JPS5214277B2 - - Google Patents

Info

Publication number
JPS5214277B2
JPS5214277B2 JP5211075A JP5211075A JPS5214277B2 JP S5214277 B2 JPS5214277 B2 JP S5214277B2 JP 5211075 A JP5211075 A JP 5211075A JP 5211075 A JP5211075 A JP 5211075A JP S5214277 B2 JPS5214277 B2 JP S5214277B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP5211075A
Other languages
Japanese (ja)
Other versions
JPS50151996A (fr
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS50151996A publication Critical patent/JPS50151996A/ja
Publication of JPS5214277B2 publication Critical patent/JPS5214277B2/ja
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L61/00—Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
    • C08L61/04—Condensation polymers of aldehydes or ketones with phenols only
    • C08L61/06—Condensation polymers of aldehydes or ketones with phenols only of aldehydes with phenols
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C381/00—Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
    • C07C381/12—Sulfonium compounds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/66—Arsenic compounds
    • C07F9/68—Arsenic compounds without As—C bonds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/90—Antimony compounds
    • C07F9/902—Compounds without antimony-carbon linkages
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F236/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds
    • C08F236/02—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds
    • C08F236/04—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated
    • C08F236/14—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated containing elements other than carbon and hydrogen
    • C08F236/16—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated containing elements other than carbon and hydrogen containing halogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
    • C08G65/06—Cyclic ethers having no atoms other than carbon and hydrogen outside the ring
    • C08G65/08—Saturated oxiranes
    • C08G65/10—Saturated oxiranes characterised by the catalysts used
    • C08G65/105—Onium compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G85/00—General processes for preparing compounds provided for in this subclass
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L61/00—Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Epoxy Resins (AREA)
  • Casings For Electric Apparatus (AREA)
  • Reinforced Plastic Materials (AREA)
  • Paints Or Removers (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP5211075A 1974-05-02 1975-05-01 Expired JPS5214277B2 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US46637574A 1974-05-02 1974-05-02

Publications (2)

Publication Number Publication Date
JPS50151996A JPS50151996A (fr) 1975-12-06
JPS5214277B2 true JPS5214277B2 (fr) 1977-04-20

Family

ID=23851515

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5211075A Expired JPS5214277B2 (fr) 1974-05-02 1975-05-01

Country Status (5)

Country Link
JP (1) JPS5214277B2 (fr)
BE (1) BE828669A (fr)
DE (2) DE2518639C3 (fr)
FR (1) FR2269552B1 (fr)
GB (2) GB1516352A (fr)

Cited By (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0410606A2 (fr) 1989-07-12 1991-01-30 Fuji Photo Film Co., Ltd. Polysiloxanes et compositions photoréserves positives
EP0726498A1 (fr) 1995-02-10 1996-08-14 Fuji Photo Film Co., Ltd. Composition photopolymérisable
EP1615073A1 (fr) 2004-07-06 2006-01-11 Fuji Photo Film Co., Ltd. Composition photosensible et procédé d'enregistrement d'images employant ladite composition
EP1701213A2 (fr) 2005-03-08 2006-09-13 Fuji Photo Film Co., Ltd. Composition photosensible
EP1707352A1 (fr) 2005-03-31 2006-10-04 Fuji Photo Film Co., Ltd. Procédé pour la fabrication d'une plaque lithographique
EP1728838A1 (fr) 2005-05-31 2006-12-06 Fuji Photo Film Co., Ltd. Composition d'encre pour l'enregistrement par jet d'encre et procédé de fabrication d'une plaque d'impression lithographique l'utilisant
EP1955858A1 (fr) 2007-02-06 2008-08-13 FUJIFILM Corporation Solution de sous-couche, procédé d'impression par jet d'encre et dispositif d'impression par jet d'encre
EP1955850A2 (fr) 2007-02-07 2008-08-13 FUJIFILM Corporation Dispositif de maintenance de tête d'impression par jet d'encre, dispositif d'impression par jet d'encre et procédé de maintenance de tête d'impression par jet d'encre
EP1975213A1 (fr) 2006-07-03 2008-10-01 FUJIFILM Corporation Composition d'encre, procédé d'enregistrement de jet d'encre, matériau d'impression, et procédé de production de plaque d'impression lithographique
EP1988136A1 (fr) 2007-03-01 2008-11-05 FUJIFILM Corporation Composition d'encre, procédé d'enregistrement de jet d'encre, matériau d'impression, procédé de production de plaque d'impression planographique et plaque d'impression planographique
EP2042335A2 (fr) 2007-09-28 2009-04-01 FUJIFILM Corporation Procédé d'impression par jet d'encre
EP2042243A2 (fr) 2007-09-28 2009-04-01 FUJIFILM Corporation Dispositif de revêtement et dispositif d'enregistrement à jet d'encre l'utilisant
EP2088176A1 (fr) 2008-02-07 2009-08-12 FUJIFILM Corporation Composition d'encre, procédé d'enregistrement à jet d'encre, et matériau imprimé, et matériau imprimé moulé
EP2093265A1 (fr) 2008-02-25 2009-08-26 FUJIFILM Corporation Composition d'encre pour jet d'encre, et procédé d'enregistrement à jet d'encre, et matériau imprimé l'utilisant
EP2100925A2 (fr) 2008-03-11 2009-09-16 FUJIFILM Corporation Composition de pigment, composition d'encre, procédé d'enregistrement à jet d'encre et dérivé de polyallylamine
EP2105478A1 (fr) 2008-03-26 2009-09-30 FUJIFILM Corporation Procédé d'enregistrement par jet d'encre et système d'enregistrement par jet d'encre
EP2216377A1 (fr) 2009-02-09 2010-08-11 FUJIFILM Corporation Composition d'encre et procédé d'enregistrement à jet d'encre
EP2230284A1 (fr) 2009-03-17 2010-09-22 Fujifilm Corporation Tintenzusammensetzung und Tintenaufzeichnungsverfahren
EP2311918A1 (fr) 2009-09-29 2011-04-20 FUJIFILM Corporation Composition d'encre et procédé d'enregistrement à jet d'encre
EP2644664A1 (fr) 2012-03-29 2013-10-02 Fujifilm Corporation Composition d'encre de type durcissant au rayonnement actinique, procédé d'enregistrement à jet d'encre, feuille décorative, produit moulé en feuille décorative, procédé de production d'article moulé dans un moule, et article moulé dans un moule
WO2014136923A1 (fr) 2013-03-07 2014-09-12 富士フイルム株式会社 Composition d'encre pour impression par jet d'encre, procédé d'impression par jet d'encre, matière imprimée et procédé de production de matière imprimée mise en forme
EP2842763A2 (fr) 2013-08-30 2015-03-04 Fujifilm Corporation Procédé de formation d'image, feuille décorative, moulage en feuille décorative, procédé de production de produit moulé, produit moulé dans le moule et ensemble d'encres

Families Citing this family (61)

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GB1539192A (en) 1975-01-27 1979-01-31 Ici Ltd Photopolymerisable compositions
US4256828A (en) * 1975-09-02 1981-03-17 Minnesota Mining And Manufacturing Company Photocopolymerizable compositions based on epoxy and hydroxyl-containing organic materials
AU517415B2 (en) * 1976-07-09 1981-07-30 General Electric Company Curable polymer composition
US4090936A (en) 1976-10-28 1978-05-23 Minnesota Mining And Manufacturing Company Photohardenable compositions
US4101513A (en) * 1977-02-02 1978-07-18 Minnesota Mining And Manufacturing Company Catalyst for condensation of hydrolyzable silanes and storage stable compositions thereof
GB1604953A (en) * 1977-08-05 1981-12-16 Gen Electric Photocurable compositions and method for curing
GB2013208B (en) * 1977-12-16 1982-11-24 Gen Electric Heat curable compositions
NL7812075A (nl) * 1977-12-16 1979-06-19 Gen Electric Hardbare, harsbevattende materialen en werkwijze voor het opschuimen hiervan.
DE2854011C2 (de) * 1978-12-14 1983-04-21 General Electric Co., Schenectady, N.Y. Hitzehärtbare Masse und Verfahren zu deren Herstellung
US4310469A (en) 1978-12-29 1982-01-12 General Electric Company Diaryliodonium salts
US4246298A (en) * 1979-03-14 1981-01-20 American Can Company Rapid curing of epoxy resin coating compositions by combination of photoinitiation and controlled heat application
DE3029247C2 (de) * 1979-08-03 1996-04-11 Gen Electric UV-härtbare Siliconüberzugsmassen, Verfahren zu deren Herstellung und deren Verwendung
US4351708A (en) 1980-02-29 1982-09-28 Ciba-Geigy Corporation Photochemically or thermally polymerizable mixtures
DE3107087A1 (de) * 1980-02-29 1981-12-24 CIBA-GEIGY AG, 4002 Basel "photopolymerisierbare gemische und verfahren zur photopolymerisation von kationisch polymerisierbaren verbindungen"
US4294746A (en) 1980-06-17 1981-10-13 Union Carbide Corporation Stabilizers for cycloaliphatic epoxide containing compositions
JPS5887348A (ja) * 1981-11-20 1983-05-25 株式会社中川製作所 捲取ロ−ラ−
EP0094915B1 (fr) * 1982-05-19 1987-01-21 Ciba-Geigy Ag Compositions durcissables à base de complexes métallocènes, obtention de précurseurs activables et emploi
US4518676A (en) * 1982-09-18 1985-05-21 Ciba Geigy Corporation Photopolymerizable compositions containing diaryliodosyl salts
US4482679A (en) * 1982-09-18 1984-11-13 Ciba-Geigy Corporation Heat-curable epoxy compositions containing diaryliodosyl salts
US4537725A (en) * 1982-09-18 1985-08-27 Ciba-Geigy Corporation Diaryliodosyl salts
JPS59152922A (ja) * 1983-02-18 1984-08-31 Mitsubishi Electric Corp 高エネルギ−線硬化型樹脂組成物
ATE37242T1 (de) * 1984-02-10 1988-09-15 Ciba Geigy Ag Verfahren zur herstellung einer schutzschicht oder einer reliefabbildung.
JPS61190524A (ja) * 1985-01-25 1986-08-25 Asahi Denka Kogyo Kk エネルギ−線硬化性組成物
US5194365A (en) * 1985-06-19 1993-03-16 Ciba-Geigy Corporation Method for forming images
US4786569A (en) * 1985-09-04 1988-11-22 Ciba-Geigy Corporation Adhesively bonded photostructurable polyimide film
DE3604580A1 (de) * 1986-02-14 1987-08-20 Basf Ag Haertbare mischungen, enthaltend n-sulfonylaminosulfoniumsalze als kationisch wirksame katalysatoren
US4849320A (en) * 1986-05-10 1989-07-18 Ciba-Geigy Corporation Method of forming images
US4751138A (en) 1986-08-11 1988-06-14 Minnesota Mining And Manufacturing Company Coated abrasive having radiation curable binder
US4857437A (en) * 1986-12-17 1989-08-15 Ciba-Geigy Corporation Process for the formation of an image
US4882201A (en) * 1988-03-21 1989-11-21 General Electric Company Non-toxic aryl onium salts, UV curable coating compositions and food packaging use
DE3933420C1 (fr) * 1989-10-06 1991-03-07 Th. Goldschmidt Ag, 4300 Essen, De
DE4024661C1 (en) * 1990-08-03 1992-04-02 Th. Goldschmidt Ag, 4300 Essen, De Tris:tri:fluoromethane:sulphonated complexes - prepd. by mixing boron tri:fluoro:methanesulphonate with onium salt in organic solvent
DE4027437C1 (en) * 1990-08-30 1991-08-29 Th. Goldschmidt Ag, 4300 Essen, De Cationically curable organo-polysiloxane(s) - used as coating materials for laminar supports or modifying additives for cationically curable cpds.
DE4027438C1 (en) * 1990-08-30 1991-08-29 Th. Goldschmidt Ag, 4300 Essen, De Cationically curable organo-polysiloxane cpd. prodn. - by reacting di:hydro:propane with an organo-polysiloxane in presence of catalyst at elevated temp.
DE4110793C1 (en) * 1991-04-04 1992-04-02 Th. Goldschmidt Ag, 4300 Essen, De Organo:polysiloxane - used as photoinitiator in cationically curable organo:polysiloxane compsn. esp. contg. epoxy¨ or vinyl¨ gps.
JPH0662692B2 (ja) * 1991-10-30 1994-08-17 オーテックス株式会社 光重合反応開始剤
DE4421623A1 (de) * 1994-06-21 1996-01-04 Thera Ges Fuer Patente Mehrkomponentige, kationisch härtende Epoxidmassen und deren Verwendung sowie Verfahren zur Herstellung gehärteter Massen
DE19534594B4 (de) * 1995-09-19 2007-07-26 Delo Industrieklebstoffe Gmbh & Co. Kg Kationisch härtende, flexible Epoxidharzmassen und ihre Verwendung zum Auftragen dünner Schichten
DE69731542T2 (de) 1996-09-19 2005-05-19 Nippon Soda Co. Ltd. Photokatalytische zusammensetzung
JPH1087963A (ja) * 1996-09-20 1998-04-07 Japan Synthetic Rubber Co Ltd 樹脂組成物および繊維質材料成形型
JP3786480B2 (ja) * 1996-10-14 2006-06-14 Ｊｓｒ株式会社 光硬化性樹脂組成物
JP3626302B2 (ja) * 1996-12-10 2005-03-09 Ｊｓｒ株式会社 光硬化性樹脂組成物
JP3765896B2 (ja) 1996-12-13 2006-04-12 Ｊｓｒ株式会社 光学的立体造形用光硬化性樹脂組成物
DE59912389D1 (de) 1999-01-16 2005-09-15 Goldschmidt Gmbh Photoinitiatoren zur kationischen Härtung
JP4130030B2 (ja) 1999-03-09 2008-08-06 富士フイルム株式会社 感光性組成物および１，３−ジヒドロ−１−オキソ−２ｈ−インデン誘導体化合物
US6677390B1 (en) 1999-08-02 2004-01-13 Nippon Soda Co., Ltd. Photocurable composition containing iodonium salt compound
JP2001106648A (ja) * 1999-08-02 2001-04-17 Nippon Soda Co Ltd ヨードニウム塩化合物を含有する光硬化性組成物
GB9921779D0 (en) 1999-09-16 1999-11-17 Ciba Sc Holding Ag UV-Curable compositions
AU5649400A (en) 1999-09-21 2001-10-11 Goldschmidt Ag Photoinitiators containing urethane groups for cationic curing
US6756013B1 (en) 2000-08-14 2004-06-29 Cornell Development Corporation, Llc Compositions of iodonium compounds and methods and uses thereof
JP2003073481A (ja) 2001-09-06 2003-03-12 Brother Ind Ltd 活性エネルギー線硬化型組成物、それを含有するインク及びそのインクを使用するプリンタ
JP2003105077A (ja) 2001-09-28 2003-04-09 Brother Ind Ltd 活性エネルギー線硬化型組成物、それを含有するインク及びそのインクを使用するプリンタ
TWI246525B (en) 2001-11-06 2006-01-01 Wako Pure Chem Ind Ltd Hybrid onium salt
EP1953149B1 (fr) 2002-03-04 2010-10-06 Wako Pure Chemical Industries, Ltd. Sel d'onium à base d'hétérocycle
EP1348727A3 (fr) 2002-03-29 2003-12-03 Brother Kogyo Kabushiki Kaisha Couche réceptrice d'image et composition pour couches de revêtement de supports d'impression par jet d'encre
US7709553B2 (en) * 2003-05-07 2010-05-04 Mitsui Chemicals, Inc. Photo cation polymerizable resin composition and surface protective material for optical disk
DE10341137A1 (de) 2003-09-06 2005-03-31 Goldschmidt Ag Verwendung von hydroxyfunktionellen Polyalkylorganosiloxanen als Lösungsmittel für kationische Photoinitiatoren für die Verwendung in strahlenhärtbaren Siliconen
TW200838967A (en) 2007-02-02 2008-10-01 Jsr Corp Composition for radiation-curable adhesive, composite, and method for producing the composite
JP5622564B2 (ja) 2010-06-30 2014-11-12 富士フイルム株式会社 感光性組成物、パターン形成材料、並びに、これを用いた感光性膜、パターン形成方法、パターン膜、低屈折率膜、光学デバイス、及び、固体撮像素子
WO2013172407A1 (fr) 2012-05-18 2013-11-21 シーメット株式会社 Composition de résine pour stéréolithographie optique
US20230051188A1 (en) 2019-12-18 2023-02-16 3M Innovative Properties Company Composition including unsaturated polyester resin, epoxy resin, and photoinitiator and method of using the same

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US3708296A (en) 1968-08-20 1973-01-02 American Can Co Photopolymerization of epoxy monomers
AU497960B2 (en) 1974-04-11 1979-01-25 Minnesota Mining And Manufacturing Company Photopolymerizable compositions
GB1539192A (en) 1975-01-27 1979-01-31 Ici Ltd Photopolymerisable compositions

Cited By (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0410606A2 (fr) 1989-07-12 1991-01-30 Fuji Photo Film Co., Ltd. Polysiloxanes et compositions photoréserves positives
EP0726498A1 (fr) 1995-02-10 1996-08-14 Fuji Photo Film Co., Ltd. Composition photopolymérisable
EP1615073A1 (fr) 2004-07-06 2006-01-11 Fuji Photo Film Co., Ltd. Composition photosensible et procédé d'enregistrement d'images employant ladite composition
EP1701213A2 (fr) 2005-03-08 2006-09-13 Fuji Photo Film Co., Ltd. Composition photosensible
EP1707352A1 (fr) 2005-03-31 2006-10-04 Fuji Photo Film Co., Ltd. Procédé pour la fabrication d'une plaque lithographique
EP1728838A1 (fr) 2005-05-31 2006-12-06 Fuji Photo Film Co., Ltd. Composition d'encre pour l'enregistrement par jet d'encre et procédé de fabrication d'une plaque d'impression lithographique l'utilisant
EP1975213A1 (fr) 2006-07-03 2008-10-01 FUJIFILM Corporation Composition d'encre, procédé d'enregistrement de jet d'encre, matériau d'impression, et procédé de production de plaque d'impression lithographique
EP1955858A1 (fr) 2007-02-06 2008-08-13 FUJIFILM Corporation Solution de sous-couche, procédé d'impression par jet d'encre et dispositif d'impression par jet d'encre
EP1955850A2 (fr) 2007-02-07 2008-08-13 FUJIFILM Corporation Dispositif de maintenance de tête d'impression par jet d'encre, dispositif d'impression par jet d'encre et procédé de maintenance de tête d'impression par jet d'encre
EP1988136A1 (fr) 2007-03-01 2008-11-05 FUJIFILM Corporation Composition d'encre, procédé d'enregistrement de jet d'encre, matériau d'impression, procédé de production de plaque d'impression planographique et plaque d'impression planographique
EP2042335A2 (fr) 2007-09-28 2009-04-01 FUJIFILM Corporation Procédé d'impression par jet d'encre
EP2042243A2 (fr) 2007-09-28 2009-04-01 FUJIFILM Corporation Dispositif de revêtement et dispositif d'enregistrement à jet d'encre l'utilisant
EP2088176A1 (fr) 2008-02-07 2009-08-12 FUJIFILM Corporation Composition d'encre, procédé d'enregistrement à jet d'encre, et matériau imprimé, et matériau imprimé moulé
EP2093265A1 (fr) 2008-02-25 2009-08-26 FUJIFILM Corporation Composition d'encre pour jet d'encre, et procédé d'enregistrement à jet d'encre, et matériau imprimé l'utilisant
EP2100925A2 (fr) 2008-03-11 2009-09-16 FUJIFILM Corporation Composition de pigment, composition d'encre, procédé d'enregistrement à jet d'encre et dérivé de polyallylamine
EP2105478A1 (fr) 2008-03-26 2009-09-30 FUJIFILM Corporation Procédé d'enregistrement par jet d'encre et système d'enregistrement par jet d'encre
EP2216377A1 (fr) 2009-02-09 2010-08-11 FUJIFILM Corporation Composition d'encre et procédé d'enregistrement à jet d'encre
EP2230284A1 (fr) 2009-03-17 2010-09-22 Fujifilm Corporation Tintenzusammensetzung und Tintenaufzeichnungsverfahren
EP2311918A1 (fr) 2009-09-29 2011-04-20 FUJIFILM Corporation Composition d'encre et procédé d'enregistrement à jet d'encre
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Publication number Publication date
FR2269552A1 (fr) 1975-11-28
DE2518639B2 (de) 1978-07-13
JPS50151996A (fr) 1975-12-06
BE828669A (fr) 1975-09-01
DE2518639A1 (de) 1975-11-06
DE2559879C2 (de) 1982-03-04
FR2269552B1 (fr) 1978-09-01
GB1516352A (en) 1978-07-05
DE2518639C3 (de) 1979-05-23
GB1516351A (en) 1978-07-05

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