JPS5519820A - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JPS5519820A JPS5519820A JP9212478A JP9212478A JPS5519820A JP S5519820 A JPS5519820 A JP S5519820A JP 9212478 A JP9212478 A JP 9212478A JP 9212478 A JP9212478 A JP 9212478A JP S5519820 A JPS5519820 A JP S5519820A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- capacity
- information
- oxide film
- sio2
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 6
- 229910052681 coesite Inorganic materials 0.000 abstract 3
- 229910052906 cristobalite Inorganic materials 0.000 abstract 3
- 239000000377 silicon dioxide Substances 0.000 abstract 3
- 235000012239 silicon dioxide Nutrition 0.000 abstract 3
- 229910052682 stishovite Inorganic materials 0.000 abstract 3
- 229910052905 tridymite Inorganic materials 0.000 abstract 3
- 239000013078 crystal Substances 0.000 abstract 1
- 238000002347 injection Methods 0.000 abstract 1
- 239000007924 injection Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B12/00—Dynamic random access memory [DRAM] devices
- H10B12/30—DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells
Landscapes
- Semiconductor Integrated Circuits (AREA)
- Semiconductor Memories (AREA)
Abstract
PURPOSE:To obtain a small-type dynamic RAM by minimizing its area occupied by a memory cell section and increasing its information-storing capacity. CONSTITUTION:A P-type Si 101 is provided with a thick film 102 of SiO2; a transistor forming a cell section makes a gate oxide film 103; an injection of ion provides an N<+> gate electrode layer 104; and using impurity-adding multi-crystal or non-fixed type Si layers 105 and 106 as a source and a drain, a section adjoining a gate oxide film of a layer 107 is turned into a channel. A cell's information- accumulating capacity is composed by surface of the Si base and a layer 106 through an SiO2 layer 108. And then, this is covered with an SiO2 layer 109. The source 105 on a thick oxide film 102 is connected to a bit wire, a gate electrode 104 and a word wire so that information can be accumulated on a part of surface of the layer 106 adjoining the thin layer 108. Since parastic capacity is reduced in this mechanism, it is possible to reduce an area of information-accumulating capacity in proportion to reduction in the parastic capacity, the information-accumulating capacity can be doubled by piling the capacity section in a layer.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9212478A JPS5519820A (en) | 1978-07-27 | 1978-07-27 | Semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9212478A JPS5519820A (en) | 1978-07-27 | 1978-07-27 | Semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5519820A true JPS5519820A (en) | 1980-02-12 |
JPS6138620B2 JPS6138620B2 (en) | 1986-08-30 |
Family
ID=14045673
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9212478A Granted JPS5519820A (en) | 1978-07-27 | 1978-07-27 | Semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5519820A (en) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56107571A (en) * | 1980-01-30 | 1981-08-26 | Fujitsu Ltd | Semiconductor memory storage device |
JPS57176757A (en) * | 1981-04-22 | 1982-10-30 | Nec Corp | Semiconductor device |
JPS5982761A (en) * | 1982-11-04 | 1984-05-12 | Hitachi Ltd | Semiconductor memory |
JPS59129461A (en) * | 1983-01-13 | 1984-07-25 | Fujitsu Ltd | Semiconductor device and manufacture thereof |
JPS59222959A (en) * | 1983-06-01 | 1984-12-14 | Hitachi Ltd | Semiconductor memory |
JPS61113271A (en) * | 1984-11-08 | 1986-05-31 | Matsushita Electronics Corp | Semiconductor memory device |
EP0187237A2 (en) * | 1984-12-07 | 1986-07-16 | Texas Instruments Incorporated | dRAM cell and method |
JPS6344755A (en) * | 1987-08-10 | 1988-02-25 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Semiconductor integrated circuit device |
-
1978
- 1978-07-27 JP JP9212478A patent/JPS5519820A/en active Granted
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56107571A (en) * | 1980-01-30 | 1981-08-26 | Fujitsu Ltd | Semiconductor memory storage device |
JPH0131308B2 (en) * | 1980-01-30 | 1989-06-26 | Fujitsu Ltd | |
JPS57176757A (en) * | 1981-04-22 | 1982-10-30 | Nec Corp | Semiconductor device |
JPH0320906B2 (en) * | 1981-04-22 | 1991-03-20 | Nippon Electric Co | |
JPS5982761A (en) * | 1982-11-04 | 1984-05-12 | Hitachi Ltd | Semiconductor memory |
JPH0342514B2 (en) * | 1982-11-04 | 1991-06-27 | ||
JPS59129461A (en) * | 1983-01-13 | 1984-07-25 | Fujitsu Ltd | Semiconductor device and manufacture thereof |
JPH0480540B2 (en) * | 1983-01-13 | 1992-12-18 | Fujitsu Ltd | |
JPS59222959A (en) * | 1983-06-01 | 1984-12-14 | Hitachi Ltd | Semiconductor memory |
JPS61113271A (en) * | 1984-11-08 | 1986-05-31 | Matsushita Electronics Corp | Semiconductor memory device |
EP0187237A2 (en) * | 1984-12-07 | 1986-07-16 | Texas Instruments Incorporated | dRAM cell and method |
JPS6344755A (en) * | 1987-08-10 | 1988-02-25 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Semiconductor integrated circuit device |
Also Published As
Publication number | Publication date |
---|---|
JPS6138620B2 (en) | 1986-08-30 |
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