GB2334145B - Methods and apparatus for cleaning,rinsing and drying wafers - Google Patents

Methods and apparatus for cleaning,rinsing and drying wafers

Info

Publication number
GB2334145B
GB2334145B GB9900410A GB9900410A GB2334145B GB 2334145 B GB2334145 B GB 2334145B GB 9900410 A GB9900410 A GB 9900410A GB 9900410 A GB9900410 A GB 9900410A GB 2334145 B GB2334145 B GB 2334145B
Authority
GB
United Kingdom
Prior art keywords
rinsing
cleaning
methods
drying wafers
wafers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
GB9900410A
Other languages
English (en)
Other versions
GB2334145A (en
GB9900410D0 (en
Inventor
Glenn E Peterson
Eric Shurtliff
Chad Goudie
John Natalicio
Gregory A Olsen
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Integrated Process Equipment Corp
Speedfam IPEC Corp
Speedfam Corp
Original Assignee
Integrated Process Equipment Corp
Speedfam IPEC Corp
Speedfam Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US08/676,546 external-priority patent/US5950327A/en
Application filed by Integrated Process Equipment Corp, Speedfam IPEC Corp, Speedfam Corp filed Critical Integrated Process Equipment Corp
Publication of GB9900410D0 publication Critical patent/GB9900410D0/en
Publication of GB2334145A publication Critical patent/GB2334145A/en
Application granted granted Critical
Publication of GB2334145B publication Critical patent/GB2334145B/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
GB9900410A 1996-07-08 1997-07-08 Methods and apparatus for cleaning,rinsing and drying wafers Expired - Fee Related GB2334145B (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US08/676,546 US5950327A (en) 1996-07-08 1996-07-08 Methods and apparatus for cleaning and drying wafers
US85520897A 1997-03-13 1997-03-13
PCT/US1997/011830 WO1998001892A1 (en) 1996-07-08 1997-07-08 Methods and apparatus for cleaning, rinsing, and drying wafers

Publications (3)

Publication Number Publication Date
GB9900410D0 GB9900410D0 (en) 1999-02-24
GB2334145A GB2334145A (en) 1999-08-11
GB2334145B true GB2334145B (en) 2001-08-22

Family

ID=27101574

Family Applications (1)

Application Number Title Priority Date Filing Date
GB9900410A Expired - Fee Related GB2334145B (en) 1996-07-08 1997-07-08 Methods and apparatus for cleaning,rinsing and drying wafers

Country Status (6)

Country Link
JP (1) JP2002509643A (de)
KR (1) KR20000023597A (de)
DE (2) DE19781822B4 (de)
GB (1) GB2334145B (de)
TW (1) TW387093B (de)
WO (1) WO1998001892A1 (de)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5954888A (en) * 1998-02-09 1999-09-21 Speedfam Corporation Post-CMP wet-HF cleaning station
WO1999053531A2 (en) * 1998-04-10 1999-10-21 Speedfam-Ipec Corporation Post-cmp wet-hf cleaning station
US6356091B1 (en) 1998-11-19 2002-03-12 Speedfam-Ipec Corporation Automatic wafer mapping in a wet environment on a wafer cleaner
US6368183B1 (en) 1999-02-03 2002-04-09 Speedfam-Ipec Corporation Wafer cleaning apparatus and associated wafer processing methods
DE19904548C2 (de) * 1999-02-04 2001-07-05 Steag Micro Tech Gmbh Verfahren und Vorrichtung zum Reinigen von Substraten
US6481447B1 (en) * 2000-09-27 2002-11-19 Lam Research Corporation Fluid delivery ring and methods for making and implementing the same
US6573522B2 (en) 2001-06-27 2003-06-03 Applied Matrials, Inc. Locator pin integrated with sensor for detecting semiconductor substrate carrier
JP3918981B2 (ja) * 2001-10-03 2007-05-23 東京エレクトロン株式会社 液処理装置及びその設定管理方法
KR100791709B1 (ko) * 2006-12-28 2008-01-03 동부일렉트로닉스 주식회사 웨이퍼의 노광장치 및 방법
KR100929817B1 (ko) * 2007-10-23 2009-12-07 세메스 주식회사 기판 처리 장치 및 기판 처리 장치의 제조 방법
US8795032B2 (en) * 2008-06-04 2014-08-05 Ebara Corporation Substrate processing apparatus, substrate processing method, substrate holding mechanism, and substrate holding method
TWI550760B (zh) * 2008-06-04 2016-09-21 荏原製作所股份有限公司 基板處理裝置、基板處理方法、基板保持機構及基板保持方法
KR101097509B1 (ko) * 2009-07-17 2011-12-22 주식회사 엠엠티 기판 세정장치
CN105665339B (zh) * 2016-02-17 2018-04-06 上海华力微电子有限公司 一种用于槽型湿法设备的干燥装置及干燥方法
CN108649008A (zh) * 2018-07-05 2018-10-12 睿力集成电路有限公司 用于离子注入后晶圆清洗的单片式清洗装置及方法
JP6892176B1 (ja) * 2020-11-19 2021-06-23 不二越機械工業株式会社 ワーク洗浄装置
CN216221344U (zh) * 2021-07-16 2022-04-08 北京石头世纪科技股份有限公司 基站和清洁机器人系统

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02250324A (ja) * 1989-03-23 1990-10-08 Hitachi Ltd 半導体装置の製造方法およびそれに使用される洗浄装置
EP0412796A2 (de) * 1989-08-09 1991-02-13 Shin-Etsu Handotai Company Limited Automatisches Reinigungsgerät für Scheiben
US5442828A (en) * 1992-11-30 1995-08-22 Ontrak Systems, Inc. Double-sided wafer scrubber with a wet submersing silicon wafer indexer
US5518552A (en) * 1992-05-28 1996-05-21 Tokyo Electron Limited Method for scrubbing and cleaning substrate

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5947457B2 (ja) * 1982-11-15 1984-11-19 株式会社東芝 半導体ウェファ−の洗浄方法
US4517752A (en) * 1983-06-27 1985-05-21 Machine Technology, Inc. Splash retarder
US4519846A (en) * 1984-03-08 1985-05-28 Seiichiro Aigo Process for washing and drying a semiconductor element
DE3644854A1 (de) * 1985-07-31 1987-07-30 Speedfam Corp Werkstueckhalter
JPS6362673A (ja) * 1986-09-01 1988-03-18 Speedfam Co Ltd 定寸機構付き平面研磨装置
JPS63224332A (ja) * 1987-03-13 1988-09-19 Nec Corp 半導体ウエハの両面洗浄装置
DE3814706A1 (de) * 1988-04-30 1989-11-09 Philips & Du Pont Optical Verfahren zur abscheidung einer duennen metallischen schutzschicht auf einem galvano
US5357645A (en) * 1989-04-09 1994-10-25 System Seiko Co., Ltd. Apparatus for cleaning and drying hard disk substrates
DE4100526A1 (de) * 1991-01-10 1992-07-16 Wacker Chemitronic Vorrichtung und verfahren zum automatischen vereinzeln von gestapelten scheiben
JP2640698B2 (ja) * 1991-07-31 1997-08-13 信越半導体株式会社 ウエーハの自動洗浄装置
JPH0547899A (ja) * 1991-08-20 1993-02-26 Sharp Corp ウエハー搬送用アーム
US5498199A (en) * 1992-06-15 1996-03-12 Speedfam Corporation Wafer polishing method and apparatus
US5329732A (en) * 1992-06-15 1994-07-19 Speedfam Corporation Wafer polishing method and apparatus
US5483984A (en) * 1992-07-10 1996-01-16 Donlan, Jr.; Fraser P. Fluid treatment apparatus and method
US5485644A (en) * 1993-03-18 1996-01-23 Dainippon Screen Mfg. Co., Ltd. Substrate treating apparatus
JPH0774225A (ja) * 1993-09-02 1995-03-17 Toshiba Corp 搬送装置
US5518542A (en) * 1993-11-05 1996-05-21 Tokyo Electron Limited Double-sided substrate cleaning apparatus
DE4408537A1 (de) * 1994-03-14 1995-09-21 Leybold Ag Vorrichtung für den Transport von Substraten
US5779203A (en) * 1996-06-28 1998-07-14 Edlinger; Erich Adjustable wafer cassette stand

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02250324A (ja) * 1989-03-23 1990-10-08 Hitachi Ltd 半導体装置の製造方法およびそれに使用される洗浄装置
EP0412796A2 (de) * 1989-08-09 1991-02-13 Shin-Etsu Handotai Company Limited Automatisches Reinigungsgerät für Scheiben
US5518552A (en) * 1992-05-28 1996-05-21 Tokyo Electron Limited Method for scrubbing and cleaning substrate
US5442828A (en) * 1992-11-30 1995-08-22 Ontrak Systems, Inc. Double-sided wafer scrubber with a wet submersing silicon wafer indexer
US5529638A (en) * 1992-11-30 1996-06-25 Ontrak Systems, Inc. Method for wafer scrubbing

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
IBM Technical Disclosure Bulletin, vol 17, no 2, 2/7/74, pg 427, "Wafer Processing", Carufe. *

Also Published As

Publication number Publication date
KR20000023597A (ko) 2000-04-25
WO1998001892A1 (en) 1998-01-15
JP2002509643A (ja) 2002-03-26
TW387093B (en) 2000-04-11
GB2334145A (en) 1999-08-11
GB9900410D0 (en) 1999-02-24
DE19781822B4 (de) 2004-09-09
DE19781822T1 (de) 1999-06-17

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Legal Events

Date Code Title Description
732E Amendments to the register in respect of changes of name or changes affecting rights (sect. 32/1977)
PCNP Patent ceased through non-payment of renewal fee

Effective date: 20030708