HK1247996A1 - 圖案描繪裝置 - Google Patents
圖案描繪裝置Info
- Publication number
- HK1247996A1 HK1247996A1 HK18107244.9A HK18107244A HK1247996A1 HK 1247996 A1 HK1247996 A1 HK 1247996A1 HK 18107244 A HK18107244 A HK 18107244A HK 1247996 A1 HK1247996 A1 HK 1247996A1
- Authority
- HK
- Hong Kong
- Prior art keywords
- drawing apparatus
- pattern drawing
- pattern
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/24—Curved surfaces
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Multimedia (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Health & Medical Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014075841 | 2014-04-01 | ||
HK18104840.4A HK1245417B (zh) | 2014-04-01 | 2017-04-06 | 基板處理方法和基板處理裝置 |
Publications (1)
Publication Number | Publication Date |
---|---|
HK1247996A1 true HK1247996A1 (zh) | 2018-10-05 |
Family
ID=54240539
Family Applications (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK18104876.1A HK1245420A1 (zh) | 2014-04-01 | 2017-04-06 | 基板處理方法 |
HK18107244.9A HK1247996A1 (zh) | 2014-04-01 | 2017-04-06 | 圖案描繪裝置 |
HK18104840.4A HK1245417B (zh) | 2014-04-01 | 2017-04-06 | 基板處理方法和基板處理裝置 |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK18104876.1A HK1245420A1 (zh) | 2014-04-01 | 2017-04-06 | 基板處理方法 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK18104840.4A HK1245417B (zh) | 2014-04-01 | 2017-04-06 | 基板處理方法和基板處理裝置 |
Country Status (6)
Country | Link |
---|---|
JP (3) | JP6597602B2 (zh) |
KR (2) | KR102430139B1 (zh) |
CN (4) | CN107957660B (zh) |
HK (3) | HK1245420A1 (zh) |
TW (6) | TWI661280B (zh) |
WO (1) | WO2015152218A1 (zh) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102377751B1 (ko) * | 2014-04-01 | 2022-03-24 | 가부시키가이샤 니콘 | 기판 처리 장치, 및 디바이스 제조 방법 |
WO2017073608A1 (ja) * | 2015-10-30 | 2017-05-04 | 株式会社ニコン | 基板処理装置、基板処理装置の調整方法、デバイス製造システム及びデバイス製造方法 |
JP6607002B2 (ja) * | 2015-11-30 | 2019-11-20 | 株式会社ニコン | パターン描画装置 |
JP6690214B2 (ja) * | 2015-12-09 | 2020-04-28 | 株式会社ニコン | パターン描画装置 |
KR102641407B1 (ko) * | 2015-12-17 | 2024-02-28 | 가부시키가이샤 니콘 | 패턴 묘화 장치 |
US11143862B2 (en) | 2016-03-30 | 2021-10-12 | Nikon Corporation | Pattern drawing device, pattern drawing method, and method for manufacturing device |
KR102456403B1 (ko) * | 2016-09-29 | 2022-10-20 | 가부시키가이샤 니콘 | 빔 주사 장치 및 패턴 묘화 장치 |
TWI736621B (zh) * | 2016-10-04 | 2021-08-21 | 日商尼康股份有限公司 | 圖案描繪裝置及圖案描繪方法 |
WO2018164087A1 (ja) * | 2017-03-10 | 2018-09-13 | 株式会社ニコン | パターン描画装置、及びパターン露光装置 |
JP7070581B2 (ja) * | 2017-09-26 | 2022-05-18 | 株式会社ニコン | パターン描画装置 |
JP7136601B2 (ja) * | 2018-06-25 | 2022-09-13 | 川崎重工業株式会社 | 導光装置及びレーザ加工装置 |
JP2020021079A (ja) * | 2019-09-04 | 2020-02-06 | 株式会社ニコン | パターン描画装置 |
JP2020024443A (ja) * | 2019-10-17 | 2020-02-13 | 株式会社ニコン | パターン描画装置 |
KR20220150942A (ko) * | 2020-04-06 | 2022-11-11 | 가부시키가이샤 니콘 | 패턴 형성 장치 및 패턴 형성 방법 |
JP7521988B2 (ja) * | 2020-09-23 | 2024-07-24 | 株式会社Screenホールディングス | 基板位置検出方法、描画方法、基板位置検出装置および描画装置 |
JP7334708B2 (ja) * | 2020-10-20 | 2023-08-29 | 株式会社豊田自動織機 | 自律移動体 |
Family Cites Families (39)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2653782B2 (ja) * | 1986-05-20 | 1997-09-17 | 東芝機械株式会社 | レーザ描画装置 |
JP3140185B2 (ja) * | 1992-07-13 | 2001-03-05 | 富士通株式会社 | 画像形成装置 |
JPH08110488A (ja) * | 1994-10-11 | 1996-04-30 | Canon Inc | 光走査装置 |
JPH10142538A (ja) * | 1996-11-12 | 1998-05-29 | Asahi Optical Co Ltd | マルチヘッド走査光学系を持つレーザ描画装置 |
US6037967A (en) * | 1996-12-18 | 2000-03-14 | Etec Systems, Inc. | Short wavelength pulsed laser scanner |
JP4232130B2 (ja) * | 1998-03-11 | 2009-03-04 | 株式会社ニコン | レーザ装置並びにこのレーザ装置を用いた光照射装置および露光方法 |
JP3945951B2 (ja) * | 1999-01-14 | 2007-07-18 | 日立ビアメカニクス株式会社 | レーザ加工方法およびレーザ加工機 |
JP4375846B2 (ja) * | 1999-09-10 | 2009-12-02 | 古河電気工業株式会社 | レーザ装置 |
JP2001133710A (ja) * | 1999-11-05 | 2001-05-18 | Asahi Optical Co Ltd | マルチヘッド走査光学系を持つレーザ描画装置 |
JP3749083B2 (ja) * | 2000-04-25 | 2006-02-22 | 株式会社ルネサステクノロジ | 電子装置の製造方法 |
JP3945966B2 (ja) * | 2000-07-27 | 2007-07-18 | 株式会社リコー | 画像形成装置 |
JP2002029094A (ja) * | 2000-07-18 | 2002-01-29 | Konica Corp | 画像形成装置 |
JP3656959B2 (ja) * | 2001-05-11 | 2005-06-08 | 大日本スクリーン製造株式会社 | 円筒外面走査装置及び刷版サイズチェック方法 |
CN1613084A (zh) * | 2002-01-08 | 2005-05-04 | 提维股份有限公司 | 电子内容分发与交换系统 |
JP2004086193A (ja) * | 2002-07-05 | 2004-03-18 | Nikon Corp | 光源装置及び光照射装置 |
JP2004146681A (ja) * | 2002-10-25 | 2004-05-20 | Sumitomo Electric Ind Ltd | 光増幅用ファイバ、光増幅装置、光源装置、光治療装置および露光装置 |
JP4351509B2 (ja) * | 2003-09-19 | 2009-10-28 | 株式会社リコー | 回転体の位置制御方法・回転体の位置制御装置・画像形成装置・画像読み取り装置・記録媒体 |
JP2007506136A (ja) * | 2003-09-22 | 2007-03-15 | オーボテック リミテッド | カラーフィルタの直接描画システム及び直接描画方法 |
US20050200929A1 (en) * | 2004-03-15 | 2005-09-15 | Michael Plotkin | Out of plane start of scan |
KR20170016532A (ko) * | 2004-06-09 | 2017-02-13 | 가부시키가이샤 니콘 | 노광 장치 및 디바이스 제조 방법 |
JP2006098719A (ja) * | 2004-09-29 | 2006-04-13 | Fuji Photo Film Co Ltd | 露光装置 |
JP2007298603A (ja) * | 2006-04-28 | 2007-11-15 | Shinko Electric Ind Co Ltd | 描画装置および描画方法 |
JP4853388B2 (ja) * | 2007-06-05 | 2012-01-11 | コニカミノルタビジネステクノロジーズ株式会社 | マルチビーム走査装置及び当該装置を備えた画像形成装置 |
FR2922330A1 (fr) * | 2007-10-15 | 2009-04-17 | Commissariat Energie Atomique | Procede de fabrication d'un masque pour la lithographie haute resolution |
JP5448240B2 (ja) * | 2008-10-10 | 2014-03-19 | 株式会社ニコン | 表示素子の製造装置 |
JP5094678B2 (ja) * | 2008-10-20 | 2012-12-12 | キヤノン株式会社 | 走査光学ユニット及びそれを用いたカラー画像形成装置 |
US8541163B2 (en) * | 2009-06-05 | 2013-09-24 | Nikon Corporation | Transporting method, transporting apparatus, exposure method, and exposure apparatus |
CN102081307B (zh) * | 2009-11-26 | 2013-06-19 | 上海微电子装备有限公司 | 光刻机曝光剂量控制方法 |
KR101948467B1 (ko) * | 2010-02-12 | 2019-02-14 | 가부시키가이샤 니콘 | 기판 처리 장치 및 기판 처리 방법 |
JP5603956B2 (ja) * | 2010-02-23 | 2014-10-08 | エーエスエムエル ネザーランズ ビー.ブイ. | リソグラフィ装置 |
CN201820072U (zh) * | 2010-08-12 | 2011-05-04 | 志圣科技(广州)有限公司 | 双面曝光装置 |
JP6074898B2 (ja) | 2012-03-26 | 2017-02-08 | 株式会社ニコン | 基板処理装置 |
TWI626515B (zh) * | 2012-03-26 | 2018-06-11 | 日商尼康股份有限公司 | 基板處理裝置、處理裝置及元件製造方法 |
CN104380204B (zh) * | 2012-06-21 | 2016-10-19 | 株式会社尼康 | 照明装置、处理装置、及元件制造方法 |
JP6091792B2 (ja) * | 2012-07-26 | 2017-03-08 | 株式会社ミクニ | 電動ポンプ |
JP2014035412A (ja) * | 2012-08-08 | 2014-02-24 | Nikon Corp | 露光装置、およびデバイス製造方法 |
JP6245174B2 (ja) * | 2012-08-28 | 2017-12-13 | 株式会社ニコン | 基板支持装置、及び露光装置 |
JP2014048575A (ja) * | 2012-09-03 | 2014-03-17 | Opcell Co Ltd | 薄膜に多数の微少孔を高速に作成する方法とそれを用いた装置 |
JP6256338B2 (ja) * | 2012-09-14 | 2018-01-10 | 株式会社ニコン | 基板処理装置及びデバイス製造方法 |
-
2015
- 2015-03-27 TW TW107127840A patent/TWI661280B/zh active
- 2015-03-27 TW TW104109884A patent/TWI639064B/zh active
- 2015-03-27 TW TW108114726A patent/TWI684836B/zh active
- 2015-03-27 TW TW107127841A patent/TWI674484B/zh active
- 2015-03-27 TW TW108135217A patent/TWI695235B/zh active
- 2015-03-27 TW TW109101148A patent/TWI709006B/zh active
- 2015-03-31 JP JP2016511920A patent/JP6597602B2/ja active Active
- 2015-03-31 KR KR1020227009101A patent/KR102430139B1/ko active IP Right Grant
- 2015-03-31 CN CN201711205151.0A patent/CN107957660B/zh active Active
- 2015-03-31 CN CN201710536605.6A patent/CN107255913B/zh active Active
- 2015-03-31 CN CN201710536857.9A patent/CN107272353B/zh active Active
- 2015-03-31 KR KR1020167027089A patent/KR102377752B1/ko active IP Right Grant
- 2015-03-31 CN CN201580017855.8A patent/CN106133610B/zh active Active
- 2015-03-31 WO PCT/JP2015/060079 patent/WO2015152218A1/ja active Application Filing
-
2017
- 2017-04-06 HK HK18104876.1A patent/HK1245420A1/zh unknown
- 2017-04-06 HK HK18107244.9A patent/HK1247996A1/zh unknown
- 2017-04-06 HK HK18104840.4A patent/HK1245417B/zh not_active IP Right Cessation
-
2018
- 2018-11-21 JP JP2018218661A patent/JP2019023764A/ja active Pending
-
2019
- 2019-10-01 JP JP2019181541A patent/JP2019215588A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
KR20170002375A (ko) | 2017-01-06 |
WO2015152218A1 (ja) | 2015-10-08 |
TWI695235B (zh) | 2020-06-01 |
CN107957660A (zh) | 2018-04-24 |
JP2019023764A (ja) | 2019-02-14 |
TWI661280B (zh) | 2019-06-01 |
CN107255913B (zh) | 2019-10-11 |
CN107272353A (zh) | 2017-10-20 |
TW201600941A (zh) | 2016-01-01 |
TWI639064B (zh) | 2018-10-21 |
TWI709006B (zh) | 2020-11-01 |
TW202004368A (zh) | 2020-01-16 |
TWI684836B (zh) | 2020-02-11 |
CN107957660B (zh) | 2020-10-23 |
KR102377752B1 (ko) | 2022-03-24 |
TW201842419A (zh) | 2018-12-01 |
HK1245420A1 (zh) | 2018-08-24 |
TW202018436A (zh) | 2020-05-16 |
CN106133610B (zh) | 2017-12-29 |
KR102430139B1 (ko) | 2022-08-08 |
JP2019215588A (ja) | 2019-12-19 |
KR20220038545A (ko) | 2022-03-28 |
CN107272353B (zh) | 2019-06-14 |
TW201842420A (zh) | 2018-12-01 |
CN107255913A (zh) | 2017-10-17 |
TW201932996A (zh) | 2019-08-16 |
TWI674484B (zh) | 2019-10-11 |
JPWO2015152218A1 (ja) | 2017-04-13 |
CN106133610A (zh) | 2016-11-16 |
HK1245417B (zh) | 2020-03-27 |
JP6597602B2 (ja) | 2019-10-30 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
HK1247996A1 (zh) | 圖案描繪裝置 | |
GB201515274D0 (en) | Apparatus | |
GB201412018D0 (en) | [Apparatus | |
AP00706S1 (en) | Spray apparatus | |
HK1225227A1 (zh) | 設備 | |
GB201416729D0 (en) | Apparatus | |
GB201417753D0 (en) | Apparatus | |
GB2534660B (en) | Apparatus | |
GB2531031B (en) | Apparatus | |
SG11201703217PA (en) | Engaging apparatus | |
AU363390S (en) | Nozzle apparatus | |
GB201514334D0 (en) | Apparatus | |
GB2515915B (en) | Apparatus | |
GB201402233D0 (en) | Apparatus | |
SG11201700015WA (en) | Improved apparatus | |
GB201505900D0 (en) | Apparatus | |
GB201502321D0 (en) | Apparatus | |
GB201501570D0 (en) | Apparatus | |
GB2519222B (en) | Apparatus | |
GB201512875D0 (en) | Cellsonic VIPP apparatus | |
GB201509821D0 (en) | Apparatus | |
ZA201502287B (en) | Ironing apparatus | |
GB201508512D0 (en) | Apparatus | |
GB201417943D0 (en) | Apparatus | |
GB201417540D0 (en) | Apparatus |