HK1028128A1 - Device for drying substrates - Google Patents

Device for drying substrates

Info

Publication number
HK1028128A1
HK1028128A1 HK00107246A HK00107246A HK1028128A1 HK 1028128 A1 HK1028128 A1 HK 1028128A1 HK 00107246 A HK00107246 A HK 00107246A HK 00107246 A HK00107246 A HK 00107246A HK 1028128 A1 HK1028128 A1 HK 1028128A1
Authority
HK
Hong Kong
Prior art keywords
glass plate
substrate disk
substrate
drying
lowering
Prior art date
Application number
HK00107246A
Other languages
English (en)
Inventor
Klaus Weber
Ulrich Speer
Original Assignee
Steag Hamatech Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Steag Hamatech Ag filed Critical Steag Hamatech Ag
Publication of HK1028128A1 publication Critical patent/HK1028128A1/xx

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26Apparatus or processes specially adapted for the manufacture of record carriers
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26DRYING
    • F26BDRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B15/00Machines or apparatus for drying objects with progressive movement; Machines or apparatus with progressive movement for drying batches of material in compact form
    • F26B15/02Machines or apparatus for drying objects with progressive movement; Machines or apparatus with progressive movement for drying batches of material in compact form with movement in the whole or part of a circle
    • F26B15/04Machines or apparatus for drying objects with progressive movement; Machines or apparatus with progressive movement for drying batches of material in compact form with movement in the whole or part of a circle in a horizontal plane
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26DRYING
    • F26BDRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B3/00Drying solid materials or objects by processes involving the application of heat
    • F26B3/28Drying solid materials or objects by processes involving the application of heat by radiation, e.g. from the sun

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Microbiology (AREA)
  • Drying Of Solid Materials (AREA)
  • Manufacturing Optical Record Carriers (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
HK00107246A 1997-05-23 2000-11-14 Device for drying substrates HK1028128A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19721689A DE19721689C2 (de) 1997-05-23 1997-05-23 Vorrichtung zum Trocknen von Substraten
PCT/EP1998/002851 WO1998053452A1 (de) 1997-05-23 1998-05-14 Vorrichtung zum trocknen von substraten

Publications (1)

Publication Number Publication Date
HK1028128A1 true HK1028128A1 (en) 2001-02-02

Family

ID=7830331

Family Applications (1)

Application Number Title Priority Date Filing Date
HK00107246A HK1028128A1 (en) 1997-05-23 2000-11-14 Device for drying substrates

Country Status (14)

Country Link
US (1) US6170169B1 (zh)
EP (1) EP0983590B1 (zh)
JP (1) JP3283533B2 (zh)
KR (1) KR100328602B1 (zh)
CN (1) CN1143290C (zh)
AT (1) ATE206554T1 (zh)
CA (1) CA2288124C (zh)
DE (2) DE19721689C2 (zh)
DK (1) DK0983590T3 (zh)
ES (1) ES2165173T3 (zh)
HK (1) HK1028128A1 (zh)
IL (1) IL132707A (zh)
TW (1) TW438664B (zh)
WO (1) WO1998053452A1 (zh)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19818478A1 (de) 1998-04-24 1999-11-04 Steag Hama Tech Ag Vorrichtung zum Fixieren von Substraten
DE29816588U1 (de) 1998-09-16 1998-12-24 Leybold Systems GmbH, 63450 Hanau Vorrichtung zum Trocknen von mit Lack überzogenen Substraten, beispielsweise für schutzlackierte Compact Disks innerhalb einer Fertigungslinie
US20050160616A1 (en) * 2002-07-13 2005-07-28 Krauss-Maffei Kunststofftechnik Gmbh Multi-format spindle transport device for transporting and cooling flat substrates
DE10231767C1 (de) * 2002-07-13 2003-08-14 Krauss Maffei Kunststofftech Multiformat-Spindeltransportvorrichtung für Transport und Kühlung von flachen Substraten
WO2004039568A2 (en) * 2002-10-29 2004-05-13 4M Technologies Holding Device and method for the production of optical discs
KR101288758B1 (ko) 2004-12-30 2013-07-23 포세온 테크날러지 인코퍼레이티드 산업 공정에서 광원을 사용하는 시스템 및 방법
JP4519037B2 (ja) * 2005-08-31 2010-08-04 東京エレクトロン株式会社 加熱装置及び塗布、現像装置
JP2011135009A (ja) * 2009-12-25 2011-07-07 Tokyo Electron Ltd 基板乾燥装置及び基板乾燥方法
KR101860631B1 (ko) * 2015-04-30 2018-05-23 시바우라 메카트로닉스 가부시끼가이샤 기판 처리 장치 및 기판 처리 방법

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4005135A (en) * 1975-04-07 1977-01-25 Sun Chemical Corporation Rotatable ultraviolet lamp reflector and heat sink
JPS5824235A (ja) 1981-08-05 1983-02-14 Fuji Xerox Co Ltd 設定時間可変crタイマ
JPS5842435A (ja) * 1981-09-04 1983-03-11 Matsushita Electric Ind Co Ltd 信号記録担体の製造法
NL8702493A (nl) * 1986-10-31 1988-05-16 Seiko Epson Corp Optisch opnamemedium en werkwijze voor het vervaardigen daarvan.
US5249255A (en) * 1990-10-03 1993-09-28 Wisconsin Automated Machinery Corporation Resin curing apparatus and method utilizing infrared lamp and blower control means
DE4041199A1 (de) 1990-12-21 1992-07-09 Hamatech Halbleiter Maschinenb Verfahren und vorrichtung zum verkleben von zwei miteinander zu verbindenden, informationen tragenden scheiben oder dergleichen
US5565034A (en) * 1993-10-29 1996-10-15 Tokyo Electron Limited Apparatus for processing substrates having a film formed on a surface of the substrate
US5518542A (en) * 1993-11-05 1996-05-21 Tokyo Electron Limited Double-sided substrate cleaning apparatus
JPH09193249A (ja) * 1995-08-15 1997-07-29 Dainippon Ink & Chem Inc ディスクの貼り合わせ方法及び装置
US5775000A (en) * 1996-05-13 1998-07-07 Ebara Corporation Substrate gripper device for spin drying
AT408287B (de) * 1996-10-01 2001-10-25 Sez Semiconduct Equip Zubehoer Verfahren und vorrichtung zum trocknen von scheibenförmigen substraten der halbleitertechnik
DE19718471A1 (de) 1997-04-30 1998-11-05 Steag Hamatech Gmbh Machines Verfahren und Vorrichtung zum Verkleben von zwei Substraten

Also Published As

Publication number Publication date
JP2000512060A (ja) 2000-09-12
KR100328602B1 (ko) 2002-03-15
CA2288124A1 (en) 1998-11-26
WO1998053452A1 (de) 1998-11-26
JP3283533B2 (ja) 2002-05-20
WO1998053452A9 (de) 1999-04-01
ES2165173T3 (es) 2002-03-01
DE59801646D1 (de) 2001-11-08
KR20010012524A (ko) 2001-02-15
IL132707A (en) 2004-06-01
ATE206554T1 (de) 2001-10-15
US6170169B1 (en) 2001-01-09
TW438664B (en) 2001-06-07
EP0983590B1 (de) 2001-10-04
DE19721689A1 (de) 1998-11-26
IL132707A0 (en) 2001-03-19
DE19721689C2 (de) 1999-06-10
EP0983590A1 (de) 2000-03-08
DK0983590T3 (da) 2002-01-28
CA2288124C (en) 2002-09-17
CN1143290C (zh) 2004-03-24
CN1257601A (zh) 2000-06-21

Similar Documents

Publication Publication Date Title
HK1028128A1 (en) Device for drying substrates
ATE186857T1 (de) Vorrichtung zum härten einer schicht auf einem substrat
EP0886305A3 (de) Verfahren und Vorrichtung zum Handhaben von scheibenförmigen Gegenständen, insbesondere Silizium-Wafer
DE59300562D1 (de) Vorrichtung zum Ein- und Ausschleusen scheibenförmiger Substrate.
WO1999025904A8 (en) Electric potential shaping apparatus for holding a semiconductor wafer during electroplating
WO2001039897A3 (de) Lichthärtung von strahlungshärtbaren massen unter schutzgas
EP1235257A4 (en) APPARATUS FOR THE PROCESSING OF SEMICONDUCTORS
KR900018937A (ko) 광 디스크 제조장치
AU2001292072A1 (en) Disc holding apparatus
EP1284201A3 (en) Coating apparatus and coating method of liquid for protection of recorded product, and protection process of recorded product
ID16828A (id) Alat untuk pelayanan basah lapisan-lapisan bawah
WO1998054227A3 (en) Device for curing an adhesive between two layers of an information carrier
EP0962301A3 (en) Method of manufacturing optical discs
EP0378782A3 (en) Ion implantation apparatus for uniformly injecting an ion beam into a substrate
TW351708B (en) Method and apparatus for treating substrate
JPH0779098A (ja) プリント基板支持装置
DK0846032T3 (da) Apparat til spin-coating af CD
DE68911378D1 (de) Vorrichtung zur Leimung von Stützplatten auf Glassubstraten.
DE59000789D1 (de) Vorrichtung zum beschichten von abstandhalterrahmen.
ATE221252T1 (de) Vorrichtung zum behandeln von substraten
US20020100559A1 (en) Production method of and production apparatus for optical recording disc
JPS61150322A (ja) 気相成長装置
JPS56144444A (en) Developing method
JPH0778751A (ja) 基板処理装置
EP1227005A3 (de) Kennzeichnungsträger

Legal Events

Date Code Title Description
PF Patent in force