MX2015008589A - Produccion de un objeto voluminoso mediante litografia, con resolucion espacial mejorada. - Google Patents
Produccion de un objeto voluminoso mediante litografia, con resolucion espacial mejorada.Info
- Publication number
- MX2015008589A MX2015008589A MX2015008589A MX2015008589A MX2015008589A MX 2015008589 A MX2015008589 A MX 2015008589A MX 2015008589 A MX2015008589 A MX 2015008589A MX 2015008589 A MX2015008589 A MX 2015008589A MX 2015008589 A MX2015008589 A MX 2015008589A
- Authority
- MX
- Mexico
- Prior art keywords
- illuminated
- plane
- lithography
- production
- spatial resolution
- Prior art date
Links
- 238000001459 lithography Methods 0.000 title abstract 2
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 238000006073 displacement reaction Methods 0.000 abstract 2
- 230000001131 transforming effect Effects 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/10—Processes of additive manufacturing
- B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
- B29C64/124—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified
- B29C64/129—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0035—Multiple processes, e.g. applying a further resist layer on an already in a previously step, processed pattern or textured surface
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0037—Production of three-dimensional images
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/22—Exposing sequentially with the same light pattern different positions of the same surface
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Mechanical Engineering (AREA)
- Optics & Photonics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Optical Elements Other Than Lenses (AREA)
Abstract
La presente invención se relaciona con un método para producir un objeto voluminoso mediante litografía, que comprende una proyección de la imagen en proyección en un plano que se va a iluminar (9) de la capa de material, que involucra: - mover la máscara (3) en un movimiento que tiene un componente (15) a lo largo de un eje oblicuo (16) que forma un ángulo (17) con el plano que se va a iluminar (9), y - transformar un movimiento de la máscara (3) con un componente (15) a lo largo del eje oblicuo (16) que forma el ángulo (17) con el plano que se va a iluminar (9) en un desplazamiento de la imagen en proyección (5) en el plano que va a ser iluminado (9) a lo largo de la primera dirección (10) del desplazamiento contenido en el plano que va a ser iluminado (9) por medio de un espejo (6) que refleja la imagen en proyección (5) que viene de la máscara (3) hacia el plano que va a ser iluminado (9).
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1350177A FR3000698B1 (fr) | 2013-01-09 | 2013-01-09 | Fabrication d'un objet en volume par lithographie, a resolution spatiale amelioree |
PCT/EP2014/050326 WO2014108473A1 (fr) | 2013-01-09 | 2014-01-09 | Fabrication d'un objet en volume par lithographie, a resolution spatiale amelioree |
Publications (1)
Publication Number | Publication Date |
---|---|
MX2015008589A true MX2015008589A (es) | 2016-01-15 |
Family
ID=47833292
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MX2015008589A MX2015008589A (es) | 2013-01-09 | 2014-01-09 | Produccion de un objeto voluminoso mediante litografia, con resolucion espacial mejorada. |
Country Status (13)
Country | Link |
---|---|
US (1) | US9632420B2 (es) |
EP (1) | EP2943329B1 (es) |
KR (1) | KR102217967B1 (es) |
CN (1) | CN104981339B (es) |
BR (1) | BR112015016385A2 (es) |
CA (1) | CA2897119A1 (es) |
EA (1) | EA030782B1 (es) |
FR (1) | FR3000698B1 (es) |
HK (1) | HK1211540A1 (es) |
IL (1) | IL239835A0 (es) |
MX (1) | MX2015008589A (es) |
SG (1) | SG11201505400VA (es) |
WO (1) | WO2014108473A1 (es) |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10792868B2 (en) | 2015-09-09 | 2020-10-06 | Carbon, Inc. | Method and apparatus for three-dimensional fabrication |
US10151960B2 (en) | 2015-09-25 | 2018-12-11 | Microsoft Technology Licensing, Llc | Backlight assembly with tunable grating layer for local dimming |
US10543645B2 (en) * | 2017-09-15 | 2020-01-28 | The Boeing Company | Feedstock lines for additive manufacturing of an object |
US11351724B2 (en) | 2017-10-03 | 2022-06-07 | General Electric Company | Selective sintering additive manufacturing method |
US11420384B2 (en) | 2017-10-03 | 2022-08-23 | General Electric Company | Selective curing additive manufacturing method |
US11254052B2 (en) | 2017-11-02 | 2022-02-22 | General Electric Company | Vatless additive manufacturing apparatus and method |
US11590691B2 (en) | 2017-11-02 | 2023-02-28 | General Electric Company | Plate-based additive manufacturing apparatus and method |
US20190129308A1 (en) | 2017-11-02 | 2019-05-02 | Taiwan Green Point Enterprises Co., Ltd. | Digital masking system, pattern imaging apparatus and digital masking method |
US10821669B2 (en) | 2018-01-26 | 2020-11-03 | General Electric Company | Method for producing a component layer-by-layer |
US10821668B2 (en) | 2018-01-26 | 2020-11-03 | General Electric Company | Method for producing a component layer-by- layer |
US11794412B2 (en) | 2019-02-20 | 2023-10-24 | General Electric Company | Method and apparatus for layer thickness control in additive manufacturing |
US11498283B2 (en) | 2019-02-20 | 2022-11-15 | General Electric Company | Method and apparatus for build thickness control in additive manufacturing |
JP7161628B2 (ja) | 2019-02-28 | 2022-10-26 | スリーディー システムズ インコーポレーテッド | 高解像度三次元プリントシステム |
US11179891B2 (en) | 2019-03-15 | 2021-11-23 | General Electric Company | Method and apparatus for additive manufacturing with shared components |
US11951679B2 (en) | 2021-06-16 | 2024-04-09 | General Electric Company | Additive manufacturing system |
US11731367B2 (en) | 2021-06-23 | 2023-08-22 | General Electric Company | Drive system for additive manufacturing |
US11958250B2 (en) | 2021-06-24 | 2024-04-16 | General Electric Company | Reclamation system for additive manufacturing |
US11958249B2 (en) | 2021-06-24 | 2024-04-16 | General Electric Company | Reclamation system for additive manufacturing |
US11826950B2 (en) | 2021-07-09 | 2023-11-28 | General Electric Company | Resin management system for additive manufacturing |
US11813799B2 (en) | 2021-09-01 | 2023-11-14 | General Electric Company | Control systems and methods for additive manufacturing |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5994419A (ja) * | 1982-11-19 | 1984-05-31 | Canon Inc | 分割焼付け装置におけるアライメント方法 |
US5133987A (en) * | 1989-10-27 | 1992-07-28 | 3D Systems, Inc. | Stereolithographic apparatus and method |
JPH04305438A (ja) * | 1991-04-02 | 1992-10-28 | Sanyo Electric Co Ltd | 光学的立体造形方法 |
US5247180A (en) | 1991-12-30 | 1993-09-21 | Texas Instruments Incorporated | Stereolithographic apparatus and method of use |
WO1995015841A1 (fr) * | 1992-06-05 | 1995-06-15 | Finab Limited | Machine de fabrication d'objets par photopolymerisation selective de liquides ou poudres par couches |
JPH07290578A (ja) * | 1994-04-26 | 1995-11-07 | Japan Synthetic Rubber Co Ltd | 光造形装置 |
JPH08281810A (ja) * | 1995-04-18 | 1996-10-29 | New Kurieishiyon:Kk | 光造形装置 |
JPH09213623A (ja) * | 1996-02-02 | 1997-08-15 | Canon Inc | 走査露光装置及びそれを用いたデバイスの製造方法 |
US7088432B2 (en) * | 2000-09-27 | 2006-08-08 | The Regents Of The University Of California | Dynamic mask projection stereo micro lithography |
JP3792168B2 (ja) | 2002-03-12 | 2006-07-05 | ナブテスコ株式会社 | 光学的立体造形方法および装置 |
JP2005268439A (ja) * | 2004-03-17 | 2005-09-29 | Tadahiro Omi | 等倍x線露光方法及び等倍x線露光装置 |
US20060147845A1 (en) * | 2005-01-05 | 2006-07-06 | Flanigan Kyle Y | Electrically reconfigurable photolithography mask for semiconductor and micromechanical substrates |
JP4713223B2 (ja) * | 2005-05-26 | 2011-06-29 | 芝浦メカトロニクス株式会社 | パターン転写装置及び転写方法 |
JP2008225417A (ja) * | 2007-03-16 | 2008-09-25 | Fujitsu Ltd | 構造体の製造方法 |
JP5234315B2 (ja) * | 2007-12-03 | 2013-07-10 | ソニー株式会社 | 光造形装置および光造形方法 |
JP5234319B2 (ja) * | 2008-01-21 | 2013-07-10 | ソニー株式会社 | 光造形装置および光造形方法 |
IT1403482B1 (it) * | 2011-01-18 | 2013-10-17 | Dws Srl | Metodo per la produzione di un oggetto tridimensionale e macchina stereolitografica impiegante tale metodo |
-
2013
- 2013-01-09 FR FR1350177A patent/FR3000698B1/fr active Active
-
2014
- 2014-01-09 WO PCT/EP2014/050326 patent/WO2014108473A1/fr active Application Filing
- 2014-01-09 MX MX2015008589A patent/MX2015008589A/es unknown
- 2014-01-09 KR KR1020157019324A patent/KR102217967B1/ko active IP Right Grant
- 2014-01-09 BR BR112015016385A patent/BR112015016385A2/pt not_active IP Right Cessation
- 2014-01-09 EA EA201591209A patent/EA030782B1/ru not_active IP Right Cessation
- 2014-01-09 US US14/759,796 patent/US9632420B2/en active Active
- 2014-01-09 CN CN201480004293.9A patent/CN104981339B/zh active Active
- 2014-01-09 CA CA2897119A patent/CA2897119A1/fr not_active Abandoned
- 2014-01-09 SG SG11201505400VA patent/SG11201505400VA/en unknown
- 2014-01-09 EP EP14700275.2A patent/EP2943329B1/fr active Active
-
2015
- 2015-07-08 IL IL239835A patent/IL239835A0/en unknown
- 2015-12-17 HK HK15112424.4A patent/HK1211540A1/xx unknown
Also Published As
Publication number | Publication date |
---|---|
BR112015016385A2 (pt) | 2017-07-11 |
IL239835A0 (en) | 2015-08-31 |
US9632420B2 (en) | 2017-04-25 |
CN104981339B (zh) | 2017-10-27 |
KR102217967B1 (ko) | 2021-02-19 |
EP2943329B1 (fr) | 2018-05-16 |
FR3000698A1 (fr) | 2014-07-11 |
CN104981339A (zh) | 2015-10-14 |
HK1211540A1 (en) | 2016-05-27 |
EA201591209A1 (ru) | 2015-12-30 |
EP2943329A1 (fr) | 2015-11-18 |
US20150355553A1 (en) | 2015-12-10 |
SG11201505400VA (en) | 2015-08-28 |
KR20150118105A (ko) | 2015-10-21 |
FR3000698B1 (fr) | 2015-02-06 |
EA030782B1 (ru) | 2018-09-28 |
CA2897119A1 (fr) | 2014-07-17 |
WO2014108473A1 (fr) | 2014-07-17 |
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