HK1211540A1 - Production of a volume object by lithography, having improved spatial resolution - Google Patents

Production of a volume object by lithography, having improved spatial resolution

Info

Publication number
HK1211540A1
HK1211540A1 HK15112424.4A HK15112424A HK1211540A1 HK 1211540 A1 HK1211540 A1 HK 1211540A1 HK 15112424 A HK15112424 A HK 15112424A HK 1211540 A1 HK1211540 A1 HK 1211540A1
Authority
HK
Hong Kong
Prior art keywords
lithography
production
spatial resolution
improved spatial
volume object
Prior art date
Application number
HK15112424.4A
Other languages
English (en)
Chinese (zh)
Inventor
Andr-Luc Allanic
Original Assignee
Prodways
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Prodways filed Critical Prodways
Publication of HK1211540A1 publication Critical patent/HK1211540A1/xx

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058Mask illumination systems
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/10Processes of additive manufacturing
    • B29C64/106Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
    • B29C64/124Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified
    • B29C64/129Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0035Multiple processes, e.g. applying a further resist layer on an already in a previously step, processed pattern or textured surface
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037Production of three-dimensional images
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • G03F7/22Exposing sequentially with the same light pattern different positions of the same surface
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/24Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24479Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optical Elements Other Than Lenses (AREA)
HK15112424.4A 2013-01-09 2015-12-17 Production of a volume object by lithography, having improved spatial resolution HK1211540A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR1350177A FR3000698B1 (fr) 2013-01-09 2013-01-09 Fabrication d'un objet en volume par lithographie, a resolution spatiale amelioree
PCT/EP2014/050326 WO2014108473A1 (fr) 2013-01-09 2014-01-09 Fabrication d'un objet en volume par lithographie, a resolution spatiale amelioree

Publications (1)

Publication Number Publication Date
HK1211540A1 true HK1211540A1 (en) 2016-05-27

Family

ID=47833292

Family Applications (1)

Application Number Title Priority Date Filing Date
HK15112424.4A HK1211540A1 (en) 2013-01-09 2015-12-17 Production of a volume object by lithography, having improved spatial resolution

Country Status (13)

Country Link
US (1) US9632420B2 (xx)
EP (1) EP2943329B1 (xx)
KR (1) KR102217967B1 (xx)
CN (1) CN104981339B (xx)
BR (1) BR112015016385A2 (xx)
CA (1) CA2897119A1 (xx)
EA (1) EA030782B1 (xx)
FR (1) FR3000698B1 (xx)
HK (1) HK1211540A1 (xx)
IL (1) IL239835A0 (xx)
MX (1) MX2015008589A (xx)
SG (1) SG11201505400VA (xx)
WO (1) WO2014108473A1 (xx)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10792868B2 (en) 2015-09-09 2020-10-06 Carbon, Inc. Method and apparatus for three-dimensional fabrication
US10151960B2 (en) 2015-09-25 2018-12-11 Microsoft Technology Licensing, Llc Backlight assembly with tunable grating layer for local dimming
US10543645B2 (en) * 2017-09-15 2020-01-28 The Boeing Company Feedstock lines for additive manufacturing of an object
US11420384B2 (en) 2017-10-03 2022-08-23 General Electric Company Selective curing additive manufacturing method
US11351724B2 (en) 2017-10-03 2022-06-07 General Electric Company Selective sintering additive manufacturing method
US20190129308A1 (en) 2017-11-02 2019-05-02 Taiwan Green Point Enterprises Co., Ltd. Digital masking system, pattern imaging apparatus and digital masking method
US11254052B2 (en) 2017-11-02 2022-02-22 General Electric Company Vatless additive manufacturing apparatus and method
US11590691B2 (en) 2017-11-02 2023-02-28 General Electric Company Plate-based additive manufacturing apparatus and method
US10821668B2 (en) 2018-01-26 2020-11-03 General Electric Company Method for producing a component layer-by- layer
US10821669B2 (en) 2018-01-26 2020-11-03 General Electric Company Method for producing a component layer-by-layer
US11794412B2 (en) 2019-02-20 2023-10-24 General Electric Company Method and apparatus for layer thickness control in additive manufacturing
US11498283B2 (en) 2019-02-20 2022-11-15 General Electric Company Method and apparatus for build thickness control in additive manufacturing
EP3930987B1 (en) 2019-02-28 2023-01-25 3D Systems, Inc. High resolution three-dimensional printing system
US11179891B2 (en) 2019-03-15 2021-11-23 General Electric Company Method and apparatus for additive manufacturing with shared components
US11951679B2 (en) 2021-06-16 2024-04-09 General Electric Company Additive manufacturing system
US11731367B2 (en) 2021-06-23 2023-08-22 General Electric Company Drive system for additive manufacturing
US11958249B2 (en) 2021-06-24 2024-04-16 General Electric Company Reclamation system for additive manufacturing
US11958250B2 (en) 2021-06-24 2024-04-16 General Electric Company Reclamation system for additive manufacturing
US11826950B2 (en) 2021-07-09 2023-11-28 General Electric Company Resin management system for additive manufacturing
US11813799B2 (en) 2021-09-01 2023-11-14 General Electric Company Control systems and methods for additive manufacturing

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JPS5994419A (ja) * 1982-11-19 1984-05-31 Canon Inc 分割焼付け装置におけるアライメント方法
US5133987A (en) * 1989-10-27 1992-07-28 3D Systems, Inc. Stereolithographic apparatus and method
JPH04305438A (ja) * 1991-04-02 1992-10-28 Sanyo Electric Co Ltd 光学的立体造形方法
US5247180A (en) * 1991-12-30 1993-09-21 Texas Instruments Incorporated Stereolithographic apparatus and method of use
WO1995015841A1 (fr) * 1992-06-05 1995-06-15 Finab Limited Machine de fabrication d'objets par photopolymerisation selective de liquides ou poudres par couches
JPH07290578A (ja) * 1994-04-26 1995-11-07 Japan Synthetic Rubber Co Ltd 光造形装置
JPH08281810A (ja) * 1995-04-18 1996-10-29 New Kurieishiyon:Kk 光造形装置
JPH09213623A (ja) * 1996-02-02 1997-08-15 Canon Inc 走査露光装置及びそれを用いたデバイスの製造方法
AU2001296428A1 (en) * 2000-09-27 2002-04-08 The Regents Of The University Of California Dynamic mask projection stereo micro lithography
JP3792168B2 (ja) 2002-03-12 2006-07-05 ナブテスコ株式会社 光学的立体造形方法および装置
JP2005268439A (ja) * 2004-03-17 2005-09-29 Tadahiro Omi 等倍x線露光方法及び等倍x線露光装置
US20060147845A1 (en) 2005-01-05 2006-07-06 Flanigan Kyle Y Electrically reconfigurable photolithography mask for semiconductor and micromechanical substrates
JP4713223B2 (ja) * 2005-05-26 2011-06-29 芝浦メカトロニクス株式会社 パターン転写装置及び転写方法
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JP5234315B2 (ja) * 2007-12-03 2013-07-10 ソニー株式会社 光造形装置および光造形方法
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Also Published As

Publication number Publication date
SG11201505400VA (en) 2015-08-28
WO2014108473A1 (fr) 2014-07-17
CA2897119A1 (fr) 2014-07-17
US9632420B2 (en) 2017-04-25
EP2943329A1 (fr) 2015-11-18
EP2943329B1 (fr) 2018-05-16
KR20150118105A (ko) 2015-10-21
IL239835A0 (en) 2015-08-31
MX2015008589A (es) 2016-01-15
KR102217967B1 (ko) 2021-02-19
FR3000698B1 (fr) 2015-02-06
CN104981339A (zh) 2015-10-14
EA201591209A1 (ru) 2015-12-30
CN104981339B (zh) 2017-10-27
US20150355553A1 (en) 2015-12-10
BR112015016385A2 (pt) 2017-07-11
FR3000698A1 (fr) 2014-07-11
EA030782B1 (ru) 2018-09-28

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