe, avec une durabilite amelioree des proprietes hydrophobes |
| US7482060B2 (en) * | 2004-07-14 | 2009-01-27 | Agc Flat Glass North America, Inc. | Silicon oxycarbide coatings having durable hydrophilic properties |
| FR2889183B1 (fr) | 2005-07-26 | 2007-09-07 | Saint Gobain | Revetement hydrophobe comprenant un primage comprenant un disilane et une couche hydrophobe comprenant un alkysilane fluore |
| FR2940966B1 (fr) * | 2009-01-09 | 2011-03-04 | Saint Gobain | Substrat hydrophobe comprenant un primage du type oxycarbure de silicium active par plasma |
| JP5494656B2 (ja) | 2009-04-30 | 2014-05-21 | コニカミノルタ株式会社 | 撥水部材、車載用ガラス、及び、撥水部材の製造方法 |
-
2011
- 2011-11-16 FR FR1160419A patent/FR2982609B1/fr not_active Expired - Fee Related
-
2012
- 2012-11-14 EP EP12795541.7A patent/EP2780295B1/fr not_active Not-in-force
- 2012-11-14 CN CN201280055822.9A patent/CN104024176B/zh not_active Expired - Fee Related
- 2012-11-14 CA CA2853193A patent/CA2853193C/fr not_active Expired - Fee Related
- 2012-11-14 PL PL12795541T patent/PL2780295T3/pl unknown
- 2012-11-14 JP JP2014541736A patent/JP6219837B2/ja not_active Expired - Fee Related
- 2012-11-14 US US14/358,496 patent/US9051213B2/en not_active Expired - Fee Related
- 2012-11-14 ES ES12795541.7T patent/ES2554913T3/es active Active
- 2012-11-14 EA EA201490977A patent/EA026831B1/ru not_active IP Right Cessation
- 2012-11-14 MX MX2014005761A patent/MX338342B/es active IP Right Grant
- 2012-11-14 KR KR1020147012776A patent/KR101996696B1/ko not_active Expired - Fee Related
- 2012-11-14 PT PT127955417T patent/PT2780295E/pt unknown
- 2012-11-14 IN IN824MUN2014 patent/IN2014MN00824A/en unknown
- 2012-11-14 BR BR112014010421A patent/BR112014010421A2/pt not_active Application Discontinuation
- 2012-11-14 WO PCT/FR2012/052621 patent/WO2013072622A1/fr not_active Ceased
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