GB1516351A - Curable epoxide compositions - Google Patents

Curable epoxide compositions

Info

Publication number
GB1516351A
GB1516351A GB1570475A GB1570475A GB1516351A GB 1516351 A GB1516351 A GB 1516351A GB 1570475 A GB1570475 A GB 1570475A GB 1570475 A GB1570475 A GB 1570475A GB 1516351 A GB1516351 A GB 1516351A
Authority
GB
United Kingdom
Prior art keywords
epoxy resin
photo
imagewise exposure
curable epoxide
epoxide compositions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB1570475A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
General Electric Co
Original Assignee
General Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Electric Co filed Critical General Electric Co
Publication of GB1516351A publication Critical patent/GB1516351A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L61/00—Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
    • C08L61/04—Condensation polymers of aldehydes or ketones with phenols only
    • C08L61/06—Condensation polymers of aldehydes or ketones with phenols only of aldehydes with phenols
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C381/00—Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
    • C07C381/12—Sulfonium compounds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/66—Arsenic compounds
    • C07F9/68—Arsenic compounds without As—C bonds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/90—Antimony compounds
    • C07F9/902—Compounds without antimony-carbon linkages
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F236/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds
    • C08F236/02—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds
    • C08F236/04—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated
    • C08F236/14—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated containing elements other than carbon and hydrogen
    • C08F236/16—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated containing elements other than carbon and hydrogen containing halogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
    • C08G65/06—Cyclic ethers having no atoms other than carbon and hydrogen outside the ring
    • C08G65/08—Saturated oxiranes
    • C08G65/10—Saturated oxiranes characterised by the catalysts used
    • C08G65/105—Onium compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G85/00—General processes for preparing compounds provided for in this subclass
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L61/00—Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Epoxy Resins (AREA)
  • Reinforced Plastic Materials (AREA)
  • Paints Or Removers (AREA)
  • Casings For Electric Apparatus (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
GB1570475A 1974-05-02 1975-04-16 Curable epoxide compositions Expired GB1516351A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US46637574A 1974-05-02 1974-05-02

Publications (1)

Publication Number Publication Date
GB1516351A true GB1516351A (en) 1978-07-05

Family

ID=23851515

Family Applications (2)

Application Number Title Priority Date Filing Date
GB49878A Expired GB1516352A (en) 1974-05-02 1975-04-16 Halonium salts
GB1570475A Expired GB1516351A (en) 1974-05-02 1975-04-16 Curable epoxide compositions

Family Applications Before (1)

Application Number Title Priority Date Filing Date
GB49878A Expired GB1516352A (en) 1974-05-02 1975-04-16 Halonium salts

Country Status (5)

Country Link
JP (1) JPS5214277B2 (fr)
BE (1) BE828669A (fr)
DE (2) DE2559879C2 (fr)
FR (1) FR2269552B1 (fr)
GB (2) GB1516352A (fr)

Cited By (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4294746A (en) 1980-06-17 1981-10-13 Union Carbide Corporation Stabilizers for cycloaliphatic epoxide containing compositions
US4310469A (en) 1978-12-29 1982-01-12 General Electric Company Diaryliodonium salts
US4518676A (en) * 1982-09-18 1985-05-21 Ciba Geigy Corporation Photopolymerizable compositions containing diaryliodosyl salts
US4684671A (en) * 1985-01-25 1987-08-04 Asahi Denka Kogyo K.K. Energy beam curable composition
US4734444A (en) * 1986-02-14 1988-03-29 Basf Aktiengesellschaft Curable mixtures containing N-sulfonylaminosulfonium salts as cationically active catalysts
US4786569A (en) * 1985-09-04 1988-11-22 Ciba-Geigy Corporation Adhesively bonded photostructurable polyimide film
US4857437A (en) * 1986-12-17 1989-08-15 Ciba-Geigy Corporation Process for the formation of an image
US6313188B1 (en) 1996-09-19 2001-11-06 Nippon Soda Co., Ltd. Photocationically polymerizable composition comprising a polycyclic aromatic compound
WO2002013612A2 (fr) * 2000-08-14 2002-02-21 Cornell Development Corporation, Llc Compositions a base de composes d'iodonium et leurs methodes d'utilisation
WO2003074509A1 (fr) * 2002-03-04 2003-09-12 Wako Pure Chemical Industries, Ltd. Sels d'onium comportant des heterocycles
EP1348727A2 (fr) 2002-03-29 2003-10-01 Brother Kogyo Kabushiki Kaisha Couche réceptrice d'image et composition pour couches de revêtement de supports d'impression par jet d'encre
US6805439B2 (en) 2001-09-06 2004-10-19 Brother Kogyo Kabushiki Kaisha Active energy beam-curable composition, ink containing the same, and printer accommodating the same ink
WO2004099286A1 (fr) 2003-05-07 2004-11-18 Mitsui Chemicals, Inc. Composition de resine a photopolymerisation cationique et matiere destinee a proteger la surface d'un disque optique
US6855748B1 (en) 1999-09-16 2005-02-15 Huntsman Advanced Materials Americas, Inc. UV-curable compositions
US6866376B2 (en) 2001-09-28 2005-03-15 Brother Kogyo Kabushiki Kaisha Active energy beam-curable composition, ink containing the same, and printer accommodating the same ink
US7101918B2 (en) 2001-11-06 2006-09-05 Wako Pure Chemical Industries, Ltd. Hybrid type onium salt
US9416220B2 (en) 2012-05-18 2016-08-16 Cmet Inc. Resin composition for optical stereolithography
WO2021124114A1 (fr) 2019-12-18 2021-06-24 3M Innovative Properties Company Composition comprenant une résine de polyester insaturé, résine époxy et photo-initiateur et son procédé d'utilisation

Families Citing this family (65)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1539192A (en) 1975-01-27 1979-01-31 Ici Ltd Photopolymerisable compositions
US4256828A (en) * 1975-09-02 1981-03-17 Minnesota Mining And Manufacturing Company Photocopolymerizable compositions based on epoxy and hydroxyl-containing organic materials
AU517415B2 (en) * 1976-07-09 1981-07-30 General Electric Company Curable polymer composition
US4090936A (en) 1976-10-28 1978-05-23 Minnesota Mining And Manufacturing Company Photohardenable compositions
US4101513A (en) * 1977-02-02 1978-07-18 Minnesota Mining And Manufacturing Company Catalyst for condensation of hydrolyzable silanes and storage stable compositions thereof
GB1604953A (en) * 1977-08-05 1981-12-16 Gen Electric Photocurable compositions and method for curing
GB2027435B (en) * 1977-12-16 1982-11-24 Gen Electric Curable resin compositions
GB2013208B (en) * 1977-12-16 1982-11-24 Gen Electric Heat curable compositions
DE2854011C2 (de) * 1978-12-14 1983-04-21 General Electric Co., Schenectady, N.Y. Hitzehärtbare Masse und Verfahren zu deren Herstellung
US4246298A (en) * 1979-03-14 1981-01-20 American Can Company Rapid curing of epoxy resin coating compositions by combination of photoinitiation and controlled heat application
DE3029247C2 (de) * 1979-08-03 1996-04-11 Gen Electric UV-härtbare Siliconüberzugsmassen, Verfahren zu deren Herstellung und deren Verwendung
DE3107087A1 (de) * 1980-02-29 1981-12-24 CIBA-GEIGY AG, 4002 Basel "photopolymerisierbare gemische und verfahren zur photopolymerisation von kationisch polymerisierbaren verbindungen"
US4351708A (en) 1980-02-29 1982-09-28 Ciba-Geigy Corporation Photochemically or thermally polymerizable mixtures
JPS5887348A (ja) * 1981-11-20 1983-05-25 株式会社中川製作所 捲取ロ−ラ−
DE3369398D1 (en) * 1982-05-19 1987-02-26 Ciba Geigy Ag Curable compositions containing metallocen complexes, activated primers obtained therefrom and their use
US4482679A (en) * 1982-09-18 1984-11-13 Ciba-Geigy Corporation Heat-curable epoxy compositions containing diaryliodosyl salts
US4537725A (en) * 1982-09-18 1985-08-27 Ciba-Geigy Corporation Diaryliodosyl salts
JPS59152922A (ja) * 1983-02-18 1984-08-31 Mitsubishi Electric Corp 高エネルギ−線硬化型樹脂組成物
DE3565013D1 (en) * 1984-02-10 1988-10-20 Ciba Geigy Ag Process for the preparation of a protection layer or a relief pattern
US5194365A (en) * 1985-06-19 1993-03-16 Ciba-Geigy Corporation Method for forming images
CH678897A5 (fr) * 1986-05-10 1991-11-15 Ciba Geigy Ag
US4751138A (en) 1986-08-11 1988-06-14 Minnesota Mining And Manufacturing Company Coated abrasive having radiation curable binder
US4882201A (en) * 1988-03-21 1989-11-21 General Electric Company Non-toxic aryl onium salts, UV curable coating compositions and food packaging use
DE69029104T2 (de) 1989-07-12 1997-03-20 Fuji Photo Film Co Ltd Polysiloxane und positiv arbeitende Resistmasse
DE3933420C1 (fr) * 1989-10-06 1991-03-07 Th. Goldschmidt Ag, 4300 Essen, De
DE4024661C1 (en) * 1990-08-03 1992-04-02 Th. Goldschmidt Ag, 4300 Essen, De Tris:tri:fluoromethane:sulphonated complexes - prepd. by mixing boron tri:fluoro:methanesulphonate with onium salt in organic solvent
DE4027438C1 (en) * 1990-08-30 1991-08-29 Th. Goldschmidt Ag, 4300 Essen, De Cationically curable organo-polysiloxane cpd. prodn. - by reacting di:hydro:propane with an organo-polysiloxane in presence of catalyst at elevated temp.
DE4027437C1 (en) * 1990-08-30 1991-08-29 Th. Goldschmidt Ag, 4300 Essen, De Cationically curable organo-polysiloxane(s) - used as coating materials for laminar supports or modifying additives for cationically curable cpds.
DE4110793C1 (en) * 1991-04-04 1992-04-02 Th. Goldschmidt Ag, 4300 Essen, De Organo:polysiloxane - used as photoinitiator in cationically curable organo:polysiloxane compsn. esp. contg. epoxy¨ or vinyl¨ gps.
JPH0662692B2 (ja) * 1991-10-30 1994-08-17 オーテックス株式会社 光重合反応開始剤
DE4421623A1 (de) * 1994-06-21 1996-01-04 Thera Ges Fuer Patente Mehrkomponentige, kationisch härtende Epoxidmassen und deren Verwendung sowie Verfahren zur Herstellung gehärteter Massen
JP3442176B2 (ja) 1995-02-10 2003-09-02 富士写真フイルム株式会社 光重合性組成物
DE19534594B4 (de) * 1995-09-19 2007-07-26 Delo Industrieklebstoffe Gmbh & Co. Kg Kationisch härtende, flexible Epoxidharzmassen und ihre Verwendung zum Auftragen dünner Schichten
JPH1087963A (ja) * 1996-09-20 1998-04-07 Japan Synthetic Rubber Co Ltd 樹脂組成物および繊維質材料成形型
JP3786480B2 (ja) * 1996-10-14 2006-06-14 Ｊｓｒ株式会社 光硬化性樹脂組成物
JP3626302B2 (ja) * 1996-12-10 2005-03-09 Ｊｓｒ株式会社 光硬化性樹脂組成物
JP3765896B2 (ja) * 1996-12-13 2006-04-12 Ｊｓｒ株式会社 光学的立体造形用光硬化性樹脂組成物
EP1020479B1 (fr) 1999-01-16 2005-08-10 Goldschmidt GmbH Photoinitiateurs pour le durcissement cationique
JP4130030B2 (ja) 1999-03-09 2008-08-06 富士フイルム株式会社 感光性組成物および１，３−ジヒドロ−１−オキソ−２ｈ−インデン誘導体化合物
ATE269842T1 (de) 1999-08-02 2004-07-15 Nippon Soda Co Photovernetzbare zusammensetzungen mit einer iodonium-salz-verbindung
JP2001106648A (ja) * 1999-08-02 2001-04-17 Nippon Soda Co Ltd ヨードニウム塩化合物を含有する光硬化性組成物
AU5649400A (en) 1999-09-21 2001-10-11 Goldschmidt Ag Photoinitiators containing urethane groups for cationic curing
DE10341137A1 (de) 2003-09-06 2005-03-31 Goldschmidt Ag Verwendung von hydroxyfunktionellen Polyalkylorganosiloxanen als Lösungsmittel für kationische Photoinitiatoren für die Verwendung in strahlenhärtbaren Siliconen
JP4452572B2 (ja) 2004-07-06 2010-04-21 富士フイルム株式会社 感光性組成物およびそれを用いた画像記録方法
EP1701213A3 (fr) 2005-03-08 2006-11-22 Fuji Photo Film Co., Ltd. Composition photosensible
JP4474317B2 (ja) 2005-03-31 2010-06-02 富士フイルム株式会社 平版印刷版の作製方法
JP2006335826A (ja) 2005-05-31 2006-12-14 Fujifilm Holdings Corp インクジェット記録用インク組成物およびこれを用いた平版印刷版の作製方法
JP5276264B2 (ja) 2006-07-03 2013-08-28 富士フイルム株式会社 インク組成物、インクジェット記録方法、印刷物、及び、平版印刷版の製造方法
TW200838967A (en) 2007-02-02 2008-10-01 Jsr Corp Composition for radiation-curable adhesive, composite, and method for producing the composite
EP1955858B1 (fr) 2007-02-06 2014-06-18 FUJIFILM Corporation Procédé et dispositif d'impression à jet d'encre
EP1955850B1 (fr) 2007-02-07 2011-04-20 FUJIFILM Corporation Dispositif d'impression par jet d'encre avec dispositif de maintenance de tête d'impression par jet d'encre et procédé de maintenance de tête d'impression par jet d'encre
JP5224699B2 (ja) 2007-03-01 2013-07-03 富士フイルム株式会社 インク組成物、インクジェット記録方法、印刷物、平版印刷版の製造方法、及び平版印刷版
JP4898618B2 (ja) 2007-09-28 2012-03-21 富士フイルム株式会社 インクジェット記録方法
JP5265165B2 (ja) 2007-09-28 2013-08-14 富士フイルム株式会社 塗布装置及びこれを用いるインクジェット記録装置
JP5254632B2 (ja) 2008-02-07 2013-08-07 富士フイルム株式会社 インク組成物、インクジェット記録方法、印刷物、及び、成形印刷物
US20090214797A1 (en) 2008-02-25 2009-08-27 Fujifilm Corporation Inkjet ink composition, and inkjet recording method and printed material employing same
JP5583329B2 (ja) 2008-03-11 2014-09-03 富士フイルム株式会社 顔料組成物、インク組成物、印刷物、インクジェット記録方法、及びポリアリルアミン誘導体
JP4914862B2 (ja) 2008-03-26 2012-04-11 富士フイルム株式会社 インクジェット記録方法、及び、インクジェット記録装置
JP5350827B2 (ja) 2009-02-09 2013-11-27 富士フイルム株式会社 インク組成物、及び、インクジェット記録方法
JP5349095B2 (ja) 2009-03-17 2013-11-20 富士フイルム株式会社 インク組成物、及び、インクジェット記録方法
JP5530141B2 (ja) 2009-09-29 2014-06-25 富士フイルム株式会社 インク組成物及びインクジェット記録方法
JP5622564B2 (ja) 2010-06-30 2014-11-12 富士フイルム株式会社 感光性組成物、パターン形成材料、並びに、これを用いた感光性膜、パターン形成方法、パターン膜、低屈折率膜、光学デバイス、及び、固体撮像素子
EP2644664B1 (fr) 2012-03-29 2015-07-29 Fujifilm Corporation Composition d'encre de type durcissant au rayonnement actinique, procédé d'enregistrement à jet d'encre, feuille décorative, produit moulé en feuille décorative, procédé de production d'article moulé dans un moule, et article moulé dans un moule
JP5980702B2 (ja) 2013-03-07 2016-08-31 富士フイルム株式会社 インクジェットインク組成物、インクジェット記録方法、及び、成型印刷物の製造方法
JP5939644B2 (ja) 2013-08-30 2016-06-22 富士フイルム株式会社 画像形成方法、インモールド成型品の製造方法、及び、インクセット

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3708296A (en) 1968-08-20 1973-01-02 American Can Co Photopolymerization of epoxy monomers
AU497960B2 (en) * 1974-04-11 1979-01-25 Minnesota Mining And Manufacturing Company Photopolymerizable compositions
GB1539192A (en) * 1975-01-27 1979-01-31 Ici Ltd Photopolymerisable compositions

Cited By (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4310469A (en) 1978-12-29 1982-01-12 General Electric Company Diaryliodonium salts
US4294746A (en) 1980-06-17 1981-10-13 Union Carbide Corporation Stabilizers for cycloaliphatic epoxide containing compositions
US4518676A (en) * 1982-09-18 1985-05-21 Ciba Geigy Corporation Photopolymerizable compositions containing diaryliodosyl salts
US4684671A (en) * 1985-01-25 1987-08-04 Asahi Denka Kogyo K.K. Energy beam curable composition
US4786569A (en) * 1985-09-04 1988-11-22 Ciba-Geigy Corporation Adhesively bonded photostructurable polyimide film
US4935320A (en) * 1985-09-04 1990-06-19 Ciba-Geigy Corporation Adhesively bonded photostructurable polyimide film
US4734444A (en) * 1986-02-14 1988-03-29 Basf Aktiengesellschaft Curable mixtures containing N-sulfonylaminosulfonium salts as cationically active catalysts
US4857437A (en) * 1986-12-17 1989-08-15 Ciba-Geigy Corporation Process for the formation of an image
US6313188B1 (en) 1996-09-19 2001-11-06 Nippon Soda Co., Ltd. Photocationically polymerizable composition comprising a polycyclic aromatic compound
US7202286B2 (en) 1999-09-16 2007-04-10 Huntsman Advanced Materials Americas Inc. UV-curable compositions
US6855748B1 (en) 1999-09-16 2005-02-15 Huntsman Advanced Materials Americas, Inc. UV-curable compositions
WO2002013612A3 (fr) * 2000-08-14 2002-08-29 Cornell Dev Corp Llc Compositions a base de composes d'iodonium et leurs methodes d'utilisation
US6756013B1 (en) 2000-08-14 2004-06-29 Cornell Development Corporation, Llc Compositions of iodonium compounds and methods and uses thereof
WO2002013612A2 (fr) * 2000-08-14 2002-02-21 Cornell Development Corporation, Llc Compositions a base de composes d'iodonium et leurs methodes d'utilisation
US6805439B2 (en) 2001-09-06 2004-10-19 Brother Kogyo Kabushiki Kaisha Active energy beam-curable composition, ink containing the same, and printer accommodating the same ink
US6866376B2 (en) 2001-09-28 2005-03-15 Brother Kogyo Kabushiki Kaisha Active energy beam-curable composition, ink containing the same, and printer accommodating the same ink
US7101918B2 (en) 2001-11-06 2006-09-05 Wako Pure Chemical Industries, Ltd. Hybrid type onium salt
WO2003074509A1 (fr) * 2002-03-04 2003-09-12 Wako Pure Chemical Industries, Ltd. Sels d'onium comportant des heterocycles
US7833691B2 (en) 2002-03-04 2010-11-16 Wako Pure Chemical Industries, Ltd. Heterocycle-bearing onium salts
US7318991B2 (en) 2002-03-04 2008-01-15 Wako Pure Chemical Industries, Ltd. Heterocycle-bearing onium salts
KR100893607B1 (ko) 2002-03-04 2009-04-20 와코 쥰야꾸 고교 가부시키가이샤 헤테로환 함유 오늄염
EP1348727A2 (fr) 2002-03-29 2003-10-01 Brother Kogyo Kabushiki Kaisha Couche réceptrice d'image et composition pour couches de revêtement de supports d'impression par jet d'encre
EP1630189A1 (fr) * 2003-05-07 2006-03-01 Mitsui Chemicals, Inc. Composition de resine a photopolymerisation cationique et matiere destinee a proteger la surface d'un disque optique
WO2004099286A1 (fr) 2003-05-07 2004-11-18 Mitsui Chemicals, Inc. Composition de resine a photopolymerisation cationique et matiere destinee a proteger la surface d'un disque optique
EP1630189A4 (fr) * 2003-05-07 2011-06-22 Mitsui Chemicals Inc Composition de resine a photopolymerisation cationique et matiere destinee a proteger la surface d'un disque optique
US9416220B2 (en) 2012-05-18 2016-08-16 Cmet Inc. Resin composition for optical stereolithography
WO2021124114A1 (fr) 2019-12-18 2021-06-24 3M Innovative Properties Company Composition comprenant une résine de polyester insaturé, résine époxy et photo-initiateur et son procédé d'utilisation

Also Published As

Publication number Publication date
JPS5214277B2 (fr) 1977-04-20
DE2518639B2 (de) 1978-07-13
FR2269552B1 (fr) 1978-09-01
BE828669A (fr) 1975-09-01
FR2269552A1 (fr) 1975-11-28
DE2518639C3 (de) 1979-05-23
DE2518639A1 (de) 1975-11-06
DE2559879C2 (de) 1982-03-04
JPS50151996A (fr) 1975-12-06
GB1516352A (en) 1978-07-05

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Legal Events

Date Code Title Description
PS Patent sealed
429A Application made for amendment of specification (sect. 29/1949)
429H Application (made) for amendment of specification now open to opposition (sect. 29/1949)
429D Case decided by the comptroller ** specification amended (sect. 29/1949)
SP Amendment (slips) printed
PCNP Patent ceased through non-payment of renewal fee

Effective date: 19940416