GB1533001A - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- GB1533001A GB1533001A GB52649/75A GB5264975A GB1533001A GB 1533001 A GB1533001 A GB 1533001A GB 52649/75 A GB52649/75 A GB 52649/75A GB 5264975 A GB5264975 A GB 5264975A GB 1533001 A GB1533001 A GB 1533001A
- Authority
- GB
- United Kingdom
- Prior art keywords
- mis structure
- electrode
- mis
- dec
- potential
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000004065 semiconductor Substances 0.000 title 1
- 239000000969 carrier Substances 0.000 abstract 2
- 230000004888 barrier function Effects 0.000 abstract 1
- 238000003384 imaging method Methods 0.000 abstract 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 abstract 1
- 229910001887 tin oxide Inorganic materials 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/148—Charge coupled imagers
- H01L27/14831—Area CCD imagers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/41—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions
- H01L29/423—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions not carrying the current to be rectified, amplified or switched
- H01L29/42312—Gate electrodes for field effect devices
- H01L29/42396—Gate electrodes for field effect devices for charge coupled devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B12/00—Dynamic random access memory [DRAM] devices
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Ceramic Engineering (AREA)
- Electromagnetism (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Transforming Light Signals Into Electric Signals (AREA)
Abstract
1533001 Charge coupled imaging device SONY CORP 23 Dec 1975 [25 Dec 1974] 52649/75 Heading H1K An image sensor comprises a first, light sensitive, MIS structure 22, Fig. 5, forming a potential well 33c in which minority carriers 35 generated by incident light are stored, and second and third MIS structures 24, 23 which form apotential barrier 33a and asecond potential wall 33b adjacent the potential wall 33c so that the carriers 35 can be transferred from the MIS structure 22 to the MIS structure 23 through the MIS structure 24, and thence along a shift register 29, Fig. 4, which includes a first electrode 28a and a second electrode 28b overlapping the first electrode. The electrode 26 of the MIS structure 22 may be tin oxide and the elecelectrode 28a polySi covered by an opaque Al layer 34. A further MIS structure 25 is used to prevent saturation of the MIS structure 22.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP753860A JPS5732547B2 (en) | 1974-12-25 | 1974-12-25 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1533001A true GB1533001A (en) | 1978-11-22 |
Family
ID=11568935
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB52649/75A Expired GB1533001A (en) | 1974-12-25 | 1975-12-23 | Semiconductor device |
Country Status (6)
Country | Link |
---|---|
JP (1) | JPS5732547B2 (en) |
CA (1) | CA1056058A (en) |
DE (1) | DE2558337C2 (en) |
FR (1) | FR2296266A1 (en) |
GB (1) | GB1533001A (en) |
NL (1) | NL7515024A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0030375A1 (en) * | 1979-12-07 | 1981-06-17 | Kabushiki Kaisha Toshiba | Solid state image sensor |
GB2149963A (en) * | 1983-10-07 | 1985-06-19 | Canon Kk | Solid state semiconductor device |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2606308C2 (en) | 1976-02-17 | 1985-05-23 | Siemens AG, 1000 Berlin und 8000 München | Two-dimensional optoelectronic semiconductor sensor |
JPS5374893A (en) * | 1976-12-15 | 1978-07-03 | Fujitsu Ltd | Driving method for semiconductor photosensitive device |
DE3044341C2 (en) * | 1980-11-25 | 1984-10-25 | Siemens AG, 1000 Berlin und 8000 München | Phototransistor |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
IE35581B1 (en) * | 1970-09-04 | 1976-03-31 | Gen Electric | Semiconductor apparatus for selectively moving electrical charges |
CA1106477A (en) * | 1972-07-10 | 1981-08-04 | Carlo H. Sequin | Overflow channel for charge transfer imaging devices |
-
1974
- 1974-12-25 JP JP753860A patent/JPS5732547B2/ja not_active Expired
-
1975
- 1975-12-23 CA CA242,395A patent/CA1056058A/en not_active Expired
- 1975-12-23 GB GB52649/75A patent/GB1533001A/en not_active Expired
- 1975-12-23 NL NL7515024A patent/NL7515024A/en not_active Application Discontinuation
- 1975-12-23 DE DE2558337A patent/DE2558337C2/en not_active Expired
- 1975-12-24 FR FR7539766A patent/FR2296266A1/en active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0030375A1 (en) * | 1979-12-07 | 1981-06-17 | Kabushiki Kaisha Toshiba | Solid state image sensor |
GB2149963A (en) * | 1983-10-07 | 1985-06-19 | Canon Kk | Solid state semiconductor device |
Also Published As
Publication number | Publication date |
---|---|
CA1056058A (en) | 1979-06-05 |
DE2558337C2 (en) | 1983-04-14 |
FR2296266A1 (en) | 1976-07-23 |
DE2558337A1 (en) | 1976-07-08 |
JPS5732547B2 (en) | 1982-07-12 |
FR2296266B1 (en) | 1982-09-24 |
NL7515024A (en) | 1976-06-29 |
JPS5175321A (en) | 1976-06-29 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed [section 19, patents act 1949] | ||
PCNP | Patent ceased through non-payment of renewal fee |
Effective date: 19931223 |