HK1005457A1 - Anionically polymerizable monomers polymers thereof and use of such polymers in photoresists - Google Patents

Anionically polymerizable monomers polymers thereof and use of such polymers in photoresists

Info

Publication number
HK1005457A1
HK1005457A1 HK98104514A HK98104514A HK1005457A1 HK 1005457 A1 HK1005457 A1 HK 1005457A1 HK 98104514 A HK98104514 A HK 98104514A HK 98104514 A HK98104514 A HK 98104514A HK 1005457 A1 HK1005457 A1 HK 1005457A1
Authority
HK
Hong Kong
Prior art keywords
polymers
image
monomers
photoresists
polymerizable monomers
Prior art date
Application number
HK98104514A
Other languages
English (en)
Inventor
John G Woods
Pauline Coakley
Original Assignee
Loctite Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Loctite Corp filed Critical Loctite Corp
Publication of HK1005457A1 publication Critical patent/HK1005457A1/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G03F7/0758—Macromolecular compounds containing Si-O, Si-C or Si-N bonds with silicon- containing groups in the side chains
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/0803—Compounds with Si-C or Si-Si linkages
    • C07F7/081—Compounds with Si-C or Si-Si linkages comprising at least one atom selected from the elements N, O, halogen, S, Se or Te
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/0834—Compounds having one or more O-Si linkage
    • C07F7/0838—Compounds with one or more Si-O-Si sequences
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
    • C07F7/1804—Compounds having Si-O-C linkages
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/28—Titanium compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F30/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal
    • C08F30/04—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymers & Plastics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Dental Preparations (AREA)
  • Polymerisation Methods In General (AREA)
  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
HK98104514A 1989-11-21 1998-05-26 Anionically polymerizable monomers polymers thereof and use of such polymers in photoresists HK1005457A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
IE371389 1989-11-21
US54246490A 1990-06-22 1990-06-22
PCT/US1990/006832 WO1991007446A1 (fr) 1989-11-21 1990-11-20 Monomeres a polarisation anionique, leurs polymeres et emploi desdits polymeres dans des agents de reserve

Publications (1)

Publication Number Publication Date
HK1005457A1 true HK1005457A1 (en) 1999-01-08

Family

ID=26319352

Family Applications (1)

Application Number Title Priority Date Filing Date
HK98104514A HK1005457A1 (en) 1989-11-21 1998-05-26 Anionically polymerizable monomers polymers thereof and use of such polymers in photoresists

Country Status (9)

Country Link
US (1) US5359101A (fr)
EP (1) EP0502128B1 (fr)
JP (1) JPH05504366A (fr)
AT (1) ATE132510T1 (fr)
CA (1) CA2019669A1 (fr)
DE (1) DE69024661T2 (fr)
ES (1) ES2082191T3 (fr)
HK (1) HK1005457A1 (fr)
WO (1) WO1991007446A1 (fr)

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US6673192B1 (en) 1997-09-25 2004-01-06 Loctite Corporation Multi-amine compound primers for bonding of polyolefins with cyanoacrylate adhesives
KR100363642B1 (ko) * 1999-11-11 2002-12-05 아남반도체 주식회사 반도체 소자의 접촉부 형성 방법
US6245933B1 (en) 1999-11-19 2001-06-12 Closure Medical Corporation Transesterification method for making cyanoacrylates
US7341716B2 (en) * 2002-04-12 2008-03-11 Boston Scientific Scimed, Inc. Occlusive composition
KR100840114B1 (ko) 2005-10-20 2008-06-19 주식회사 엘지화학 점착제 조성물
WO2007046646A1 (fr) * 2005-10-20 2007-04-26 Lg Chem, Ltd. Compose de silane organique
US7867688B2 (en) * 2006-05-30 2011-01-11 Eastman Kodak Company Laser ablation resist
US7745101B2 (en) * 2006-06-02 2010-06-29 Eastman Kodak Company Nanoparticle patterning process
US8686105B2 (en) * 2007-10-24 2014-04-01 Henkel IP & Holding GmbH Adhesive systems using imines and salts thereof, precursors to electron deficient olefins and coreactants therefor
WO2009053484A2 (fr) 2007-10-24 2009-04-30 Loctite (R & D) Limited Oléfines déficientes en électrons
US20100086735A1 (en) * 2008-10-03 2010-04-08 The United States Of America As Represented By The Secretary Of The Navy Patterned Functionalization of Nanomechanical Resonators for Chemical Sensing
US10196471B1 (en) 2008-10-24 2019-02-05 Henkel IP & Holding GmbH Curable composition having an electron deficient olefin
WO2015035066A1 (fr) 2013-09-04 2015-03-12 President And Fellows Of Harvard College Croissance de films par l'intermédiaire de phases liquide/vapeur séquentielles
EP3144072A1 (fr) * 2015-09-17 2017-03-22 Henkel AG & Co. KGaA Distributeur, kit et procédé pour appliquer un activateur pour un composant durcissable à base de cyanoacrylate

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Also Published As

Publication number Publication date
DE69024661T2 (de) 1996-08-01
CA2019669A1 (fr) 1991-05-21
ES2082191T3 (es) 1996-03-16
EP0502128A4 (fr) 1992-04-02
EP0502128B1 (fr) 1996-01-03
US5359101A (en) 1994-10-25
EP0502128A1 (fr) 1992-09-09
ATE132510T1 (de) 1996-01-15
DE69024661D1 (de) 1996-02-15
WO1991007446A1 (fr) 1991-05-30
JPH05504366A (ja) 1993-07-08

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)