HK1007319A1 - Polyether-ester amide and permanently antistatic resin composition - Google Patents

Polyether-ester amide and permanently antistatic resin composition

Info

Publication number
HK1007319A1
HK1007319A1 HK98106553A HK98106553A HK1007319A1 HK 1007319 A1 HK1007319 A1 HK 1007319A1 HK 98106553 A HK98106553 A HK 98106553A HK 98106553 A HK98106553 A HK 98106553A HK 1007319 A1 HK1007319 A1 HK 1007319A1
Authority
HK
Hong Kong
Prior art keywords
polyether
resin composition
ester amide
antistatic resin
permanently antistatic
Prior art date
Application number
HK98106553A
Other languages
English (en)
Inventor
Tadao Fukumoto
Kazuhisa Yano
Masatoshi Iwamoto
Original Assignee
Toray Industries
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Industries filed Critical Toray Industries
Publication of HK1007319A1 publication Critical patent/HK1007319A1/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L51/00—Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
    • C08L51/04—Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers grafted on to rubbers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G69/00—Macromolecular compounds obtained by reactions forming a carboxylic amide link in the main chain of the macromolecule
    • C08G69/44—Polyester-amides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L77/00—Compositions of polyamides obtained by reactions forming a carboxylic amide link in the main chain; Compositions of derivatives of such polymers
    • C08L77/12—Polyester-amides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2201/00—Properties
    • C08L2201/04—Antistatic

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polyamides (AREA)
  • Epoxy Resins (AREA)
HK98106553A 1987-08-13 1998-06-25 Polyether-ester amide and permanently antistatic resin composition HK1007319A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP20212287 1987-08-13
JP20212387 1987-08-13

Publications (1)

Publication Number Publication Date
HK1007319A1 true HK1007319A1 (en) 1999-04-09

Family

ID=26513196

Family Applications (1)

Application Number Title Priority Date Filing Date
HK98106553A HK1007319A1 (en) 1987-08-13 1998-06-25 Polyether-ester amide and permanently antistatic resin composition

Country Status (8)

Country Link
US (1) US5096995A (xx)
EP (1) EP0303489B1 (xx)
JP (1) JPH01144417A (xx)
KR (2) KR970004933B1 (xx)
CA (1) CA1302623C (xx)
DE (1) DE3853180T2 (xx)
ES (1) ES2070853T3 (xx)
HK (1) HK1007319A1 (xx)

Families Citing this family (39)

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US5574104A (en) * 1990-01-05 1996-11-12 The B. F. Goodrich Company Chain extended low molecular weight polyoxiranes and electrostatic dissipating blend compositions based thereon
CA2073171C (en) * 1990-01-05 2002-10-29 Francis Ryan Sullivan Chain extended low molecular weight polyoxiranes for electrostatic applications
EP0459862B1 (fr) * 1990-06-01 1997-07-30 Elf Atochem S.A. Compositions d 'élastomères thermoplastiques à base de polyamide et de polyoléfines modifiées, pièces moulées ou extrudées, films et matériaux composites obtenus à partir desdites compositions
US5272206A (en) * 1990-06-18 1993-12-21 General Electric Company Vulcanized blends of thermoplastic elastomers and EPDM rubber and method for making
US5489667A (en) * 1991-03-20 1996-02-06 Atochem Deutschland Gmbh Polyetheresteramides and process for making and using the same
US5298558A (en) * 1991-06-25 1994-03-29 The Geon Company Electrostatic dissipative blends of PVC, polyetheramides and an impact modifier
US5652326A (en) * 1993-03-03 1997-07-29 Sanyo Chemical Industries, Ltd. Polyetheresteramide and antistatic resin composition
US6284839B1 (en) 1995-12-29 2001-09-04 The B.F. Goodrich Company Blends of thermoplastic polymers, electrostatic dissipative polymers and electrostatic dissipative enhancers
JP3283743B2 (ja) * 1996-01-11 2002-05-20 帝人株式会社 シリコンウェーハーキャリア
JP3051344B2 (ja) * 1996-09-11 2000-06-12 本田技研工業株式会社 静電塗装性付与兼塗膜の耐水密着性改良剤及び樹脂成形品
JP3546614B2 (ja) * 1996-10-07 2004-07-28 ソニー株式会社 ディスクカートリッジ
EP1881034A1 (en) 1997-04-04 2008-01-23 Teijin Limited Silicon wafer carrier
WO1998045879A1 (fr) * 1997-04-04 1998-10-15 Teijin Limited Support de plaquette de silicium
JPH11199773A (ja) * 1997-12-24 1999-07-27 E I Du Pont De Nemours & Co 帯電防止ポリマー組成物およびその成形品
KR20000075607A (ko) * 1997-12-24 2000-12-26 엘프 아토켐 소시에떼아노님 폴리아미드 블록 및 친수성 블록 공중합체로 피복된 물질로 이루어진 다층 구조물
JPH11240995A (ja) * 1998-02-24 1999-09-07 Techno Polymer Kk 熱可塑性樹脂組成物
DE69829415T2 (de) * 1998-06-12 2006-04-13 Nippon A&L Inc. Formkörper
EP0985704B1 (en) * 1998-09-11 2003-11-05 Mitsui Chemicals, Inc. Nitrile resin composition
JP4054151B2 (ja) * 1999-01-18 2008-02-27 日本ポリペンコ株式会社 帯電防止性ポリエステルアミド樹脂成形体
US6673873B1 (en) 1999-08-25 2004-01-06 Cyro Industries Electrostatic-dissipative multipolymer compositions
AU7298700A (en) * 1999-09-09 2001-04-10 Atofina Antistatic acrylic polymer compositions
SA01220282B1 (ar) 2000-08-29 2006-12-05 سيبا سبشيالتي كيميكالز هولدينج انك طرية لتقليل ترسب الاتربة على اشرطة films بولي اوليفين polyolefin
EP1184416A1 (en) * 2000-08-29 2002-03-06 Ciba SC Holding AG Method for reducing dust deposition on polyolefin films
KR100851693B1 (ko) * 2000-10-04 2008-08-11 미쓰비시 쥬시 가부시끼가이샤 수지 조성물, 압출 성형체 및 대전 방지성 시트
DK1354083T3 (da) 2000-12-06 2006-06-06 Ciba Sc Holding Ag Indfarvningsegnede polyolefinfibre og -tekstiler
AU2003303752A1 (en) * 2003-01-24 2004-08-13 Ciba Specialty Chemicals Holding Inc. Antistatic composition
US7723418B2 (en) * 2003-08-29 2010-05-25 Sanyo Chemical Industries, Ltd. Antistatic resin composition
JP2005097598A (ja) * 2003-08-29 2005-04-14 Sanyo Chem Ind Ltd 帯電防止性樹脂組成物
WO2005097905A1 (ja) * 2004-03-31 2005-10-20 Techno Polymer Co., Ltd. 熱可塑性樹脂組成物及び樹脂成形体
KR101319781B1 (ko) * 2005-08-25 2013-10-17 테크노 폴리머 가부시키가이샤 고무 강화 수지, 제전성 수지 조성물, 성형체 및 적층체
EP2022810B1 (de) 2007-07-25 2012-04-04 Ems-Patent Ag Transparente Polyamid-Elastomere
US20120196992A1 (en) 2009-09-23 2012-08-02 Basf Se Synergistic antistatic compositions
US20110152808A1 (en) 2009-12-21 2011-06-23 Jackson David M Resilient absorbent coform nonwoven web
US9260808B2 (en) 2009-12-21 2016-02-16 Kimberly-Clark Worldwide, Inc. Flexible coform nonwoven web
JP5742076B2 (ja) * 2010-01-07 2015-07-01 テクノポリマー株式会社 透明熱可塑性樹脂組成物および樹脂成形品
WO2014062601A1 (en) * 2012-10-16 2014-04-24 Arkema France Impact resistant transparent thermoplastic compositions
CN104479127B (zh) * 2014-12-12 2016-10-19 东华大学 一种己内酰胺水解聚合物及其水解聚合方法
WO2017040388A1 (en) 2015-08-28 2017-03-09 E.I. Du Pont De Nemours And Company Multilayer bottles with reduced permanent static effect for cosmetic packaging
US11052549B2 (en) 2015-12-10 2021-07-06 Milwaukee Electric Tool Corporation Knife

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4182842A (en) * 1977-08-08 1980-01-08 Eastman Kodak Company Poly(ester-amides)prepared from an aromatic dicarboxylic acid, ethylene glycol and a p-acylaminobenzoic acid
JPS6023435A (ja) * 1983-07-19 1985-02-06 Toray Ind Inc 制電性樹脂組成物
JPS6110411A (ja) * 1984-06-19 1986-01-17 Daicel Chem Ind Ltd 樹脂組成物
JPS6173765A (ja) * 1984-09-19 1986-04-15 Toray Ind Inc ポリエ−テルエステルアミド樹脂組成物
DE3542855A1 (de) * 1985-12-04 1987-06-11 Basf Ag Vollaromatische mesomorphe polyesteramide, deren herstellung und verwendung
FR2591607B1 (fr) * 1985-12-16 1988-03-18 Atochem Compositions thermoplastiques a base de polyetheramides et de copolymeres styrene-diene et leur procede de fabrication.

Also Published As

Publication number Publication date
DE3853180T2 (de) 1995-08-17
US5096995A (en) 1992-03-17
KR970009429B1 (en) 1997-06-13
JPH01144417A (ja) 1989-06-06
CA1302623C (en) 1992-06-02
ES2070853T3 (es) 1995-06-16
DE3853180D1 (de) 1995-04-06
JPH0585571B2 (xx) 1993-12-08
KR970004933B1 (ko) 1997-04-10
EP0303489A2 (en) 1989-02-15
EP0303489A3 (en) 1990-10-31
KR890003837A (ko) 1989-04-18
EP0303489B1 (en) 1995-03-01

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)