IL151166A0 - Process monitoring system for lithography lasers - Google Patents

Process monitoring system for lithography lasers

Info

Publication number
IL151166A0
IL151166A0 IL15116601A IL15116601A IL151166A0 IL 151166 A0 IL151166 A0 IL 151166A0 IL 15116601 A IL15116601 A IL 15116601A IL 15116601 A IL15116601 A IL 15116601A IL 151166 A0 IL151166 A0 IL 151166A0
Authority
IL
Israel
Prior art keywords
monitoring system
process monitoring
lithography lasers
lithography
lasers
Prior art date
Application number
IL15116601A
Other languages
English (en)
Original Assignee
Cymer Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US09/505,233 external-priority patent/US6408260B1/en
Application filed by Cymer Inc filed Critical Cymer Inc
Publication of IL151166A0 publication Critical patent/IL151166A0/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70991—Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70525—Controlling normal operating mode, e.g. matching different apparatus, remote control or prediction of failure
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70975—Assembly, maintenance, transport or storage of apparatus
    • G—PHYSICS
    • G07—CHECKING-DEVICES
    • G07C—TIME OR ATTENDANCE REGISTERS; REGISTERING OR INDICATING THE WORKING OF MACHINES; GENERATING RANDOM NUMBERS; VOTING OR LOTTERY APPARATUS; ARRANGEMENTS, SYSTEMS OR APPARATUS FOR CHECKING NOT PROVIDED FOR ELSEWHERE
    • G07C3/00—Registering or indicating the condition or the working of machines or other apparatus, other than vehicles
    • G07C3/005—Registering or indicating the condition or the working of machines or other apparatus, other than vehicles during manufacturing process
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00—Program-control systems
    • G05B2219/30—Nc systems
    • G05B2219/31—From computer integrated manufacturing till monitoring
    • G05B2219/31205—Remote transmission of measured values from site, local to host
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00—Program-control systems
    • G05B2219/30—Nc systems
    • G05B2219/31—From computer integrated manufacturing till monitoring
    • G05B2219/31485—Verify and update all related data in relational database
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P90/00—Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
    • Y02P90/80—Management or planning

Landscapes

  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lasers (AREA)
  • Testing And Monitoring For Control Systems (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Computer And Data Communications (AREA)
  • Management, Administration, Business Operations System, And Electronic Commerce (AREA)
  • Laser Beam Processing (AREA)
  • Accessory Devices And Overall Control Thereof (AREA)
IL15116601A 2000-02-16 2001-02-05 Process monitoring system for lithography lasers IL151166A0 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/505,233 US6408260B1 (en) 2000-02-16 2000-02-16 Laser lithography quality alarm system
US09/733,194 US6687562B2 (en) 2000-02-16 2000-12-08 Process monitoring system for lithography lasers
PCT/US2001/003762 WO2001061514A1 (en) 2000-02-16 2001-02-05 Process monitoring system for lithography lasers

Publications (1)

Publication Number Publication Date
IL151166A0 true IL151166A0 (en) 2003-04-10

Family

ID=27055070

Family Applications (1)

Application Number Title Priority Date Filing Date
IL15116601A IL151166A0 (en) 2000-02-16 2001-02-05 Process monitoring system for lithography lasers

Country Status (10)

Country Link
US (1) US7203562B2 (ja)
EP (1) EP1257924A4 (ja)
JP (1) JP3541183B2 (ja)
CN (1) CN1168024C (ja)
AU (1) AU2001238036A1 (ja)
CA (1) CA2400201A1 (ja)
IL (1) IL151166A0 (ja)
RU (1) RU2258253C2 (ja)
TW (1) TW483035B (ja)
WO (1) WO2001061514A1 (ja)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6697695B1 (en) * 2000-04-25 2004-02-24 Komatsu Ltd. Laser device management system
JP4497674B2 (ja) * 2000-06-21 2010-07-07 キヤノン株式会社 露光装置およびデバイス製造方法
AU2003301377A1 (en) * 2002-10-18 2004-05-04 California Institute Of Technology Circular geometry oscillators
JP4119295B2 (ja) * 2003-04-07 2008-07-16 東京エレクトロン株式会社 保守・診断データ蓄積サーバ、保守・診断データの蓄積・取得システム、保守・診断データの蓄積・提供システム
JP2006024765A (ja) * 2004-07-08 2006-01-26 Komatsu Ltd レーザ装置管理システム
KR100639676B1 (ko) * 2004-09-21 2006-10-30 삼성전자주식회사 반도체 제조용 포토리소그라피 설비 제어시스템 및 그제어방법
KR100843765B1 (ko) 2006-12-15 2008-07-04 홍운식 노광용 광 에너지의 전달 효율값 산출시스템 및산출시스템을 이용한 광 에너지의 전달 효율값 산출방법
KR100856579B1 (ko) * 2007-01-18 2008-09-04 홍운식 웨이퍼의 노광 에너지 정보를 축적하는 시스템에 의해 누적된 웨이퍼의 노광 에너지 정보를 이용한 노광용 마스크의 관리방법
US20100095232A1 (en) * 2008-10-15 2010-04-15 Daniel Measurement And Control, Inc. Calculating and plotting statistical data
EP2320287A1 (de) * 2009-11-05 2011-05-11 Siemens Aktiengesellschaft Überwachungssystem und Verfahren zur Überwachung des Zustands einer technischen Anlage
RU2573398C2 (ru) 2011-04-22 2016-01-20 МЭППЕР ЛИТОГРАФИ АйПи Б.В. Сетевая архитектура и протокол для кластера литографических машин
CN103827898B (zh) 2011-07-22 2017-12-08 科学玻璃技术新加坡有限公司 用于对包括可回收气体净化器的消耗品的更换进行管理的系统及方法
US9694448B2 (en) * 2012-05-11 2017-07-04 Universal Laser Systems, Inc. Methods and systems for operating laser processing systems
WO2014017562A1 (ja) 2012-07-26 2014-01-30 ギガフォトン株式会社 レーザ装置及びレーザ装置の制御方法
WO2014030645A1 (ja) 2012-08-23 2014-02-27 ギガフォトン株式会社 光源装置及びデータ処理方法
WO2014038584A1 (ja) 2012-09-07 2014-03-13 ギガフォトン株式会社 レーザ装置及びレーザ装置の制御方法
RU2602393C2 (ru) * 2014-03-26 2016-11-20 Общество с ограниченной ответственностью "ТатАСУ" Система контроля выполнения технологических процессов
WO2016132479A1 (ja) * 2015-02-18 2016-08-25 東芝三菱電機産業システム株式会社 鉄鋼プラントアラームマネジメント装置
FR3052268B1 (fr) * 2016-06-01 2019-10-11 Fives Filling & Sealing Dispositif de gestion de maintenance d'equipement de remplissage ou de test
JP6820777B2 (ja) * 2017-03-21 2021-01-27 三菱電機株式会社 監視装置、監視方法、監視プログラム
CN110622373B (zh) 2017-06-12 2022-08-12 极光先进雷射株式会社 激光装置和激光装置管理系统、以及激光装置的管理方法
CN107317878B (zh) * 2017-07-31 2023-04-07 光惠（上海）激光科技有限公司 一种新型物联网智能激光器系统
JP7258028B2 (ja) * 2018-08-08 2023-04-14 ギガフォトン株式会社 リソグラフィシステムのメインテナンス管理方法、メインテナンス管理装置、及びコンピュータ可読媒体
JP7412150B2 (ja) * 2019-11-29 2024-01-12 東京エレクトロン株式会社 予測装置、予測方法及び予測プログラム
JP7447158B2 (ja) * 2020-02-12 2024-03-11 ギガフォトン株式会社 情報処理装置、情報処理方法、及び半導体製造システム
CN114077576A (zh) * 2020-08-19 2022-02-22 长鑫存储技术有限公司 晶圆修补方法、装置、设备及存储介质

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3336436B2 (ja) * 1991-04-02 2002-10-21 株式会社ニコン リソグラフィシステム、情報収集装置、露光装置、及び半導体デバイス製造方法
US5444637A (en) * 1993-09-28 1995-08-22 Advanced Micro Devices, Inc. Programmable semiconductor wafer for sensing, recording and retrieving fabrication process conditions to which the wafer is exposed
KR19980702629A (ko) 1995-09-27 1998-08-05 안자끼 사토루 레이저장치
US5764505A (en) 1996-01-23 1998-06-09 Cymer, Inc. Gas discharge laser control systems using multiple CPU's with shared memory on a common bus
US5646954A (en) 1996-02-12 1997-07-08 Cymer, Inc. Maintenance strategy control system and monitoring method for gas discharge lasers
US5805442A (en) * 1996-05-30 1998-09-08 Control Technology Corporation Distributed interface architecture for programmable industrial control systems
US5779799A (en) 1996-06-21 1998-07-14 Micron Technology, Inc. Substrate coating apparatus
TWI249760B (en) * 1996-07-31 2006-02-21 Canon Kk Remote maintenance system
JPH10161707A (ja) 1996-11-29 1998-06-19 Sukiyan Technol:Kk Ｆａシステムの制御方法
US5991324A (en) * 1998-03-11 1999-11-23 Cymer, Inc. Reliable. modular, production quality narrow-band KRF excimer laser
US6128323A (en) 1997-04-23 2000-10-03 Cymer, Inc. Reliable modular production quality narrow-band high REP rate excimer laser
US5982800A (en) * 1997-04-23 1999-11-09 Cymer, Inc. Narrow band excimer laser
JP3578886B2 (ja) 1997-05-02 2004-10-20 東京エレクトロン株式会社 プロセス制御システムとそのプロセスデータ転送制御方法
US6014398A (en) 1997-10-10 2000-01-11 Cymer, Inc. Narrow band excimer laser with gas additive
US6282454B1 (en) 1997-09-10 2001-08-28 Schneider Automation Inc. Web interface to a programmable controller
US6188710B1 (en) * 1997-10-10 2001-02-13 Cymer, Inc. Narrow band gas discharge laser with gas additive
KR19990065486A (ko) 1998-01-14 1999-08-05 윤종용 반도체 제조설비 관리시스템의 공정조건 관리방법
US5978406A (en) * 1998-01-30 1999-11-02 Cymer, Inc. Fluorine control system for excimer lasers
US6199018B1 (en) 1998-03-04 2001-03-06 Emerson Electric Co. Distributed diagnostic system
US6201996B1 (en) 1998-05-29 2001-03-13 Control Technology Corporationa Object-oriented programmable industrial controller with distributed interface architecture
JP4139015B2 (ja) * 1999-09-21 2008-08-27 株式会社小松製作所 パルスレーザ制御システム
US6408260B1 (en) * 2000-02-16 2002-06-18 Cymer, Inc. Laser lithography quality alarm system
US6697695B1 (en) * 2000-04-25 2004-02-24 Komatsu Ltd. Laser device management system
US6564171B1 (en) * 2000-09-14 2003-05-13 Advanced Micro Devices Inc. Method and apparatus for parsing event logs to determine tool operability
JP2003288496A (ja) * 2002-03-27 2003-10-10 Toshiba Corp 描画支援システム、描画支援方法、マスク製造支援システム、及びマスク製造支援方法

Also Published As

Publication number Publication date
CA2400201A1 (en) 2001-08-23
EP1257924A4 (en) 2007-06-20
US7203562B2 (en) 2007-04-10
RU2258253C2 (ru) 2005-08-10
WO2001061514A1 (en) 2001-08-23
CN1401103A (zh) 2003-03-05
TW483035B (en) 2002-04-11
JP3541183B2 (ja) 2004-07-07
US20040186609A1 (en) 2004-09-23
CN1168024C (zh) 2004-09-22
EP1257924A1 (en) 2002-11-20
JP2002015986A (ja) 2002-01-18
RU2002124596A (ru) 2004-02-27
AU2001238036A1 (en) 2001-08-27

Similar Documents

Publication Publication Date Title
IL151166A0 (en) Process monitoring system for lithography lasers
AU2001236702A1 (en) Laser lithography quality alarm system
IL139368A0 (en) Process control for microlithography
EG23914A (en) Process for preparing an antichnolinergic
GB0012465D0 (en) Monitoring method
GB0011251D0 (en) Fault monitoring system
AU2001260985A1 (en) Control technique for microlithography lasers
GB0019454D0 (en) Laser system
EP1304337A4 (en) PROCESS FOR THE PRODUCTION OF CELLULOSE
GB0004142D0 (en) Monitoring system
GB0121417D0 (en) Exposure system
AU2001274137A1 (en) Method for purifying lactams
AU2831501A (en) Method for monitoring an aqueous system
GB0029259D0 (en) Monitoring system
GB0119986D0 (en) Monitoring system
AU2001286245A1 (en) Exposure system, exposure method, and production method for device
GB2372130B (en) Monitoring system
GB0004584D0 (en) Apparatus for controlling a braking system
GB2362980B (en) An alert system
GB0002514D0 (en) Improved monitoring system
GB0105886D0 (en) Monitoring system
GB2364167B (en) Laser system
AU2002210637A1 (en) Highly selective ionic lithography method
TW494719U (en) System for packaging pasture
GB0112116D0 (en) Monitoring system

Legal Events

Date Code Title Description
FF Patent granted
KB Patent renewed
KB Patent renewed
KB Patent renewed
KB Patent renewed