IL133422A0 - Optical device, method of cleaning the same, projection aligner, and method of producing the same - Google Patents
Optical device, method of cleaning the same, projection aligner, and method of producing the sameInfo
- Publication number
- IL133422A0 IL133422A0 IL13342298A IL13342298A IL133422A0 IL 133422 A0 IL133422 A0 IL 133422A0 IL 13342298 A IL13342298 A IL 13342298A IL 13342298 A IL13342298 A IL 13342298A IL 133422 A0 IL133422 A0 IL 133422A0
- Authority
- IL
- Israel
- Prior art keywords
- same
- cleaning
- producing
- optical device
- projection aligner
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0006—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means to keep optical surfaces clean, e.g. by preventing or removing dirt, stains, contamination, condensation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
- G03F7/70891—Temperature
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Toxicology (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15269597 | 1997-06-10 | ||
PCT/JP1998/002536 WO1998057213A1 (fr) | 1997-06-10 | 1998-06-09 | Dispositif optique, son procede de nettoyage, dispositif d'alignement de projection et son procede de fabrication |
Publications (1)
Publication Number | Publication Date |
---|---|
IL133422A0 true IL133422A0 (en) | 2001-04-30 |
Family
ID=15546128
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IL13342298A IL133422A0 (en) | 1997-06-10 | 1998-06-09 | Optical device, method of cleaning the same, projection aligner, and method of producing the same |
Country Status (6)
Country | Link |
---|---|
US (4) | US6288769B1 (xx) |
EP (1) | EP0997761A4 (xx) |
KR (1) | KR100636451B1 (xx) |
AU (1) | AU7552498A (xx) |
IL (1) | IL133422A0 (xx) |
WO (1) | WO1998057213A1 (xx) |
Families Citing this family (71)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
AU8356298A (en) | 1997-07-22 | 1999-02-16 | Nikon Corporation | Projection exposure method, projection aligner, and methods of manufacturing andoptically cleaning the aligner |
WO1999005710A1 (fr) | 1997-07-25 | 1999-02-04 | Nikon Corporation | Aligneur de projection, procede d'exposition a une projection, procede de nettoyage optique et procede de fabrication de dispositifs a semi-conducteurs |
WO1999027568A1 (fr) | 1997-11-21 | 1999-06-03 | Nikon Corporation | Graveur de motifs a projection et procede de sensibilisation a projection |
JPH11224839A (ja) * | 1998-02-04 | 1999-08-17 | Canon Inc | 露光装置とデバイス製造方法、ならびに該露光装置の光学素子クリーニング方法 |
WO1999052130A1 (fr) | 1998-04-07 | 1999-10-14 | Nikon Corporation | Procede d'exposition, appareil d'exposition, son procede de production, dispositif et son procede de fabrication |
US6442182B1 (en) | 1999-02-12 | 2002-08-27 | Lambda Physik Ag | Device for on-line control of output power of vacuum-UV laser |
JP3832984B2 (ja) * | 1998-10-27 | 2006-10-11 | キヤノン株式会社 | 露光装置およびデバイス製造方法 |
US6327290B1 (en) | 1999-02-12 | 2001-12-04 | Lambda Physik Ag | Beam delivery system for molecular fluorine (F2) laser |
US6762412B1 (en) | 1999-05-10 | 2004-07-13 | Nikon Corporation | Optical apparatus, exposure apparatus using the same, and gas introduction method |
WO2001023933A1 (fr) | 1999-09-29 | 2001-04-05 | Nikon Corporation | Systeme optique de projection |
WO2001023935A1 (fr) | 1999-09-29 | 2001-04-05 | Nikon Corporation | Procede et dispositif d'exposition par projection, et systeme optique de projection |
JP3413131B2 (ja) * | 1999-10-04 | 2003-06-03 | キヤノン株式会社 | 光学装置及びデバイス製造方法 |
TW563002B (en) * | 1999-11-05 | 2003-11-21 | Asml Netherlands Bv | Lithographic projection apparatus, method of manufacturing a device using a lithographic projection apparatus, and device manufactured by the method |
JP2001144003A (ja) * | 1999-11-16 | 2001-05-25 | Canon Inc | 露光装置およびデバイス製造方法 |
US6529533B1 (en) | 1999-11-22 | 2003-03-04 | Lambda Physik Ag | Beam parameter monitoring unit for a molecular fluorine (F2) laser |
US6795456B2 (en) | 1999-12-20 | 2004-09-21 | Lambda Physik Ag | 157 nm laser system and method for multi-layer semiconductor failure analysis |
US6496246B1 (en) * | 2000-03-15 | 2002-12-17 | Nikon Corporation | Optical assembly for an exposure apparatus |
US6571057B2 (en) | 2000-03-27 | 2003-05-27 | Nikon Corporation | Optical instrument, gas replacement method and cleaning method of optical instrument, exposure apparatus, exposure method and manufacturing method for devices |
JP3976981B2 (ja) * | 2000-03-30 | 2007-09-19 | キヤノン株式会社 | 露光装置、ガス置換方法、デバイス製造方法 |
JP2001345263A (ja) * | 2000-03-31 | 2001-12-14 | Nikon Corp | 露光装置及び露光方法、並びにデバイス製造方法 |
AU4459701A (en) * | 2000-03-31 | 2001-10-15 | Nikon Corporation | Method and device for holding optical member, optical device, exposure apparatus, and device manufacturing method |
US7508487B2 (en) * | 2000-06-01 | 2009-03-24 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method, and device manufactured thereby |
JP2002134389A (ja) * | 2000-10-23 | 2002-05-10 | Canon Inc | 露光装置 |
WO2002039491A1 (fr) * | 2000-11-10 | 2002-05-16 | Nikon Corporation | Dispositif optique, dispositif d'exposition et leurs procedes de fabrication |
US6589354B2 (en) * | 2001-01-04 | 2003-07-08 | Paul B. Reid | Method and apparatus for in-situ lithography mask cleaning |
EP1223468B1 (en) * | 2001-01-10 | 2008-07-02 | ASML Netherlands B.V. | Lithographic projection apparatus and device manufacturing method |
US6614505B2 (en) | 2001-01-10 | 2003-09-02 | Asml Netherlands B.V. | Lithographic projection apparatus, device manufacturing method, and device manufactured thereby |
JP3619157B2 (ja) * | 2001-02-13 | 2005-02-09 | キヤノン株式会社 | 光学素子、該光学素子を有する露光装置、洗浄装置及び光学素子の洗浄方法 |
US6828569B2 (en) * | 2001-11-19 | 2004-12-07 | Asml Netherlands B.V. | Lithographic projection apparatus, device manufacturing method and device manufactured thereby |
US6724460B2 (en) * | 2001-11-19 | 2004-04-20 | Asml Netherlands B.V. | Lithographic projection apparatus, device manufacturing method, device manufactured thereby, cleaning unit and method of cleaning contaminated objects |
US20030224265A1 (en) * | 2001-12-11 | 2003-12-04 | Uzodinma Okoroanyanwu | System and method for reducing photoresist photo-oxidative degradation in 193 nm photolithography |
EP1329773A3 (en) * | 2002-01-18 | 2006-08-30 | ASML Netherlands B.V. | Lithographic apparatus, apparatus cleaning method, and device manufacturing method |
KR100733128B1 (ko) * | 2002-02-01 | 2007-06-27 | 에이에스엠엘 네델란즈 비.브이. | 리소그래피장치 및 디바이스 제조방법 |
DE10211611A1 (de) * | 2002-03-12 | 2003-09-25 | Zeiss Carl Smt Ag | Verfahren und Vorrichtung zur Dekontamination optischer Oberflächen |
WO2003090265A1 (fr) * | 2002-04-22 | 2003-10-30 | Nikon Corporation | Appareil de support, appareil optique, appareil d'exposition a la lumiere et procede de production d'un dispositif |
US7050149B2 (en) * | 2002-06-11 | 2006-05-23 | Nikon Corporation | Exposure apparatus and exposure method |
DE10239344A1 (de) * | 2002-08-28 | 2004-03-11 | Carl Zeiss Smt Ag | Vorrichtung zum Abdichten einer Projektionsbelichtungsanlage |
DE10253162B4 (de) * | 2002-11-14 | 2005-11-03 | Infineon Technologies Ag | Verfahren zum Spülen einer optischen Linse |
DE10256808B4 (de) * | 2002-12-05 | 2006-06-29 | Carl Zeiss Smt Ag | Projektionsbelichtungsanlage |
US6847431B2 (en) * | 2003-03-10 | 2005-01-25 | Nikon Corporation | Method and device for controlling fluid flow in an optical assembly |
US7184123B2 (en) * | 2004-03-24 | 2007-02-27 | Asml Netherlands B.V. | Lithographic optical system |
US20050223973A1 (en) * | 2004-03-30 | 2005-10-13 | Infineon Technologies Ag | EUV lithography system and chuck for releasing reticle in a vacuum isolated environment |
TWI235410B (en) * | 2004-07-16 | 2005-07-01 | Toppan Chunghwa Electronic Co | Method for cleaning semiconductor device |
US7446849B2 (en) * | 2004-07-22 | 2008-11-04 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
JP2006245400A (ja) * | 2005-03-04 | 2006-09-14 | Canon Inc | 光学装置およびデバイス製造方法。 |
US8317929B2 (en) | 2005-09-16 | 2012-11-27 | Asml Netherlands B.V. | Lithographic apparatus comprising an electrical discharge generator and method for cleaning an element of a lithographic apparatus |
US7522263B2 (en) * | 2005-12-27 | 2009-04-21 | Asml Netherlands B.V. | Lithographic apparatus and method |
US20070146658A1 (en) * | 2005-12-27 | 2007-06-28 | Asml Netherlands B.V. | Lithographic apparatus and method |
US7724351B2 (en) * | 2006-01-30 | 2010-05-25 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method and exchangeable optical element |
US7663747B2 (en) * | 2006-04-27 | 2010-02-16 | Metrosol, Inc. | Contamination monitoring and control techniques for use with an optical metrology instrument |
US7342235B1 (en) * | 2006-04-27 | 2008-03-11 | Metrosol, Inc. | Contamination monitoring and control techniques for use with an optical metrology instrument |
US7622310B2 (en) * | 2006-04-27 | 2009-11-24 | Metrosol, Inc. | Contamination monitoring and control techniques for use with an optical metrology instrument |
JP5305568B2 (ja) * | 2006-05-22 | 2013-10-02 | 株式会社東芝 | 露光装置及びケミカルフィルタ寿命検知方法 |
JP2008016825A (ja) * | 2006-06-09 | 2008-01-24 | Canon Inc | 露光装置、除去方法及びデバイス製造方法 |
DE102006036488A1 (de) * | 2006-08-04 | 2008-02-07 | Carl Zeiss Smt Ag | Optisches System, insbesondere Projektionsobjektiv in der Mikrolithographie |
DE102006044591A1 (de) * | 2006-09-19 | 2008-04-03 | Carl Zeiss Smt Ag | Optische Anordnung, insbesondere Projektionsbelichtungsanlage für die EUV-Lithographie, sowie reflektives optisches Element mit verminderter Kontamination |
JP2008277585A (ja) * | 2007-04-27 | 2008-11-13 | Canon Inc | 露光装置の洗浄装置及び露光装置 |
US20090015806A1 (en) * | 2007-06-04 | 2009-01-15 | Nikon Corporation | Environmental control apparatus, stage apparatus, exposure apparatus and device manufacturing method |
DE102008000957A1 (de) * | 2008-04-03 | 2009-10-08 | Carl Zeiss Smt Ag | Schutzmodul sowie EUV-Lithographievorrichtung mit Schutzmodul |
US8931908B2 (en) * | 2008-07-31 | 2015-01-13 | Fluke Corporation | Air purge collar |
KR101004568B1 (ko) | 2010-08-26 | 2010-12-28 | (주)차바이오앤디오스텍 | 액체 세정이 가능한 렌즈 조립체 및 이를 포함하는 카메라 모듈 |
NL2007498A (en) * | 2010-12-23 | 2012-06-27 | Asml Netherlands Bv | Lithographic apparatus and method of modifying a beam of radiation within a lithographic apparatus. |
KR101986341B1 (ko) * | 2012-03-30 | 2019-06-07 | 삼성전자주식회사 | 양방향 카메라 모듈 및 그를 구비한 플립 칩 본딩 장치 |
WO2014131016A1 (en) * | 2013-02-25 | 2014-08-28 | Kla-Tencor Corporation | Method and system for gas flow mitigation of molecular contamination of optics |
US10307803B2 (en) * | 2016-07-20 | 2019-06-04 | The United States Of America As Represented By Secretary Of The Navy | Transmission window cleanliness for directed energy devices |
KR101944492B1 (ko) * | 2016-07-26 | 2019-02-01 | 에이피시스템 주식회사 | 레이저 장치, 이를 구비하는 레이저 처리설비, 및 이의 오염 방지방법 |
EP3844565B1 (en) * | 2018-08-29 | 2022-08-17 | Merck Patent GmbH | Method and apparatus for filling liquid crystal cells with a medium comprising at least one liquid crystalline material |
US11106140B2 (en) | 2019-07-16 | 2021-08-31 | Taiwan Semiconductor Manufacturing Co., Ltd. | Semiconductor apparatus and method of operating the same |
JP7425661B2 (ja) | 2019-07-25 | 2024-01-31 | キヤノン株式会社 | 光学装置、露光装置及び物品の製造方法 |
EP4170421A1 (en) * | 2021-10-25 | 2023-04-26 | ASML Netherlands B.V. | A cleaning method and associated illumination source metrology apparatus |
WO2022228820A1 (en) * | 2021-04-26 | 2022-11-03 | Asml Netherlands B.V. | A cleaning method and associated illumination source metrology apparatus |
Family Cites Families (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DD160756A3 (de) * | 1981-04-24 | 1984-02-29 | Gudrun Dietz | Anordnung zur verbesserung fotochemischer umsetzungsprozesse in fotoresistschichten |
US4655599A (en) * | 1982-11-15 | 1987-04-07 | Canon Kabushiki Kaisha | Mask aligner having a photo-mask setting device |
US4690528A (en) * | 1983-10-05 | 1987-09-01 | Nippon Kogaku K. K. | Projection exposure apparatus |
JP2516194B2 (ja) * | 1984-06-11 | 1996-07-10 | 株式会社日立製作所 | 投影露光方法 |
US4616908A (en) * | 1984-07-19 | 1986-10-14 | Gca Corporation | Microlithographic system |
JPS6179228A (ja) * | 1984-09-26 | 1986-04-22 | Nippon Kogaku Kk <Nikon> | 投影光学装置 |
US4825247A (en) * | 1987-02-16 | 1989-04-25 | Canon Kabushiki Kaisha | Projection exposure apparatus |
US5821175A (en) * | 1988-07-08 | 1998-10-13 | Cauldron Limited Partnership | Removal of surface contaminants by irradiation using various methods to achieve desired inert gas flow over treated surface |
JPH03154390A (ja) * | 1989-11-13 | 1991-07-02 | Mitsubishi Electric Corp | エキシマレーザ用波長選択装置 |
JPH03155611A (ja) * | 1989-11-14 | 1991-07-03 | Seiko Epson Corp | 極短波超紫外線露光装置 |
JPH05243120A (ja) | 1992-02-28 | 1993-09-21 | Nikon Corp | レーザ光学装置 |
US5430303A (en) * | 1992-07-01 | 1995-07-04 | Nikon Corporation | Exposure apparatus |
US5559584A (en) * | 1993-03-08 | 1996-09-24 | Nikon Corporation | Exposure apparatus |
TW252211B (xx) * | 1993-04-12 | 1995-07-21 | Cauldron Ltd Parthership | |
US5854671A (en) * | 1993-05-28 | 1998-12-29 | Nikon Corporation | Scanning exposure method and apparatus therefor and a projection exposure apparatus and method which selectively chooses between static exposure and scanning exposure |
US5696623A (en) * | 1993-08-05 | 1997-12-09 | Fujitsu Limited | UV exposure with elongated service lifetime |
FR2708757B1 (fr) * | 1993-08-05 | 1997-05-09 | Fujitsu Ltd | Procédé et appareil d'exposition par de la lumière ultraviolette. |
JPH0786152A (ja) * | 1993-09-14 | 1995-03-31 | Nikon Corp | 投影露光装置 |
BE1007851A3 (nl) * | 1993-12-03 | 1995-11-07 | Asml Lithography B V | Belichtingseenheid met een voorziening tegen vervuiling van optische componenten en een fotolithografisch apparaat voorzien van een dergelijke belichtingseenheid. |
BE1007907A3 (nl) * | 1993-12-24 | 1995-11-14 | Asm Lithography Bv | Lenzenstelsel met in gasgevulde houder aangebrachte lenselementen en fotolithografisch apparaat voorzien van een dergelijk stelsel. |
JP3221226B2 (ja) * | 1994-03-30 | 2001-10-22 | キヤノン株式会社 | 照明装置及びそれを用いた投影露光装置 |
EP0676672B1 (en) * | 1994-04-08 | 2003-06-11 | Canon Kabushiki Kaisha | Processing method and apparatus for a resist-coated substrate |
WO1995033594A1 (en) * | 1994-06-06 | 1995-12-14 | Amada Company, Limited | Method and apparatus for supplying gaseous nitrogen to a laser beam machine |
JP2644705B2 (ja) * | 1995-07-17 | 1997-08-25 | キヤノン株式会社 | 素子製造方法及び露光装置 |
US5883704A (en) | 1995-08-07 | 1999-03-16 | Nikon Corporation | Projection exposure apparatus wherein focusing of the apparatus is changed by controlling the temperature of a lens element of the projection optical system |
JPH1054932A (ja) | 1996-08-08 | 1998-02-24 | Nikon Corp | 投影光学装置及びそれを装着した投影露光装置 |
JPH10270333A (ja) * | 1997-03-27 | 1998-10-09 | Nikon Corp | 露光装置 |
US6268904B1 (en) * | 1997-04-23 | 2001-07-31 | Nikon Corporation | Optical exposure apparatus and photo-cleaning method |
-
1998
- 1998-06-09 IL IL13342298A patent/IL133422A0/xx unknown
- 1998-06-09 EP EP98923177A patent/EP0997761A4/en not_active Withdrawn
- 1998-06-09 KR KR1019997011682A patent/KR100636451B1/ko not_active IP Right Cessation
- 1998-06-09 WO PCT/JP1998/002536 patent/WO1998057213A1/ja active IP Right Grant
- 1998-06-09 AU AU75524/98A patent/AU7552498A/en not_active Abandoned
-
1999
- 1999-12-10 US US09/458,807 patent/US6288769B1/en not_active Expired - Lifetime
-
2001
- 2001-08-02 US US09/919,924 patent/US20010055099A1/en not_active Abandoned
-
2002
- 2002-04-10 US US10/119,141 patent/US6671033B2/en not_active Expired - Fee Related
-
2003
- 2003-07-14 US US10/617,762 patent/US20040008328A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
AU7552498A (en) | 1998-12-30 |
US20010055099A1 (en) | 2001-12-27 |
US6671033B2 (en) | 2003-12-30 |
EP0997761A4 (en) | 2000-09-13 |
US20020109826A1 (en) | 2002-08-15 |
KR20010013670A (ko) | 2001-02-26 |
US20040008328A1 (en) | 2004-01-15 |
WO1998057213A1 (fr) | 1998-12-17 |
US6288769B1 (en) | 2001-09-11 |
KR100636451B1 (ko) | 2006-10-18 |
EP0997761A1 (en) | 2000-05-03 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
IL133422A0 (en) | Optical device, method of cleaning the same, projection aligner, and method of producing the same | |
AU8356298A (en) | Projection exposure method, projection aligner, and methods of manufacturing andoptically cleaning the aligner | |
HK1022745A1 (en) | Light-selective prism, projection display apparatus using the same, and method of manufacturing light-selective prism | |
AU1053199A (en) | Exposure apparatus and method of manufacturing the same, and exposure method | |
AU6853598A (en) | Aligner, exposure method using the aligner, and method of manufacture of circuitdevice | |
EP0729044A3 (en) | Substrate for mounting an optical fiber, its manufacturing process and optical component | |
AU6000499A (en) | Alignment method and method for producing device using the alignment method | |
NO975440D0 (no) | Formingsbehandlingsmetode som anvender deformerbare partikler | |
AU1505699A (en) | Projection exposure method and projection aligner | |
AU1175799A (en) | Projection aligner and projection exposure method | |
GR3031759T3 (en) | Toothbrush and the process for its manufacture | |
IL132424A0 (en) | Prescription compliance device and method of using the device | |
EP0675534A3 (en) | SOI substrate and manufacturing method. | |
EP0829739A4 (en) | POLARIZATION BEAM DIVIDER, METHOD FOR ITS PRODUCTION AND PROJECTION DISPLAY | |
AU1435599A (en) | Polymer-nanocrystal photo device and method for making the same | |
AU5447499A (en) | Exposure apparatus and exposure method, and device and method for producing the same | |
AU1176199A (en) | Aligner, exposure method and device manufacturing method | |
AU7933498A (en) | Projection aligner, method of manufacturing the aligner, method of exposure using the aligner, and method of manufacturing circuit devices by using the aligner | |
AU9648198A (en) | Aligner and exposure method | |
AU6659598A (en) | Device and method for framing pictures, certificates and the like | |
EP0726474A3 (en) | Colored contact lens and method for its manufacture | |
EP0663710A3 (en) | Semiconductor optical device and manufacturing method. | |
EP1011007A4 (en) | OPTICAL ELEMENT, OPTICAL CONTROL METHOD AND DEVICE USING THE OPTICAL ELEMENT AND MANUFACTURING METHOD OF THE OPTICAL ELEMENT | |
EP0728700A3 (en) | Alpha-alumina and process for its preparation | |
EP0710540A3 (en) | Optical object, and method and device for the production thereof |