ATE121854T1 - Verfahren zur bildung von fotowiderständen durchpolymerisation zweifach ungesättigter monomere. - Google Patents
Verfahren zur bildung von fotowiderständen durchpolymerisation zweifach ungesättigter monomere.Info
- Publication number
- ATE121854T1 ATE121854T1 AT90306514T AT90306514T ATE121854T1 AT E121854 T1 ATE121854 T1 AT E121854T1 AT 90306514 T AT90306514 T AT 90306514T AT 90306514 T AT90306514 T AT 90306514T AT E121854 T1 ATE121854 T1 AT E121854T1
- Authority
- AT
- Austria
- Prior art keywords
- photoresistors
- forming
- unsaturated monomers
- cyanopenta
- dienoate
- Prior art date
Links
- 239000000178 monomer Substances 0.000 title abstract 4
- 238000000034 method Methods 0.000 title abstract 2
- 230000000379 polymerizing effect Effects 0.000 title 1
- 239000011248 coating agent Substances 0.000 abstract 2
- 238000000576 coating method Methods 0.000 abstract 2
- 125000006527 (C1-C5) alkyl group Chemical group 0.000 abstract 1
- 125000006729 (C2-C5) alkenyl group Chemical group 0.000 abstract 1
- 206010073306 Exposure to radiation Diseases 0.000 abstract 1
- 125000002877 alkyl aryl group Chemical group 0.000 abstract 1
- -1 allyl 2-cyanopenta-2,4-dienoate Chemical compound 0.000 abstract 1
- 125000003118 aryl group Chemical group 0.000 abstract 1
- 230000008021 deposition Effects 0.000 abstract 1
- 125000006575 electron-withdrawing group Chemical group 0.000 abstract 1
- BWHKRILVUGMGCE-UHFFFAOYSA-N ethyl 2-cyanopenta-2,4-dienoate Chemical compound CCOC(=O)C(C#N)=CC=C BWHKRILVUGMGCE-UHFFFAOYSA-N 0.000 abstract 1
- 238000003384 imaging method Methods 0.000 abstract 1
- 238000001393 microlithography Methods 0.000 abstract 1
- 229920002120 photoresistant polymer Polymers 0.000 abstract 1
- 229920000642 polymer Polymers 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/167—Coating processes; Apparatus therefor from the gas phase, by plasma deposition
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Polymerisation Methods In General (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| IE204489A IE892044A1 (en) | 1989-06-23 | 1989-06-23 | Photoresists formed by polymerisation of di-unsaturated¹monomers |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE121854T1 true ATE121854T1 (de) | 1995-05-15 |
Family
ID=11032474
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT90306514T ATE121854T1 (de) | 1989-06-23 | 1990-06-14 | Verfahren zur bildung von fotowiderständen durchpolymerisation zweifach ungesättigter monomere. |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US5187048A (de) |
| EP (1) | EP0404446B1 (de) |
| JP (1) | JP2863276B2 (de) |
| KR (1) | KR910001464A (de) |
| AT (1) | ATE121854T1 (de) |
| CA (1) | CA2019666A1 (de) |
| DE (1) | DE69018883T2 (de) |
| IE (1) | IE892044A1 (de) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA2019669A1 (en) * | 1989-11-21 | 1991-05-21 | John Woods | Anionically polymerizable monomers, polymers thereof, and use of such polymers in photoresists |
| US5386047A (en) * | 1994-03-11 | 1995-01-31 | Loctite Corporation | Di-α-cyanopentadienoate disiloxane compounds for use in adhesives |
| US6291544B1 (en) * | 1997-08-15 | 2001-09-18 | Chemence, Inc. | Reactive esters of 2-cyanopenta-2,4-dienoic acid and the adhesives and polymers thereof |
| EP1266264A1 (de) * | 1999-11-30 | 2002-12-18 | Brewer Science, Inc. | Nicht-aromatische chromophoren zur verwendung in polymerischen antireflexionsbeschichtungen |
| US6749986B2 (en) * | 2000-09-08 | 2004-06-15 | Shipley Company, L.L.C. | Polymers and photoresist compositions for short wavelength imaging |
| JP2004148807A (ja) * | 2002-10-09 | 2004-05-27 | Fuji Photo Film Co Ltd | インクジェット記録方法 |
| JP4899770B2 (ja) | 2006-10-11 | 2012-03-21 | ソニー株式会社 | ヘッドホン装置 |
| US10018920B2 (en) * | 2016-03-04 | 2018-07-10 | Taiwan Semiconductor Manufacturing Co., Ltd. | Lithography patterning with a gas phase resist |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1222076C2 (de) * | 1962-02-03 | 1976-01-15 | Bayer Ag, 5090 Leverkusen | Verfahren zur herstellung von diepoxiden |
| US3554990A (en) * | 1968-06-10 | 1971-01-12 | Eastman Kodak Co | Esters of 2-cyanopenta-2,4-dienoic acid and polymers thereof |
| FR2041411A5 (de) * | 1969-04-23 | 1971-01-29 | Eastman Kodak Co | |
| US4081276A (en) * | 1976-10-18 | 1978-03-28 | General Electric Company | Photographic method |
| DE3036615A1 (de) * | 1980-09-29 | 1982-05-13 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zur herstellung von resiststrukturen |
| US4348473A (en) * | 1981-03-04 | 1982-09-07 | Xerox Corporation | Dry process for the production of microelectronic devices |
| US4425471A (en) * | 1981-04-23 | 1984-01-10 | Minnesota Mining & Manufacturing Company | Novel cyanoacrylate adhesive compositions and methods of bonding |
| EP0090089B1 (de) * | 1981-12-19 | 1988-10-05 | Daikin Kogyo Co., Ltd. | Resistmaterial und Verfahren zur Herstellung eines feinen Resistmusters |
| JPS58108213A (ja) * | 1981-12-22 | 1983-06-28 | Toagosei Chem Ind Co Ltd | ２−シアノアクリル酸エステル重合体の製造方法 |
| JPS58123727A (ja) * | 1982-01-18 | 1983-07-23 | Fujitsu Ltd | 半導体装置の製造方法 |
| US4460436A (en) * | 1983-09-06 | 1984-07-17 | International Business Machines Corporation | Deposition of polymer films by means of ion beams |
| EP0161256B1 (de) * | 1983-11-02 | 1988-01-13 | Hughes Aircraft Company | Pfropfpolymerisierte sio2 lithographische masken |
| US4675270A (en) * | 1986-02-10 | 1987-06-23 | Loctite (Ireland) Limited | Imaging method for vapor deposited photoresists of anionically polymerizable monomer |
| US4743528A (en) * | 1986-11-21 | 1988-05-10 | Eastman Kodak Company | Enhanced imaging composition containing an azinium activator |
-
1989
- 1989-06-23 IE IE204489A patent/IE892044A1/en unknown
-
1990
- 1990-06-14 AT AT90306514T patent/ATE121854T1/de not_active IP Right Cessation
- 1990-06-14 EP EP90306514A patent/EP0404446B1/de not_active Expired - Lifetime
- 1990-06-14 DE DE69018883T patent/DE69018883T2/de not_active Expired - Fee Related
- 1990-06-22 JP JP2165513A patent/JP2863276B2/ja not_active Expired - Lifetime
- 1990-06-22 CA CA002019666A patent/CA2019666A1/en not_active Abandoned
- 1990-06-23 KR KR1019900009357A patent/KR910001464A/ko not_active Application Discontinuation
-
1991
- 1991-08-28 US US07/751,414 patent/US5187048A/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0342662A (ja) | 1991-02-22 |
| DE69018883T2 (de) | 1995-12-21 |
| EP0404446B1 (de) | 1995-04-26 |
| CA2019666A1 (en) | 1990-12-23 |
| US5187048A (en) | 1993-02-16 |
| JP2863276B2 (ja) | 1999-03-03 |
| EP0404446A2 (de) | 1990-12-27 |
| DE69018883D1 (de) | 1995-06-01 |
| EP0404446A3 (de) | 1992-01-29 |
| IE892044A1 (en) | 1991-01-02 |
| KR910001464A (ko) | 1991-01-30 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |