ATE132510T1 - Anionisch polymerisierbare monomere, daraus hergestellte polymere und die verwendung der polymere in photowiderständen - Google Patents

Anionisch polymerisierbare monomere, daraus hergestellte polymere und die verwendung der polymere in photowiderständen

Info

Publication number
ATE132510T1
ATE132510T1 AT91902819T AT91902819T ATE132510T1 AT E132510 T1 ATE132510 T1 AT E132510T1 AT 91902819 T AT91902819 T AT 91902819T AT 91902819 T AT91902819 T AT 91902819T AT E132510 T1 ATE132510 T1 AT E132510T1
Authority
AT
Austria
Prior art keywords
polymers
image
monomers
polymerizable monomers
photoresistors
Prior art date
Application number
AT91902819T
Other languages
English (en)
Inventor
John G Woods
Pauline Coakley
Original Assignee
Loctite Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Loctite Corp filed Critical Loctite Corp
Application granted granted Critical
Publication of ATE132510T1 publication Critical patent/ATE132510T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G03F7/0758—Macromolecular compounds containing Si-O, Si-C or Si-N bonds with silicon- containing groups in the side chains
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/0803—Compounds with Si-C or Si-Si linkages
    • C07F7/081—Compounds with Si-C or Si-Si linkages comprising at least one atom selected from the elements N, O, halogen, S, Se or Te
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/0834—Compounds having one or more O-Si linkage
    • C07F7/0838—Compounds with one or more Si-O-Si sequences
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
    • C07F7/1804—Compounds having Si-O-C linkages
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/28—Titanium compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F30/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal
    • C08F30/04—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Dental Preparations (AREA)
  • Polymerisation Methods In General (AREA)
  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
AT91902819T 1989-11-21 1990-11-20 Anionisch polymerisierbare monomere, daraus hergestellte polymere und die verwendung der polymere in photowiderständen ATE132510T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
IE371389 1989-11-21
US54246490A 1990-06-22 1990-06-22

Publications (1)

Publication Number Publication Date
ATE132510T1 true ATE132510T1 (de) 1996-01-15

Family

ID=26319352

Family Applications (1)

Application Number Title Priority Date Filing Date
AT91902819T ATE132510T1 (de) 1989-11-21 1990-11-20 Anionisch polymerisierbare monomere, daraus hergestellte polymere und die verwendung der polymere in photowiderständen

Country Status (9)

Country Link
US (1) US5359101A (de)
EP (1) EP0502128B1 (de)
JP (1) JPH05504366A (de)
AT (1) ATE132510T1 (de)
CA (1) CA2019669A1 (de)
DE (1) DE69024661T2 (de)
ES (1) ES2082191T3 (de)
HK (1) HK1005457A1 (de)
WO (1) WO1991007446A1 (de)

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KR100363642B1 (ko) * 1999-11-11 2002-12-05 아남반도체 주식회사 반도체 소자의 접촉부 형성 방법
US6245933B1 (en) 1999-11-19 2001-06-12 Closure Medical Corporation Transesterification method for making cyanoacrylates
US7341716B2 (en) * 2002-04-12 2008-03-11 Boston Scientific Scimed, Inc. Occlusive composition
KR100822142B1 (ko) 2005-10-20 2008-04-14 주식회사 엘지화학 신규한 유기 실란 화합물
US7262313B2 (en) * 2005-10-20 2007-08-28 Lg Chem, Ltd. Organic silane compound
US7867688B2 (en) * 2006-05-30 2011-01-11 Eastman Kodak Company Laser ablation resist
US7745101B2 (en) * 2006-06-02 2010-06-29 Eastman Kodak Company Nanoparticle patterning process
US8686105B2 (en) * 2007-10-24 2014-04-01 Henkel IP & Holding GmbH Adhesive systems using imines and salts thereof, precursors to electron deficient olefins and coreactants therefor
CN102083784A (zh) * 2007-10-24 2011-06-01 洛克泰特(R&D)有限公司 缺电子烯烃和由其制备的可固化组合物
US20100086735A1 (en) * 2008-10-03 2010-04-08 The United States Of America As Represented By The Secretary Of The Navy Patterned Functionalization of Nanomechanical Resonators for Chemical Sensing
US10196471B1 (en) 2008-10-24 2019-02-05 Henkel IP & Holding GmbH Curable composition having an electron deficient olefin
US9765429B2 (en) 2013-09-04 2017-09-19 President And Fellows Of Harvard College Growing films via sequential liquid/vapor phases
EP3144072A1 (de) * 2015-09-17 2017-03-22 Henkel AG & Co. KGaA Spender, kit und verfahren zum aufbringen eines aktivators für härtbare cyanacrylatbasierte komponente

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US2721858A (en) * 1954-03-10 1955-10-25 Eastman Kodak Co Method of making alpha-cyanoacrylates
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Also Published As

Publication number Publication date
JPH05504366A (ja) 1993-07-08
WO1991007446A1 (en) 1991-05-30
EP0502128B1 (de) 1996-01-03
EP0502128A4 (de) 1992-04-02
ES2082191T3 (es) 1996-03-16
DE69024661T2 (de) 1996-08-01
HK1005457A1 (en) 1999-01-08
US5359101A (en) 1994-10-25
CA2019669A1 (en) 1991-05-21
EP0502128A1 (de) 1992-09-09
DE69024661D1 (de) 1996-02-15

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