GB1597726A - Extremely low current load device for integrated circuit - Google Patents

Extremely low current load device for integrated circuit Download PDF

Info

Publication number
GB1597726A
GB1597726A GB39787/78A GB3978778A GB1597726A GB 1597726 A GB1597726 A GB 1597726A GB 39787/78 A GB39787/78 A GB 39787/78A GB 3978778 A GB3978778 A GB 3978778A GB 1597726 A GB1597726 A GB 1597726A
Authority
GB
United Kingdom
Prior art keywords
conductive path
substrate
defining
conductivity type
conductive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB39787/78A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CTU of Delaware Inc
Original Assignee
Mostek Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mostek Corp filed Critical Mostek Corp
Publication of GB1597726A publication Critical patent/GB1597726A/en
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/21Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
    • G11C11/34Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices
    • G11C11/40Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors
    • G11C11/41Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming static cells with positive feedback, i.e. cells not needing refreshing or charge regeneration, e.g. bistable multivibrator or Schmitt trigger
    • G11C11/412Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming static cells with positive feedback, i.e. cells not needing refreshing or charge regeneration, e.g. bistable multivibrator or Schmitt trigger using field-effect transistors only
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/80Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
    • H10D84/811Combinations of field-effect devices and one or more diodes, capacitors or resistors
    • H10D84/817Combinations of field-effect devices and resistors only
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00Interconnections in chips, wafers or substrates
    • H10W20/01Manufacture or treatment
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00Interconnections in chips, wafers or substrates
    • H10W20/20Interconnections within wafers or substrates, e.g. through-silicon vias [TSV]

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Semiconductor Memories (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Static Random-Access Memory (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Bipolar Transistors (AREA)
GB39787/78A 1976-11-22 1977-11-21 Extremely low current load device for integrated circuit Expired GB1597726A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US74381076A 1976-11-22 1976-11-22

Publications (1)

Publication Number Publication Date
GB1597726A true GB1597726A (en) 1981-09-09

Family

ID=24990283

Family Applications (2)

Application Number Title Priority Date Filing Date
GB39787/78A Expired GB1597726A (en) 1976-11-22 1977-11-21 Extremely low current load device for integrated circuit
GB48383/77A Expired GB1597725A (en) 1976-11-22 1977-11-21 Integrated circuit memory

Family Applications After (1)

Application Number Title Priority Date Filing Date
GB48383/77A Expired GB1597725A (en) 1976-11-22 1977-11-21 Integrated circuit memory

Country Status (5)

Country Link
JP (6) JPS5389382A (https=)
DE (1) DE2751481C2 (https=)
FR (2) FR2382744A1 (https=)
GB (2) GB1597726A (https=)
IT (1) IT1090938B (https=)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4453175A (en) * 1979-09-19 1984-06-05 Tokyo Shibaura Denki Kabushiki Kaisha MOS Static RAM layout with polysilicon resistors over FET gates
EP0032608A1 (en) * 1980-01-22 1981-07-29 Mostek Corporation Column line powered static ram cell
JPS57130461A (en) * 1981-02-06 1982-08-12 Hitachi Ltd Semiconductor memory storage
US4446613A (en) * 1981-10-19 1984-05-08 Intel Corporation Integrated circuit resistor and method of fabrication
JPS61134054A (ja) * 1984-12-04 1986-06-21 Nec Corp 半導体装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3576478A (en) * 1969-07-22 1971-04-27 Philco Ford Corp Igfet comprising n-type silicon substrate, silicon oxide gate insulator and p-type polycrystalline silicon gate electrode
GB1318856A (en) * 1971-03-18 1973-05-31 Ferranti Ltd Semiconductor devices
JPS5710578B2 (https=) * 1972-06-20 1982-02-26
GB1391959A (en) * 1972-07-20 1975-04-23 Ferranti Ltd Semiconductor devices
JPS584459B2 (ja) 1973-06-01 1983-01-26 株式会社日立製作所 フリツプフロツプ回路装置
GB1501114A (en) * 1974-04-25 1978-02-15 Rca Corp Method of making a semiconductor device
CH581904A5 (https=) * 1974-08-29 1976-11-15 Centre Electron Horloger
DE2733514A1 (de) * 1976-07-26 1978-02-09 Hitachi Ltd Halbleiter-vorrichtungen

Also Published As

Publication number Publication date
FR2382744A1 (fr) 1978-09-29
FR2382771A1 (fr) 1978-09-29
JP2696110B2 (ja) 1998-01-14
JPS60181055U (ja) 1985-12-02
JP2692439B2 (ja) 1997-12-17
JPH0613577A (ja) 1994-01-21
FR2382744B1 (https=) 1984-01-06
IT1090938B (it) 1985-06-26
JPS5389382A (en) 1978-08-05
GB1597725A (en) 1981-09-09
JPS6159360U (https=) 1986-04-21
JPH06188389A (ja) 1994-07-08
FR2382771B1 (https=) 1985-04-19
DE2751481C2 (de) 1986-10-23
JPS5886763A (ja) 1983-05-24
DE2751481A1 (de) 1978-06-08

Similar Documents

Publication Publication Date Title
EP0523830B1 (en) A stacked CMOS SRAM cell with polysilicon transistor load
US4297721A (en) Extremely low current load device for integrated circuit
US4258378A (en) Electrically alterable floating gate memory with self-aligned low-threshold series enhancement transistor
US5547892A (en) Process for forming stacked contacts and metal contacts on static random access memory having thin film transistors
CN100380666C (zh) 薄膜存储器、阵列及其操作方法和制造方法
KR100253032B1 (ko) 스테이틱 랜덤 액세스 메모리를 갖는 반도체 메모리 장치 및 그의 제조방법
US4290185A (en) Method of making an extremely low current load device for integrated circuit
EP0952614B1 (en) Field effect device with polycrystaline silicon channel
US4380863A (en) Method of making double level polysilicon series transistor devices
US5592011A (en) Single layer thin film transistor static random access memory cell
US5497022A (en) Semiconductor device and a method of manufacturing thereof
US6009010A (en) Static semiconductor memory device having data lines in parallel with power supply lines
US4251876A (en) Extremely low current load device for integrated circuit
KR100302578B1 (ko) 억세스속도를높일수있는스태틱반도체메모리디바이스
US5079611A (en) Semiconductor integrated circuit device and process for fabricating the same
US5985707A (en) Semiconductor memory device with improved current control through an access transistor and method thereof
GB1597726A (en) Extremely low current load device for integrated circuit
US5761113A (en) Soft error suppressing resistance load type SRAM cell
US4198695A (en) Static semiconductor memory cell using data lines for voltage supply
KR100252560B1 (ko) 반도체메모리장치및그제조방법
US4212083A (en) MOS Integrated with implanted resistor elements
US5323046A (en) Semiconductor device and method for producing semiconductor device
US5027175A (en) Integrated circuit semiconductor device having improved wiring structure
GB2070329A (en) Semiconductor memory device
JP3081620B2 (ja) 半導体装置及びその製造方法

Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]

Free format text: FOR PRINTING ERROR 1596726 READ 1597726

PE20 Patent expired after termination of 20 years

Effective date: 19971120