IL73170A - Process and catalyst system for conducting or catalysing a chemical reaction on a surface,especially electroless metal deposition - Google Patents
Process and catalyst system for conducting or catalysing a chemical reaction on a surface,especially electroless metal depositionInfo
- Publication number
- IL73170A IL73170A IL73170A IL7317084A IL73170A IL 73170 A IL73170 A IL 73170A IL 73170 A IL73170 A IL 73170A IL 7317084 A IL7317084 A IL 7317084A IL 73170 A IL73170 A IL 73170A
- Authority
- IL
- Israel
- Prior art keywords
- catalysing
- conducting
- chemical reaction
- catalyst system
- metal deposition
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/28—Sensitising or activating
- C23C18/30—Activating or accelerating or sensitising with palladium or other noble metal
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/28—Sensitising or activating
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
- H05K3/181—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/386—Improvement of the adhesion between the insulating substrate and the metal by the use of an organic polymeric bonding layer, e.g. adhesive
- H05K3/387—Improvement of the adhesion between the insulating substrate and the metal by the use of an organic polymeric bonding layer, e.g. adhesive for electroless plating
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemically Coating (AREA)
- Catalysts (AREA)
- Manufacturing Of Printed Wiring (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US53692583A | 1983-09-28 | 1983-09-28 | |
GB08424618A GB2164954A (en) | 1983-09-28 | 1984-09-28 | Conducting or catalysing a chemical reaction on a surface especially electroless metal deposition and catalyst systems used therein |
Publications (2)
Publication Number | Publication Date |
---|---|
IL73170A0 IL73170A0 (en) | 1985-01-31 |
IL73170A true IL73170A (en) | 1988-07-31 |
Family
ID=26288277
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IL73170A IL73170A (en) | 1983-09-28 | 1984-10-04 | Process and catalyst system for conducting or catalysing a chemical reaction on a surface,especially electroless metal deposition |
Country Status (12)
Country | Link |
---|---|
EP (1) | EP0141528B1 (xx) |
JP (1) | JPS60175549A (xx) |
KR (1) | KR910009982B1 (xx) |
AU (1) | AU572564B2 (xx) |
BR (1) | BR8404858A (xx) |
CA (1) | CA1233158A (xx) |
DE (1) | DE3481067D1 (xx) |
GB (1) | GB2164954A (xx) |
IL (1) | IL73170A (xx) |
PH (1) | PH23907A (xx) |
SG (1) | SG79090G (xx) |
ZA (1) | ZA847657B (xx) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4634468A (en) * | 1984-05-07 | 1987-01-06 | Shipley Company Inc. | Catalytic metal of reduced particle size |
US4652311A (en) * | 1984-05-07 | 1987-03-24 | Shipley Company Inc. | Catalytic metal of reduced particle size |
US4701351A (en) * | 1986-06-16 | 1987-10-20 | International Business Machines Corporation | Seeding process for electroless metal deposition |
IT1232841B (it) * | 1989-02-03 | 1992-03-05 | Kemifar Spa | Composizione attivante per la metallizzazione di substrati isolanti e procedimento di metalizzazione di tali substrati impiegante la stessa |
JPH06279602A (ja) * | 1993-03-26 | 1994-10-04 | Idemitsu Petrochem Co Ltd | 無電解めっき可能なポリオレフィン樹脂成形体 |
BE1007610A3 (nl) * | 1993-10-11 | 1995-08-22 | Philips Electronics Nv | Werkwijze voor het stroomloos aanbrengen van een metaalpatroon op een elektrisch isolerend substraat. |
JP5117656B2 (ja) * | 2001-09-28 | 2013-01-16 | セーレン株式会社 | 無電解メッキの前処理方法及びそれを用いてなる導電性材料 |
DE60316108T2 (de) * | 2003-03-31 | 2008-06-05 | Council Of Scientific & Industrial Research | Geträgerter Nanopalladium Katalysator für C-C Kupplungsreaktionen von Haloarenen |
JP5095909B2 (ja) * | 2003-06-24 | 2012-12-12 | ローム・アンド・ハース・エレクトロニック・マテリアルズ,エル.エル.シー. | 触媒組成物および析出方法 |
JP2005206905A (ja) * | 2004-01-23 | 2005-08-04 | Ebara Corp | 基板処理方法及び装置、並びに処理液 |
EP1676937B1 (en) * | 2004-11-26 | 2016-06-01 | Rohm and Haas Electronic Materials, L.L.C. | UV curable catalyst compositions |
EP2610366A3 (en) * | 2011-12-31 | 2014-07-30 | Rohm and Haas Electronic Materials LLC | Plating catalyst and method |
EP2610365B1 (en) * | 2011-12-31 | 2020-02-26 | Rohm and Haas Electronic Materials LLC | Electroless plating method |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR1543792A (fr) * | 1966-12-29 | 1900-01-01 | Ibm | Métallisation de matières plastiques |
BE755520A (fr) * | 1969-09-01 | 1971-02-01 | Dynamit Nobel Ag | Procede de metallisation de matieres synthetiques |
DE2111136A1 (de) * | 1971-03-09 | 1972-09-28 | Kalle Ag | Verfahren zur Herstellung von metallisierten Formkoerpern aus makromolekularem Material |
US3900320A (en) * | 1971-09-30 | 1975-08-19 | Bell & Howell Co | Activation method for electroless plating |
GB1403197A (en) * | 1971-09-30 | 1975-08-28 | Bell & Howell Co | Metal encapsulation |
NL7413977A (nl) * | 1974-10-25 | 1976-04-27 | Philips Nv | Aanbrengen van een geleiderlaagpatroon met op een geringe onderlinge afstand gelegen delen, in het bijzonder bij de vervaardiging van half- geleiderinrichtingen. |
DE2531769C3 (de) * | 1975-07-16 | 1978-07-06 | Deutsche Gold- Und Silber-Scheideanstalt Vormals Roessler, 6000 Frankfurt | Verwendung von hochstabilen Metalloxid-Dispersionen zur Erzeugung haftfester Metalloxid-Überzüge auf einem festen chemisch ineiten porösen Katalysatorträger |
GB1573241A (en) * | 1977-03-08 | 1980-08-20 | Western Electric Co | Method of depositing a metal on a surface |
US4073981A (en) * | 1977-03-11 | 1978-02-14 | Western Electric Company, Inc. | Method of selectively depositing metal on a surface |
JPS5586533A (en) * | 1978-12-26 | 1980-06-30 | Toa Nenryo Kogyo Kk | Manufacturing method of granular catalyst coated with polymer |
US4259409A (en) * | 1980-03-06 | 1981-03-31 | Ses, Incorporated | Electroless plating process for glass or ceramic bodies and product |
DK427780A (da) * | 1980-10-10 | 1982-04-11 | Neselco As | Pulver til brug ved toer sensibilisering for stroemloes metallisering |
DE3150985A1 (de) * | 1981-12-23 | 1983-06-30 | Bayer Ag, 5090 Leverkusen | Verfahren zur aktivierung von substratoberflaechen fuer die stromlose metallisierung |
DK153572C (da) * | 1982-02-18 | 1988-12-19 | Platonec Aps | Pulver til brug ved toer aktivering for stroemloes metallisering, fremgangsmaade til fremstilling deraf samt anvendelse deraf |
-
1984
- 1984-09-19 PH PH31238A patent/PH23907A/en unknown
- 1984-09-26 AU AU33542/84A patent/AU572564B2/en not_active Ceased
- 1984-09-26 CA CA000464009A patent/CA1233158A/en not_active Expired
- 1984-09-27 BR BR8404858A patent/BR8404858A/pt not_active IP Right Cessation
- 1984-09-28 GB GB08424618A patent/GB2164954A/en not_active Withdrawn
- 1984-09-28 EP EP84306615A patent/EP0141528B1/en not_active Expired - Lifetime
- 1984-09-28 ZA ZA847657A patent/ZA847657B/xx unknown
- 1984-09-28 JP JP59202140A patent/JPS60175549A/ja active Granted
- 1984-09-28 DE DE8484306615T patent/DE3481067D1/de not_active Expired - Fee Related
- 1984-09-28 KR KR1019840006021A patent/KR910009982B1/ko not_active IP Right Cessation
- 1984-10-04 IL IL73170A patent/IL73170A/xx not_active IP Right Cessation
-
1990
- 1990-09-27 SG SG790/90A patent/SG79090G/en unknown
Also Published As
Publication number | Publication date |
---|---|
JPS60175549A (ja) | 1985-09-09 |
EP0141528A2 (en) | 1985-05-15 |
GB8424618D0 (en) | 1984-11-07 |
AU3354284A (en) | 1985-04-04 |
EP0141528A3 (en) | 1987-06-03 |
DE3481067D1 (de) | 1990-02-22 |
GB2164954A (en) | 1986-04-03 |
PH23907A (en) | 1989-12-18 |
KR850002846A (ko) | 1985-05-20 |
BR8404858A (pt) | 1985-08-13 |
IL73170A0 (en) | 1985-01-31 |
EP0141528B1 (en) | 1990-01-17 |
KR910009982B1 (ko) | 1991-12-09 |
JPH0585219B2 (xx) | 1993-12-06 |
AU572564B2 (en) | 1988-05-12 |
SG79090G (en) | 1990-11-23 |
ZA847657B (en) | 1985-11-27 |
CA1233158A (en) | 1988-02-23 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
KB | Patent renewed | ||
RH1 | Patent not in force |