IL156419A0 - Sample dimension measuring method and scanning electron microscope - Google Patents

Sample dimension measuring method and scanning electron microscope

Info

Publication number
IL156419A0
IL156419A0 IL15641902A IL15641902A IL156419A0 IL 156419 A0 IL156419 A0 IL 156419A0 IL 15641902 A IL15641902 A IL 15641902A IL 15641902 A IL15641902 A IL 15641902A IL 156419 A0 IL156419 A0 IL 156419A0
Authority
IL
Israel
Prior art keywords
electron microscope
scanning electron
measuring method
dimension measuring
sample dimension
Prior art date
Application number
IL15641902A
Other languages
English (en)
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Publication of IL156419A0 publication Critical patent/IL156419A0/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B15/00—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2813—Scanning microscopes characterised by the application
    • H01J2237/2814—Measurement of surface topography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
IL15641902A 2001-08-29 2002-03-27 Sample dimension measuring method and scanning electron microscope IL156419A0 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2001259126 2001-08-29
PCT/JP2002/002983 WO2003021186A1 (fr) 2001-08-29 2002-03-27 Procede pour mesurer les dimensions d'un echantillon et microscope electronique a balayage

Publications (1)

Publication Number Publication Date
IL156419A0 true IL156419A0 (en) 2004-01-04

Family

ID=19086548

Family Applications (2)

Application Number Title Priority Date Filing Date
IL15641902A IL156419A0 (en) 2001-08-29 2002-03-27 Sample dimension measuring method and scanning electron microscope
IL156419A IL156419A (en) 2001-08-29 2003-06-12 Sample dimension measuring method and scanning electron microscope

Family Applications After (1)

Application Number Title Priority Date Filing Date
IL156419A IL156419A (en) 2001-08-29 2003-06-12 Sample dimension measuring method and scanning electron microscope

Country Status (4)

Country Link
US (2) US7659508B2 (xx)
JP (1) JP4268867B2 (xx)
IL (2) IL156419A0 (xx)
WO (1) WO2003021186A1 (xx)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007003535A (ja) * 2001-08-29 2007-01-11 Hitachi Ltd 試料寸法測定方法及び走査型電子顕微鏡
JP2006138864A (ja) * 2001-08-29 2006-06-01 Hitachi Ltd 試料寸法測定方法及び走査型電子顕微鏡
JP4268867B2 (ja) * 2001-08-29 2009-05-27 株式会社日立製作所 試料寸法測定方法及び走査型電子顕微鏡
US7285777B2 (en) 2001-08-29 2007-10-23 Hitachi High-Technologies Corporation Sample dimension measuring method and scanning electron microscope
JP3823117B2 (ja) * 2002-05-20 2006-09-20 株式会社日立ハイテクノロジーズ 試料寸法測長方法及び走査電子顕微鏡
JP2004227879A (ja) * 2003-01-22 2004-08-12 Hitachi Ltd パターン検査方法及びパターン検査装置
JP4194526B2 (ja) * 2004-05-14 2008-12-10 株式会社日立ハイテクノロジーズ 荷電粒子線の調整方法、及び荷電粒子線装置
JP4299195B2 (ja) * 2004-06-28 2009-07-22 株式会社日立ハイテクノロジーズ 荷電粒子線装置及びその光軸調整方法
JP4357410B2 (ja) * 2004-12-20 2009-11-04 株式会社日立ハイテクノロジーズ 電子顕微鏡による測定条件決定方法
DE102005020540A1 (de) * 2005-05-03 2006-11-09 Carl Zeiss Jena Gmbh Laser-Scanning-Mikroskop
JP4881677B2 (ja) * 2006-08-31 2012-02-22 株式会社日立ハイテクノロジーズ 荷電粒子線走査方法及び荷電粒子線装置
US9991092B2 (en) * 2009-08-07 2018-06-05 Hitachi High-Technologies Corporation Scanning electron microscope and sample observation method
WO2011089913A1 (ja) 2010-01-25 2011-07-28 株式会社日立ハイテクノロジーズ 走査型電子顕微鏡
JP5542478B2 (ja) * 2010-03-02 2014-07-09 株式会社日立ハイテクノロジーズ 荷電粒子線顕微鏡
JP5396350B2 (ja) 2010-08-31 2014-01-22 株式会社日立ハイテクノロジーズ 画像形成装置、及びコンピュータプログラム
JP5686627B2 (ja) 2011-02-24 2015-03-18 株式会社日立ハイテクノロジーズ パターン寸法測定方法、及び荷電粒子線装置
US8805147B2 (en) * 2011-05-17 2014-08-12 Canon Kabushiki Kaisha Waveguide, apparatus including the waveguide, and method of manufacturing the waveguide
JP5813413B2 (ja) 2011-08-22 2015-11-17 株式会社日立ハイテクノロジーズ シュリンク前形状推定方法およびｃｄ−ｓｅｍ装置
JP5859795B2 (ja) 2011-10-06 2016-02-16 株式会社日立ハイテクノロジーズ 計測方法、データ処理装置及びそれを用いた電子顕微鏡
JP6165444B2 (ja) * 2013-01-11 2017-07-19 株式会社日立ハイテクノロジーズ 荷電粒子線装置
NL2013262B1 (en) * 2014-07-25 2016-09-09 Delmic B V Method for inspecting a sample using an assembly comprising a scanning electron microscope and a light microscope.
US9316492B2 (en) * 2014-08-08 2016-04-19 International Business Machines Corporation Reducing the impact of charged particle beams in critical dimension analysis
DE102015216673A1 (de) 2015-09-01 2017-03-02 Carl Zeiss Smt Gmbh Verfahren und Vorrichtungen zum Untersuchen einer elektrisch geladenen Probenoberfläche
CN109073568B (zh) 2016-04-29 2022-01-11 Asml荷兰有限公司 用于确定结构的特性的方法和装置、器件制造方法
WO2019145278A1 (en) * 2018-01-26 2019-08-01 Asml Netherlands B.V. Pre-scan feature determination methods and systems

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JPS5330865A (en) 1976-09-03 1978-03-23 Hitachi Ltd Electron microscope provided with sample irradiating electron beam quantity measuring unit
JPS5727548A (en) * 1980-07-25 1982-02-13 Hitachi Ltd Scanning type electron microscope
JPS59179530A (ja) 1983-03-29 1984-10-12 Nok Corp 陰イオン交換膜およびその製造法
JPS59201351A (ja) 1983-04-30 1984-11-14 Shimadzu Corp 走査型電子顕微鏡
JPS59214151A (ja) * 1983-05-20 1984-12-04 Jeol Ltd 荷電粒子線装置等における二次元画像デ−タの表示方法
JPS61148312A (ja) 1984-12-24 1986-07-07 Hitachi Ltd 検査方法
JPS61265517A (ja) 1985-05-20 1986-11-25 Jeol Ltd 荷電粒子線を用いた測長装置
JPS62192609A (ja) 1986-02-19 1987-08-24 Fuji Electric Co Ltd 微小凹凸の深さ測定方法
JPS6376252A (ja) 1986-09-19 1988-04-06 Toshiba Corp 位置決め装置
JP2607652B2 (ja) 1988-12-12 1997-05-07 日本電信電話株式会社 荷電ビームを用いた測定装置における照射条件決定方法およびそれに用いる評価パタン
JP2869827B2 (ja) * 1991-09-17 1999-03-10 株式会社日立製作所 走査電子顕微鏡
JPH0763542A (ja) 1993-08-26 1995-03-10 Mitsubishi Electric Corp 電子線測長方法及び電子線測長装置
JP3505013B2 (ja) * 1995-08-07 2004-03-08 株式会社日立製作所 試料像表示方法
JP3509348B2 (ja) 1995-12-15 2004-03-22 株式会社日立製作所 測長用電子顕微鏡
JPH1050245A (ja) 1996-08-07 1998-02-20 Jeol Ltd 荷電粒子ビーム装置における焦点合わせ方法
JP2943714B2 (ja) * 1996-08-22 1999-08-30 日本電気株式会社 固体撮像装置
JPH11237230A (ja) 1998-02-23 1999-08-31 Hitachi Ltd 電子顕微鏡における試料測定法及び装置
JP2001147112A (ja) * 1999-11-22 2001-05-29 Hitachi Ltd 走査電子顕微鏡
JP2001235865A (ja) * 2000-02-23 2001-08-31 Fuji Photo Film Co Ltd ポジ型フォトレジスト組成物
JP4331854B2 (ja) * 2000-03-24 2009-09-16 富士通マイクロエレクトロニクス株式会社 走査型電子顕微鏡装置とその制御方法
US7285777B2 (en) * 2001-08-29 2007-10-23 Hitachi High-Technologies Corporation Sample dimension measuring method and scanning electron microscope
JP4268867B2 (ja) * 2001-08-29 2009-05-27 株式会社日立製作所 試料寸法測定方法及び走査型電子顕微鏡
JP3823117B2 (ja) * 2002-05-20 2006-09-20 株式会社日立ハイテクノロジーズ 試料寸法測長方法及び走査電子顕微鏡
JP2004227879A (ja) * 2003-01-22 2004-08-12 Hitachi Ltd パターン検査方法及びパターン検査装置

Also Published As

Publication number Publication date
US7659508B2 (en) 2010-02-09
US20040051040A1 (en) 2004-03-18
JPWO2003021186A1 (ja) 2004-12-16
US8080789B2 (en) 2011-12-20
WO2003021186A1 (fr) 2003-03-13
JP4268867B2 (ja) 2009-05-27
IL156419A (en) 2009-05-04
US20100038535A1 (en) 2010-02-18

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