HRP20020100B1 - Method for producing an evaporation source - Google Patents

Method for producing an evaporation source

Info

Publication number
HRP20020100B1
HRP20020100B1 HR20020100A HRP20020100A HRP20020100B1 HR P20020100 B1 HRP20020100 B1 HR P20020100B1 HR 20020100 A HR20020100 A HR 20020100A HR P20020100 A HRP20020100 A HR P20020100A HR P20020100 B1 HRP20020100 B1 HR P20020100B1
Authority
HR
Croatia
Prior art keywords
target
components
producing
return plate
density
Prior art date
Application number
HR20020100A
Other languages
English (en)
Croatian (hr)
Inventor
Wilhartitz Peter
Schoenauer Stefan
Polcik Peter
Original Assignee
Plansee Se
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Plansee Se filed Critical Plansee Se
Publication of HRP20020100A2 publication Critical patent/HRP20020100A2/xx
Publication of HRP20020100B1 publication Critical patent/HRP20020100B1/xx

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F7/00—Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression
    • B22F7/06—Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression of composite workpieces or articles from parts, e.g. to form tipped tools
    • B22F7/08—Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression of composite workpieces or articles from parts, e.g. to form tipped tools with one or more parts not made from powder
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3488—Constructional details of particle beam apparatus not otherwise provided for, e.g. arrangement, mounting, housing, environment; special provisions for cleaning or maintenance of the apparatus
    • H01J37/3491—Manufacturing of targets
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
    • B22F3/12—Both compacting and sintering
    • B22F3/14—Both compacting and sintering simultaneously
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F7/00—Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression
    • B22F7/06—Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression of composite workpieces or articles from parts, e.g. to form tipped tools
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F2999/00—Aspects linked to processes or compositions used in powder metallurgy

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Composite Materials (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Powder Metallurgy (AREA)
  • Laminated Bodies (AREA)
HR20020100A 2000-11-20 2002-02-01 Method for producing an evaporation source HRP20020100B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
AT0085100U AT4240U1 (de) 2000-11-20 2000-11-20 Verfahren zur herstellung einer verdampfungsquelle
PCT/AT2001/000349 WO2002040735A1 (de) 2000-11-20 2001-11-07 Verfahren zur herstellung einer verdampfungsquelle

Publications (2)

Publication Number Publication Date
HRP20020100A2 HRP20020100A2 (en) 2003-12-31
HRP20020100B1 true HRP20020100B1 (en) 2010-11-30

Family

ID=3501235

Family Applications (1)

Application Number Title Priority Date Filing Date
HR20020100A HRP20020100B1 (en) 2000-11-20 2002-02-01 Method for producing an evaporation source

Country Status (21)

Country Link
US (1) US6908588B2 (cs)
EP (1) EP1335995B1 (cs)
JP (1) JP4226900B2 (cs)
KR (1) KR100775140B1 (cs)
CN (1) CN1268780C (cs)
AT (2) AT4240U1 (cs)
AU (1) AU775031B2 (cs)
BG (1) BG64450B1 (cs)
CA (1) CA2375783C (cs)
CZ (1) CZ298911B6 (cs)
DE (1) DE50103914D1 (cs)
DK (1) DK1335995T3 (cs)
ES (1) ES2227293T3 (cs)
HR (1) HRP20020100B1 (cs)
HU (1) HU225577B1 (cs)
MX (1) MXPA02001478A (cs)
MY (1) MY128636A (cs)
PL (1) PL199272B1 (cs)
RS (1) RS49852B (cs)
SI (1) SI1335995T1 (cs)
WO (1) WO2002040735A1 (cs)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100441733C (zh) * 2004-03-30 2008-12-10 株式会社延原表 蒸镀工序用喷嘴蒸发源
CN101052739A (zh) * 2004-11-18 2007-10-10 霍尼韦尔国际公司 形成三维物理汽相沉积靶的方法
DE102004060423B4 (de) * 2004-12-14 2016-10-27 Heraeus Deutschland GmbH & Co. KG Rohrtarget und dessen Verwendung
DE102006003279B4 (de) * 2006-01-23 2010-03-25 W.C. Heraeus Gmbh Sputtertarget mit hochschmelzender Phase
US20070251819A1 (en) * 2006-05-01 2007-11-01 Kardokus Janine K Hollow cathode magnetron sputtering targets and methods of forming hollow cathode magnetron sputtering targets
US8778987B2 (en) * 2007-03-13 2014-07-15 Symrise Ag Use of 4-hydroxychalcone derivatives for masking an unpleasant taste
US8702919B2 (en) * 2007-08-13 2014-04-22 Honeywell International Inc. Target designs and related methods for coupled target assemblies, methods of production and uses thereof
US20100140084A1 (en) * 2008-12-09 2010-06-10 Chi-Fung Lo Method for production of aluminum containing targets
AT12021U1 (de) * 2010-04-14 2011-09-15 Plansee Se Beschichtungsquelle und verfahren zu deren herstellung
EP2723915A1 (en) 2011-06-27 2014-04-30 Soleras Ltd. Sputtering target
US9992917B2 (en) 2014-03-10 2018-06-05 Vulcan GMS 3-D printing method for producing tungsten-based shielding parts
RU2696910C2 (ru) 2014-06-27 2019-08-07 Планзее Композит Материалс Гмбх Распыляемая мишень
AT14497U1 (de) * 2015-01-26 2015-12-15 Plansee Composite Mat Gmbh Beschichtungsquelle
JP6728839B2 (ja) * 2016-03-24 2020-07-22 大同特殊鋼株式会社 プレス成形品の製造方法およびスパッタリングターゲット材

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63169307A (ja) * 1987-01-06 1988-07-13 Tokyo Tungsten Co Ltd Ｗ又はＷ合金／Ｍｏ又はＭｏ合金張り合わせ材料の製造方法
US5656216A (en) * 1994-08-25 1997-08-12 Sony Corporation Method for making metal oxide sputtering targets (barrier powder envelope)
US5863398A (en) * 1996-10-11 1999-01-26 Johnson Matthey Electonics, Inc. Hot pressed and sintered sputtering target assemblies and method for making same
US5963778A (en) * 1997-02-13 1999-10-05 Tosoh Smd, Inc. Method for producing near net shape planar sputtering targets and an intermediate therefor

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Publication number Priority date Publication date Assignee Title
US4126451A (en) * 1977-03-30 1978-11-21 Airco, Inc. Manufacture of plates by powder-metallurgy
JPS60194070A (ja) 1984-03-16 1985-10-02 Tokuyama Soda Co Ltd スパツタリングタ−ゲツト
AT388752B (de) * 1986-04-30 1989-08-25 Plansee Metallwerk Verfahren zur herstellung eines targets fuer die kathodenzerstaeubung
JPH0196068A (ja) * 1987-10-07 1989-04-14 Nippon Chemicon Corp 窒化アルミニウム焼結体の製造方法
JPH0741304B2 (ja) * 1990-03-13 1995-05-10 株式会社神戸製鋼所 高Ａ１含有Ｔｉ合金の熱間押出方法
US5342571A (en) * 1992-02-19 1994-08-30 Tosoh Smd, Inc. Method for producing sputtering target for deposition of titanium, aluminum and nitrogen coatings, sputtering target made thereby, and method of sputtering with said targets
JPH06128738A (ja) * 1992-10-20 1994-05-10 Mitsubishi Kasei Corp スパッタリングターゲットの製造方法
US5397050A (en) * 1993-10-27 1995-03-14 Tosoh Smd, Inc. Method of bonding tungsten titanium sputter targets to titanium plates and target assemblies produced thereby
US6073830A (en) * 1995-04-21 2000-06-13 Praxair S.T. Technology, Inc. Sputter target/backing plate assembly and method of making same
US5836506A (en) * 1995-04-21 1998-11-17 Sony Corporation Sputter target/backing plate assembly and method of making same
FR2756572B1 (fr) 1996-12-04 1999-01-08 Pechiney Aluminium Alliages d'aluminium a temperature de recristallisation elevee utilisee dans les cibles de pulverisation cathodiques
JP3946298B2 (ja) * 1997-03-25 2007-07-18 本田技研工業株式会社 セラミックス−金属傾斜機能材およびその製造方法
US6010583A (en) 1997-09-09 2000-01-04 Sony Corporation Method of making unreacted metal/aluminum sputter target
JPH11106904A (ja) * 1997-09-29 1999-04-20 Riyouka Massey Kk スパッタリングターゲットの製造方法
US6579431B1 (en) * 1998-01-14 2003-06-17 Tosoh Smd, Inc. Diffusion bonding of high purity metals and metal alloys to aluminum backing plates using nickel or nickel alloy interlayers
JPH11200030A (ja) 1998-01-20 1999-07-27 Sumitomo Chem Co Ltd スパッタリングターゲット用バッキングプレート
US6183686B1 (en) * 1998-08-04 2001-02-06 Tosoh Smd, Inc. Sputter target assembly having a metal-matrix-composite backing plate and methods of making same
US6328927B1 (en) * 1998-12-24 2001-12-11 Praxair Technology, Inc. Method of making high-density, high-purity tungsten sputter targets
JP2000273623A (ja) * 1999-03-29 2000-10-03 Japan Energy Corp Ｔｉ−Ａｌ合金スパッタリングターゲット
US6042777A (en) * 1999-08-03 2000-03-28 Sony Corporation Manufacturing of high density intermetallic sputter targets

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63169307A (ja) * 1987-01-06 1988-07-13 Tokyo Tungsten Co Ltd Ｗ又はＷ合金／Ｍｏ又はＭｏ合金張り合わせ材料の製造方法
US5656216A (en) * 1994-08-25 1997-08-12 Sony Corporation Method for making metal oxide sputtering targets (barrier powder envelope)
US5863398A (en) * 1996-10-11 1999-01-26 Johnson Matthey Electonics, Inc. Hot pressed and sintered sputtering target assemblies and method for making same
US5963778A (en) * 1997-02-13 1999-10-05 Tosoh Smd, Inc. Method for producing near net shape planar sputtering targets and an intermediate therefor

Also Published As

Publication number Publication date
US6908588B2 (en) 2005-06-21
YU44502A (sh) 2005-03-15
PL199272B1 (pl) 2008-09-30
HU225577B1 (en) 2007-03-28
CZ298911B6 (cs) 2008-03-12
HUP0301848A2 (en) 2003-09-29
JP4226900B2 (ja) 2009-02-18
EP1335995A1 (de) 2003-08-20
CA2375783C (en) 2007-05-08
HRP20020100A2 (en) 2003-12-31
DK1335995T3 (da) 2005-01-31
JP2004513244A (ja) 2004-04-30
SI1335995T1 (en) 2005-06-30
KR100775140B1 (ko) 2007-11-12
BG64450B1 (en) 2005-02-28
AU1198202A (en) 2002-05-27
CZ2002669A3 (cs) 2002-08-14
PL355115A1 (en) 2004-04-05
DE50103914D1 (de) 2004-11-04
AT4240U1 (de) 2001-04-25
RS49852B (sr) 2008-08-07
MY128636A (en) 2007-02-28
KR20020074145A (ko) 2002-09-28
MXPA02001478A (es) 2002-09-23
ATE278050T1 (de) 2004-10-15
BG106371A (en) 2002-08-30
WO2002040735A1 (de) 2002-05-23
ES2227293T3 (es) 2005-04-01
CA2375783A1 (en) 2002-05-20
US20020155016A1 (en) 2002-10-24
CN1392904A (zh) 2003-01-22
AU775031B2 (en) 2004-07-15
CN1268780C (zh) 2006-08-09
EP1335995B1 (de) 2004-09-29

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Legal Events

Date Code Title Description
A1OB Publication of a patent application
ARAI Request for the grant of a patent on the basis of the submitted results of a substantive examination of a patent application
PNAN Change of the applicant name, address/residence

Owner name: PLANSEE SE, AT

B1PR Patent granted
ODRP Renewal fee for the maintenance of a patent

Payment date: 20121024

Year of fee payment: 12

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Effective date: 20131107